CN102428213B - 金属的表面处理方法 - Google Patents
金属的表面处理方法 Download PDFInfo
- Publication number
- CN102428213B CN102428213B CN201080019011.4A CN201080019011A CN102428213B CN 102428213 B CN102428213 B CN 102428213B CN 201080019011 A CN201080019011 A CN 201080019011A CN 102428213 B CN102428213 B CN 102428213B
- Authority
- CN
- China
- Prior art keywords
- surface treatment
- electrolytic solution
- metallic surface
- mentioned
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 title claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 39
- 239000002184 metal Substances 0.000 title claims abstract description 39
- 238000004381 surface treatment Methods 0.000 claims abstract description 45
- 238000002848 electrochemical method Methods 0.000 claims abstract description 6
- 239000008151 electrolyte solution Substances 0.000 claims description 63
- 230000008569 process Effects 0.000 claims description 51
- 229910000861 Mg alloy Inorganic materials 0.000 claims description 29
- 230000003647 oxidation Effects 0.000 claims description 24
- 238000007254 oxidation reaction Methods 0.000 claims description 24
- 238000005868 electrolysis reaction Methods 0.000 claims description 20
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 239000011777 magnesium Substances 0.000 claims description 10
- 229910000838 Al alloy Inorganic materials 0.000 claims description 9
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- 150000004673 fluoride salts Chemical class 0.000 claims description 9
- 229910052749 magnesium Inorganic materials 0.000 claims description 9
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- 235000019353 potassium silicate Nutrition 0.000 claims description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 3
- 239000004111 Potassium silicate Substances 0.000 claims description 2
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 claims description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical group [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052913 potassium silicate Inorganic materials 0.000 claims description 2
- 239000011775 sodium fluoride Substances 0.000 claims description 2
- 235000013024 sodium fluoride Nutrition 0.000 claims description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 4
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 claims 2
- 235000019982 sodium hexametaphosphate Nutrition 0.000 claims 2
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims 2
- 229910018125 Al-Si Inorganic materials 0.000 claims 1
- 229910018520 Al—Si Inorganic materials 0.000 claims 1
- 239000008139 complexing agent Substances 0.000 abstract description 26
- 230000000694 effects Effects 0.000 abstract description 9
- 239000003792 electrolyte Substances 0.000 abstract description 7
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000004040 coloring Methods 0.000 abstract description 3
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 abstract 1
- 150000003681 vanadium Chemical class 0.000 abstract 1
- 229910001935 vanadium oxide Inorganic materials 0.000 abstract 1
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 20
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 20
- 239000012528 membrane Substances 0.000 description 14
- 150000003839 salts Chemical class 0.000 description 14
- 238000010586 diagram Methods 0.000 description 12
- 210000000981 epithelium Anatomy 0.000 description 11
- 238000004458 analytical method Methods 0.000 description 9
- 150000003016 phosphoric acids Chemical class 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 229910052720 vanadium Inorganic materials 0.000 description 7
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 230000003628 erosive effect Effects 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000001000 micrograph Methods 0.000 description 5
- 208000035126 Facies Diseases 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004512 die casting Methods 0.000 description 4
- 229940005740 hexametaphosphate Drugs 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- -1 silicon metalloid Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 244000137852 Petrea volubilis Species 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- FZIPCQLKPTZZIM-UHFFFAOYSA-N 2-oxidanylpropane-1,2,3-tricarboxylic acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O.OC(=O)CC(O)(C(O)=O)CC(O)=O FZIPCQLKPTZZIM-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910021552 Vanadium(IV) chloride Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000000879 optical micrograph Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000001226 triphosphate Substances 0.000 description 1
- 235000011178 triphosphate Nutrition 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 229910001456 vanadium ion Inorganic materials 0.000 description 1
- JTJFQBNJBPPZRI-UHFFFAOYSA-J vanadium tetrachloride Chemical compound Cl[V](Cl)(Cl)Cl JTJFQBNJBPPZRI-UHFFFAOYSA-J 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/14—Producing integrally coloured layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/30—Anodisation of magnesium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Chemical Treatment Of Metals (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2009-0035265 | 2009-04-22 | ||
| KR20090035265 | 2009-04-22 | ||
| KR10-2010-0036848 | 2010-04-21 | ||
| KR1020100036848A KR101195458B1 (ko) | 2009-04-22 | 2010-04-21 | 금속의 표면처리 방법 |
| PCT/KR2010/002519 WO2010123289A2 (ko) | 2009-04-22 | 2010-04-22 | 금속의 표면처리 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102428213A CN102428213A (zh) | 2012-04-25 |
| CN102428213B true CN102428213B (zh) | 2015-04-01 |
Family
ID=43403512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080019011.4A Active CN102428213B (zh) | 2009-04-22 | 2010-04-22 | 金属的表面处理方法 |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101195458B1 (ko) |
| CN (1) | CN102428213B (ko) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102649209B (zh) * | 2011-02-23 | 2015-08-12 | 汉达精密电子(昆山)有限公司 | 一种铝合金外观件的制作方法 |
| KR101274979B1 (ko) * | 2011-06-09 | 2013-06-14 | 한양대학교 에리카산학협력단 | 알루미늄 합금에 탄소나노튜브를 포함하는 코팅층을 형성하는 방법 및 이에 의해 형성된 코팅층을 갖는 알루미늄 합금 |
| CN103173836B (zh) * | 2012-11-22 | 2016-05-04 | 华南理工大学 | 镁合金微弧氧化低能耗黑色陶瓷膜及制备方法 |
| KR101476235B1 (ko) * | 2012-12-11 | 2014-12-24 | 한국기계연구원 | 플라즈마 전해산화를 이용한 마그네슘재 표면처리 방법, 이에 의해 형성된 마그네슘 양극산화피막 및 플라즈마 전해산화에 사용되는 마그네슘재 표면처리액 |
| CN104694993A (zh) * | 2013-12-06 | 2015-06-10 | 中国科学院兰州化学物理研究所 | 一种镁合金表面微弧氧化制备高吸光率的黑色陶瓷膜层工艺 |
| KR101701268B1 (ko) * | 2015-04-09 | 2017-02-13 | 현대성우메탈 주식회사 | 마그네슘 합금용 플라즈마 전해 산화용 전해액 및 이를 이용한 전해산화방법 |
| KR101709602B1 (ko) | 2015-12-10 | 2017-02-23 | 영남대학교 산학협력단 | 마이크로 아크 전해 산화 처리를 통한 알루미늄 합금 내산화 코팅층 제조방법 |
| CN107313097A (zh) * | 2016-04-26 | 2017-11-03 | 昆山汉鼎精密金属有限公司 | 压铸铝合金工件表面着色方法及其产品 |
| CN106757261B (zh) * | 2016-11-29 | 2018-11-09 | 中南大学 | 一种铝材表面氧化陶瓷膜和沸石膜复合的耐磨耐蚀涂层及其制备方法 |
| CN106868514A (zh) * | 2016-12-31 | 2017-06-20 | 马鞍山市川金属科技有限公司 | 一种提升汽车发动机盖支撑杆防腐性能的处理方法 |
| KR101894055B1 (ko) * | 2017-03-30 | 2018-08-31 | 고등기술연구원연구조합 | 알루미늄-실리콘 합금의 표면처리방법 |
| KR102153162B1 (ko) * | 2017-12-26 | 2020-09-07 | 주식회사 포스코 | 알루미늄합금 도금강판의 표면처리방법 및 이에 따라 제조된 알루미늄합금 도금강판 |
| KR102127959B1 (ko) * | 2018-12-05 | 2020-06-29 | 고등기술연구원연구조합 | 알루미늄계 금속의 표면처리 방법 |
| US11180832B2 (en) | 2018-12-17 | 2021-11-23 | Canon Kabushiki Kaisha | Magnesium-lithium alloy member, manufacturing method thereof, optical apparatus, imaging apparatus, electronic apparatus and mobile object |
| JP7418117B2 (ja) * | 2018-12-17 | 2024-01-19 | キヤノン株式会社 | マグネシウム－リチウム系合金部材及びその製造方法 |
| WO2023048342A1 (ko) * | 2021-09-27 | 2023-03-30 | 문정일 | 알루미늄 소재의 세라믹 코팅층 제조방법 및 이를 포함하여 제조된 알루미늄 소재의 조리기구 |
| CN114836805B (zh) * | 2022-04-24 | 2023-09-26 | 山东鹏博新材料有限公司 | 一种铝合金表面处理方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5069763A (en) * | 1990-01-02 | 1991-12-03 | Rudolf Hradcovsky | Method of coating aluminum with vanadium oxides |
| CN1050389C (zh) * | 1997-04-21 | 2000-03-15 | 哈尔滨环亚微弧技术有限公司 | 等离子体增强电化学表面陶瓷化能量控制方法 |
| CN1262344A (zh) * | 1999-02-04 | 2000-08-09 | 哈尔滨三利亚实业发展有限公司 | 等离子体增强电化学表面陶瓷化方法及其制得产品 |
| JP2000345370A (ja) * | 1999-06-07 | 2000-12-12 | Ueda Alumite Kogyo Kk | マグネシウム又はマグネシウム合金の表面処理方法 |
| JP2003253493A (ja) * | 2001-12-27 | 2003-09-10 | Kansai Paint Co Ltd | アルミニウム材の着色被膜形成方法 |
| JP2004018981A (ja) * | 2002-06-19 | 2004-01-22 | Toyota Central Res & Dev Lab Inc | マグネシウム系部材とその製造方法およびマグネシウム系部材の表面処理方法 |
| CN100425740C (zh) * | 2005-11-25 | 2008-10-15 | 湖南大学 | 镁合金在抑弧状态下的阳极氧化电解液及阳极氧化方法 |
| CN1928341A (zh) * | 2006-02-20 | 2007-03-14 | 山东华盛农业药械股份有限公司 | 一种铝合金缸体的生产方法 |
| CN101041904B (zh) * | 2006-03-25 | 2010-11-10 | 鸿富锦精密工业（深圳）有限公司 | 镁制品镀膜方法 |
| JP4125765B2 (ja) * | 2006-09-28 | 2008-07-30 | 日本パーカライジング株式会社 | 金属のセラミックス皮膜コーティング方法およびそれに用いる電解液ならびにセラミックス皮膜および金属材料 |
| CN101311326B (zh) * | 2007-05-25 | 2011-05-18 | 比亚迪股份有限公司 | 一种用于轻金属微弧氧化的电解液及微弧氧化方法 |
| CN101187049A (zh) * | 2007-09-18 | 2008-05-28 | 中国科学院长春应用化学研究所 | 稀土镁合金微弧氧化绿色陶瓷膜制备方法 |
| CN101270495B (zh) * | 2008-04-21 | 2010-10-27 | 华南理工大学 | 合金表面微弧氧化制备防腐抗磨陶瓷涂层的方法 |
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| CN102428213A (zh) | 2012-04-25 |
| KR20100116546A (ko) | 2010-11-01 |
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