CN102184930B - 固态成像装置和相机 - Google Patents
固态成像装置和相机 Download PDFInfo
- Publication number
- CN102184930B CN102184930B CN201110090935.XA CN201110090935A CN102184930B CN 102184930 B CN102184930 B CN 102184930B CN 201110090935 A CN201110090935 A CN 201110090935A CN 102184930 B CN102184930 B CN 102184930B
- Authority
- CN
- China
- Prior art keywords
- substrate
- pixel
- image pickup
- solid state
- state image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/199—Back-illuminated image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8057—Optical shielding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8063—Microlenses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8067—Reflectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/807—Pixel isolation structures
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-326175 | 2007-12-18 | ||
| JP2007326175A JP5167799B2 (ja) | 2007-12-18 | 2007-12-18 | 固体撮像装置およびカメラ |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101835900A Division CN101465364B (zh) | 2007-12-18 | 2008-12-18 | 固态成像装置和相机 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102184930A CN102184930A (zh) | 2011-09-14 |
| CN102184930B true CN102184930B (zh) | 2014-02-26 |
Family
ID=40429769
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110090935.XA Expired - Fee Related CN102184930B (zh) | 2007-12-18 | 2008-12-18 | 固态成像装置和相机 |
| CN2008101835900A Expired - Fee Related CN101465364B (zh) | 2007-12-18 | 2008-12-18 | 固态成像装置和相机 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101835900A Expired - Fee Related CN101465364B (zh) | 2007-12-18 | 2008-12-18 | 固态成像装置和相机 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8106983B2 (https=) |
| EP (1) | EP2073270B1 (https=) |
| JP (1) | JP5167799B2 (https=) |
| KR (1) | KR101534117B1 (https=) |
| CN (2) | CN102184930B (https=) |
| TW (1) | TWI416949B (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109844952A (zh) * | 2017-01-19 | 2019-06-04 | 索尼半导体解决方案公司 | 光接收元件、成像元件和成像装置 |
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7057256B2 (en) | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
| US7442629B2 (en) | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
| JP5167799B2 (ja) * | 2007-12-18 | 2013-03-21 | ソニー株式会社 | 固体撮像装置およびカメラ |
| JP5458690B2 (ja) * | 2009-06-22 | 2014-04-02 | ソニー株式会社 | 固体撮像装置およびカメラ |
| US20100327390A1 (en) * | 2009-06-26 | 2010-12-30 | Mccarten John P | Back-illuminated image sensor with electrically biased conductive material and backside well |
| US9911781B2 (en) | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
| US9673243B2 (en) | 2009-09-17 | 2017-06-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
| KR101893331B1 (ko) * | 2009-09-17 | 2018-08-30 | 사이오닉스, 엘엘씨 | 감광성 이미징 장치 및 이와 관련된 방법 |
| JP5564874B2 (ja) * | 2009-09-25 | 2014-08-06 | ソニー株式会社 | 固体撮像装置、及び電子機器 |
| JP5538811B2 (ja) * | 2009-10-21 | 2014-07-02 | キヤノン株式会社 | 固体撮像素子 |
| CN102104113B (zh) * | 2009-12-18 | 2014-05-07 | 中国科学院微电子研究所 | 有机场效应晶体管阈值电压的调制方法 |
| JP5458869B2 (ja) * | 2009-12-21 | 2014-04-02 | ソニー株式会社 | 固体撮像装置およびその駆動方法、カメラ |
| JP5538876B2 (ja) * | 2009-12-25 | 2014-07-02 | キヤノン株式会社 | 固体撮像装置 |
| KR101830196B1 (ko) * | 2010-02-12 | 2018-02-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 구동 방법 |
| JP5118715B2 (ja) * | 2010-03-11 | 2013-01-16 | 株式会社東芝 | 固体撮像装置 |
| US8692198B2 (en) | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
| US9891102B2 (en) * | 2010-04-22 | 2018-02-13 | Samsung Electronics Co., Ltd. | Simplified light sensing circuit, light sensing apparatus including the light sensing circuit, method of driving the light sensing apparatus, and image acquisition apparatus and optical touch screen apparatus including the light sensing apparatus |
| KR101652786B1 (ko) * | 2010-04-22 | 2016-09-12 | 삼성전자주식회사 | 단순화된 광센싱 회로 및 상기 광센싱 회로를 채용한 리모트 광터치 패널 및 영상 획득 장치 |
| KR102056905B1 (ko) * | 2011-07-25 | 2019-12-18 | 삼성전자주식회사 | 광센싱 장치 및 그 구동 방법, 광센싱 장치를 포함하는 광터치 스크린 장치 |
| WO2011160130A2 (en) | 2010-06-18 | 2011-12-22 | Sionyx, Inc | High speed photosensitive devices and associated methods |
| JP2012019169A (ja) * | 2010-07-09 | 2012-01-26 | Panasonic Corp | 固体撮像装置 |
| JP2012023207A (ja) * | 2010-07-14 | 2012-02-02 | Toshiba Corp | 裏面照射型固体撮像装置 |
| JP2012094672A (ja) * | 2010-10-27 | 2012-05-17 | Sony Corp | 半導体装置、および、半導体装置の製造方法 |
| US8785986B1 (en) * | 2011-02-02 | 2014-07-22 | Aptina Imaging Corporation | BCMD image sensor with junction gate for back side or front side illumination |
| CN103503438A (zh) | 2011-05-24 | 2014-01-08 | 索尼公司 | 固态图像拾取装置和相机系统 |
| US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
| WO2013010127A2 (en) | 2011-07-13 | 2013-01-17 | Sionyx, Inc. | Biometric imaging devices and associated methods |
| JP5791571B2 (ja) * | 2011-08-02 | 2015-10-07 | キヤノン株式会社 | 撮像素子及び撮像装置 |
| JP2013084785A (ja) | 2011-10-11 | 2013-05-09 | Sony Corp | 固体撮像装置、撮像装置 |
| JP2013090233A (ja) * | 2011-10-20 | 2013-05-13 | Sony Corp | 撮像素子およびカメラシステム |
| US9064764B2 (en) | 2012-03-22 | 2015-06-23 | Sionyx, Inc. | Pixel isolation elements, devices, and associated methods |
| US8686477B2 (en) * | 2012-07-25 | 2014-04-01 | Omnivision Technologies, Inc. | Ground contact structure for a low dark current CMOS pixel cell |
| DE102013110695A1 (de) * | 2012-10-02 | 2014-04-03 | Samsung Electronics Co., Ltd. | Bildsensor, Verfahren zum Betreiben desselben und Bildverarbeitungssystem mit demselben |
| KR20140047494A (ko) * | 2012-10-12 | 2014-04-22 | 삼성전자주식회사 | 서브픽셀, 이를 포함하는 이미지 센서, 및 이미지 센싱 시스템 |
| FR2997596B1 (fr) * | 2012-10-26 | 2015-12-04 | New Imaging Technologies Sas | Structure d'un pixel actif de type cmos |
| WO2014100787A1 (en) * | 2012-12-21 | 2014-06-26 | Flir Systems, Inc. | Compact multi-spectrum imaging with fusion |
| KR20150130303A (ko) | 2013-02-15 | 2015-11-23 | 사이오닉스, 아이엔씨. | 안티 블루밍 특성 및 관련 방법을 가지는 높은 동적 범위의 cmos 이미지 센서 |
| JP2014199898A (ja) * | 2013-03-11 | 2014-10-23 | ソニー株式会社 | 固体撮像素子および製造方法、並びに、電子機器 |
| JP6160139B2 (ja) * | 2013-03-13 | 2017-07-12 | セイコーエプソン株式会社 | 撮像装置及び方法 |
| US9939251B2 (en) | 2013-03-15 | 2018-04-10 | Sionyx, Llc | Three dimensional imaging utilizing stacked imager devices and associated methods |
| US9209345B2 (en) | 2013-06-29 | 2015-12-08 | Sionyx, Inc. | Shallow trench textured regions and associated methods |
| US10079325B2 (en) | 2013-11-04 | 2018-09-18 | Artto Aurola | Semiconductor radiation detector |
| US9147704B2 (en) * | 2013-11-11 | 2015-09-29 | Omnivision Technologies, Inc. | Dual pixel-sized color image sensors and methods for manufacturing the same |
| JP6233188B2 (ja) * | 2013-12-12 | 2017-11-22 | ソニー株式会社 | 固体撮像素子およびその製造方法、並びに電子機器 |
| US9312299B2 (en) | 2014-04-10 | 2016-04-12 | Omnivision Technologies, Inc. | Image sensor with dielectric charge trapping device |
| KR102306670B1 (ko) | 2014-08-29 | 2021-09-29 | 삼성전자주식회사 | 이미지 센서 및 그 제조 방법 |
| JP6576025B2 (ja) * | 2014-09-29 | 2019-09-18 | キヤノン株式会社 | 光電変換装置、及び撮像システム |
| JP2016081950A (ja) | 2014-10-10 | 2016-05-16 | ソニー株式会社 | 画素回路および撮像装置 |
| US9843756B2 (en) * | 2015-05-27 | 2017-12-12 | Samsung Electronics Co., Ltd. | Imaging devices, arrays of pixels receiving photocharges in bulk of select transistor, and methods |
| WO2019211968A1 (ja) * | 2018-05-02 | 2019-11-07 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像素子および撮像装置 |
| CN108922940B (zh) * | 2018-07-17 | 2020-03-06 | 京东方科技集团股份有限公司 | 光学检测像素单元、电路、光学检测方法和显示装置 |
| CN109726718B (zh) * | 2019-01-03 | 2022-09-16 | 电子科技大学 | 一种基于关系正则化的视觉场景图生成系统及方法 |
| JPWO2023132137A1 (https=) * | 2022-01-06 | 2023-07-13 | ||
| CN115356545B (zh) * | 2022-08-10 | 2023-04-11 | 中国科学院近代物理研究所 | 一种用于带电粒子探测的新型像素单元结构及其使用方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1310999A2 (en) * | 2001-11-13 | 2003-05-14 | Kabushiki Kaisha Toshiba | Solid image sensor using junction gate type field-effect transistor as pixel |
| CN1822379A (zh) * | 2004-12-30 | 2006-08-23 | 美格纳半导体有限会社 | 具有放大的光检测区域的图像传感器及其制造方法 |
| JP2006261638A (ja) * | 2005-02-21 | 2006-09-28 | Sony Corp | 固体撮像装置および固体撮像装置の駆動方法 |
| CN101312205A (zh) * | 2007-05-24 | 2008-11-26 | 索尼株式会社 | 固态成像装置及照相机 |
| CN101465364B (zh) * | 2007-12-18 | 2011-06-08 | 索尼株式会社 | 固态成像装置和相机 |
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| JPS60140752A (ja) | 1983-12-28 | 1985-07-25 | Olympus Optical Co Ltd | 半導体光電変換装置 |
| JPH0666446B2 (ja) | 1984-03-29 | 1994-08-24 | オリンパス光学工業株式会社 | 固体撮像素子 |
| JPS6414959A (en) | 1987-04-10 | 1989-01-19 | Texas Instruments Inc | Device for sensing threshold of substrate charge modulation type transistor |
| JP2692218B2 (ja) | 1988-12-29 | 1997-12-17 | ソニー株式会社 | 固体撮像素子 |
| JPH02304973A (ja) | 1989-05-19 | 1990-12-18 | Hitachi Ltd | 固体撮像装置 |
| JPH06120473A (ja) | 1992-10-08 | 1994-04-28 | Olympus Optical Co Ltd | 固体撮像装置及びその駆動方法 |
| JPH0778959A (ja) * | 1993-09-09 | 1995-03-20 | Sony Corp | 固体撮像素子 |
| JPH1065138A (ja) | 1996-08-19 | 1998-03-06 | Sony Corp | 固体撮像素子 |
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| JP2935492B2 (ja) | 1997-10-30 | 1999-08-16 | イノビジョン株式会社 | 固体撮像素子及び固体撮像素子による光信号検出方法 |
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| JP2007326175A (ja) | 2006-06-07 | 2007-12-20 | Nihon Micro Coating Co Ltd | クリーニングテープ及び方法 |
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-
2007
- 2007-12-18 JP JP2007326175A patent/JP5167799B2/ja not_active Expired - Fee Related
-
2008
- 2008-12-09 US US12/331,116 patent/US8106983B2/en not_active Expired - Fee Related
- 2008-12-15 TW TW097148776A patent/TWI416949B/zh not_active IP Right Cessation
- 2008-12-16 KR KR1020080127805A patent/KR101534117B1/ko not_active Expired - Fee Related
- 2008-12-17 EP EP08021947.0A patent/EP2073270B1/en not_active Not-in-force
- 2008-12-18 CN CN201110090935.XA patent/CN102184930B/zh not_active Expired - Fee Related
- 2008-12-18 CN CN2008101835900A patent/CN101465364B/zh not_active Expired - Fee Related
-
2012
- 2012-01-12 US US13/348,760 patent/US8687101B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1310999A2 (en) * | 2001-11-13 | 2003-05-14 | Kabushiki Kaisha Toshiba | Solid image sensor using junction gate type field-effect transistor as pixel |
| CN1822379A (zh) * | 2004-12-30 | 2006-08-23 | 美格纳半导体有限会社 | 具有放大的光检测区域的图像传感器及其制造方法 |
| JP2006261638A (ja) * | 2005-02-21 | 2006-09-28 | Sony Corp | 固体撮像装置および固体撮像装置の駆動方法 |
| CN101312205A (zh) * | 2007-05-24 | 2008-11-26 | 索尼株式会社 | 固态成像装置及照相机 |
| CN101465364B (zh) * | 2007-12-18 | 2011-06-08 | 索尼株式会社 | 固态成像装置和相机 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109844952A (zh) * | 2017-01-19 | 2019-06-04 | 索尼半导体解决方案公司 | 光接收元件、成像元件和成像装置 |
| CN109844952B (zh) * | 2017-01-19 | 2021-07-20 | 索尼半导体解决方案公司 | 光接收元件、成像元件和成像装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090153708A1 (en) | 2009-06-18 |
| US8687101B2 (en) | 2014-04-01 |
| TW200943938A (en) | 2009-10-16 |
| JP5167799B2 (ja) | 2013-03-21 |
| US8106983B2 (en) | 2012-01-31 |
| TWI416949B (zh) | 2013-11-21 |
| EP2073270A2 (en) | 2009-06-24 |
| CN101465364B (zh) | 2011-06-08 |
| JP2009152234A (ja) | 2009-07-09 |
| CN102184930A (zh) | 2011-09-14 |
| KR101534117B1 (ko) | 2015-07-06 |
| KR20090066227A (ko) | 2009-06-23 |
| EP2073270A3 (en) | 2012-05-16 |
| CN101465364A (zh) | 2009-06-24 |
| EP2073270B1 (en) | 2014-03-19 |
| US20120113292A1 (en) | 2012-05-10 |
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