CN102034794B - 测试结构及测试半导体衬底的方法 - Google Patents
测试结构及测试半导体衬底的方法 Download PDFInfo
- Publication number
- CN102034794B CN102034794B CN2009100579668A CN200910057966A CN102034794B CN 102034794 B CN102034794 B CN 102034794B CN 2009100579668 A CN2009100579668 A CN 2009100579668A CN 200910057966 A CN200910057966 A CN 200910057966A CN 102034794 B CN102034794 B CN 102034794B
- Authority
- CN
- China
- Prior art keywords
- comb section
- voltage
- read
- test structure
- dielectric layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2856—Internal circuit aspects, e.g. built-in test features; Test chips; Measuring material aspects, e.g. electro migration [EM]
- G01R31/2858—Measuring of material aspects, e.g. electro-migration [EM], hot carrier injection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2884—Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Environmental & Geological Engineering (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Claims (15)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009100579668A CN102034794B (zh) | 2009-09-28 | 2009-09-28 | 测试结构及测试半导体衬底的方法 |
US12/887,491 US20110074459A1 (en) | 2009-09-28 | 2010-09-21 | Structure and method for semiconductor testing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009100579668A CN102034794B (zh) | 2009-09-28 | 2009-09-28 | 测试结构及测试半导体衬底的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102034794A CN102034794A (zh) | 2011-04-27 |
CN102034794B true CN102034794B (zh) | 2012-10-31 |
Family
ID=43779617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009100579668A Expired - Fee Related CN102034794B (zh) | 2009-09-28 | 2009-09-28 | 测试结构及测试半导体衬底的方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20110074459A1 (zh) |
CN (1) | CN102034794B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107887291A (zh) * | 2017-12-27 | 2018-04-06 | 中国电子产品可靠性与环境试验研究所 | 连接通孔的电迁移寿命时间测试装置及其测试方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8519729B2 (en) * | 2010-02-10 | 2013-08-27 | Sunpower Corporation | Chucks for supporting solar cell in hot spot testing |
KR101711477B1 (ko) * | 2010-05-11 | 2017-03-14 | 삼성전자 주식회사 | 반도체 소자의 티디디비 테스트 구조 및 이를 이용한 티디디비 테스트 방법 |
CN102759677B (zh) * | 2011-04-27 | 2014-11-05 | 中芯国际集成电路制造(上海)有限公司 | 芯片测试结构以及测试方法 |
US8754655B2 (en) | 2011-08-11 | 2014-06-17 | International Business Machines Corporation | Test structure, method and circuit for simultaneously testing time dependent dielectric breakdown and electromigration or stress migration |
CN103137610B (zh) * | 2011-11-25 | 2015-07-08 | 中芯国际集成电路制造(上海)有限公司 | 一种微加热装置及形成方法 |
CN103187397B (zh) * | 2011-12-27 | 2015-09-02 | 中芯国际集成电路制造(上海)有限公司 | 微加热装置 |
CN102496611B (zh) * | 2011-12-31 | 2016-03-16 | 上海集成电路研发中心有限公司 | 用于集成电路金属互连的可靠性测试或mems电极层的结构 |
CN103295954B (zh) * | 2012-02-27 | 2015-09-09 | 中芯国际集成电路制造(上海)有限公司 | 形成半导体器件的方法 |
CN103579193B (zh) * | 2012-08-07 | 2016-04-06 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的漏电测试结构及测试方法 |
CN103681621B (zh) * | 2012-09-10 | 2016-03-16 | 中芯国际集成电路制造(上海)有限公司 | 半导体检测结构及形成方法 |
CN103779328B (zh) * | 2012-10-18 | 2016-08-31 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的测试结构及测试方法 |
CN104142459B (zh) * | 2013-05-09 | 2017-07-14 | 中芯国际集成电路制造(上海)有限公司 | 半导体检测电路及检测方法 |
CN104345253B (zh) * | 2013-08-02 | 2017-11-10 | 中芯国际集成电路制造(上海)有限公司 | 一种tddb的测试结构及测试方法 |
CN104681429B (zh) * | 2013-11-27 | 2017-12-29 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构的形成方法 |
CN104733438B (zh) * | 2013-12-19 | 2017-08-04 | 中芯国际集成电路制造(上海)有限公司 | 一种晶圆允收测试结构 |
US9881844B2 (en) * | 2013-12-19 | 2018-01-30 | Globalfoundries Singapore Pte. Ltd. | Integrated circuits with copper hillock-detecting structures and methods for detecting copper hillocks using the same |
CN105895619B (zh) * | 2015-01-23 | 2021-06-25 | 恩智浦美国有限公司 | 用于监测集成电路上金属退化的电路 |
US9851397B2 (en) | 2015-03-02 | 2017-12-26 | Globalfoundries Inc. | Electromigration testing of interconnect analogues having bottom-connected sensory pins |
JP6647145B2 (ja) * | 2016-05-30 | 2020-02-14 | ルネサスエレクトロニクス株式会社 | 半導体装置、電子制御システムおよび電子制御システムの評価方法 |
CN106653733A (zh) * | 2016-12-22 | 2017-05-10 | 中国电子科技集团公司第五十八研究所 | 一种漏电测试结构 |
US9953727B1 (en) * | 2017-02-10 | 2018-04-24 | Globalfoundries Inc. | Circuit and method for detecting time dependent dielectric breakdown (TDDB) shorts and signal-margin testing |
CN111007387A (zh) * | 2019-12-07 | 2020-04-14 | 苏州容启传感器科技有限公司 | 一种测试芯片及集成方法 |
CN112002651A (zh) * | 2020-06-18 | 2020-11-27 | 上海华力集成电路制造有限公司 | Mom结构及金属层间电介质击穿测试方法 |
CN113363241B (zh) * | 2021-05-13 | 2023-03-24 | 武汉新芯集成电路制造有限公司 | 测试结构及测试方法 |
CN115172336B (zh) * | 2022-09-06 | 2022-11-18 | 合肥晶合集成电路股份有限公司 | 一种测试结构 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1426098A (zh) * | 2001-11-02 | 2003-06-25 | 联华电子股份有限公司 | 监测自行对准硅化物残留的测试窗结构 |
CN101471239A (zh) * | 2007-12-26 | 2009-07-01 | 东部高科股份有限公司 | 半导体器件的测试图样及其制造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100797202B1 (ko) * | 2000-06-23 | 2008-01-23 | 허니웰 인터내셔널 인코포레이티드 | 손상된 실리카 유전 필름에 소수성을 부여하는 방법 및 손상된 실리카 유전 필름 처리 방법 |
KR100414213B1 (ko) * | 2001-07-24 | 2004-01-07 | 삼성전자주식회사 | 집적 회로 배선의 절연 신뢰성 검사 장치 |
US7764003B2 (en) * | 2006-04-04 | 2010-07-27 | Kolo Technologies, Inc. | Signal control in micromachined ultrasonic transducer |
US7355201B2 (en) * | 2006-06-27 | 2008-04-08 | Advanced Micro Devices, Inc. | Test structure for measuring electrical and dimensional characteristics |
US7851793B2 (en) * | 2006-11-07 | 2010-12-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Test structure with TDDB test pattern |
CN100561731C (zh) * | 2006-11-30 | 2009-11-18 | 中芯国际集成电路制造(上海)有限公司 | 多级互连的可靠性测试结构 |
CN101197348B (zh) * | 2006-12-05 | 2010-04-21 | 中芯国际集成电路制造(上海)有限公司 | 多用途多晶硅边缘测试结构 |
US7818698B2 (en) * | 2007-06-29 | 2010-10-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Accurate parasitic capacitance extraction for ultra large scale integrated circuits |
US7759957B2 (en) * | 2007-07-27 | 2010-07-20 | United Microelectronics Corp. | Method for fabricating a test structure |
US8481423B2 (en) * | 2007-09-19 | 2013-07-09 | International Business Machines Corporation | Methods to mitigate plasma damage in organosilicate dielectrics |
-
2009
- 2009-09-28 CN CN2009100579668A patent/CN102034794B/zh not_active Expired - Fee Related
-
2010
- 2010-09-21 US US12/887,491 patent/US20110074459A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1426098A (zh) * | 2001-11-02 | 2003-06-25 | 联华电子股份有限公司 | 监测自行对准硅化物残留的测试窗结构 |
CN101471239A (zh) * | 2007-12-26 | 2009-07-01 | 东部高科股份有限公司 | 半导体器件的测试图样及其制造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107887291A (zh) * | 2017-12-27 | 2018-04-06 | 中国电子产品可靠性与环境试验研究所 | 连接通孔的电迁移寿命时间测试装置及其测试方法 |
CN107887291B (zh) * | 2017-12-27 | 2020-07-10 | 中国电子产品可靠性与环境试验研究所 | 连接通孔的电迁移寿命时间测试装置及其测试方法 |
Also Published As
Publication number | Publication date |
---|---|
US20110074459A1 (en) | 2011-03-31 |
CN102034794A (zh) | 2011-04-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102034794B (zh) | 测试结构及测试半导体衬底的方法 | |
TWI601222B (zh) | 具有監控鏈與測試導線之積體電路測試結構 | |
CN100561731C (zh) | 多级互连的可靠性测试结构 | |
US6633083B2 (en) | Barrier layer integrity test | |
CN207925459U (zh) | 电子装置 | |
US8232115B2 (en) | Test structure for determination of TSV depth | |
CN107452715B (zh) | 用于测试晶体管结构的栅极绝缘的半导体器件和方法 | |
US8093074B2 (en) | Analysis method for semiconductor device | |
CN103545294B (zh) | 半导体检测结构及检测方法 | |
US9759766B2 (en) | Electromigration test structure for Cu barrier integrity and blech effect evaluations | |
CN103811467A (zh) | 电迁移测试结构及测试方法 | |
US7119545B2 (en) | Capacitive monitors for detecting metal extrusion during electromigration | |
CN111157152B (zh) | 用于测量微电子元件分层金属化结构中机械应力的传感器 | |
TWI619186B (zh) | 用於監測半導體製造之方法及裝置 | |
US9970981B2 (en) | Method and device for temperature measurement of FinFET devices | |
JP2007123755A (ja) | ボイド検出装置、その製造方法及び評価方法 | |
JP2002093918A (ja) | 集積回路及び集積回路の製造方法 | |
US20240168084A1 (en) | Semiconductor structure | |
JP2007317743A (ja) | 半導体装置 | |
KR20090088158A (ko) | 반도체 소자의 테스트 패턴 및 그 형성 방법 | |
KR100906063B1 (ko) | 테스트 소자 | |
KR100906052B1 (ko) | 플래시 메모리 소자의 테스트 패턴 형성 방법 | |
US20140332952A1 (en) | Semiconductor structure and method for testing the same | |
US6866416B1 (en) | Detecting heat generating failures in unpassivated semiconductor devices | |
JP2022042488A (ja) | プローブ位置モニタリング構造及びプローブの位置をモニタリングする方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20121109 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121109 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121031 Termination date: 20190928 |
|
CF01 | Termination of patent right due to non-payment of annual fee |