CN101946305B - 用于制备具有改善的边缘清晰度的结构的方法 - Google Patents

用于制备具有改善的边缘清晰度的结构的方法 Download PDF

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Publication number
CN101946305B
CN101946305B CN200880126667.9A CN200880126667A CN101946305B CN 101946305 B CN101946305 B CN 101946305B CN 200880126667 A CN200880126667 A CN 200880126667A CN 101946305 B CN101946305 B CN 101946305B
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radiation beam
power
focal point
multiphoton
scanning
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CN101946305A (zh
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布拉因·J·盖茨
罗伯特·T·克拉沙
普热梅斯瓦夫·P·马尔科维茨
克雷格·R·斯克拉
罗伯特·J·德沃
迪安·法克里斯
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3M Innovative Properties Co
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
CN200880126667.9A 2007-12-12 2008-11-06 用于制备具有改善的边缘清晰度的结构的方法 Active CN101946305B (zh)

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US1312107P 2007-12-12 2007-12-12
US61/013,121 2007-12-12
PCT/US2008/082588 WO2009075970A1 (en) 2007-12-12 2008-11-06 Method for making structures with improved edge definition

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CN101946305A CN101946305A (zh) 2011-01-12
CN101946305B true CN101946305B (zh) 2014-02-12

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US (1) US8455846B2 (enExample)
EP (1) EP2232531B1 (enExample)
JP (2) JP5524856B2 (enExample)
CN (1) CN101946305B (enExample)
WO (1) WO2009075970A1 (enExample)

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JP2020032561A (ja) * 2018-08-28 2020-03-05 富士ゼロックス株式会社 三次元形状データの生成装置、三次元造形装置、及び三次元形状データの生成プログラム
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ES2934510T3 (es) * 2020-03-31 2023-02-22 Upnano Gmbh Procedimiento y dispositivo para la fabricación generativa basada en litografía de un componente tridimensional
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CN113954359A (zh) * 2021-10-29 2022-01-21 江苏迪盛智能科技有限公司 一种扫描式光固化3d打印装置及其方法
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CN120202065A (zh) 2022-11-15 2025-06-24 舒万诺知识产权公司 用于从流体中去除颗粒的方法和套件
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