JP2011507031A - エッジ明瞭性が向上した構造の製造方法 - Google Patents
エッジ明瞭性が向上した構造の製造方法 Download PDFInfo
- Publication number
- JP2011507031A JP2011507031A JP2010538011A JP2010538011A JP2011507031A JP 2011507031 A JP2011507031 A JP 2011507031A JP 2010538011 A JP2010538011 A JP 2010538011A JP 2010538011 A JP2010538011 A JP 2010538011A JP 2011507031 A JP2011507031 A JP 2011507031A
- Authority
- JP
- Japan
- Prior art keywords
- emitted light
- output
- scanning
- focal point
- radiation beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title description 11
- 230000005855 radiation Effects 0.000 claims abstract description 58
- 239000000203 mixture Substances 0.000 claims abstract description 29
- 230000008859 change Effects 0.000 claims description 10
- 230000003746 surface roughness Effects 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 9
- 238000010521 absorption reaction Methods 0.000 claims description 7
- 230000004044 response Effects 0.000 claims description 2
- 239000011347 resin Substances 0.000 description 81
- 229920005989 resin Polymers 0.000 description 81
- 238000001723 curing Methods 0.000 description 25
- 230000003287 optical effect Effects 0.000 description 20
- 239000000758 substrate Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 11
- 230000033001 locomotion Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012806 monitoring device Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000011358 absorbing material Substances 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (18)
- 方法であって、多光子硬化性光反応性組成物に対して放射光線を走査する工程であって、前記放射光線が所定体積の前記多光子硬化性光反応性組成物を少なくとも部分的に硬化させるために充分な出力を有する工程と、
前記放射光線が走査される際に前記放射光線の特性を改変する工程と、を含む方法。 - 前記放射光線の特性を改変する工程によって、構造のエッジ明瞭性が変化する、請求項1に記載の方法。
- 前記放射光線の特性を改変する工程が、前記光線の出力を改変することを含む、請求項1に記載の方法。
- 前記放射光線の特性を改変する工程が、
前記放射光線の出力を測定することと、
前記放射光線の測定された出力を前記放射光線の所望の出力と比較することと、
前記放射光線の測定された出力が前記放射光線の所望の出力とほぼ等しくなるように前記放射光線の出力を変化させることと、を更に含む、請求項3に記載の方法。 - 前記放射光線の特性を改変する工程が、少なくとも部分的に硬化されたボクセルのサイズがほぼ一定に維持されるように前記放射光線の出力を改変することを含む、請求項3に記載の方法。
- 前記放射光線の特性を改変する工程が、前記放射光線の焦点の走査速度の変化に応じて前記放射光線の出力を改変することを含む、請求項3に記載の方法。
- 前記放射光線の特性を改変する工程が、前記光線の走査速度を改変することを含む、請求項1に記載の方法。
- 前記放射光線の特性を改変する工程が、前記放射光線を少なくとも1つの軸方向にディザリングすることを含む、請求項1に記載の方法。
- 前記放射光線の特性を改変する工程が、前記光線の焦点を空間変調することを含む、請求項1に記載の方法。
- 前記放射光線の特性を改変する工程によって、構造の表面粗さが低下する、請求項1に記載の方法。
- 前記放射光線の特性を改変する工程が、構造の縁部に達した時点で光線のシャッターを閉じることを含む、請求項1に記載の方法。
- 方法であって、多光子硬化性光反応性組成物の内部で放射光線の焦点を走査することによって所定体積の前記多光子硬化性光反応性組成物を多光子吸収により少なくとも部分的に硬化させる工程と、
前記焦点を走査するのと同時に前記放射光線の少なくとも一部の出力を測定する工程と、
前記放射光線の前記少なくとも一部の前記測定された出力を前記放射光線の所望の出力と比較する工程と、
前記測定された出力と前記所望の出力との間の差に基づいて、前記焦点を走査するのと同時に前記放射光線の出力を調節する工程と、を含む方法。 - 放射光線の焦点を走査する工程が、前記放射光線の前記焦点の走査速度を変化させることを含み、前記放射光線の前記所望の出力が、前記走査速度が変化する際に変化する、請求項12に記載の方法。
- 前記放射光線の前記出力を調節する工程が、ほぼ一定のボクセルサイズが維持されるように前記放射光線の前記出力を調節することを更に含む、請求項12に記載の方法。
- 方法であって、多光子硬化性光反応性組成物に対して放射光線の焦点を走査する工程であって、前記放射光線が前記焦点の近傍の所定体積の前記多光子硬化性光反応性組成物を少なくとも部分的に硬化させるために充分な出力を有する工程と、
前記焦点を走査するのと同時に前記放射光線の前記焦点を少なくとも1つの軸に沿ってディザリングする工程と、を含む方法。 - 前記放射光線の前記焦点が走査される際に前記放射光線の前記出力を改変することを更に含む、請求項15に記載の方法。
- 前記放射光線の前記焦点をディザリングする工程が、所定の体積の表面に沿ってあるいはその付近に前記焦点が走査される場合には前記放射光線の前記焦点をディザリングするが、前記所定体積内を走査する場合には前記放射光線の前記焦点をディザリングしないことを含む、請求項15に記載の方法。
- 方法であって、
多光子硬化性光反応性組成物内に境界を有する領域を特定する工程と、
前記特定された領域内の多光子硬化性光反応性組成物に対して放射光線を走査する工程であって、前記放射光線が所定体積の前記多光子硬化性光反応性組成物を少なくとも部分的に硬化させるために充分な出力を有する工程と、
前記放射光線を、前記境界を超えて前記特定された領域の外部へと走査する工程と、
前記放射光線が前記特定された領域の外部に達した時点で前記放射光線のシャッターを閉じる工程と、
前記放射光線を、前記境界を越えて前記特定された領域の内部へと走査する工程であって、前記放射光線が前記特定された領域の内部に達した時点で前記放射光線のシャッターが開かれ、前記放射光線の走査速度が、光線が前記境界を越えて走査される際に変化しない工程と、を含む方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1312107P | 2007-12-12 | 2007-12-12 | |
US61/013,121 | 2007-12-12 | ||
PCT/US2008/082588 WO2009075970A1 (en) | 2007-12-12 | 2008-11-06 | Method for making structures with improved edge definition |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014022569A Division JP5806348B2 (ja) | 2007-12-12 | 2014-02-07 | エッジ明瞭性が向上した構造の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011507031A true JP2011507031A (ja) | 2011-03-03 |
JP2011507031A5 JP2011507031A5 (ja) | 2011-12-22 |
JP5524856B2 JP5524856B2 (ja) | 2014-06-18 |
Family
ID=40755815
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010538011A Active JP5524856B2 (ja) | 2007-12-12 | 2008-11-06 | エッジ明瞭性が向上した構造の製造方法 |
JP2014022569A Active JP5806348B2 (ja) | 2007-12-12 | 2014-02-07 | エッジ明瞭性が向上した構造の製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014022569A Active JP5806348B2 (ja) | 2007-12-12 | 2014-02-07 | エッジ明瞭性が向上した構造の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8455846B2 (ja) |
EP (1) | EP2232531B1 (ja) |
JP (2) | JP5524856B2 (ja) |
CN (1) | CN101946305B (ja) |
WO (1) | WO2009075970A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016533925A (ja) * | 2013-08-07 | 2016-11-04 | マサチューセッツ インスティテュート オブ テクノロジー | 付加製造装置の自動プロセス制御 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8322874B2 (en) | 2007-09-06 | 2012-12-04 | 3M Innovative Properties Company | Lightguides having light extraction structures providing regional control of light output |
CN101795840B (zh) | 2007-09-06 | 2013-08-07 | 3M创新有限公司 | 形成模具的方法以及使用所述模具形成制品的方法 |
WO2009048808A1 (en) | 2007-10-11 | 2009-04-16 | 3M Innovative Properties Company | Chromatic confocal sensor |
JP5801558B2 (ja) | 2008-02-26 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子露光システム |
EP2228817B1 (en) * | 2009-03-09 | 2012-07-18 | IMS Nanofabrication AG | Global point spreading function in multi-beam patterning |
WO2014031793A2 (en) * | 2012-08-21 | 2014-02-27 | Massachusetts Institute Of Technology | Electromagnetic digital materials |
JP6485097B2 (ja) * | 2015-02-19 | 2019-03-20 | セイコーエプソン株式会社 | 立体物造形装置、立体物造形装置の制御方法、及び、立体物造形装置の制御プログラム |
DE102015208852A1 (de) * | 2015-05-13 | 2016-11-17 | Nanoscribe Gmbh | Verfahren zum Herstellen einer dreidimensionalen Struktur |
KR101766327B1 (ko) * | 2015-07-03 | 2017-08-09 | 진광식 | 자동 노광 제어 기능을 갖는 3차원 프린터 |
DE102017110241A1 (de) * | 2017-05-11 | 2018-11-15 | Nanoscribe Gmbh | Verfahren zum Erzeugen einer 3D-Struktur mittels Laserlithographie sowie Computerprogrammprodukt |
US10591815B2 (en) * | 2018-06-28 | 2020-03-17 | Applied Materials, Inc. | Shifting of patterns to reduce line waviness |
KR102239441B1 (ko) * | 2018-08-22 | 2021-04-12 | 주식회사 엘지화학 | 마스크 필름을 이용한 편광판의 제조방법 및 그 편광판 |
JP2020032561A (ja) * | 2018-08-28 | 2020-03-05 | 富士ゼロックス株式会社 | 三次元形状データの生成装置、三次元造形装置、及び三次元形状データの生成プログラム |
LU101723B1 (en) * | 2020-03-31 | 2021-09-30 | Univ Hamburg | Microchannel sensor and method of manufacturing the same |
EP3888887B1 (de) * | 2020-03-31 | 2022-11-16 | UpNano GmbH | Verfahren und vorrichtung zur lithographiebasierten generativen fertigung eines dreidimensionalen bauteils |
LU101722B1 (en) * | 2020-03-31 | 2021-09-30 | Univ Hamburg | Step-wise formation of a three-dimensional structure employing different resolutions |
CN113954359A (zh) * | 2021-10-29 | 2022-01-21 | 江苏迪盛智能科技有限公司 | 一种扫描式光固化3d打印装置及其方法 |
WO2023248159A1 (en) | 2022-06-23 | 2023-12-28 | 3M Innovative Properties Company | Methods and devices for removing particles from fluids |
WO2024105470A1 (en) | 2022-11-15 | 2024-05-23 | Solventum Intellectual Properties Company | Microstructured substrate including connected wells |
WO2024107373A1 (en) | 2022-11-15 | 2024-05-23 | Solventum Intellectual Properties Company | Methods and kits for removing particles from fluids |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02103127A (ja) * | 1988-10-13 | 1990-04-16 | Matsushita Electric Works Ltd | 三次元形状の形成方法および装置 |
JPH1031314A (ja) * | 1996-07-17 | 1998-02-03 | Sony Corp | フォトレジストの露光方法 |
JP2006106227A (ja) * | 2004-10-01 | 2006-04-20 | Hokkaido Univ | レーザ加工方法および装置 |
JP2006227609A (ja) * | 2005-01-24 | 2006-08-31 | Fuji Photo Film Co Ltd | 露光方法、凹凸状パターンの形成方法、及び光学素子の製造方法 |
JP2007118612A (ja) * | 1997-04-28 | 2007-05-17 | Three D Syst Inc | 立体造形法を用いた三次元物体の構築においてパルス放射線源を用いた硬化可能な媒体の露出を制御する装置 |
Family Cites Families (117)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3018262A (en) | 1957-05-01 | 1962-01-23 | Shell Oil Co | Curing polyepoxides with certain metal salts of inorganic acids |
US3729313A (en) | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
US3808006A (en) | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
US3779778A (en) | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
US3741769A (en) | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
AU497960B2 (en) | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
US4250053A (en) | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
US4249011A (en) | 1979-06-25 | 1981-02-03 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic compounds |
US4262072A (en) | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
US4279717A (en) | 1979-08-03 | 1981-07-21 | General Electric Company | Ultraviolet curable epoxy silicone coating compositions |
US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
US4668601A (en) | 1985-01-18 | 1987-05-26 | Minnesota Mining And Manufacturing Company | Protective coating for phototools |
US4642126A (en) | 1985-02-11 | 1987-02-10 | Norton Company | Coated abrasives with rapidly curable adhesives and controllable curvature |
US4652274A (en) | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
CA1323949C (en) | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
JPH01228828A (ja) * | 1988-03-08 | 1989-09-12 | Osaka Prefecture | 光学的造形法 |
US5182055A (en) * | 1988-04-18 | 1993-01-26 | 3D Systems, Inc. | Method of making a three-dimensional object by stereolithography |
US4859572A (en) | 1988-05-02 | 1989-08-22 | Eastman Kodak Company | Dye sensitized photographic imaging system |
US5369511A (en) | 1989-08-21 | 1994-11-29 | Amos; Carl R. | Methods of and apparatus for manipulating electromagnetic phenomenon |
JPH03193434A (ja) * | 1989-12-25 | 1991-08-23 | Matsushita Electric Works Ltd | 三次元形状の形成方法 |
JP2724232B2 (ja) | 1990-05-02 | 1998-03-09 | 株式会社日立製作所 | 自動焦点手段およびその自動焦点手段を用いた光ディスク装置 |
US5235015A (en) | 1991-02-21 | 1993-08-10 | Minnesota Mining And Manufacturing Company | High speed aqueous solvent developable photopolymer compositions |
GB9121789D0 (en) | 1991-10-14 | 1991-11-27 | Minnesota Mining & Mfg | Positive-acting photothermographic materials |
DE69217177T2 (de) | 1991-11-28 | 1997-05-15 | Enplas Corp | Flächenartige Lichtquelle |
TW268969B (ja) | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
US5298741A (en) | 1993-01-13 | 1994-03-29 | Trustees Of Tufts College | Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample |
JPH07137141A (ja) * | 1993-11-16 | 1995-05-30 | C Met Kk | ミラー式光硬化造形装置 |
US5512219A (en) | 1994-06-03 | 1996-04-30 | Reflexite Corporation | Method of casting a microstructure sheet having an array of prism elements using a reusable polycarbonate mold |
US5856373A (en) | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
JP3779358B2 (ja) * | 1995-10-06 | 2006-05-24 | ソニー株式会社 | 立体形状造形方法 |
US5858624A (en) | 1996-09-20 | 1999-01-12 | Minnesota Mining And Manufacturing Company | Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process |
US5922238A (en) | 1997-02-14 | 1999-07-13 | Physical Optics Corporation | Method of making replicas and compositions for use therewith |
DE19713362A1 (de) | 1997-03-29 | 1998-10-01 | Zeiss Carl Jena Gmbh | Konfokale mikroskopische Anordnung |
US5998495A (en) | 1997-04-11 | 1999-12-07 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
US6025406A (en) | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
US5770737A (en) | 1997-09-18 | 1998-06-23 | The United States Of America As Represented By The Secretary Of The Air Force | Asymmetrical dyes with large two-photon absorption cross-sections |
US5859251A (en) | 1997-09-18 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Air Force | Symmetrical dyes with large two-photon absorption cross-sections |
JP4564655B2 (ja) | 1998-04-21 | 2010-10-20 | ユニバーシティ オブ コネチカット | 多光子励起を用いたフリーフォームナノ製作 |
US6325961B1 (en) * | 1999-02-08 | 2001-12-04 | 3D Systems, Inc. | Stereolithographic method and apparatus with enhanced control of prescribed stimulation and application |
US6341029B1 (en) * | 1999-04-27 | 2002-01-22 | Gsi Lumonics, Inc. | Method and apparatus for shaping a laser-beam intensity profile by dithering |
US6100405A (en) | 1999-06-15 | 2000-08-08 | The United States Of America As Represented By The Secretary Of The Air Force | Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion |
US7046905B1 (en) | 1999-10-08 | 2006-05-16 | 3M Innovative Properties Company | Blacklight with structured surfaces |
JP2001150451A (ja) | 1999-11-22 | 2001-06-05 | Canon Inc | 成形型およびその製造方法 |
JP3815652B2 (ja) * | 1999-12-02 | 2006-08-30 | 独立行政法人科学技術振興機構 | 2光子マイクロ光造形方法およびその装置、2光子マイクロ光造形法によって形成した部品および可動機構 |
US6288842B1 (en) | 2000-02-22 | 2001-09-11 | 3M Innovative Properties | Sheeting with composite image that floats |
US6696157B1 (en) | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
US6560248B1 (en) * | 2000-06-08 | 2003-05-06 | Mania Barco Nv | System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
US7381516B2 (en) | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
ATE440305T1 (de) | 2000-06-15 | 2009-09-15 | 3M Innovative Properties Co | Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren |
AU2001266918A1 (en) | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
US6852766B1 (en) | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
DE60114820T2 (de) | 2000-06-15 | 2006-09-14 | 3M Innovative Properties Co., St. Paul | Mikroherstellungsverfahren für organische optische bauteile |
DE10034737C2 (de) | 2000-07-17 | 2002-07-11 | Fraunhofer Ges Forschung | Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung |
EP1245372B1 (en) | 2001-03-26 | 2011-09-28 | Novartis AG | Mould and method for the production of ophthalmic lenses |
US20020192569A1 (en) | 2001-05-15 | 2002-12-19 | The Chromaline Corporation | Devices and methods for exposure of photoreactive compositions with light emitting diodes |
TWI254815B (en) | 2001-05-22 | 2006-05-11 | Nichia Corp | Guide-plate for a plane-luminous device |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US20030006535A1 (en) | 2001-06-26 | 2003-01-09 | Michael Hennessey | Method and apparatus for forming microstructures on polymeric substrates |
DE10131156A1 (de) | 2001-06-29 | 2003-01-16 | Fraunhofer Ges Forschung | Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung |
US6804062B2 (en) | 2001-10-09 | 2004-10-12 | California Institute Of Technology | Nonimaging concentrator lens arrays and microfabrication of the same |
US6948448B2 (en) | 2001-11-27 | 2005-09-27 | General Electric Company | Apparatus and method for depositing large area coatings on planar surfaces |
US7887889B2 (en) | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
US6750266B2 (en) | 2001-12-28 | 2004-06-15 | 3M Innovative Properties Company | Multiphoton photosensitization system |
JP2003321704A (ja) * | 2002-05-01 | 2003-11-14 | Hitachi Ltd | 積層造形法およびそれに用いる積層造形装置 |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
US7478942B2 (en) | 2003-01-23 | 2009-01-20 | Samsung Electronics Co., Ltd. | Light guide plate with light reflection pattern |
TWI352228B (en) | 2003-02-28 | 2011-11-11 | Sharp Kk | Surface dadiation conversion element, liquid cryst |
JP4269745B2 (ja) | 2003-03-31 | 2009-05-27 | 株式会社日立製作所 | スタンパ及び転写装置 |
US20040202865A1 (en) | 2003-04-08 | 2004-10-14 | Andrew Homola | Release coating for stamper |
US7070406B2 (en) | 2003-04-29 | 2006-07-04 | Hewlett-Packard Development Company, L.P. | Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media |
KR100585108B1 (ko) * | 2003-11-14 | 2006-06-01 | 삼성전자주식회사 | 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법 |
EP1538482B1 (en) | 2003-12-05 | 2016-02-17 | Obducat AB | Device and method for large area lithography |
US9040090B2 (en) | 2003-12-19 | 2015-05-26 | The University Of North Carolina At Chapel Hill | Isolated and fixed micro and nano structures and methods thereof |
US7632087B2 (en) | 2003-12-19 | 2009-12-15 | Wd Media, Inc. | Composite stamper for imprint lithography |
US20050273146A1 (en) | 2003-12-24 | 2005-12-08 | Synecor, Llc | Liquid perfluoropolymers and medical applications incorporating same |
US20050271794A1 (en) | 2003-12-24 | 2005-12-08 | Synecor, Llc | Liquid perfluoropolymers and medical and cosmetic applications incorporating same |
US7282324B2 (en) | 2004-01-05 | 2007-10-16 | Microchem Corp. | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them |
JP4879159B2 (ja) | 2004-03-05 | 2012-02-22 | アプライド マテリアルズ インコーポレイテッド | アモルファス炭素膜堆積のためのcvdプロセス |
US20050254035A1 (en) | 2004-05-11 | 2005-11-17 | Chromaplex, Inc. | Multi-photon lithography |
US20050272599A1 (en) | 2004-06-04 | 2005-12-08 | Kenneth Kramer | Mold release layer |
JP4389791B2 (ja) | 2004-08-25 | 2009-12-24 | セイコーエプソン株式会社 | 微細構造体の製造方法および露光装置 |
JP2006165371A (ja) | 2004-12-09 | 2006-06-22 | Canon Inc | 転写装置およびデバイス製造方法 |
US9370881B2 (en) | 2005-03-02 | 2016-06-21 | The Trustees Of Boston College | Structures and methods of replicating the same |
KR100688866B1 (ko) | 2005-04-07 | 2007-03-02 | 삼성전기주식회사 | 임프린트 장치, 시스템 및 방법 |
US7478791B2 (en) | 2005-04-15 | 2009-01-20 | 3M Innovative Properties Company | Flexible mold comprising cured polymerizable resin composition |
KR100692742B1 (ko) | 2005-05-13 | 2007-03-09 | 삼성전자주식회사 | 도광층을 갖는 키 패드 및 키 패드 어셈블리 |
EP1959299B1 (en) | 2005-06-10 | 2012-12-26 | Obducat AB | Pattern replication with intermediate stamp |
US7326948B2 (en) * | 2005-08-15 | 2008-02-05 | Asml Netherlands B.V. | Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method |
KR100610336B1 (ko) | 2005-09-12 | 2006-08-09 | 김형준 | 키패드 백라이트용 도광판 및 그 제조 방법 |
US7878791B2 (en) | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
US20080319404A1 (en) | 2005-12-21 | 2008-12-25 | Pekurovsky Mikhail L | Microneedle Devices |
US7583444B1 (en) | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
JP4880701B2 (ja) | 2005-12-21 | 2012-02-22 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子硬化反応性組成物を処理するための方法及び装置 |
JP4845508B2 (ja) * | 2005-12-27 | 2011-12-28 | シーメット株式会社 | 光造形装置とオフセット距離設定方法 |
US7545569B2 (en) | 2006-01-13 | 2009-06-09 | Avery Dennison Corporation | Optical apparatus with flipped compound prism structures |
CA2643510C (en) | 2006-02-27 | 2014-04-29 | Microcontinuum, Inc. | Formation of pattern replicating tools |
TWM298289U (en) | 2006-03-17 | 2006-09-21 | Hon Hai Prec Ind Co Ltd | Light guide plates and electronic products using the same |
US20070216049A1 (en) | 2006-03-20 | 2007-09-20 | Heptagon Oy | Method and tool for manufacturing optical elements |
US8858807B2 (en) | 2006-03-24 | 2014-10-14 | 3M Innovative Properties Company | Process for making microneedles, microneedle arrays, masters, and replication tools |
CN101448632B (zh) | 2006-05-18 | 2012-12-12 | 3M创新有限公司 | 用于制备具有提取结构的光导的方法以及由此方法生产的光导 |
TWI322927B (en) | 2006-05-24 | 2010-04-01 | Ind Tech Res Inst | Roller module for microstructure thin film imprint |
TW200745490A (en) | 2006-06-07 | 2007-12-16 | Jeng Shiang Prec Ind Co Ltd | Light guide plate |
US20080007964A1 (en) | 2006-07-05 | 2008-01-10 | Tai-Yen Lin | Light guiding structure |
US7551359B2 (en) | 2006-09-14 | 2009-06-23 | 3M Innovative Properties Company | Beam splitter apparatus and system |
US20080083886A1 (en) | 2006-09-14 | 2008-04-10 | 3M Innovative Properties Company | Optical system suitable for processing multiphoton curable photoreactive compositions |
US8241713B2 (en) | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
US7891636B2 (en) | 2007-08-27 | 2011-02-22 | 3M Innovative Properties Company | Silicone mold and use thereof |
US8322874B2 (en) | 2007-09-06 | 2012-12-04 | 3M Innovative Properties Company | Lightguides having light extraction structures providing regional control of light output |
CN101795840B (zh) | 2007-09-06 | 2013-08-07 | 3M创新有限公司 | 形成模具的方法以及使用所述模具形成制品的方法 |
JP2010537843A (ja) | 2007-09-06 | 2010-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | 微細構造物品を作製するための工具 |
WO2009048808A1 (en) | 2007-10-11 | 2009-04-16 | 3M Innovative Properties Company | Chromatic confocal sensor |
WO2009048705A1 (en) | 2007-10-11 | 2009-04-16 | 3M Innovative Properties Company | Highly functional multiphoton curable reactive species |
US8586285B2 (en) | 2007-11-27 | 2013-11-19 | 3M Innovative Properties Company | Methods for forming sheeting with a composite image that floats and a master tooling |
US8080073B2 (en) | 2007-12-20 | 2011-12-20 | 3M Innovative Properties Company | Abrasive article having a plurality of precisely-shaped abrasive composites |
JP5801558B2 (ja) | 2008-02-26 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子露光システム |
US8570270B2 (en) | 2009-10-19 | 2013-10-29 | Apple Inc. | Backlight unit color compensation techniques |
TWM385715U (en) | 2009-12-14 | 2010-08-01 | Chunghwa Picture Tubes Ltd | Backlight module |
-
2008
- 2008-11-06 WO PCT/US2008/082588 patent/WO2009075970A1/en active Application Filing
- 2008-11-06 US US12/746,888 patent/US8455846B2/en active Active
- 2008-11-06 JP JP2010538011A patent/JP5524856B2/ja active Active
- 2008-11-06 CN CN200880126667.9A patent/CN101946305B/zh active Active
- 2008-11-06 EP EP08860374.1A patent/EP2232531B1/en active Active
-
2014
- 2014-02-07 JP JP2014022569A patent/JP5806348B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02103127A (ja) * | 1988-10-13 | 1990-04-16 | Matsushita Electric Works Ltd | 三次元形状の形成方法および装置 |
JPH1031314A (ja) * | 1996-07-17 | 1998-02-03 | Sony Corp | フォトレジストの露光方法 |
JP2007118612A (ja) * | 1997-04-28 | 2007-05-17 | Three D Syst Inc | 立体造形法を用いた三次元物体の構築においてパルス放射線源を用いた硬化可能な媒体の露出を制御する装置 |
JP2006106227A (ja) * | 2004-10-01 | 2006-04-20 | Hokkaido Univ | レーザ加工方法および装置 |
JP2006227609A (ja) * | 2005-01-24 | 2006-08-31 | Fuji Photo Film Co Ltd | 露光方法、凹凸状パターンの形成方法、及び光学素子の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016533925A (ja) * | 2013-08-07 | 2016-11-04 | マサチューセッツ インスティテュート オブ テクノロジー | 付加製造装置の自動プロセス制御 |
Also Published As
Publication number | Publication date |
---|---|
EP2232531A4 (en) | 2017-08-02 |
US20100294954A1 (en) | 2010-11-25 |
CN101946305B (zh) | 2014-02-12 |
WO2009075970A1 (en) | 2009-06-18 |
JP5524856B2 (ja) | 2014-06-18 |
US8455846B2 (en) | 2013-06-04 |
JP2014111385A (ja) | 2014-06-19 |
CN101946305A (zh) | 2011-01-12 |
EP2232531B1 (en) | 2018-09-19 |
JP5806348B2 (ja) | 2015-11-10 |
EP2232531A1 (en) | 2010-09-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5806348B2 (ja) | エッジ明瞭性が向上した構造の製造方法 | |
US20170225393A1 (en) | Apparatus and method for forming three-dimensional objects using two-photon absorption linear solidification | |
CN111316166B (zh) | 用于可缩放亚微米增材制造的深度分辨的并行双光子聚合的系统和方法 | |
US6833234B1 (en) | Stereolithographic patterning with variable size exposure areas | |
US20120098164A1 (en) | Two-photon stereolithography using photocurable compositions | |
JP2019524487A (ja) | リソグラフィに基づいて三次元構成要素を生成的に製造するための方法 | |
US10101652B2 (en) | Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus | |
US20180196353A1 (en) | Multiphoton absorption lithography processing system | |
US20210001540A1 (en) | System and method for submicron additive manufacturing | |
KR20220148321A (ko) | 연속 회절 광학 소자를 생성하기 위한 방법, 생성 방법을 수행하기 위한 장치, 및 연속 회절 광학 소자 | |
Park et al. | Investigation of three-dimensional pattern collapse owing to surface tension using an imperfection finite element model | |
JP2007251015A (ja) | レーザアニール装置及びレーザアニール方法 | |
JP7420967B2 (ja) | 3次元部品をリソグラフィに基づいて生成して製造するための方法及び装置 | |
US20100136489A1 (en) | Manufacturing device and manufacturing method for polymer waveguide device | |
US20230369052A1 (en) | Nano-scale lithography method | |
JP6941758B2 (ja) | 光学式シャッター装置及びその製造方法、光学装置、並びに画像形成方法。 | |
JP2004077747A (ja) | 3次元フォトニック結晶を形成する方法 | |
TR2022007784A2 (tr) | Nano ölçekte bi̇r li̇tografi̇ yöntemi̇ | |
Zyla | Laser-based 3D printing of novel optical devices | |
TW202231393A (zh) | 雷射加工設備、操作該設備的方法以及使用其加工工件的方法 | |
KR101389320B1 (ko) | 직접레이저 노광법을 이용한 위상회절소자 제조장치, 위상회절소자 제조방법 및 직접레이저 노광법을 이용한 위상회절소자 | |
Saghiri et al. | SU-8 multiple layer structuring by means of maskless photolithography (DWL66) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111031 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20111031 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130124 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130424 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20131008 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140207 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20140218 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140311 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140410 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5524856 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |