JP2011507031A5 - - Google Patents

Download PDF

Info

Publication number
JP2011507031A5
JP2011507031A5 JP2010538011A JP2010538011A JP2011507031A5 JP 2011507031 A5 JP2011507031 A5 JP 2011507031A5 JP 2010538011 A JP2010538011 A JP 2010538011A JP 2010538011 A JP2010538011 A JP 2010538011A JP 2011507031 A5 JP2011507031 A5 JP 2011507031A5
Authority
JP
Japan
Prior art keywords
emitted light
radiation beam
output
focal point
photoreactive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010538011A
Other languages
English (en)
Other versions
JP5524856B2 (ja
JP2011507031A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2008/082588 external-priority patent/WO2009075970A1/en
Publication of JP2011507031A publication Critical patent/JP2011507031A/ja
Publication of JP2011507031A5 publication Critical patent/JP2011507031A5/ja
Application granted granted Critical
Publication of JP5524856B2 publication Critical patent/JP5524856B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (3)

  1. 方法であって、多光子硬化性光反応性組成物に対して放射光線を走査する工程であって、前記放射光線が所定体積の前記多光子硬化性光反応性組成物を少なくとも部分的に硬化させるために充分な出力を有する工程と、
    前記放射光線が走査される際に前記放射光線の特性を改変する工程と、を含む方法。
  2. 前記放射光線の特性を改変する工程が、
    前記放射光線の出力を測定することと、
    前記放射光線の測定された出力を前記放射光線の所望の出力と比較することと、
    前記放射光線の測定された出力が前記放射光線の所望の出力とほぼ等しくなるように前記放射光線の出力を変化させることと、を更に含む、請求項1に記載の方法。
  3. 方法であって、多光子硬化性光反応性組成物に対して放射光線の焦点を走査する工程であって、前記放射光線が前記焦点の近傍の所定体積の前記多光子硬化性光反応性組成物を少なくとも部分的に硬化させるために充分な出力を有する工程と、
    前記焦点を走査するのと同時に前記放射光線の前記焦点を少なくとも1つの軸に沿ってディザリングする工程と、を含む方法。
JP2010538011A 2007-12-12 2008-11-06 エッジ明瞭性が向上した構造の製造方法 Active JP5524856B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US1312107P 2007-12-12 2007-12-12
US61/013,121 2007-12-12
PCT/US2008/082588 WO2009075970A1 (en) 2007-12-12 2008-11-06 Method for making structures with improved edge definition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014022569A Division JP5806348B2 (ja) 2007-12-12 2014-02-07 エッジ明瞭性が向上した構造の製造方法

Publications (3)

Publication Number Publication Date
JP2011507031A JP2011507031A (ja) 2011-03-03
JP2011507031A5 true JP2011507031A5 (ja) 2011-12-22
JP5524856B2 JP5524856B2 (ja) 2014-06-18

Family

ID=40755815

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010538011A Active JP5524856B2 (ja) 2007-12-12 2008-11-06 エッジ明瞭性が向上した構造の製造方法
JP2014022569A Active JP5806348B2 (ja) 2007-12-12 2014-02-07 エッジ明瞭性が向上した構造の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2014022569A Active JP5806348B2 (ja) 2007-12-12 2014-02-07 エッジ明瞭性が向上した構造の製造方法

Country Status (5)

Country Link
US (1) US8455846B2 (ja)
EP (1) EP2232531B1 (ja)
JP (2) JP5524856B2 (ja)
CN (1) CN101946305B (ja)
WO (1) WO2009075970A1 (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9440376B2 (en) 2007-09-06 2016-09-13 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
CN101796443A (zh) 2007-09-06 2010-08-04 3M创新有限公司 具有提供输出光区域控制的光提取结构的光导装置
US8451457B2 (en) 2007-10-11 2013-05-28 3M Innovative Properties Company Chromatic confocal sensor
EP2257854B1 (en) 2008-02-26 2018-10-31 3M Innovative Properties Company Multi-photon exposure system
EP2228817B1 (en) * 2009-03-09 2012-07-18 IMS Nanofabrication AG Global point spreading function in multi-beam patterning
WO2014031793A2 (en) * 2012-08-21 2014-02-27 Massachusetts Institute Of Technology Electromagnetic digital materials
US9855698B2 (en) * 2013-08-07 2018-01-02 Massachusetts Institute Of Technology Automatic process control of additive manufacturing device
JP6485097B2 (ja) 2015-02-19 2019-03-20 セイコーエプソン株式会社 立体物造形装置、立体物造形装置の制御方法、及び、立体物造形装置の制御プログラム
DE102015208852A1 (de) * 2015-05-13 2016-11-17 Nanoscribe Gmbh Verfahren zum Herstellen einer dreidimensionalen Struktur
KR101766327B1 (ko) * 2015-07-03 2017-08-09 진광식 자동 노광 제어 기능을 갖는 3차원 프린터
DE102017110241A1 (de) * 2017-05-11 2018-11-15 Nanoscribe Gmbh Verfahren zum Erzeugen einer 3D-Struktur mittels Laserlithographie sowie Computerprogrammprodukt
US10591815B2 (en) * 2018-06-28 2020-03-17 Applied Materials, Inc. Shifting of patterns to reduce line waviness
KR102239441B1 (ko) 2018-08-22 2021-04-12 주식회사 엘지화학 마스크 필름을 이용한 편광판의 제조방법 및 그 편광판
JP2020032561A (ja) * 2018-08-28 2020-03-05 富士ゼロックス株式会社 三次元形状データの生成装置、三次元造形装置、及び三次元形状データの生成プログラム
EP3888887B1 (de) * 2020-03-31 2022-11-16 UpNano GmbH Verfahren und vorrichtung zur lithographiebasierten generativen fertigung eines dreidimensionalen bauteils
LU101722B1 (en) * 2020-03-31 2021-09-30 Univ Hamburg Step-wise formation of a three-dimensional structure employing different resolutions
LU101723B1 (en) * 2020-03-31 2021-09-30 Univ Hamburg Microchannel sensor and method of manufacturing the same
CN113954359A (zh) * 2021-10-29 2022-01-21 江苏迪盛智能科技有限公司 一种扫描式光固化3d打印装置及其方法
WO2023248159A1 (en) 2022-06-23 2023-12-28 3M Innovative Properties Company Methods and devices for removing particles from fluids
WO2024105470A1 (en) 2022-11-15 2024-05-23 Solventum Intellectual Properties Company Microstructured substrate including connected wells
WO2024107373A1 (en) 2022-11-15 2024-05-23 Solventum Intellectual Properties Company Methods and kits for removing particles from fluids

Family Cites Families (122)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4249011A (en) 1979-06-25 1981-02-03 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic compounds
US4262072A (en) 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4668601A (en) 1985-01-18 1987-05-26 Minnesota Mining And Manufacturing Company Protective coating for phototools
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
JPH01228828A (ja) * 1988-03-08 1989-09-12 Osaka Prefecture 光学的造形法
US5182055A (en) * 1988-04-18 1993-01-26 3D Systems, Inc. Method of making a three-dimensional object by stereolithography
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2613928B2 (ja) * 1988-10-13 1997-05-28 松下電工株式会社 三次元形状の形成方法および装置
JPH05502304A (ja) 1989-08-21 1993-04-22 アモス,カール・アール 電磁現象を操作するための方法及び装置
JPH03193434A (ja) * 1989-12-25 1991-08-23 Matsushita Electric Works Ltd 三次元形状の形成方法
JP2724232B2 (ja) 1990-05-02 1998-03-09 株式会社日立製作所 自動焦点手段およびその自動焦点手段を用いた光ディスク装置
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
GB9121789D0 (en) 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
EP0544332B1 (en) 1991-11-28 1997-01-29 Enplas Corporation Surface light source device
TW268969B (ja) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5298741A (en) 1993-01-13 1994-03-29 Trustees Of Tufts College Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample
JPH07137141A (ja) * 1993-11-16 1995-05-30 C Met Kk ミラー式光硬化造形装置
US5512219A (en) 1994-06-03 1996-04-30 Reflexite Corporation Method of casting a microstructure sheet having an array of prism elements using a reusable polycarbonate mold
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JP3779358B2 (ja) * 1995-10-06 2006-05-24 ソニー株式会社 立体形状造形方法
JPH1031314A (ja) * 1996-07-17 1998-02-03 Sony Corp フォトレジストの露光方法
US5858624A (en) 1996-09-20 1999-01-12 Minnesota Mining And Manufacturing Company Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process
US5922238A (en) 1997-02-14 1999-07-13 Physical Optics Corporation Method of making replicas and compositions for use therewith
DE19713362A1 (de) 1997-03-29 1998-10-01 Zeiss Carl Jena Gmbh Konfokale mikroskopische Anordnung
US5998495A (en) 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US6001297A (en) 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US5770737A (en) 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US5859251A (en) 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
EP1084454B1 (en) 1998-04-21 2016-03-09 University of Connecticut Free-form nanofabrication using multi-photon excitation
US6325961B1 (en) * 1999-02-08 2001-12-04 3D Systems, Inc. Stereolithographic method and apparatus with enhanced control of prescribed stimulation and application
US6341029B1 (en) * 1999-04-27 2002-01-22 Gsi Lumonics, Inc. Method and apparatus for shaping a laser-beam intensity profile by dithering
US6100405A (en) 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US7046905B1 (en) 1999-10-08 2006-05-16 3M Innovative Properties Company Blacklight with structured surfaces
JP2001150451A (ja) 1999-11-22 2001-06-05 Canon Inc 成形型およびその製造方法
JP3815652B2 (ja) * 1999-12-02 2006-08-30 独立行政法人科学技術振興機構 2光子マイクロ光造形方法およびその装置、2光子マイクロ光造形法によって形成した部品および可動機構
US6288842B1 (en) 2000-02-22 2001-09-11 3M Innovative Properties Sheeting with composite image that floats
US6696157B1 (en) 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
US6560248B1 (en) * 2000-06-08 2003-05-06 Mania Barco Nv System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation
EP1303791B1 (en) 2000-06-15 2009-08-19 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
DE60114820T2 (de) 2000-06-15 2006-09-14 3M Innovative Properties Co., St. Paul Mikroherstellungsverfahren für organische optische bauteile
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
KR100811017B1 (ko) 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
DE10034737C2 (de) 2000-07-17 2002-07-11 Fraunhofer Ges Forschung Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung
ATE526135T1 (de) 2001-03-26 2011-10-15 Novartis Ag Giessform und verfahren zur herstellung von opthalmischen linsen
US20020192569A1 (en) 2001-05-15 2002-12-19 The Chromaline Corporation Devices and methods for exposure of photoreactive compositions with light emitting diodes
KR100788827B1 (ko) 2001-05-22 2007-12-27 니치아 카가쿠 고교 가부시키가이샤 면발광 장치의 도광판
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US20030006535A1 (en) 2001-06-26 2003-01-09 Michael Hennessey Method and apparatus for forming microstructures on polymeric substrates
DE10131156A1 (de) 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
US6804062B2 (en) 2001-10-09 2004-10-12 California Institute Of Technology Nonimaging concentrator lens arrays and microfabrication of the same
US6948448B2 (en) 2001-11-27 2005-09-27 General Electric Company Apparatus and method for depositing large area coatings on planar surfaces
US7887889B2 (en) 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
JP2003321704A (ja) * 2002-05-01 2003-11-14 Hitachi Ltd 積層造形法およびそれに用いる積層造形装置
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7478942B2 (en) 2003-01-23 2009-01-20 Samsung Electronics Co., Ltd. Light guide plate with light reflection pattern
TWI352228B (en) 2003-02-28 2011-11-11 Sharp Kk Surface dadiation conversion element, liquid cryst
JP4269745B2 (ja) 2003-03-31 2009-05-27 株式会社日立製作所 スタンパ及び転写装置
US20040202865A1 (en) 2003-04-08 2004-10-14 Andrew Homola Release coating for stamper
US7070406B2 (en) 2003-04-29 2006-07-04 Hewlett-Packard Development Company, L.P. Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
KR100585108B1 (ko) * 2003-11-14 2006-06-01 삼성전자주식회사 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법
EP1538482B1 (en) 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US7632087B2 (en) 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
US20050271794A1 (en) 2003-12-24 2005-12-08 Synecor, Llc Liquid perfluoropolymers and medical and cosmetic applications incorporating same
US20050273146A1 (en) 2003-12-24 2005-12-08 Synecor, Llc Liquid perfluoropolymers and medical applications incorporating same
US7282324B2 (en) 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
US7407893B2 (en) 2004-03-05 2008-08-05 Applied Materials, Inc. Liquid precursors for the CVD deposition of amorphous carbon films
US20050254035A1 (en) 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
US20050272599A1 (en) 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
JP4389791B2 (ja) 2004-08-25 2009-12-24 セイコーエプソン株式会社 微細構造体の製造方法および露光装置
JP4599553B2 (ja) * 2004-10-01 2010-12-15 国立大学法人北海道大学 レーザ加工方法および装置
JP2006165371A (ja) 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
JP2006227609A (ja) * 2005-01-24 2006-08-31 Fuji Photo Film Co Ltd 露光方法、凹凸状パターンの形成方法、及び光学素子の製造方法
WO2006093963A1 (en) 2005-03-02 2006-09-08 The Trustees Of Boston College Structures and methods of replicating the same
KR100688866B1 (ko) 2005-04-07 2007-03-02 삼성전기주식회사 임프린트 장치, 시스템 및 방법
US7478791B2 (en) 2005-04-15 2009-01-20 3M Innovative Properties Company Flexible mold comprising cured polymerizable resin composition
KR100692742B1 (ko) 2005-05-13 2007-03-09 삼성전자주식회사 도광층을 갖는 키 패드 및 키 패드 어셈블리
EP1959299B1 (en) 2005-06-10 2012-12-26 Obducat AB Pattern replication with intermediate stamp
US7326948B2 (en) * 2005-08-15 2008-02-05 Asml Netherlands B.V. Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method
KR100610336B1 (ko) 2005-09-12 2006-08-09 김형준 키패드 백라이트용 도광판 및 그 제조 방법
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
EP1962942A1 (en) 2005-12-21 2008-09-03 3M Innovative Properties Company Microneedle devices
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
DE112006003494T5 (de) 2005-12-21 2008-10-30 3M Innovative Properties Co., Saint Paul Verfahren und Vorrichtung zur Verarbeitung von mehrphotonen-aushärtbaren photoreaktiven Zusammensetzungen
JP4845508B2 (ja) * 2005-12-27 2011-12-28 シーメット株式会社 光造形装置とオフセット距離設定方法
US7545569B2 (en) 2006-01-13 2009-06-09 Avery Dennison Corporation Optical apparatus with flipped compound prism structures
WO2007100849A2 (en) 2006-02-27 2007-09-07 Microcontinuum, Inc. Formation of pattern replicating tools
TWM298289U (en) 2006-03-17 2006-09-21 Hon Hai Prec Ind Co Ltd Light guide plates and electronic products using the same
US20070216049A1 (en) 2006-03-20 2007-09-20 Heptagon Oy Method and tool for manufacturing optical elements
WO2007112309A2 (en) 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
CN101448632B (zh) 2006-05-18 2012-12-12 3M创新有限公司 用于制备具有提取结构的光导的方法以及由此方法生产的光导
TWI322927B (en) 2006-05-24 2010-04-01 Ind Tech Res Inst Roller module for microstructure thin film imprint
TW200745490A (en) 2006-06-07 2007-12-16 Jeng Shiang Prec Ind Co Ltd Light guide plate
US20080007964A1 (en) 2006-07-05 2008-01-10 Tai-Yen Lin Light guiding structure
US7551359B2 (en) 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US20080083886A1 (en) 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions
US8241713B2 (en) 2007-02-21 2012-08-14 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
US7891636B2 (en) 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
US9440376B2 (en) 2007-09-06 2016-09-13 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
JP2010537843A (ja) 2007-09-06 2010-12-09 スリーエム イノベイティブ プロパティズ カンパニー 微細構造物品を作製するための工具
CN101796443A (zh) 2007-09-06 2010-08-04 3M创新有限公司 具有提供输出光区域控制的光提取结构的光导装置
US20100227272A1 (en) 2007-10-11 2010-09-09 Innovative Properties Company Highly Functional Multiphoton Curable Reactive Species
US8451457B2 (en) 2007-10-11 2013-05-28 3M Innovative Properties Company Chromatic confocal sensor
CN101878438B (zh) 2007-11-27 2013-09-25 3M创新有限公司 形成具有悬浮合成图像的片材以及母模具的方法
US8080073B2 (en) 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
EP2257854B1 (en) 2008-02-26 2018-10-31 3M Innovative Properties Company Multi-photon exposure system
US8570270B2 (en) 2009-10-19 2013-10-29 Apple Inc. Backlight unit color compensation techniques
TWM385715U (en) 2009-12-14 2010-08-01 Chunghwa Picture Tubes Ltd Backlight module

Similar Documents

Publication Publication Date Title
JP2011507031A5 (ja)
JP2011501209A5 (ja)
ATE423164T1 (de) Infrarot-strahlung absorbierende artikel und methode zu deren herstellung
IL212338A (en) A biomass processing method that involves biomass irradiation with electron beam radiation
BRPI0512987A (pt) processo para preparar compostos, composto, uso do mesmo, e, material de revestimento termicamente curável, curável por radiação ou de cura dupla
JP2016520202A5 (ja)
RU2013132675A (ru) Отверждаемые облучением суперпокрытия для многомодового оптического волокна
DE602008002257D1 (de) Polyolefinzusammensetzungen mit hochkristallinen regenerierten zellulosefasern
JP2013502614A5 (ja)
WO2008054361A3 (en) Method and apparatus for optimizing the target intensity distribution transmitted form a fiber coupled array
WO2007124021A3 (en) Scanning treatment laser with sweep beam spot and universal carriage
ATE547234T1 (de) Optische formungsvorrichtung und optisches formungsverfahren
WO2014049056A3 (de) Faseroptisches konversionsmodul
JP2013095138A5 (ja) デジタル硬化方法
WO2013050589A3 (de) Strahlungsquelle sowie lichtleiteinrichtung
JP2011039290A5 (ja)
IL210254A0 (en) Materials for producing light- transmitting heat protection elements and light protection elements produced using such materials, and method for the production thereof
WO2013036314A3 (en) Laser probe with an electrically steerable light beam
ATE533086T1 (de) Lichtempfindliche zusammensetzung und verfahren zur strukturformung damit
WO2008078456A1 (ja) 光走査用アクチュエータ
JP2007232696A (ja) 墨出用のレーザー照射装置
JP2010262252A5 (ja) レーザ光源
BRPI0801196A2 (pt) metodo para a fabricaÇço de uma prÉ-forma assim como de uma fibra àtica a ser obtida com a mesma
JP2007115708A5 (ja)
DK3936937T3 (en) Hollow-Core Fiber Based Broadband Radiation Generator With Extended Fiber Lifetime