JP2011501209A5 - - Google Patents

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Publication number
JP2011501209A5
JP2011501209A5 JP2010528958A JP2010528958A JP2011501209A5 JP 2011501209 A5 JP2011501209 A5 JP 2011501209A5 JP 2010528958 A JP2010528958 A JP 2010528958A JP 2010528958 A JP2010528958 A JP 2010528958A JP 2011501209 A5 JP2011501209 A5 JP 2011501209A5
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JP
Japan
Prior art keywords
substrate
position signal
light
composition
light beam
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JP2010528958A
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JP2011501209A (ja
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Priority claimed from PCT/US2008/078724 external-priority patent/WO2009048808A1/en
Publication of JP2011501209A publication Critical patent/JP2011501209A/ja
Publication of JP2011501209A5 publication Critical patent/JP2011501209A5/ja
Withdrawn legal-status Critical Current

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Claims (4)

  1. 多光子硬化可能光反応性組成物をその上に有する基材と、
    複数の波長を含む光ビームを、前記基材上の前記組成物の少なくとも1つの領域の上に放射する光源と、
    前記基材に関する位置信号を得るために、前記組成物から反射される光の一部を検出する検出器であって、前記位置信号は少なくとも前記反射光の波長に基づいている、検出器と、
    を備えるシステム。
  2. 前記光ビームが、前記多光子硬化可能光反応性組成物の領域を少なくとも部分的に硬化させる、請求項1に記載のシステム。
  3. 多光子硬化可能光反応性組成物をその上に有する基材を提供する工程と、
    複数の波長を含む少なくとも1つの光ビームを、物質の少なくとも1つの領域に適用する工程であって、前記複数の波長の少なくとも1つが、前記多光子硬化可能光反応性組成物を多光子吸収によって少なくとも部分的に硬化させるのに十分な強度を備える、適用工程と、
    前記基材に関する位置信号を得るために、前記物質から反射される光の一部を処理する工程であって、前記位置信号が前記反射光の波長を含む、処理工程と、
    を含む方法。
  4. 前記位置信号に対応して、前記基材と前記少なくとも1つの光ビームとの相対位置を調節する工程を更に含む、請求項3に記載の方法。
JP2010528958A 2007-10-11 2008-10-03 色共焦点センサ Withdrawn JP2011501209A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97924007P 2007-10-11 2007-10-11
PCT/US2008/078724 WO2009048808A1 (en) 2007-10-11 2008-10-03 Chromatic confocal sensor

Related Child Applications (1)

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JP2014014491A Division JP5890443B2 (ja) 2007-10-11 2014-01-29 色共焦点センサ

Publications (2)

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JP2011501209A JP2011501209A (ja) 2011-01-06
JP2011501209A5 true JP2011501209A5 (ja) 2011-11-10

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JP2010528958A Withdrawn JP2011501209A (ja) 2007-10-11 2008-10-03 色共焦点センサ
JP2014014491A Active JP5890443B2 (ja) 2007-10-11 2014-01-29 色共焦点センサ

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Country Status (5)

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US (1) US8451457B2 (ja)
EP (1) EP2208100B8 (ja)
JP (2) JP2011501209A (ja)
CN (1) CN101821659B (ja)
WO (1) WO2009048808A1 (ja)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009033017A1 (en) 2007-09-06 2009-03-12 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
KR20100080785A (ko) 2007-09-06 2010-07-12 쓰리엠 이노베이티브 프로퍼티즈 컴파니 광 출력의 영역 제어를 제공하는 광 추출 구조물을 갖는 도광체
US8455846B2 (en) 2007-12-12 2013-06-04 3M Innovative Properties Company Method for making structures with improved edge definition
JP5801558B2 (ja) 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
KR101819006B1 (ko) * 2010-10-27 2018-01-17 삼성전자주식회사 광학 측정 장치
US10001622B2 (en) * 2011-10-25 2018-06-19 Sanford Burnham Medical Research Institute Multifunction autofocus system and method for automated microscopy
GB2497792A (en) * 2011-12-21 2013-06-26 Taylor Hobson Ltd Metrological apparatus comprising a confocal sensor
GB201205491D0 (en) * 2012-03-28 2012-05-09 Ucl Business Plc Measuring surface curvature
US8654352B1 (en) 2012-08-08 2014-02-18 Asm Technology Singapore Pte Ltd Chromatic confocal scanning apparatus
DE102013008582B4 (de) 2013-05-08 2015-04-30 Technische Universität Ilmenau Verfahren und Vorrichtung zur chromatisch-konfokalen Mehrpunktmessung sowie deren Verwendung
CN105204151A (zh) * 2014-06-17 2015-12-30 谢赟燕 一种照明装置和方法
KR102299921B1 (ko) 2014-10-07 2021-09-09 삼성전자주식회사 광학 장치
US10627614B2 (en) * 2016-04-11 2020-04-21 Verily Life Sciences Llc Systems and methods for simultaneous acquisition of multiple planes with one or more chromatic lenses
US10260941B2 (en) * 2016-10-04 2019-04-16 Precitec Optronik Gmbh Chromatic confocal distance sensor
DE102016221630A1 (de) * 2016-11-04 2018-05-09 Carl Zeiss Industrielle Messtechnik Gmbh Konfokal chromatischer Sensor zur Bestimmung von Koordinaten eines Messobjekts
TWI674089B (zh) * 2017-10-31 2019-10-11 銳準醫光股份有限公司 整合米洛(Mirau)光學干涉顯微術之光學切層裝置
CN109752354A (zh) * 2017-11-06 2019-05-14 锐准医光股份有限公司 整合米洛光学干涉显微术与荧光显微术的光学切层装置
JPWO2019116802A1 (ja) * 2017-12-15 2020-12-24 株式会社堀場製作所 粒子分析装置
EP3743763A4 (en) * 2018-01-24 2021-12-08 Cyberoptics Corporation STRUCTURED LIGHT PROJECTION FOR REFLECTIVE SURFACES
US10866092B2 (en) * 2018-07-24 2020-12-15 Kla-Tencor Corporation Chromatic confocal area sensor
EP3613561B1 (en) * 2018-08-22 2023-07-26 Concept Laser GmbH Apparatus for additively manufacturing three-dimensional objects
US10900775B2 (en) * 2018-08-24 2021-01-26 Tdk Taiwan Corp. Modeling system
WO2020207908A1 (en) * 2019-04-11 2020-10-15 Koninklijke Philips N.V. A particle sensing system for example for use in a pollution mask
CN111596464B (zh) * 2020-05-28 2021-10-15 华中科技大学 一种调控聚焦光斑三维方向强度的装置和方法
CN113358030B (zh) * 2021-07-15 2022-09-30 中国科学院长春光学精密机械与物理研究所 色散共焦测量系统及其误差修正方法

Family Cites Families (111)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
US3729131A (en) * 1970-07-13 1973-04-24 United Gas Industries Ltd Thermostatically controlled gas valve
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4249011A (en) 1979-06-25 1981-02-03 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic compounds
US4262072A (en) 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4668601A (en) 1985-01-18 1987-05-26 Minnesota Mining And Manufacturing Company Protective coating for phototools
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
JPH01188816A (ja) * 1988-01-25 1989-07-28 Hitachi Ltd 分光型走査顕微鏡
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
WO1991002992A1 (en) * 1989-08-21 1991-03-07 Amos Carl R Methods of and apparatus for manipulating electromagnetic phenomenon
JP2724232B2 (ja) * 1990-05-02 1998-03-09 株式会社日立製作所 自動焦点手段およびその自動焦点手段を用いた光ディスク装置
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
GB9121789D0 (en) 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
EP0544332B1 (en) 1991-11-28 1997-01-29 Enplas Corporation Surface light source device
TW268969B (ja) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5298741A (en) * 1993-01-13 1994-03-29 Trustees Of Tufts College Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample
US5512219A (en) 1994-06-03 1996-04-30 Reflexite Corporation Method of casting a microstructure sheet having an array of prism elements using a reusable polycarbonate mold
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
US5858624A (en) 1996-09-20 1999-01-12 Minnesota Mining And Manufacturing Company Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process
US5922238A (en) 1997-02-14 1999-07-13 Physical Optics Corporation Method of making replicas and compositions for use therewith
DE19713362A1 (de) * 1997-03-29 1998-10-01 Zeiss Carl Jena Gmbh Konfokale mikroskopische Anordnung
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5998495A (en) 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6001297A (en) 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US5770737A (en) 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US5859251A (en) 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
WO1999054784A1 (en) * 1998-04-21 1999-10-28 University Of Connecticut Free-form nanofabrication using multi-photon excitation
US6100405A (en) 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US7046905B1 (en) 1999-10-08 2006-05-16 3M Innovative Properties Company Blacklight with structured surfaces
JP2001150451A (ja) 1999-11-22 2001-06-05 Canon Inc 成形型およびその製造方法
US6288842B1 (en) 2000-02-22 2001-09-11 3M Innovative Properties Sheeting with composite image that floats
US6696157B1 (en) 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
US6560248B1 (en) 2000-06-08 2003-05-06 Mania Barco Nv System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
AU2001266905A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Microfabrication of organic optical elements
US7790353B2 (en) * 2000-06-15 2010-09-07 3M Innovative Properties Company Multidirectional photoreactive absorption method
JP4472922B2 (ja) * 2000-06-15 2010-06-02 スリーエム イノベイティブ プロパティズ カンパニー 多光子光化学プロセスを使用したマルチカラー画像化
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
DE10034737C2 (de) 2000-07-17 2002-07-11 Fraunhofer Ges Forschung Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung
EP1245372B1 (en) 2001-03-26 2011-09-28 Novartis AG Mould and method for the production of ophthalmic lenses
US20020192569A1 (en) * 2001-05-15 2002-12-19 The Chromaline Corporation Devices and methods for exposure of photoreactive compositions with light emitting diodes
KR100788827B1 (ko) 2001-05-22 2007-12-27 니치아 카가쿠 고교 가부시키가이샤 면발광 장치의 도광판
US20030006535A1 (en) 2001-06-26 2003-01-09 Michael Hennessey Method and apparatus for forming microstructures on polymeric substrates
DE10131156A1 (de) 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
US6804062B2 (en) 2001-10-09 2004-10-12 California Institute Of Technology Nonimaging concentrator lens arrays and microfabrication of the same
US6713718B1 (en) * 2001-11-27 2004-03-30 Vi Engineering, Inc. Scoring process and apparatus with confocal optical measurement
US6948448B2 (en) 2001-11-27 2005-09-27 General Electric Company Apparatus and method for depositing large area coatings on planar surfaces
US7887889B2 (en) 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US20030155667A1 (en) 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7478942B2 (en) 2003-01-23 2009-01-20 Samsung Electronics Co., Ltd. Light guide plate with light reflection pattern
US7537369B2 (en) 2003-02-28 2009-05-26 Sharp Kabushiki Kaisha Surface radiation conversion element, liquid crystal display device, and method of producing a surface radiation conversion element
JP4269745B2 (ja) 2003-03-31 2009-05-27 株式会社日立製作所 スタンパ及び転写装置
US20040202865A1 (en) 2003-04-08 2004-10-14 Andrew Homola Release coating for stamper
US7070406B2 (en) 2003-04-29 2006-07-04 Hewlett-Packard Development Company, L.P. Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
EP1538482B1 (en) 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
US7632087B2 (en) 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US20050273146A1 (en) 2003-12-24 2005-12-08 Synecor, Llc Liquid perfluoropolymers and medical applications incorporating same
US20050271794A1 (en) 2003-12-24 2005-12-08 Synecor, Llc Liquid perfluoropolymers and medical and cosmetic applications incorporating same
US7282324B2 (en) 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
WO2005087974A2 (en) 2004-03-05 2005-09-22 Applied Materials, Inc. Cvd processes for the deposition of amorphous carbon films
US20050254035A1 (en) * 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
US20050272599A1 (en) 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
JP4389791B2 (ja) 2004-08-25 2009-12-24 セイコーエプソン株式会社 微細構造体の製造方法および露光装置
JP2006165371A (ja) 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
JP4674333B2 (ja) * 2005-01-18 2011-04-20 独立行政法人情報通信研究機構 レーザー加工装置、この装置を用いて製造した光デバイス
US9370881B2 (en) 2005-03-02 2016-06-21 The Trustees Of Boston College Structures and methods of replicating the same
KR100688866B1 (ko) 2005-04-07 2007-03-02 삼성전기주식회사 임프린트 장치, 시스템 및 방법
US7478791B2 (en) 2005-04-15 2009-01-20 3M Innovative Properties Company Flexible mold comprising cured polymerizable resin composition
KR100692742B1 (ko) 2005-05-13 2007-03-09 삼성전자주식회사 도광층을 갖는 키 패드 및 키 패드 어셈블리
CN101198903B (zh) 2005-06-10 2011-09-07 奥贝达克特公司 利用中间印模的图案复制
US7326948B2 (en) 2005-08-15 2008-02-05 Asml Netherlands B.V. Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method
KR100610336B1 (ko) 2005-09-12 2006-08-09 김형준 키패드 백라이트용 도광판 및 그 제조 방법
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
JP4880701B2 (ja) * 2005-12-21 2012-02-22 スリーエム イノベイティブ プロパティズ カンパニー 多光子硬化反応性組成物を処理するための方法及び装置
US20080319404A1 (en) 2005-12-21 2008-12-25 Pekurovsky Mikhail L Microneedle Devices
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
US7545569B2 (en) 2006-01-13 2009-06-09 Avery Dennison Corporation Optical apparatus with flipped compound prism structures
WO2007100849A2 (en) 2006-02-27 2007-09-07 Microcontinuum, Inc. Formation of pattern replicating tools
TWM298289U (en) 2006-03-17 2006-09-21 Hon Hai Prec Ind Co Ltd Light guide plates and electronic products using the same
US20070216049A1 (en) 2006-03-20 2007-09-20 Heptagon Oy Method and tool for manufacturing optical elements
WO2007112309A2 (en) 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
EP2018263B1 (en) 2006-05-18 2017-03-01 3M Innovative Properties Company Process for making light guides with extraction structures
TWI322927B (en) 2006-05-24 2010-04-01 Ind Tech Res Inst Roller module for microstructure thin film imprint
TW200745490A (en) 2006-06-07 2007-12-16 Jeng Shiang Prec Ind Co Ltd Light guide plate
US20080007964A1 (en) 2006-07-05 2008-01-10 Tai-Yen Lin Light guiding structure
US20080083886A1 (en) 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8241713B2 (en) 2007-02-21 2012-08-14 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
US7891636B2 (en) 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
US20100308497A1 (en) 2007-09-06 2010-12-09 David Moses M Tool for making microstructured articles
KR20100080785A (ko) 2007-09-06 2010-07-12 쓰리엠 이노베이티브 프로퍼티즈 컴파니 광 출력의 영역 제어를 제공하는 광 추출 구조물을 갖는 도광체
WO2009033017A1 (en) 2007-09-06 2009-03-12 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
JP2011501772A (ja) 2007-10-11 2011-01-13 スリーエム イノベイティブ プロパティズ カンパニー 高機能性多光子硬化性反応種
WO2009070434A1 (en) 2007-11-27 2009-06-04 3M Innovative Properties Company Methods for forming sheeting with a composite image that floats and a master tooling
US8455846B2 (en) 2007-12-12 2013-06-04 3M Innovative Properties Company Method for making structures with improved edge definition
US8080073B2 (en) 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
JP5801558B2 (ja) 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
US8570270B2 (en) 2009-10-19 2013-10-29 Apple Inc. Backlight unit color compensation techniques
TWM385715U (en) 2009-12-14 2010-08-01 Chunghwa Picture Tubes Ltd Backlight module

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