JP5890443B2 - 色共焦点センサ - Google Patents
色共焦点センサ Download PDFInfo
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- JP5890443B2 JP5890443B2 JP2014014491A JP2014014491A JP5890443B2 JP 5890443 B2 JP5890443 B2 JP 5890443B2 JP 2014014491 A JP2014014491 A JP 2014014491A JP 2014014491 A JP2014014491 A JP 2014014491A JP 5890443 B2 JP5890443 B2 JP 5890443B2
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- 239000000203 mixture Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 26
- 230000004075 alteration Effects 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 238000010226 confocal imaging Methods 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 description 30
- 239000000835 fiber Substances 0.000 description 15
- 238000005286 illumination Methods 0.000 description 10
- 239000013307 optical fiber Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 230000010287 polarization Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0075—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. increasing, the depth of field or depth of focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/0064—Optical details of the image generation multi-spectral or wavelength-selective arrangements, e.g. wavelength fan-out, chromatic profiling
Description
Claims (3)
- 共焦点結像システムであって、
多光子硬化可能光反応性組成物をその上に有する基材と、
複数の波長を含む光ビームを、前記基材上の前記組成物の少なくとも1つの領域の上に放射する光源であって、前記光ビームの少なくとも一部が前記組成物から反射される、光源と、
前記光ビームの異なる波長が異なる位置で集束することをもたらす前記光ビームの縦色収差を引き起こすように構成された光学コンポーネントと、
前記基材に関する位置信号を得るために、前記組成物から反射される光の一部を検出する検出器であって、前記位置信号が、前記複数の波長の光のうちの、前記多光子硬化可能光反応性組成物の表面に集束している光の波長に基づいている、検出器と、
を備えるシステム。 - 前記光ビームが、前記多光子硬化可能光反応性組成物の領域を少なくとも部分的に硬化させるのに十分な強度を有する少なくとも1つの波長を含む、請求項1に記載のシステム。
- 多光子硬化可能光反応性組成物をその上に有する基材を提供する工程と、
複数の波長を含む少なくとも1つの光ビームを、前記組成物の少なくとも1つの領域に適用する工程であって、前記複数の波長の少なくとも1つが、前記多光子硬化可能光反応性組成物を多光子吸収によって少なくとも部分的に硬化させるのに十分な強度を備える、適用工程と、
前記光ビームの異なる波長が異なる位置で集束することをもたらす前記光ビームの縦色収差を引き起こす工程と、
前記基材に関する位置信号を得るために、前記組成物から反射される光の一部を処理する工程であって、前記位置信号が、前記複数の波長の光のうちの、前記多光子硬化可能光反応性組成物の表面に集束している光の波長に基づいている、処理工程と、
を含む方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97924007P | 2007-10-11 | 2007-10-11 | |
US60/979,240 | 2007-10-11 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010528958A Division JP2011501209A (ja) | 2007-10-11 | 2008-10-03 | 色共焦点センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014088041A JP2014088041A (ja) | 2014-05-15 |
JP5890443B2 true JP5890443B2 (ja) | 2016-03-22 |
Family
ID=40549506
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010528958A Withdrawn JP2011501209A (ja) | 2007-10-11 | 2008-10-03 | 色共焦点センサ |
JP2014014491A Active JP5890443B2 (ja) | 2007-10-11 | 2014-01-29 | 色共焦点センサ |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010528958A Withdrawn JP2011501209A (ja) | 2007-10-11 | 2008-10-03 | 色共焦点センサ |
Country Status (5)
Country | Link |
---|---|
US (1) | US8451457B2 (ja) |
EP (1) | EP2208100B8 (ja) |
JP (2) | JP2011501209A (ja) |
CN (1) | CN101821659B (ja) |
WO (1) | WO2009048808A1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2197645B1 (en) | 2007-09-06 | 2014-10-22 | 3M Innovative Properties Company | Methods of forming molds and methods of forming articles using said molds |
JP5951928B2 (ja) | 2007-09-06 | 2016-07-13 | スリーエム イノベイティブ プロパティズ カンパニー | 光出力の領域制御を提供する光抽出構造体を有する光ガイド |
US8455846B2 (en) | 2007-12-12 | 2013-06-04 | 3M Innovative Properties Company | Method for making structures with improved edge definition |
WO2009108543A2 (en) | 2008-02-26 | 2009-09-03 | 3M Innovative Properties Company | Multi-photon exposure system |
KR101819006B1 (ko) * | 2010-10-27 | 2018-01-17 | 삼성전자주식회사 | 광학 측정 장치 |
US10001622B2 (en) * | 2011-10-25 | 2018-06-19 | Sanford Burnham Medical Research Institute | Multifunction autofocus system and method for automated microscopy |
GB2497792A (en) * | 2011-12-21 | 2013-06-26 | Taylor Hobson Ltd | Metrological apparatus comprising a confocal sensor |
GB201205491D0 (en) * | 2012-03-28 | 2012-05-09 | Ucl Business Plc | Measuring surface curvature |
US8654352B1 (en) | 2012-08-08 | 2014-02-18 | Asm Technology Singapore Pte Ltd | Chromatic confocal scanning apparatus |
DE102013008582B4 (de) | 2013-05-08 | 2015-04-30 | Technische Universität Ilmenau | Verfahren und Vorrichtung zur chromatisch-konfokalen Mehrpunktmessung sowie deren Verwendung |
CN105204151A (zh) * | 2014-06-17 | 2015-12-30 | 谢赟燕 | 一种照明装置和方法 |
KR102299921B1 (ko) | 2014-10-07 | 2021-09-09 | 삼성전자주식회사 | 광학 장치 |
US10627614B2 (en) * | 2016-04-11 | 2020-04-21 | Verily Life Sciences Llc | Systems and methods for simultaneous acquisition of multiple planes with one or more chromatic lenses |
US10260941B2 (en) * | 2016-10-04 | 2019-04-16 | Precitec Optronik Gmbh | Chromatic confocal distance sensor |
DE102016221630A1 (de) * | 2016-11-04 | 2018-05-09 | Carl Zeiss Industrielle Messtechnik Gmbh | Konfokal chromatischer Sensor zur Bestimmung von Koordinaten eines Messobjekts |
TWI674089B (zh) * | 2017-10-31 | 2019-10-11 | 銳準醫光股份有限公司 | 整合米洛(Mirau)光學干涉顯微術之光學切層裝置 |
CN109752354A (zh) * | 2017-11-06 | 2019-05-14 | 锐准医光股份有限公司 | 整合米洛光学干涉显微术与荧光显微术的光学切层装置 |
JPWO2019116802A1 (ja) * | 2017-12-15 | 2020-12-24 | 株式会社堀場製作所 | 粒子分析装置 |
EP3743763A4 (en) * | 2018-01-24 | 2021-12-08 | Cyberoptics Corporation | STRUCTURED LIGHT PROJECTION FOR REFLECTIVE SURFACES |
US10866092B2 (en) | 2018-07-24 | 2020-12-15 | Kla-Tencor Corporation | Chromatic confocal area sensor |
EP3613561B1 (en) * | 2018-08-22 | 2023-07-26 | Concept Laser GmbH | Apparatus for additively manufacturing three-dimensional objects |
US10900775B2 (en) * | 2018-08-24 | 2021-01-26 | Tdk Taiwan Corp. | Modeling system |
CN114041048A (zh) * | 2019-04-11 | 2022-02-11 | 皇家飞利浦有限公司 | 例如用于防污口罩的颗粒感测系统 |
CN111596464B (zh) * | 2020-05-28 | 2021-10-15 | 华中科技大学 | 一种调控聚焦光斑三维方向强度的装置和方法 |
CN113358030B (zh) * | 2021-07-15 | 2022-09-30 | 中国科学院长春光学精密机械与物理研究所 | 色散共焦测量系统及其误差修正方法 |
Family Cites Families (111)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3018262A (en) * | 1957-05-01 | 1962-01-23 | Shell Oil Co | Curing polyepoxides with certain metal salts of inorganic acids |
US3729131A (en) * | 1970-07-13 | 1973-04-24 | United Gas Industries Ltd | Thermostatically controlled gas valve |
US3729313A (en) | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
US3779778A (en) | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
US3741769A (en) * | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
US4250053A (en) | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
US4262072A (en) * | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
US4249011A (en) * | 1979-06-25 | 1981-02-03 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic compounds |
US4279717A (en) | 1979-08-03 | 1981-07-21 | General Electric Company | Ultraviolet curable epoxy silicone coating compositions |
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
US4668601A (en) * | 1985-01-18 | 1987-05-26 | Minnesota Mining And Manufacturing Company | Protective coating for phototools |
US4642126A (en) | 1985-02-11 | 1987-02-10 | Norton Company | Coated abrasives with rapidly curable adhesives and controllable curvature |
US4652274A (en) | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
CA1323949C (en) | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
JPH01188816A (ja) * | 1988-01-25 | 1989-07-28 | Hitachi Ltd | 分光型走査顕微鏡 |
US4859572A (en) * | 1988-05-02 | 1989-08-22 | Eastman Kodak Company | Dye sensitized photographic imaging system |
AU6294690A (en) * | 1989-08-21 | 1991-04-03 | Carl R. Amos | Methods of and apparatus for manipulating electromagnetic phenomenon |
JP2724232B2 (ja) * | 1990-05-02 | 1998-03-09 | 株式会社日立製作所 | 自動焦点手段およびその自動焦点手段を用いた光ディスク装置 |
US5235015A (en) | 1991-02-21 | 1993-08-10 | Minnesota Mining And Manufacturing Company | High speed aqueous solvent developable photopolymer compositions |
GB9121789D0 (en) * | 1991-10-14 | 1991-11-27 | Minnesota Mining & Mfg | Positive-acting photothermographic materials |
EP0544332B1 (en) * | 1991-11-28 | 1997-01-29 | Enplas Corporation | Surface light source device |
TW268969B (ja) * | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
US5298741A (en) * | 1993-01-13 | 1994-03-29 | Trustees Of Tufts College | Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample |
US5512219A (en) | 1994-06-03 | 1996-04-30 | Reflexite Corporation | Method of casting a microstructure sheet having an array of prism elements using a reusable polycarbonate mold |
US5856373A (en) | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
US5858624A (en) | 1996-09-20 | 1999-01-12 | Minnesota Mining And Manufacturing Company | Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process |
US5922238A (en) * | 1997-02-14 | 1999-07-13 | Physical Optics Corporation | Method of making replicas and compositions for use therewith |
DE19713362A1 (de) * | 1997-03-29 | 1998-10-01 | Zeiss Carl Jena Gmbh | Konfokale mikroskopische Anordnung |
US6025406A (en) * | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
US5998495A (en) * | 1997-04-11 | 1999-12-07 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
US6001297A (en) * | 1997-04-28 | 1999-12-14 | 3D Systems, Inc. | Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography |
US5859251A (en) | 1997-09-18 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Air Force | Symmetrical dyes with large two-photon absorption cross-sections |
US5770737A (en) | 1997-09-18 | 1998-06-23 | The United States Of America As Represented By The Secretary Of The Air Force | Asymmetrical dyes with large two-photon absorption cross-sections |
CA2326322C (en) * | 1998-04-21 | 2011-03-01 | University Of Connecticut | Free-form nanofabrication using multi-photon excitation |
US6100405A (en) * | 1999-06-15 | 2000-08-08 | The United States Of America As Represented By The Secretary Of The Air Force | Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion |
US7046905B1 (en) | 1999-10-08 | 2006-05-16 | 3M Innovative Properties Company | Blacklight with structured surfaces |
JP2001150451A (ja) | 1999-11-22 | 2001-06-05 | Canon Inc | 成形型およびその製造方法 |
US6288842B1 (en) | 2000-02-22 | 2001-09-11 | 3M Innovative Properties | Sheeting with composite image that floats |
US6696157B1 (en) * | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
US6560248B1 (en) | 2000-06-08 | 2003-05-06 | Mania Barco Nv | System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
WO2001096959A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
US7381516B2 (en) | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
EP1303791B1 (en) * | 2000-06-15 | 2009-08-19 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
DE60114820T2 (de) | 2000-06-15 | 2006-09-14 | 3M Innovative Properties Co., St. Paul | Mikroherstellungsverfahren für organische optische bauteile |
US6852766B1 (en) | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
DE10034737C2 (de) | 2000-07-17 | 2002-07-11 | Fraunhofer Ges Forschung | Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung |
ATE526135T1 (de) | 2001-03-26 | 2011-10-15 | Novartis Ag | Giessform und verfahren zur herstellung von opthalmischen linsen |
US20020192569A1 (en) * | 2001-05-15 | 2002-12-19 | The Chromaline Corporation | Devices and methods for exposure of photoreactive compositions with light emitting diodes |
TWI254815B (en) | 2001-05-22 | 2006-05-11 | Nichia Corp | Guide-plate for a plane-luminous device |
US20030006535A1 (en) * | 2001-06-26 | 2003-01-09 | Michael Hennessey | Method and apparatus for forming microstructures on polymeric substrates |
DE10131156A1 (de) | 2001-06-29 | 2003-01-16 | Fraunhofer Ges Forschung | Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung |
US6804062B2 (en) | 2001-10-09 | 2004-10-12 | California Institute Of Technology | Nonimaging concentrator lens arrays and microfabrication of the same |
US6948448B2 (en) * | 2001-11-27 | 2005-09-27 | General Electric Company | Apparatus and method for depositing large area coatings on planar surfaces |
US6713718B1 (en) | 2001-11-27 | 2004-03-30 | Vi Engineering, Inc. | Scoring process and apparatus with confocal optical measurement |
US7887889B2 (en) | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
US6750266B2 (en) * | 2001-12-28 | 2004-06-15 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US20030155667A1 (en) | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
US7478942B2 (en) | 2003-01-23 | 2009-01-20 | Samsung Electronics Co., Ltd. | Light guide plate with light reflection pattern |
CN100454087C (zh) | 2003-02-28 | 2009-01-21 | 夏普株式会社 | 面辐射变换元件及其制造方法和液晶显示装置 |
JP4269745B2 (ja) * | 2003-03-31 | 2009-05-27 | 株式会社日立製作所 | スタンパ及び転写装置 |
US20040202865A1 (en) * | 2003-04-08 | 2004-10-14 | Andrew Homola | Release coating for stamper |
US7070406B2 (en) | 2003-04-29 | 2006-07-04 | Hewlett-Packard Development Company, L.P. | Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media |
EP1538482B1 (en) * | 2003-12-05 | 2016-02-17 | Obducat AB | Device and method for large area lithography |
US9040090B2 (en) * | 2003-12-19 | 2015-05-26 | The University Of North Carolina At Chapel Hill | Isolated and fixed micro and nano structures and methods thereof |
US7632087B2 (en) * | 2003-12-19 | 2009-12-15 | Wd Media, Inc. | Composite stamper for imprint lithography |
US20050273146A1 (en) | 2003-12-24 | 2005-12-08 | Synecor, Llc | Liquid perfluoropolymers and medical applications incorporating same |
US20050271794A1 (en) | 2003-12-24 | 2005-12-08 | Synecor, Llc | Liquid perfluoropolymers and medical and cosmetic applications incorporating same |
US7282324B2 (en) | 2004-01-05 | 2007-10-16 | Microchem Corp. | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them |
US7407893B2 (en) * | 2004-03-05 | 2008-08-05 | Applied Materials, Inc. | Liquid precursors for the CVD deposition of amorphous carbon films |
US20050254035A1 (en) * | 2004-05-11 | 2005-11-17 | Chromaplex, Inc. | Multi-photon lithography |
US20050272599A1 (en) * | 2004-06-04 | 2005-12-08 | Kenneth Kramer | Mold release layer |
JP4389791B2 (ja) | 2004-08-25 | 2009-12-24 | セイコーエプソン株式会社 | 微細構造体の製造方法および露光装置 |
JP2006165371A (ja) * | 2004-12-09 | 2006-06-22 | Canon Inc | 転写装置およびデバイス製造方法 |
JP4674333B2 (ja) * | 2005-01-18 | 2011-04-20 | 独立行政法人情報通信研究機構 | レーザー加工装置、この装置を用いて製造した光デバイス |
US9370881B2 (en) | 2005-03-02 | 2016-06-21 | The Trustees Of Boston College | Structures and methods of replicating the same |
KR100688866B1 (ko) * | 2005-04-07 | 2007-03-02 | 삼성전기주식회사 | 임프린트 장치, 시스템 및 방법 |
US7478791B2 (en) | 2005-04-15 | 2009-01-20 | 3M Innovative Properties Company | Flexible mold comprising cured polymerizable resin composition |
KR100692742B1 (ko) | 2005-05-13 | 2007-03-09 | 삼성전자주식회사 | 도광층을 갖는 키 패드 및 키 패드 어셈블리 |
WO2006131153A1 (en) | 2005-06-10 | 2006-12-14 | Obducat Ab | Pattern replication with intermediate stamp |
US7326948B2 (en) | 2005-08-15 | 2008-02-05 | Asml Netherlands B.V. | Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method |
KR100610336B1 (ko) | 2005-09-12 | 2006-08-09 | 김형준 | 키패드 백라이트용 도광판 및 그 제조 방법 |
US7878791B2 (en) * | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
WO2007073482A2 (en) * | 2005-12-21 | 2007-06-28 | 3M Innovative Properties Company | Method and apparatus for processing multiphoton curable photoreactive compositions |
US7583444B1 (en) | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
EP1962942A1 (en) | 2005-12-21 | 2008-09-03 | 3M Innovative Properties Company | Microneedle devices |
US7545569B2 (en) | 2006-01-13 | 2009-06-09 | Avery Dennison Corporation | Optical apparatus with flipped compound prism structures |
WO2007100849A2 (en) * | 2006-02-27 | 2007-09-07 | Microcontinuum, Inc. | Formation of pattern replicating tools |
TWM298289U (en) | 2006-03-17 | 2006-09-21 | Hon Hai Prec Ind Co Ltd | Light guide plates and electronic products using the same |
US20070216049A1 (en) * | 2006-03-20 | 2007-09-20 | Heptagon Oy | Method and tool for manufacturing optical elements |
WO2007112309A2 (en) | 2006-03-24 | 2007-10-04 | 3M Innovative Properties Company | Process for making microneedles, microneedle arrays, masters, and replication tools |
JP2009537870A (ja) | 2006-05-18 | 2009-10-29 | スリーエム イノベイティブ プロパティズ カンパニー | 抽出構造体を備えた導光体の製造方法及びその方法で製造された導光体 |
TWI322927B (en) * | 2006-05-24 | 2010-04-01 | Ind Tech Res Inst | Roller module for microstructure thin film imprint |
TW200745490A (en) * | 2006-06-07 | 2007-12-16 | Jeng Shiang Prec Ind Co Ltd | Light guide plate |
US20080007964A1 (en) * | 2006-07-05 | 2008-01-10 | Tai-Yen Lin | Light guiding structure |
US20080083886A1 (en) | 2006-09-14 | 2008-04-10 | 3M Innovative Properties Company | Optical system suitable for processing multiphoton curable photoreactive compositions |
US7551359B2 (en) * | 2006-09-14 | 2009-06-23 | 3M Innovative Properties Company | Beam splitter apparatus and system |
US8241713B2 (en) | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
US7891636B2 (en) | 2007-08-27 | 2011-02-22 | 3M Innovative Properties Company | Silicone mold and use thereof |
EP2197645B1 (en) | 2007-09-06 | 2014-10-22 | 3M Innovative Properties Company | Methods of forming molds and methods of forming articles using said molds |
JP5951928B2 (ja) | 2007-09-06 | 2016-07-13 | スリーエム イノベイティブ プロパティズ カンパニー | 光出力の領域制御を提供する光抽出構造体を有する光ガイド |
EP2205521A4 (en) | 2007-09-06 | 2013-09-11 | 3M Innovative Properties Co | TOOL FOR MANUFACTURING MICROSTRUCTURE ARTICLES |
US20100227272A1 (en) | 2007-10-11 | 2010-09-09 | Innovative Properties Company | Highly Functional Multiphoton Curable Reactive Species |
JP5406203B2 (ja) | 2007-11-27 | 2014-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 浮遊する合成画像を有するシートの形成方法及びマスターツール |
US8455846B2 (en) | 2007-12-12 | 2013-06-04 | 3M Innovative Properties Company | Method for making structures with improved edge definition |
US8080073B2 (en) | 2007-12-20 | 2011-12-20 | 3M Innovative Properties Company | Abrasive article having a plurality of precisely-shaped abrasive composites |
WO2009108543A2 (en) | 2008-02-26 | 2009-09-03 | 3M Innovative Properties Company | Multi-photon exposure system |
US8570270B2 (en) * | 2009-10-19 | 2013-10-29 | Apple Inc. | Backlight unit color compensation techniques |
TWM385715U (en) * | 2009-12-14 | 2010-08-01 | Chunghwa Picture Tubes Ltd | Backlight module |
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2008
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- 2008-10-03 JP JP2010528958A patent/JP2011501209A/ja not_active Withdrawn
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EP2208100B8 (en) | 2017-08-16 |
US20100296106A1 (en) | 2010-11-25 |
EP2208100B1 (en) | 2017-06-28 |
JP2011501209A (ja) | 2011-01-06 |
EP2208100A4 (en) | 2011-03-09 |
CN101821659B (zh) | 2014-09-24 |
US8451457B2 (en) | 2013-05-28 |
WO2009048808A1 (en) | 2009-04-16 |
EP2208100A1 (en) | 2010-07-21 |
CN101821659A (zh) | 2010-09-01 |
JP2014088041A (ja) | 2014-05-15 |
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