JP2009521315A5 - - Google Patents
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- JP2009521315A5 JP2009521315A5 JP2008547458A JP2008547458A JP2009521315A5 JP 2009521315 A5 JP2009521315 A5 JP 2009521315A5 JP 2008547458 A JP2008547458 A JP 2008547458A JP 2008547458 A JP2008547458 A JP 2008547458A JP 2009521315 A5 JP2009521315 A5 JP 2009521315A5
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- Prior art keywords
- light beam
- region
- optical system
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- 230000003287 optical Effects 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 4
Claims (3)
- 多光子硬化性光反応組成物を含んだ層をその上に有する基板を提供するステップと、
第1の光学系を通じて光ビームを前記層の少なくとも第1の領域に作用させるステップと、
反射した光ビームをもたらすために、前記光ビームの一部分を各第1の領域で前記基板から反射させるステップと、
各第1の領域における前記反射した光ビームを、光検出器を備える第2の光学系内で処理するステップであって、前記光検出器の出力は、各第1の領域における前記基板と前記層との境界面の位置信号を含む、ステップと、
前記第1の光学系を、前記位置信号に応答して調節するステップと、
前記組成物を硬化領域内で硬化させるために、前記第1の光学系を通じて前記光ビームを作用させるステップと、を含む方法。 - 前記硬化領域は、前記第1の領域とは異なる、請求項1に記載の方法。
- 前記信号は、前記光ビームが前記硬化領域に作用されるとき、前記第1の光学系に連続的に作用される、請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75252905P | 2005-12-21 | 2005-12-21 | |
US60/752,529 | 2005-12-21 | ||
PCT/US2006/048498 WO2007073482A2 (en) | 2005-12-21 | 2006-12-20 | Method and apparatus for processing multiphoton curable photoreactive compositions |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009521315A JP2009521315A (ja) | 2009-06-04 |
JP2009521315A5 true JP2009521315A5 (ja) | 2010-02-04 |
JP4880701B2 JP4880701B2 (ja) | 2012-02-22 |
Family
ID=38189117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008547458A Expired - Fee Related JP4880701B2 (ja) | 2005-12-21 | 2006-12-20 | 多光子硬化反応性組成物を処理するための方法及び装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7893410B2 (ja) |
JP (1) | JP4880701B2 (ja) |
CN (1) | CN101341578B (ja) |
DE (1) | DE112006003494T5 (ja) |
WO (1) | WO2007073482A2 (ja) |
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CN101795840B (zh) | 2007-09-06 | 2013-08-07 | 3M创新有限公司 | 形成模具的方法以及使用所述模具形成制品的方法 |
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US8451457B2 (en) * | 2007-10-11 | 2013-05-28 | 3M Innovative Properties Company | Chromatic confocal sensor |
WO2009075970A1 (en) | 2007-12-12 | 2009-06-18 | 3M Innovative Properties Company | Method for making structures with improved edge definition |
JP5801558B2 (ja) | 2008-02-26 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子露光システム |
GB2489722B (en) | 2011-04-06 | 2017-01-18 | Precitec Optronik Gmbh | Apparatus and method for determining a depth of a region having a high aspect ratio that protrudes into a surface of a semiconductor wafer |
DE102011051146B3 (de) * | 2011-06-17 | 2012-10-04 | Precitec Optronik Gmbh | Prüfverfahren zum Prüfen einer Verbindungsschicht zwischen waferförmigen Proben |
CN104303108A (zh) * | 2012-02-28 | 2015-01-21 | 3M创新有限公司 | 利用负对比组合物的多光子固化方法 |
WO2014042771A2 (en) * | 2012-07-28 | 2014-03-20 | Harvard Bioscience, Inc. | Analytical methods |
DE102012111008B4 (de) | 2012-11-15 | 2014-05-22 | Precitec Optronik Gmbh | Optisches Messverfahren und optische Messvorrichtung zum Erfassen einer Oberflächentopographie |
US9005878B2 (en) | 2013-03-19 | 2015-04-14 | Eastman Kodak Company | Forming patterns using thiosulfate polymer compositions |
US9499650B2 (en) | 2013-03-19 | 2016-11-22 | Eastman Kodak Company | Thiosulfate polymers |
US8986924B2 (en) | 2013-03-19 | 2015-03-24 | Eastman Kodak Company | Method of sequestering metals using thiosulfate polymers |
US9772552B2 (en) | 2013-03-19 | 2017-09-26 | Eastman Kodak Company | Thiosulfate polymer compositions and articles |
US8916336B2 (en) | 2013-03-19 | 2014-12-23 | Eastman Kodak Company | Patterning method using thiosulfate polymer and metal nanoparticles |
US9500471B2 (en) | 2013-06-17 | 2016-11-22 | Precitec Optronik Gmbh | Optical measuring device and method for acquiring in situ a stage height between a support and an edge region of an object |
CN105917275B (zh) | 2013-12-06 | 2018-01-16 | 3M创新有限公司 | 液体光反应性组合物以及制造结构的方法 |
TWI583916B (zh) * | 2015-10-08 | 2017-05-21 | 財團法人工業技術研究院 | 雷射共焦量測方法及應用此方法之雷射共焦量測裝置 |
US10234265B2 (en) | 2016-12-12 | 2019-03-19 | Precitec Optronik Gmbh | Distance measuring device and method for measuring distances |
DE102017126310A1 (de) | 2017-11-09 | 2019-05-09 | Precitec Optronik Gmbh | Abstandsmessvorrichtung |
US11150484B2 (en) * | 2018-05-18 | 2021-10-19 | Lawrence Livermore National Security, Llc | System and method for curved light sheet projection during two-photon polymerization |
DE102018130901A1 (de) | 2018-12-04 | 2020-06-04 | Precitec Optronik Gmbh | Optische Messeinrichtung |
DE102021113189A1 (de) | 2021-05-20 | 2022-11-24 | Nanoscribe Holding Gmbh | Verfahren zum Erzeugen einer dreidimensionalen Zielstruktur in einem Lithographiematerial mittels einer Laserlithographie-Vorrichtung |
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US7583444B1 (en) | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
-
2006
- 2006-12-20 WO PCT/US2006/048498 patent/WO2007073482A2/en active Application Filing
- 2006-12-20 DE DE112006003494T patent/DE112006003494T5/de not_active Withdrawn
- 2006-12-20 CN CN2006800482953A patent/CN101341578B/zh not_active Expired - Fee Related
- 2006-12-20 US US12/158,143 patent/US7893410B2/en not_active Expired - Fee Related
- 2006-12-20 JP JP2008547458A patent/JP4880701B2/ja not_active Expired - Fee Related
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