CN101768357A - 组合物、由组合物形成的涂膜、含有涂膜的层积体以及装有层积体的电子机器 - Google Patents
组合物、由组合物形成的涂膜、含有涂膜的层积体以及装有层积体的电子机器 Download PDFInfo
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- CN101768357A CN101768357A CN200910004515A CN200910004515A CN101768357A CN 101768357 A CN101768357 A CN 101768357A CN 200910004515 A CN200910004515 A CN 200910004515A CN 200910004515 A CN200910004515 A CN 200910004515A CN 101768357 A CN101768357 A CN 101768357A
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- polyimide
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- laminate
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- 229920001721 polyimide Polymers 0.000 claims abstract description 168
- 239000004642 Polyimide Substances 0.000 claims abstract description 167
- 239000012046 mixed solvent Substances 0.000 claims abstract description 49
- 239000004020 conductor Substances 0.000 claims abstract description 40
- 238000001035 drying Methods 0.000 claims abstract description 27
- 239000000126 substance Substances 0.000 claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 198
- 239000000377 silicon dioxide Substances 0.000 claims description 98
- 238000007639 printing Methods 0.000 claims description 82
- 239000002904 solvent Substances 0.000 claims description 82
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical group O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 36
- 239000011248 coating agent Substances 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 28
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- 239000002245 particle Substances 0.000 claims description 25
- 150000008064 anhydrides Chemical class 0.000 claims description 23
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 23
- 150000004692 metal hydroxides Chemical class 0.000 claims description 23
- -1 acetylacetone metal complex Chemical class 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
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- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Natural products CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 12
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- 125000000217 alkyl group Chemical group 0.000 claims description 2
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- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 10
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- 150000003457 sulfones Chemical class 0.000 description 6
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 6
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- AIVVXPSKEVWKMY-UHFFFAOYSA-N 4-(3,4-dicarboxyphenoxy)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 AIVVXPSKEVWKMY-UHFFFAOYSA-N 0.000 description 5
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
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- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
- C08G73/1032—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous characterised by the solvent(s) used
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08K3/22—Oxides; Hydroxides of metals
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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- C—CHEMISTRY; METALLURGY
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- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
- C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08K5/57—Organo-tin compounds
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
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- Chemical Kinetics & Catalysis (AREA)
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- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Paints Or Removers (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Laminated Bodies (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims (53)
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JP2008334314A JP5256018B2 (ja) | 2008-12-26 | 2008-12-26 | 組成物、組成物からなる塗膜、塗膜を含む積層体、及び積層体を組み込んだ電子機器 |
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CN101768357A true CN101768357A (zh) | 2010-07-07 |
CN101768357B CN101768357B (zh) | 2013-02-27 |
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JP (1) | JP5256018B2 (zh) |
CN (1) | CN101768357B (zh) |
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JP2022129993A (ja) * | 2021-02-25 | 2022-09-06 | 三菱マテリアル株式会社 | ポリイミド樹脂組成物及び金属ベース基板 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3356096B2 (ja) * | 1990-11-30 | 2002-12-09 | 宇部興産株式会社 | 接着剤の必須成分として使用されるポリイミドシロキサン |
JP2910948B2 (ja) * | 1991-06-11 | 1999-06-23 | 宇部興産株式会社 | 屈曲部付き柔軟性配線板の製法 |
JP3894668B2 (ja) * | 1997-12-26 | 2007-03-22 | 宇部興産株式会社 | 接着性の改良された耐熱性フィルムの積層体 |
US6129982A (en) * | 1997-11-28 | 2000-10-10 | Ube Industries, Ltd. | Aromatic polyimide film having improved adhesion |
JP2001213961A (ja) * | 2000-02-04 | 2001-08-07 | Manac Inc | ポリイミドの製造方法 |
JP4365987B2 (ja) * | 2000-05-15 | 2009-11-18 | 協和化学工業株式会社 | 積層板用材料および電機および電子機器用樹脂組成物およびその成型品 |
JP4008249B2 (ja) * | 2001-01-31 | 2007-11-14 | 住友ベークライト株式会社 | 絶縁樹脂組成物及び絶縁樹脂シート並びにプリント配線板 |
JP4151008B2 (ja) * | 2003-10-07 | 2008-09-17 | 東レ・デュポン株式会社 | ポリイミドフィルム積層体、その製造方法およびフレキシブル回路基板 |
US7348373B2 (en) * | 2004-01-09 | 2008-03-25 | E.I. Du Pont De Nemours And Company | Polyimide compositions having resistance to water sorption, and methods relating thereto |
JP4947612B2 (ja) * | 2004-04-28 | 2012-06-06 | 神島化学工業株式会社 | 水酸化マグネシウム系難燃剤とその製造方法、及び難燃性樹脂組成物 |
TWI367907B (en) * | 2004-06-21 | 2012-07-11 | Mitsubishi Gas Chemical Co | Colorless transparent polyimide complex film and method for producing the same |
JP4997717B2 (ja) * | 2004-06-21 | 2012-08-08 | 三菱瓦斯化学株式会社 | 無色透明性ポリイミド複合フィルムおよびその製造方法 |
WO2007097795A2 (en) * | 2005-11-28 | 2007-08-30 | Martin Marietta Materials, Inc. | Flame-retardant magnesium hydroxide compositions and associated methods of manufacture and use |
JP4905878B2 (ja) * | 2005-12-06 | 2012-03-28 | ニッタ株式会社 | ポリイミド合成用組成物及びポリイミドの製造方法 |
CN101395234B (zh) * | 2006-03-03 | 2012-08-22 | 株式会社Pi技术研究所 | 丝网印刷用感光性油墨组合物和使用其的正型浮雕图案的形成方法 |
JP5093742B2 (ja) * | 2006-09-07 | 2012-12-12 | 住友電気工業株式会社 | 難燃性ポリイミドインク組成物、保護膜、及びフレキシブルプリント配線板 |
-
2008
- 2008-12-26 JP JP2008334314A patent/JP5256018B2/ja not_active Expired - Fee Related
-
2009
- 2009-03-05 US US12/398,954 patent/US20100167022A1/en not_active Abandoned
- 2009-03-05 TW TW98107197A patent/TWI388627B/zh not_active IP Right Cessation
- 2009-03-06 CN CN2009100045158A patent/CN101768357B/zh active Active
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2011
- 2011-11-14 US US13/296,012 patent/US20120065310A1/en not_active Abandoned
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CN103582677A (zh) * | 2011-06-09 | 2014-02-12 | 住友精化株式会社 | 不燃膜、不燃膜用分散液、不燃膜的制造方法、太阳能电池背板、柔性基板和太阳能电池 |
TWI588187B (zh) * | 2011-06-09 | 2017-06-21 | Sumitomo Seika Chemicals | Non-flammable film, dispersion liquid for nonflammable film, method for producing incombustible film, solar cell backsheet, flexible substrate, and solar cell |
CN103582677B (zh) * | 2011-06-09 | 2017-11-28 | 住友精化株式会社 | 不燃膜、不燃膜用分散液、不燃膜的制造方法、太阳能电池背板、柔性基板和太阳能电池 |
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CN104967075B (zh) * | 2015-05-11 | 2018-07-27 | 江苏江城电气有限公司 | 一种高温环境下的耐高温母线槽 |
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CN107857880B (zh) * | 2017-11-03 | 2020-08-11 | 东华大学 | 一种高粘结性含酞菁聚酰亚胺树脂的制备方法 |
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Also Published As
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US20120065310A1 (en) | 2012-03-15 |
TWI388627B (zh) | 2013-03-11 |
JP5256018B2 (ja) | 2013-08-07 |
CN101768357B (zh) | 2013-02-27 |
TW201024376A (en) | 2010-07-01 |
US20100167022A1 (en) | 2010-07-01 |
JP2010155895A (ja) | 2010-07-15 |
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