CN101550557A - 电解电极的制造工艺 - Google Patents
电解电极的制造工艺 Download PDFInfo
- Publication number
- CN101550557A CN101550557A CNA2009101330012A CN200910133001A CN101550557A CN 101550557 A CN101550557 A CN 101550557A CN A2009101330012 A CNA2009101330012 A CN A2009101330012A CN 200910133001 A CN200910133001 A CN 200910133001A CN 101550557 A CN101550557 A CN 101550557A
- Authority
- CN
- China
- Prior art keywords
- valve metal
- electrode
- tantalum
- undercoat
- aip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
Abstract
Description
靶(蒸发源): | 包括Ta∶Ti=60wt%∶40wt%的合金盘(背面水冷) |
达到真空的时间: | 1.5×10-2Pa或更低 |
衬底温度: | 500摄氏度或更低 |
涂覆压力: | 3.0×10-1~4.0×10-1Pa |
蒸发源输入功率: | 20~30V、140~160A |
涂覆时间: | 15~20分钟 |
涂覆厚度: | 2微米(重量等效) |
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP089251/08 | 2008-03-31 | ||
JP2008089251 | 2008-03-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101550557A true CN101550557A (zh) | 2009-10-07 |
CN101550557B CN101550557B (zh) | 2012-07-18 |
Family
ID=40568335
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009101330012A Active CN101550557B (zh) | 2008-03-31 | 2009-03-31 | 电解电极的制造工艺 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7842353B2 (zh) |
EP (1) | EP2107137B1 (zh) |
JP (1) | JP4335302B1 (zh) |
CN (1) | CN101550557B (zh) |
HK (1) | HK1132306A1 (zh) |
MY (1) | MY143925A (zh) |
TW (1) | TWI453305B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107002262A (zh) * | 2014-11-10 | 2017-08-01 | 国立大学法人横浜国立大学 | 氧气发生用阳极 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2107136B1 (en) * | 2008-03-31 | 2014-12-31 | Permelec Electrode Ltd. | Manufacturing process of electrodes for electrolysis |
TWI512129B (zh) * | 2010-08-06 | 2015-12-11 | Industrie De Nora Spa | 電解製程所用電極之製法 |
FI2823079T3 (fi) | 2012-02-23 | 2023-05-04 | Treadstone Tech Inc | Korrosiota kestävä ja sähköä johtava metallin pinta |
CN108554756A (zh) * | 2017-12-07 | 2018-09-21 | 宁夏天元锰业有限公司 | 一种电解金属锰铅银合金阳极板过渡排的保护方法 |
JP7168729B1 (ja) * | 2021-07-12 | 2022-11-09 | デノラ・ペルメレック株式会社 | 工業用電解プロセス用電極 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4052271A (en) | 1965-05-12 | 1977-10-04 | Diamond Shamrock Technologies, S.A. | Method of making an electrode having a coating containing a platinum metal oxide thereon |
US3933616A (en) | 1967-02-10 | 1976-01-20 | Chemnor Corporation | Coating of protected electrocatalytic material on an electrode |
CH596621A5 (zh) * | 1976-06-30 | 1978-03-15 | Cerberus Ag | |
JPS6021232B2 (ja) | 1981-05-19 | 1985-05-25 | ペルメレツク電極株式会社 | 耐久性を有する電解用電極及びその製造方法 |
JPS6022074B2 (ja) | 1982-08-26 | 1985-05-30 | ペルメレツク電極株式会社 | 耐久性を有する電解用電極及びその製造方法 |
JP2761751B2 (ja) | 1989-03-20 | 1998-06-04 | ペルメレック電極株式会社 | 耐久性電解用電極及びその製造方法 |
JP2574699B2 (ja) | 1989-04-21 | 1997-01-22 | ダイソー 株式会社 | 酸素発生陽極及びその製法 |
JP3044797B2 (ja) * | 1991-02-04 | 2000-05-22 | ダイソー株式会社 | 酸素発生用陽極の製法 |
JP3116490B2 (ja) | 1991-12-24 | 2000-12-11 | ダイソー株式会社 | 酸素発生用陽極の製法 |
DE69330773T2 (de) | 1992-10-14 | 2002-07-04 | Daiki Engineering Co | Hochfeste Elektroden für die Elektrolyse und ein Verfahren für die Herstellung derselben |
JP2920040B2 (ja) | 1993-04-28 | 1999-07-19 | 大機エンジニアリング株式会社 | 高耐久性電解用電極およびその製造方法 |
JP2768904B2 (ja) | 1993-07-21 | 1998-06-25 | 古河電気工業株式会社 | 酸素発生用電極 |
JP3430479B2 (ja) | 1993-12-24 | 2003-07-28 | ダイソー株式会社 | 酸素発生用陽極 |
KR100501142B1 (ko) * | 2000-09-01 | 2005-07-18 | 산요덴키가부시키가이샤 | 리튬 2차 전지용 음극 및 그 제조 방법 |
KR100869956B1 (ko) * | 2000-10-31 | 2008-11-21 | 미츠비시 마테리알 가부시키가이샤 | 고속도 공구강제 기어 절삭공구 및 그 제조방법 |
DE10233222B4 (de) * | 2001-07-23 | 2007-03-01 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe | Harte verschleissfeste Schicht, Verfahren zum Bilden derselben und Verwendung |
MY136763A (en) * | 2003-05-15 | 2008-11-28 | Permelec Electrode Ltd | Electrolytic electrode and process of producing the same |
JP4209801B2 (ja) | 2003-05-15 | 2009-01-14 | ペルメレック電極株式会社 | 電解用電極及びその製造方法 |
DE102006004394B4 (de) * | 2005-02-16 | 2011-01-13 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe-shi | Hartfilm, Mehrschichthartfilm und Herstellungsverfahren dafür |
JP2007154237A (ja) * | 2005-12-02 | 2007-06-21 | Permelec Electrode Ltd | 電解用電極及びその製造方法 |
JP5135576B2 (ja) | 2006-10-03 | 2013-02-06 | 国立大学法人長岡技術科学大学 | 製氷装置 |
EP2107136B1 (en) * | 2008-03-31 | 2014-12-31 | Permelec Electrode Ltd. | Manufacturing process of electrodes for electrolysis |
-
2009
- 2009-02-26 TW TW098106123A patent/TWI453305B/zh active
- 2009-02-26 EP EP09002769.9A patent/EP2107137B1/en active Active
- 2009-03-10 MY MYPI20090947A patent/MY143925A/en unknown
- 2009-03-11 JP JP2009058534A patent/JP4335302B1/ja active Active
- 2009-03-18 US US12/381,979 patent/US7842353B2/en active Active
- 2009-03-31 CN CN2009101330012A patent/CN101550557B/zh active Active
- 2009-12-24 HK HK09112126.3A patent/HK1132306A1/xx not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107002262A (zh) * | 2014-11-10 | 2017-08-01 | 国立大学法人横浜国立大学 | 氧气发生用阳极 |
Also Published As
Publication number | Publication date |
---|---|
JP2009263771A (ja) | 2009-11-12 |
TW200942646A (en) | 2009-10-16 |
EP2107137A1 (en) | 2009-10-07 |
US20090242417A1 (en) | 2009-10-01 |
EP2107137B1 (en) | 2014-10-08 |
CN101550557B (zh) | 2012-07-18 |
HK1132306A1 (en) | 2010-02-19 |
JP4335302B1 (ja) | 2009-09-30 |
US7842353B2 (en) | 2010-11-30 |
TWI453305B (zh) | 2014-09-21 |
MY143925A (en) | 2011-07-29 |
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