HK1132306A1 - Manufacturing process of electrodes for electrolysis - Google Patents

Manufacturing process of electrodes for electrolysis

Info

Publication number
HK1132306A1
HK1132306A1 HK09112126.3A HK09112126A HK1132306A1 HK 1132306 A1 HK1132306 A1 HK 1132306A1 HK 09112126 A HK09112126 A HK 09112126A HK 1132306 A1 HK1132306 A1 HK 1132306A1
Authority
HK
Hong Kong
Prior art keywords
valve metal
component
ion plating
arc ion
undercoating layer
Prior art date
Application number
HK09112126.3A
Other languages
English (en)
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Publication of HK1132306A1 publication Critical patent/HK1132306A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
HK09112126.3A 2008-03-31 2009-12-24 Manufacturing process of electrodes for electrolysis HK1132306A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008089251 2008-03-31

Publications (1)

Publication Number Publication Date
HK1132306A1 true HK1132306A1 (en) 2010-02-19

Family

ID=40568335

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09112126.3A HK1132306A1 (en) 2008-03-31 2009-12-24 Manufacturing process of electrodes for electrolysis

Country Status (7)

Country Link
US (1) US7842353B2 (zh)
EP (1) EP2107137B1 (zh)
JP (1) JP4335302B1 (zh)
CN (1) CN101550557B (zh)
HK (1) HK1132306A1 (zh)
MY (1) MY143925A (zh)
TW (1) TWI453305B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2107136B1 (en) * 2008-03-31 2014-12-31 Permelec Electrode Ltd. Manufacturing process of electrodes for electrolysis
TWI512129B (zh) * 2010-08-06 2015-12-11 Industrie De Nora Spa 電解製程所用電極之製法
EP2823079B1 (en) * 2012-02-23 2023-02-22 Treadstone Technologies, Inc. Corrosion resistant and electrically conductive surface of metal
DK3228731T3 (da) 2014-11-10 2020-05-25 Nat Univ Corp Yokohama Nat Univ Oxygen-genererende anode
CN108554756A (zh) * 2017-12-07 2018-09-21 宁夏天元锰业有限公司 一种电解金属锰铅银合金阳极板过渡排的保护方法
JP7168729B1 (ja) * 2021-07-12 2022-11-09 デノラ・ペルメレック株式会社 工業用電解プロセス用電極

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4052271A (en) 1965-05-12 1977-10-04 Diamond Shamrock Technologies, S.A. Method of making an electrode having a coating containing a platinum metal oxide thereon
US3933616A (en) 1967-02-10 1976-01-20 Chemnor Corporation Coating of protected electrocatalytic material on an electrode
CH596621A5 (zh) * 1976-06-30 1978-03-15 Cerberus Ag
JPS6021232B2 (ja) 1981-05-19 1985-05-25 ペルメレツク電極株式会社 耐久性を有する電解用電極及びその製造方法
JPS6022074B2 (ja) 1982-08-26 1985-05-30 ペルメレツク電極株式会社 耐久性を有する電解用電極及びその製造方法
JP2761751B2 (ja) 1989-03-20 1998-06-04 ペルメレック電極株式会社 耐久性電解用電極及びその製造方法
JP2574699B2 (ja) 1989-04-21 1997-01-22 ダイソー 株式会社 酸素発生陽極及びその製法
JP3044797B2 (ja) * 1991-02-04 2000-05-22 ダイソー株式会社 酸素発生用陽極の製法
JP3116490B2 (ja) 1991-12-24 2000-12-11 ダイソー株式会社 酸素発生用陽極の製法
JP2920040B2 (ja) 1993-04-28 1999-07-19 大機エンジニアリング株式会社 高耐久性電解用電極およびその製造方法
DE69330773T2 (de) 1992-10-14 2002-07-04 Daiki Engineering Co Hochfeste Elektroden für die Elektrolyse und ein Verfahren für die Herstellung derselben
JP2768904B2 (ja) 1993-07-21 1998-06-25 古河電気工業株式会社 酸素発生用電極
JP3430479B2 (ja) 1993-12-24 2003-07-28 ダイソー株式会社 酸素発生用陽極
WO2002021616A1 (fr) * 2000-09-01 2002-03-14 Sanyo Electric Co., Ltd. Electrode negative pour accumulateur au lithium et procede de production
KR100869956B1 (ko) * 2000-10-31 2008-11-21 미츠비시 마테리알 가부시키가이샤 고속도 공구강제 기어 절삭공구 및 그 제조방법
DE10233222B4 (de) * 2001-07-23 2007-03-01 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe Harte verschleissfeste Schicht, Verfahren zum Bilden derselben und Verwendung
MY136763A (en) * 2003-05-15 2008-11-28 Permelec Electrode Ltd Electrolytic electrode and process of producing the same
JP4209801B2 (ja) 2003-05-15 2009-01-14 ペルメレック電極株式会社 電解用電極及びその製造方法
DE102006004394B4 (de) * 2005-02-16 2011-01-13 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe-shi Hartfilm, Mehrschichthartfilm und Herstellungsverfahren dafür
JP2007154237A (ja) 2005-12-02 2007-06-21 Permelec Electrode Ltd 電解用電極及びその製造方法
JP5135576B2 (ja) 2006-10-03 2013-02-06 国立大学法人長岡技術科学大学 製氷装置
EP2107136B1 (en) * 2008-03-31 2014-12-31 Permelec Electrode Ltd. Manufacturing process of electrodes for electrolysis

Also Published As

Publication number Publication date
US20090242417A1 (en) 2009-10-01
CN101550557A (zh) 2009-10-07
MY143925A (en) 2011-07-29
TW200942646A (en) 2009-10-16
JP4335302B1 (ja) 2009-09-30
US7842353B2 (en) 2010-11-30
EP2107137A1 (en) 2009-10-07
EP2107137B1 (en) 2014-10-08
JP2009263771A (ja) 2009-11-12
CN101550557B (zh) 2012-07-18
TWI453305B (zh) 2014-09-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20160331