EA201270451A1 - Электрод для электролитических процессов с контролируемой кристаллической структурой - Google Patents

Электрод для электролитических процессов с контролируемой кристаллической структурой

Info

Publication number
EA201270451A1
EA201270451A1 EA201270451A EA201270451A EA201270451A1 EA 201270451 A1 EA201270451 A1 EA 201270451A1 EA 201270451 A EA201270451 A EA 201270451A EA 201270451 A EA201270451 A EA 201270451A EA 201270451 A1 EA201270451 A1 EA 201270451A1
Authority
EA
Eurasian Patent Office
Prior art keywords
electrode
crystalline structure
electrolytic processes
controlled crystalline
ruthenium
Prior art date
Application number
EA201270451A
Other languages
English (en)
Other versions
EA023083B1 (ru
Inventor
Кристиан Урджеге
Стефания Мора
Антонио Лоренцо Антоцци
Original Assignee
Индустрие Де Нора С.П.А.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Индустрие Де Нора С.П.А. filed Critical Индустрие Де Нора С.П.А.
Publication of EA201270451A1 publication Critical patent/EA201270451A1/ru
Publication of EA023083B1 publication Critical patent/EA023083B1/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Изобретение относится к катоду для электролизных процессов с каталитическим покрытием на основе кристаллитов рутения с высококонтролируемым размером в диапазоне 1-10 нм. Покрытие может быть изготовлено физическим парофазным осаждением рутения или оксидным рутениевым слоем.
EA201270451A 2009-09-23 2010-09-23 Электрод для катодного выделения водорода в электролитическом процессе EA023083B1 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001621A ITMI20091621A1 (it) 2009-09-23 2009-09-23 Elettrodo per processi elettrolitici con struttura cristallina controllata
PCT/EP2010/064081 WO2011036225A1 (en) 2009-09-23 2010-09-23 Electrode for electrolytic processes with controlled crystalline structure

Publications (2)

Publication Number Publication Date
EA201270451A1 true EA201270451A1 (ru) 2012-08-30
EA023083B1 EA023083B1 (ru) 2016-04-29

Family

ID=42138977

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201270451A EA023083B1 (ru) 2009-09-23 2010-09-23 Электрод для катодного выделения водорода в электролитическом процессе

Country Status (18)

Country Link
US (1) US9090982B2 (ru)
EP (1) EP2480705B1 (ru)
JP (1) JP5824454B2 (ru)
KR (1) KR101742011B1 (ru)
CN (1) CN102575363B (ru)
AR (1) AR078442A1 (ru)
AU (1) AU2010299850B2 (ru)
BR (1) BR112012006530A2 (ru)
CA (1) CA2769824C (ru)
DK (1) DK2480705T3 (ru)
EA (1) EA023083B1 (ru)
HK (1) HK1172936A1 (ru)
IL (1) IL217859A (ru)
IT (1) ITMI20091621A1 (ru)
MX (1) MX2012003517A (ru)
TW (1) TWI490372B (ru)
WO (1) WO2011036225A1 (ru)
ZA (1) ZA201201825B (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20122035A1 (it) * 2012-11-29 2014-05-30 Industrie De Nora Spa Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali
DK3351659T3 (da) * 2015-09-18 2019-12-16 Asahi Chemical Ind Positiv elektrode til vandelektrolyse, elektrolysecelle og fremgangsmåde til at fremstille en positiv elektrode til vandelektrolyse
EP4335942A2 (en) * 2018-04-18 2024-03-13 Materion Corporation Electrodes for biosensors
CN113073336B (zh) * 2021-03-26 2022-07-08 浙江工业大学 一种RuO2泡沫镍复合电极及其制备方法和应用

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2088659A5 (ru) * 1970-04-21 1972-01-07 Progil
AU5889880A (en) * 1979-07-02 1981-01-15 Olin Corporation Manufacture of low overvoltage electrodes by cathodic sputtering
EP0107612A3 (en) * 1982-09-02 1985-12-27 Eltech Systems Limited Method of conditioning a porous gas-diffusion electrode
CN1008543B (zh) * 1985-11-21 1990-06-27 中国科学院大连化学物理研究所 一种电解水方法
GB8617325D0 (en) * 1986-07-16 1986-08-20 Johnson Matthey Plc Poison-resistant cathodes
US6171460B1 (en) * 1993-05-10 2001-01-09 John L. Bill Chemically protected electrode system
FR2775486B1 (fr) * 1998-03-02 2000-04-07 Atochem Elf Sa Cathode specifique, utilisable pour la preparation d'un chlorate de metal alcalin et son procede de fabrication
WO2003016592A2 (en) * 2001-08-14 2003-02-27 3-One-2, Llc Electrolytic cell and electrodes for use in electrochemical processes
US6686308B2 (en) * 2001-12-03 2004-02-03 3M Innovative Properties Company Supported nanoparticle catalyst
RU2422357C2 (ru) * 2005-09-23 2011-06-27 Мекс, Инк. Катализаторы на основе оксида рутения для конверсии диоксида серы в триоксид серы
US8183174B2 (en) * 2008-10-15 2012-05-22 California Institute Of Technology IR-doped ruthenium oxide catalyst for oxygen evolution
US8221599B2 (en) * 2009-04-03 2012-07-17 The Board Of Trustees Of The Leland Stanford Junior University Corrosion-resistant anodes, devices including the anodes, and methods of using the anodes
CN101525760B (zh) * 2009-04-17 2011-03-23 中南大学 一种用于制备超级电容器RuO2电极材料的电沉积工艺

Also Published As

Publication number Publication date
JP5824454B2 (ja) 2015-11-25
EP2480705A1 (en) 2012-08-01
BR112012006530A2 (pt) 2016-04-26
CN102575363A (zh) 2012-07-11
HK1172936A1 (en) 2013-05-03
AU2010299850B2 (en) 2014-11-20
KR101742011B1 (ko) 2017-05-31
US20120175270A1 (en) 2012-07-12
WO2011036225A1 (en) 2011-03-31
KR20120085787A (ko) 2012-08-01
AU2010299850A1 (en) 2012-03-01
JP2013505363A (ja) 2013-02-14
ITMI20091621A1 (it) 2011-03-24
CN102575363B (zh) 2015-07-01
IL217859A0 (en) 2012-03-29
EA023083B1 (ru) 2016-04-29
ZA201201825B (en) 2013-05-29
CA2769824A1 (en) 2011-03-31
AR078442A1 (es) 2011-11-09
TW201114948A (en) 2011-05-01
DK2480705T3 (en) 2019-02-18
IL217859A (en) 2017-10-31
MX2012003517A (es) 2012-04-19
TWI490372B (zh) 2015-07-01
EP2480705B1 (en) 2018-11-21
US9090982B2 (en) 2015-07-28
CA2769824C (en) 2017-12-19

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MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM BY KG MD TJ