MX2012002713A - Activacion de superficies electrodicas por medio de tecnicas de deposicion al vacio en un proceso continuo. - Google Patents
Activacion de superficies electrodicas por medio de tecnicas de deposicion al vacio en un proceso continuo.Info
- Publication number
- MX2012002713A MX2012002713A MX2012002713A MX2012002713A MX2012002713A MX 2012002713 A MX2012002713 A MX 2012002713A MX 2012002713 A MX2012002713 A MX 2012002713A MX 2012002713 A MX2012002713 A MX 2012002713A MX 2012002713 A MX2012002713 A MX 2012002713A
- Authority
- MX
- Mexico
- Prior art keywords
- activation
- vacuum deposition
- continuous process
- deposition techniques
- electrode surfaces
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
- H01M4/88—Processes of manufacture
- H01M4/8825—Methods for deposition of the catalytic active composition
- H01M4/8867—Vapour deposition
- H01M4/8871—Sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electrolytic Production Of Metals (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
La invención es relativa a un método de producción de electrodos metálicos para aplicaciones electrolíticas por medio de una deposición en continuo de una capa de metales nobles sobre sustratos metálicos mediante una técnica de deposición física de vapor.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT001531A ITMI20091531A1 (it) | 2009-09-03 | 2009-09-03 | Attivazione continua di strutture elettrodiche mediante tecniche di deposizione in vuoto |
PCT/EP2010/062902 WO2011026914A1 (en) | 2009-09-03 | 2010-09-02 | Activation of electrode surfaces by means of vacuum deposition techniques in a continuous process |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2012002713A true MX2012002713A (es) | 2012-04-19 |
Family
ID=41650354
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2012002713A MX2012002713A (es) | 2009-09-03 | 2010-09-02 | Activacion de superficies electrodicas por medio de tecnicas de deposicion al vacio en un proceso continuo. |
Country Status (17)
Country | Link |
---|---|
US (1) | US20120164344A1 (es) |
EP (1) | EP2473647A1 (es) |
JP (1) | JP5693583B2 (es) |
KR (1) | KR20120049380A (es) |
CN (1) | CN102482770B (es) |
AR (1) | AR078328A1 (es) |
AU (1) | AU2010291209B2 (es) |
BR (1) | BR112012004765A2 (es) |
CA (1) | CA2769818A1 (es) |
EA (1) | EA024663B1 (es) |
EG (1) | EG26695A (es) |
HK (1) | HK1167691A1 (es) |
IL (1) | IL217803A0 (es) |
IT (1) | ITMI20091531A1 (es) |
MX (1) | MX2012002713A (es) |
WO (1) | WO2011026914A1 (es) |
ZA (1) | ZA201201432B (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9567681B2 (en) * | 2013-02-12 | 2017-02-14 | Treadstone Technologies, Inc. | Corrosion resistant and electrically conductive surface of metallic components for electrolyzers |
US20150056493A1 (en) * | 2013-08-21 | 2015-02-26 | GM Global Technology Operations LLC | Coated porous separators and coated electrodes for lithium batteries |
KR102491154B1 (ko) * | 2021-01-21 | 2023-01-26 | 주식회사 테크로스 | 전기분해용 이중코팅 촉매 전극 및 이의 제조방법 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2405662A (en) * | 1941-08-30 | 1946-08-13 | Crown Cork & Seal Co | Coating |
US4331523A (en) * | 1980-03-31 | 1982-05-25 | Showa Denko Kk | Method for electrolyzing water or aqueous solutions |
US4544473A (en) * | 1980-05-12 | 1985-10-01 | Energy Conversion Devices, Inc. | Catalytic electrolytic electrode |
JPS6379955A (ja) * | 1986-09-20 | 1988-04-09 | Nippon Steel Corp | ろう付け性に優れたステンレス鋼帯の製造方法 |
JPS63204726A (ja) * | 1987-02-20 | 1988-08-24 | Anelva Corp | 真空処理装置 |
US5003428A (en) * | 1989-07-17 | 1991-03-26 | National Semiconductor Corporation | Electrodes for ceramic oxide capacitors |
US5236509A (en) * | 1992-02-06 | 1993-08-17 | Spire Corporation | Modular ibad apparatus for continuous coating |
GB9316926D0 (en) * | 1993-08-13 | 1993-09-29 | Ici Plc | Electrode |
AU719341B2 (en) * | 1997-01-22 | 2000-05-04 | De Nora Elettrodi S.P.A. | Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
US6673127B1 (en) * | 1997-01-22 | 2004-01-06 | Denora S.P.A. | Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
JPH1129863A (ja) * | 1997-07-10 | 1999-02-02 | Canon Inc | 堆積膜製造方法 |
US5879827A (en) * | 1997-10-10 | 1999-03-09 | Minnesota Mining And Manufacturing Company | Catalyst for membrane electrode assembly and method of making |
US6866958B2 (en) * | 2002-06-05 | 2005-03-15 | General Motors Corporation | Ultra-low loadings of Au for stainless steel bipolar plates |
US7193934B2 (en) * | 2002-06-07 | 2007-03-20 | Carnegie Mellon University | Domain position detection magnetic amplifying magneto-optical system |
KR20140018994A (ko) * | 2005-07-01 | 2014-02-13 | 바스프 푸엘 셀 게엠베하 | 가스 확산 전극, 막-전극 어셈블리 및 그의 제조방법 |
JP4670530B2 (ja) * | 2005-08-01 | 2011-04-13 | アイテック株式会社 | 電解用の貴金属電極とその製造方法 |
DE102006057386A1 (de) * | 2006-12-04 | 2008-06-05 | Uhde Gmbh | Verfahren zum Beschichten von Substraten |
JP5189781B2 (ja) * | 2007-03-23 | 2013-04-24 | ペルメレック電極株式会社 | 水素発生用電極 |
US7806641B2 (en) * | 2007-08-30 | 2010-10-05 | Ascentool, Inc. | Substrate processing system having improved substrate transport system |
-
2009
- 2009-09-03 IT IT001531A patent/ITMI20091531A1/it unknown
-
2010
- 2010-09-02 KR KR1020127007956A patent/KR20120049380A/ko not_active Application Discontinuation
- 2010-09-02 BR BR112012004765A patent/BR112012004765A2/pt not_active IP Right Cessation
- 2010-09-02 CN CN201080039017.8A patent/CN102482770B/zh not_active Expired - Fee Related
- 2010-09-02 WO PCT/EP2010/062902 patent/WO2011026914A1/en active Application Filing
- 2010-09-02 MX MX2012002713A patent/MX2012002713A/es active IP Right Grant
- 2010-09-02 AU AU2010291209A patent/AU2010291209B2/en not_active Ceased
- 2010-09-02 JP JP2012527326A patent/JP5693583B2/ja not_active Expired - Fee Related
- 2010-09-02 CA CA2769818A patent/CA2769818A1/en not_active Abandoned
- 2010-09-02 EA EA201270368A patent/EA024663B1/ru not_active IP Right Cessation
- 2010-09-02 EP EP10762880A patent/EP2473647A1/en not_active Withdrawn
- 2010-09-03 AR ARP100103249A patent/AR078328A1/es not_active Application Discontinuation
-
2012
- 2012-01-29 IL IL217803A patent/IL217803A0/en unknown
- 2012-02-27 ZA ZA2012/01432A patent/ZA201201432B/en unknown
- 2012-03-04 EG EG2012030387A patent/EG26695A/en active
- 2012-03-06 US US13/413,121 patent/US20120164344A1/en not_active Abandoned
- 2012-08-23 HK HK12108279.1A patent/HK1167691A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
IL217803A0 (en) | 2012-03-29 |
AU2010291209B2 (en) | 2014-08-28 |
WO2011026914A1 (en) | 2011-03-10 |
HK1167691A1 (en) | 2012-12-07 |
EG26695A (en) | 2014-06-11 |
EA201270368A1 (ru) | 2012-09-28 |
ZA201201432B (en) | 2013-05-29 |
AR078328A1 (es) | 2011-11-02 |
CN102482770B (zh) | 2015-03-25 |
JP5693583B2 (ja) | 2015-04-01 |
CN102482770A (zh) | 2012-05-30 |
EP2473647A1 (en) | 2012-07-11 |
KR20120049380A (ko) | 2012-05-16 |
AU2010291209A1 (en) | 2012-03-01 |
US20120164344A1 (en) | 2012-06-28 |
BR112012004765A2 (pt) | 2016-03-15 |
JP2013503967A (ja) | 2013-02-04 |
ITMI20091531A1 (it) | 2011-03-04 |
EA024663B1 (ru) | 2016-10-31 |
CA2769818A1 (en) | 2011-03-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IN2014KN01179A (es) | ||
TW200940750A (en) | Manufacturing process of electrodes for electrolysis | |
EP2371996A4 (en) | CERAMIC ELECTROLYTIC COATING PROCESS FOR METALS, ELECTROLYSIS SOLUTION FOR CERAMIC ELECTROLYTIC COATING, AND METALLIC MATERIAL | |
WO2009112573A3 (de) | Verfahren und dispersion zum aufbringen einer metallschicht auf einem substrat sowie metallisierbare thermoplastische formmasse | |
GB2499560A (en) | Insulated metal substrate | |
EP2462791A4 (en) | Process for forming optically clear conductive metal or metal alloy thin films and films made therefrom | |
DE602008006059D1 (de) | Barriereschicht und herstellungsverfahren dafür | |
EP2155927A4 (en) | DEPOSITION OF METALLIC IONS ON SURFACES OF CONDUCTIVE SUBSTRATES | |
PH12015502695A1 (en) | Metal coating on ceramic substrates | |
MX361261B (es) | Catodo para desarrollo electrolitico de hidrogeno. | |
MX2016005564A (es) | Capa de carrera contra oxidacion. | |
ZA201105812B (en) | Method for the ion beam treatment of a metal layer deposited on a substrate | |
MX2012002713A (es) | Activacion de superficies electrodicas por medio de tecnicas de deposicion al vacio en un proceso continuo. | |
MX2015004299A (es) | Electrodo transparente y metodo de produccion asociado. | |
MY170921A (en) | Electro-deposited copper-alloy foil and electro-deposited copper-alloy foil provided with carrier foil | |
WO2009059915A3 (de) | Goldhaltige nickelschicht | |
TW200942646A (en) | Manufacturing process of electrodes for electrolysis | |
WO2011076430A3 (de) | Verfahren und vorrichtung zum ausbilden einer dielektrischen schicht auf einem substrat | |
WO2011011736A3 (en) | Solid-state thin film capacitor | |
MX2012003517A (es) | Electrodo para procesos electroliticos con estructura cristalina controlada. | |
PT2934804T (pt) | Processo para pré-soldadura de superfícies metálicas em substratos metalizados sob utilização de um tecido metálico; substrato metálico com uma camada de solda, que apresenta uma estrutura de superfície de um tecido | |
MX2016001414A (es) | Lamina de acero pintada provista de un recubrimiento de zinc. | |
WO2013057065A3 (de) | Keramisches erzeugnis zur verwendung als target | |
WO2013092580A3 (de) | Anodisierungsverfahren, dekorative beschichtung, schutzschicht und artikel | |
RU2012148290A (ru) | Способ изготовления мембраны для выделения водорода из газовых смесей |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration |