CN101384959B - 辐射固化树脂组合物及应用其的快速三维成像方法 - Google Patents
辐射固化树脂组合物及应用其的快速三维成像方法 Download PDFInfo
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- CN101384959B CN101384959B CN2007800015753A CN200780001575A CN101384959B CN 101384959 B CN101384959 B CN 101384959B CN 2007800015753 A CN2007800015753 A CN 2007800015753A CN 200780001575 A CN200780001575 A CN 200780001575A CN 101384959 B CN101384959 B CN 101384959B
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
Abstract
Description
物质名称 | 物质说明 | 供应商 |
Epon 825 | 双酚A二缩水甘油醚环氧树脂 | Resolution Performance Products |
Cyracure UVR-6105 | 甲基-3,4-环氧环己基羧酸-3,4- 环氧环己酯 | Dow Chemical |
Ebecryl 3605 | 部分丙烯酸化的双酚-A环氧树 脂 | UCB/Cytec |
Oxetane OXT-101 | 3-乙基-3-羟甲基-氧杂环丁烷 | Toagosei |
乙烯醚丙烯酸乙 酯 | 丙烯酸-2-(2-乙烯氧基乙氧基) 乙基酯 | Nippon Shokubai Co.Ltd. |
Ebecryl 3700 | 双酚-A环氧二丙烯酸酯 | UCB/Cytec |
SR-399 | 二季戊四醇二丙烯酸酯 | Sartomer |
SR-349 | 双酚-A乙氧基化二丙烯酸酯 | Sartomer |
SynFac 8025U | 聚烷氧基化双酚A | Milliken Chemical |
SynFac 8009 | 聚烷氧基化双酚A | Milliken Chemical |
Stepanpol PS2002 | 二(二乙二醇)邻位酞酸二酯 | Stepan Company |
Emulgen BPA-5 | 聚烷氧基化双酚A | Kao Specialties Americas |
BisphenolA (ethoxylate)4, EO(4)BPA | 聚烷氧基化双酚A 平均Mn=404g/mol | Aldrich |
三乙二醇 | Aldrich | |
Pluracol TP440 | 丙氧基化三羟甲基丙烷 | BASF |
Terathane 1000 | 聚四亚甲基醚二醇 | Invista |
Placcel 220EB | 聚六亚甲基碳酸酯二醇 CAS#616-98-6 平均Mn=2000g/mol | Daicel |
碳酸亚丙酯 | Aldrich | |
BYK A 501 | 防泡沫溶液,无硅酮 | BYK Chemie |
Silwet L7600 | 聚环氧烷改性的聚二甲基硅氧 烷 | GESilicones-OSISpecialties |
Chivacure 1176 | 六氟锑酸芳基硫酯 | Chitec |
Rhodorsil 2074 | 四个五氟苯基硼酸芳基碘 | Rhodia |
Chivacure BMS | 4-苯甲酰-4’-甲基二苯硫 | Chitec |
Irgacure 184 | 1-羟基环己基苯酮 | Ciba Additives |
Paraloid EXL-2314 | 丙烯酸核-壳聚合物 | Rohmand Hass |
Paraloid EXL-2600 | 丙烯酸核-壳聚合物 | Rohmand Hass |
Durastrength D400 | 丙烯酸核-壳聚合物 | Arkema |
SR-9003 | 丙氧基化新戊二醇二丙烯酸酯 | Sartomer |
Paraloid KM-365 | 丙烯酸核-壳聚合物 | Rohmand Hass |
Albidur EP 2240 | 在环氧树脂中的聚硅氧烷颗粒 | Hanse Chemie |
Terathane 250 | 聚四亚甲基醚二醇 | Invista |
DPHA | 二季戊四醇六丙烯酸酯 | Sartomer |
D1 | D2 | D3 | D4 | D5 | D6 | |
UVR6105(%) | 62.7 | 80 | 80 | 52.6 | ||
Epon 825(%) | 20.2 | 80 | 80 | 27.4 | ||
EXL-2314(%) | 17.1 | 20 | 20 | 20 | 20 | |
KM-365(%) | 20 | |||||
用于实施例/ 比较实验 | 9 | 4,7,B,C | 5,7,8 | 5,7,8 | 4,7,B,C | 10 |
说明 | ESIS几何形状要求 |
样品厚度,B | B |
线宽,W | 4B>W>2B |
样品长度,L | L≥4.4W |
支持和装载直径,D | W/4<D<W |
支持长度,S | S=4W |
切槽长度,a | a/W=0.3 |
预破裂切口长度 | a/W=0.4-0.6 |
实施例 | 1 | 2 | 3 |
EPON 825(%) | 58.8 | 58.8 | 58.8 |
Emulgen(%) | 31.7 | 31.7 | 31.7 |
EXL2600(%) | 9.0 | ||
EXL2314(%) | 9.0 | ||
Albidur EP 2240(%) | 9.0* | ||
Chivacure(%) | 0.5 | 0.5 | 0.5 |
阳离子可聚合基/羟基 | 2.34 | 2.34 | 2.34 |
芳香族和脂肪族环含量 | 0.36 | 0.36 | 0.36 |
E[GPa] | 2.2 | 2.3 | 2.2 |
屈服[MPa] | 44 | 47 | 41 |
K1Q(MPa*m1/2) | 1.43 | 2.55 | 1.44 |
样本宽度W(mm) | 8.9 | 8.9 | 8.9 |
样本厚度B(mm) | 3.34 | 2.99 | 2.79 |
K1c[MPa*m1/2] | 1.43 | >1.63** | >1.37** |
Claims (30)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US79619706P | 2006-05-01 | 2006-05-01 | |
US60/796,197 | 2006-05-01 | ||
US90700207P | 2007-03-16 | 2007-03-16 | |
US60/907,002 | 2007-03-16 | ||
PCT/EP2007/003676 WO2007124911A1 (en) | 2006-05-01 | 2007-04-26 | Radiation curable resin composition and rapid three dimensional imaging process using the same |
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CN201110369644.4A Division CN102558510B (zh) | 2006-05-01 | 2007-04-26 | 辐射固化树脂组合物及应用其的快速三维成像方法 |
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CN101384959B true CN101384959B (zh) | 2012-01-11 |
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CN2007800015753A Active CN101384959B (zh) | 2006-05-01 | 2007-04-26 | 辐射固化树脂组合物及应用其的快速三维成像方法 |
CN201110369644.4A Active CN102558510B (zh) | 2006-05-01 | 2007-04-26 | 辐射固化树脂组合物及应用其的快速三维成像方法 |
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Country Status (6)
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US (3) | US9676899B2 (zh) |
EP (1) | EP2019975B1 (zh) |
JP (1) | JP5167496B2 (zh) |
CN (2) | CN101384959B (zh) |
HK (1) | HK1130540A1 (zh) |
WO (1) | WO2007124911A1 (zh) |
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JP5334389B2 (ja) * | 2007-03-29 | 2013-11-06 | Jsr株式会社 | 光学的立体造形用光硬化性樹脂組成物及び立体造形物 |
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EP2019975B1 (en) | 2017-08-16 |
US10358524B2 (en) | 2019-07-23 |
JP2009535467A (ja) | 2009-10-01 |
HK1130540A1 (en) | 2009-12-31 |
JP5167496B2 (ja) | 2013-03-21 |
CN102558510B (zh) | 2015-05-20 |
US20170327632A1 (en) | 2017-11-16 |
CN101384959A (zh) | 2009-03-11 |
US20120282439A1 (en) | 2012-11-08 |
US9676899B2 (en) | 2017-06-13 |
WO2007124911A1 (en) | 2007-11-08 |
US20100304088A1 (en) | 2010-12-02 |
CN102558510A (zh) | 2012-07-11 |
EP2019975A1 (en) | 2009-02-04 |
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