HK1130540A1 - Radiation curable resin composition and rapid three dimensional imaging process using the same - Google Patents

Radiation curable resin composition and rapid three dimensional imaging process using the same

Info

Publication number
HK1130540A1
HK1130540A1 HK09108334.9A HK09108334A HK1130540A1 HK 1130540 A1 HK1130540 A1 HK 1130540A1 HK 09108334 A HK09108334 A HK 09108334A HK 1130540 A1 HK1130540 A1 HK 1130540A1
Authority
HK
Hong Kong
Prior art keywords
rapid
resin composition
same
curable resin
radiation curable
Prior art date
Application number
HK09108334.9A
Other languages
English (en)
Inventor
Paulus Antonius Maria Steeman
Beert Jacobus Keestra
Marco Marcus Matheus Driessen
Debra Lynn Fish Repko
Melvin Zussman
Original Assignee
Dsm Ip Assets Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dsm Ip Assets Bv filed Critical Dsm Ip Assets Bv
Publication of HK1130540A1 publication Critical patent/HK1130540A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
HK09108334.9A 2006-05-01 2009-09-11 Radiation curable resin composition and rapid three dimensional imaging process using the same HK1130540A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US79619706P 2006-05-01 2006-05-01
US90700207P 2007-03-16 2007-03-16
PCT/EP2007/003676 WO2007124911A1 (en) 2006-05-01 2007-04-26 Radiation curable resin composition and rapid three dimensional imaging process using the same

Publications (1)

Publication Number Publication Date
HK1130540A1 true HK1130540A1 (en) 2009-12-31

Family

ID=38290036

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09108334.9A HK1130540A1 (en) 2006-05-01 2009-09-11 Radiation curable resin composition and rapid three dimensional imaging process using the same

Country Status (6)

Country Link
US (3) US9676899B2 (zh)
EP (1) EP2019975B1 (zh)
JP (1) JP5167496B2 (zh)
CN (2) CN102558510B (zh)
HK (1) HK1130540A1 (zh)
WO (1) WO2007124911A1 (zh)

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Also Published As

Publication number Publication date
US20120282439A1 (en) 2012-11-08
CN101384959A (zh) 2009-03-11
CN101384959B (zh) 2012-01-11
JP5167496B2 (ja) 2013-03-21
US20100304088A1 (en) 2010-12-02
WO2007124911A1 (en) 2007-11-08
JP2009535467A (ja) 2009-10-01
US10358524B2 (en) 2019-07-23
CN102558510B (zh) 2015-05-20
EP2019975B1 (en) 2017-08-16
CN102558510A (zh) 2012-07-11
US20170327632A1 (en) 2017-11-16
US9676899B2 (en) 2017-06-13
EP2019975A1 (en) 2009-02-04

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