ATE465434T1 - Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie - Google Patents

Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Info

Publication number
ATE465434T1
ATE465434T1 AT01902387T AT01902387T ATE465434T1 AT E465434 T1 ATE465434 T1 AT E465434T1 AT 01902387 T AT01902387 T AT 01902387T AT 01902387 T AT01902387 T AT 01902387T AT E465434 T1 ATE465434 T1 AT E465434T1
Authority
AT
Austria
Prior art keywords
radiation
liquid
stereolithography
cured composition
free
Prior art date
Application number
AT01902387T
Other languages
English (en)
Inventor
David Johnson
Richard Leyden
Ranjana Patel
Original Assignee
Huntsman Adv Mat Switzerland
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huntsman Adv Mat Switzerland filed Critical Huntsman Adv Mat Switzerland
Application granted granted Critical
Publication of ATE465434T1 publication Critical patent/ATE465434T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
AT01902387T 2000-02-08 2001-02-02 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie ATE465434T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18105200P 2000-02-08 2000-02-08
PCT/EP2001/001115 WO2001059524A1 (en) 2000-02-08 2001-02-02 Liquid, radiation-curable composition, especially for stereolithography

Publications (1)

Publication Number Publication Date
ATE465434T1 true ATE465434T1 (de) 2010-05-15

Family

ID=22662702

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01902387T ATE465434T1 (de) 2000-02-08 2001-02-02 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Country Status (12)

Country Link
US (2) US20010046642A1 (de)
EP (1) EP1256032B1 (de)
JP (1) JP2003522821A (de)
KR (1) KR100808954B1 (de)
CN (1) CN1422394B (de)
AT (1) ATE465434T1 (de)
AU (1) AU3023301A (de)
CA (1) CA2398160A1 (de)
DE (1) DE60141886D1 (de)
ES (1) ES2345031T3 (de)
TW (1) TWI298114B (de)
WO (1) WO2001059524A1 (de)

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US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20030198824A1 (en) * 2002-04-19 2003-10-23 Fong John W. Photocurable compositions containing reactive polysiloxane particles
US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US20060066006A1 (en) * 2002-07-19 2006-03-30 Haraldsson K T Fabrication of 3d photopolymeric devices
US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
JP4874116B2 (ja) * 2003-11-06 2012-02-15 ハンツマン・アドヴァンスト・マテリアルズ・（スイッツランド）・ゲーエムベーハー 高い透明性と改良された機械的性質とを有する硬化物品を製造するための光硬化性組成物
KR20070005638A (ko) * 2004-03-22 2007-01-10 훈츠만 어드밴스트 머티리얼스(스위처랜드) 게엠베하 광경화성 조성물
GB2423521A (en) * 2005-02-25 2006-08-30 Sun Chemical Ltd Energy-curable coating composition
CN101263428A (zh) * 2005-09-13 2008-09-10 亨斯迈先进材料（瑞士）有限公司 用于制备类似abs的制品的可光固化组合物
CN101360800B (zh) * 2005-12-21 2014-02-12 卡尔蔡司视觉澳大利亚控股有限公司 用于光学元件的涂层
JP5167496B2 (ja) * 2006-05-01 2013-03-21 ディーエスエム アイピー アセッツ ビー．ブイ． 放射線硬化性樹脂組成物およびそれを使用した急速三次元的画像形成方法
US20080103226A1 (en) * 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
WO2013091003A1 (en) * 2011-12-24 2013-06-27 Zydex Pty Ltd Method and apparatus for making an object
TWI561132B (en) 2013-11-01 2016-12-01 Ind Tech Res Inst Method for forming metal circuit, liquid trigger material for forming metal circuit and metal circuit structure
KR101551255B1 (ko) 2013-12-30 2015-09-09 전자부품연구원 3d 프린팅용 저점도 세라믹 슬러리 조성물
CN104311461B (zh) * 2014-09-28 2017-04-12 上海维凯光电新材料有限公司 乙氧化(2)双酚s二丙烯酸酯及其制备方法
US10471655B2 (en) * 2015-09-04 2019-11-12 Carbon, Inc. Cyanate ester dual resins for additive manufacturing
EP3578338B1 (de) * 2017-03-06 2023-05-10 Maxell, Ltd. Modellmaterialtintensatz, trägermaterialzusammensetzung, tintensatz, dreidimensionales formobjekt und verfahren zur herstellung eines dreidimensionalen formkörpers
ES2685280B2 (es) 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
CN108693708A (zh) * 2017-04-12 2018-10-23 住友化学株式会社 固化性树脂组合物及固化膜
EP3758916A4 (de) * 2018-03-02 2021-10-27 Formlabs, Inc. Harze mit latenter härtung und verwandte verfahren
US20220111582A1 (en) 2020-10-13 2022-04-14 Cabot Corporation Conductive photo-curable compositions for additive manufacturing

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JP3743088B2 (ja) * 1996-12-02 2006-02-08 東洋インキ製造株式会社 光造形用組成物
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US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
US6350792B1 (en) * 2000-07-13 2002-02-26 Suncolor Corporation Radiation-curable compositions and cured articles

Also Published As

Publication number Publication date
TWI298114B (en) 2008-06-21
EP1256032A1 (de) 2002-11-13
US20010046642A1 (en) 2001-11-29
KR100808954B1 (ko) 2008-03-04
US20050228064A1 (en) 2005-10-13
WO2001059524A1 (en) 2001-08-16
CN1422394A (zh) 2003-06-04
JP2003522821A (ja) 2003-07-29
KR20030031884A (ko) 2003-04-23
EP1256032B1 (de) 2010-04-21
AU3023301A (en) 2001-08-20
CN1422394B (zh) 2012-08-22
DE60141886D1 (de) 2010-06-02
ES2345031T3 (es) 2010-09-14
CA2398160A1 (en) 2001-08-16

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