ES2147777T3 - Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables. - Google Patents

Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables.

Info

Publication number
ES2147777T3
ES2147777T3 ES94810517T ES94810517T ES2147777T3 ES 2147777 T3 ES2147777 T3 ES 2147777T3 ES 94810517 T ES94810517 T ES 94810517T ES 94810517 T ES94810517 T ES 94810517T ES 2147777 T3 ES2147777 T3 ES 2147777T3
Authority
ES
Spain
Prior art keywords
compounds
vinileter
reticulable
formulation
functional groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94810517T
Other languages
English (en)
Inventor
Bettina Dr Steinmann
Adrian Dr Schulthess
Max Dr Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of ES2147777T3 publication Critical patent/ES2147777T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C233/00—Carboxylic acid amides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F16/14—Monomers containing only one unsaturated aliphatic radical
    • C08F16/26—Monomers containing oxygen atoms in addition to the ether oxygen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/32—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings
    • C07C271/38—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
    • C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
    • C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/38—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D303/40—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/60—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members
    • C07C2603/66—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
    • C07C2603/68—Dicyclopentadienes; Hydrogenated dicyclopentadienes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

LA INVENCION SE REFIERE A COMPUESTOS CON AL MENOS UN GRUPO ETER VINIL, QUE MUESTRAN AL MENOS UN OTRO GRUPO FUNCIONAL ELEGIDO A PARTIR DE LOS GRUPOS DE ACRILATO, METACRILATO, EPOXI, ALQUENIL, CICLOALQUENIL ASI COMO GRUPOS VINILARIL EN LA MOLECULA, COMPOSICIONES ESPECIALMENTE PARA ESTEREO LITOGRAFIA, CON ESTOS COMPUESTOS DE ETER VINIL Y UN PROCEDIMIENTO PARA LA ELABORACION DE OBJETOS TRIDIMENSIONALES CON LA AYUDA DE LAS COMPOSICIONES.
ES94810517T 1993-09-16 1994-09-07 Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables. Expired - Lifetime ES2147777T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH278693 1993-09-16
CH68494 1994-03-08

Publications (1)

Publication Number Publication Date
ES2147777T3 true ES2147777T3 (es) 2000-10-01

Family

ID=25685361

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94810517T Expired - Lifetime ES2147777T3 (es) 1993-09-16 1994-09-07 Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables.

Country Status (9)

Country Link
US (4) US5605941A (es)
EP (1) EP0646580B1 (es)
JP (1) JPH07233112A (es)
KR (1) KR100355313B1 (es)
AT (1) ATE193532T1 (es)
AU (1) AU685824B2 (es)
CA (1) CA2132064C (es)
DE (1) DE59409385D1 (es)
ES (1) ES2147777T3 (es)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
JP4129550B2 (ja) * 1995-12-22 2008-08-06 バンティコ アクチエンゲゼルシャフト フィラーを含有する放射線硬化性液状配合物を用いる三次元物品のステレオリソグラフィーによる製造方法
ES2144836T3 (es) * 1996-07-29 2000-06-16 Ciba Sc Holding Ag Composicion liquida reticulable por radiacion, en especial para estereolitografia.
US7332537B2 (en) * 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
US5878664A (en) * 1997-07-15 1999-03-09 Hartka; Theodore J Printing system and method
US6107008A (en) * 1997-08-29 2000-08-22 Lockheed Martin Energy Research Ionizing radiation post-curing of objects produced by stereolithography and other methods
US6308001B1 (en) * 1998-12-22 2001-10-23 Alliedsignal Inc. Radiation curable fluorinated vinyl ethers derived from hexafluoropropene
US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
EP1693390B1 (fr) 1998-06-25 2010-10-13 Hydro-Quebec Polymères à base de monomères polymérisables en séquences et leur utilisation dans la production de conducteurs ioniques.
DE19835849A1 (de) * 1998-08-07 2000-02-10 Basf Coatings Ag Mit energiereicher Strahlung und/oder thermisch härtbare Pulverlacke mit funktionalisierter Grundstruktur
US6476122B1 (en) * 1998-08-20 2002-11-05 Vantico Inc. Selective deposition modeling material
DE60008778T2 (de) * 1999-11-05 2005-02-10 Z Corp., Burlington Verfahren für dreidimensionales drucken
ATE465434T1 (de) * 2000-02-08 2010-05-15 Huntsman Adv Mat Switzerland Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie
US8481241B2 (en) 2000-03-13 2013-07-09 Stratasys Ltd. Compositions and methods for use in three dimensional model printing
US7300619B2 (en) 2000-03-13 2007-11-27 Objet Geometries Ltd. Compositions and methods for use in three dimensional model printing
US20030207959A1 (en) * 2000-03-13 2003-11-06 Eduardo Napadensky Compositions and methods for use in three dimensional model printing
US6569373B2 (en) 2000-03-13 2003-05-27 Object Geometries Ltd. Compositions and methods for use in three dimensional model printing
US6746814B2 (en) 2000-10-09 2004-06-08 Dorsey D. Coe Method and system for colorizing a stereolithographically generated model
US6652256B2 (en) * 2000-10-27 2003-11-25 Dorsey D. Coe Three-dimensional model colorization during model construction from computer aided design data
US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
US20050256219A1 (en) * 2002-03-11 2005-11-17 Hideaki Takase Photocurable resin composition and optical component
GB0212977D0 (en) 2002-06-06 2002-07-17 Vantico Ag Actinic radiation curable compositions and their use
US6716992B2 (en) * 2002-07-22 2004-04-06 National Starch And Chemical Investment Holding Corporation Cycloaliphatic epoxy compounds containing styrenic, cinnamyl, or maleimide functionality
US6833231B2 (en) * 2002-07-31 2004-12-21 3D Systems, Inc. Toughened stereolithographic resin compositions
US7087109B2 (en) * 2002-09-25 2006-08-08 Z Corporation Three dimensional printing material system and method
ES2376237T3 (es) * 2003-05-21 2012-03-12 Z Corporation Sistema de material en polvo termopl�?stico para modelos de apariencia a partir de sistemas de impresión en 3d.
WO2005019128A2 (en) * 2003-08-20 2005-03-03 Dsm Ip Assets B.V. Radiation-curable liquid resin composition
US7232850B2 (en) 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
JP4874116B2 (ja) 2003-11-06 2012-02-15 ハンツマン・アドヴァンスト・マテリアルズ・（スイッツランド）・ゲーエムベーハー 高い透明性と改良された機械的性質とを有する硬化物品を製造するための光硬化性組成物
GB0326286D0 (en) 2003-11-11 2003-12-17 Vantico Gmbh Initiator systems for polymerisable compositions
KR20060132591A (ko) * 2003-11-25 2006-12-21 코닌클리케 필립스 일렉트로닉스 엔.브이. 데이터 저장 장치로부터의 정보 아이템들의 검색
JP4131864B2 (ja) 2003-11-25 2008-08-13 東京応化工業株式会社 化学増幅型ポジ型感光性熱硬化性樹脂組成物、硬化物の形成方法、及び機能素子の製造方法
US20050158660A1 (en) * 2004-01-20 2005-07-21 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
EP1727663B1 (en) * 2004-03-22 2011-10-05 Huntsman Advanced Materials (Switzerland) GmbH Photocurable compositions
JP4766856B2 (ja) * 2004-08-31 2011-09-07 ダイセル化学工業株式会社 酸素原子含有多環式化合物、重合性組成物及びその硬化物
US20060058428A1 (en) * 2004-09-16 2006-03-16 Honeywell International Inc. Fluorinated compounds having epoxy and vinyl ether functional groups
JP4967660B2 (ja) * 2004-10-04 2012-07-04 東亞合成株式会社 シクロヘキシル基または長鎖アルキル基を有するシクロヘキセンオキサイド化合物とその用途
CA2625482C (en) * 2005-10-19 2014-01-21 Kao Corporation Cleaning implement
JP4657075B2 (ja) * 2005-10-21 2011-03-23 花王株式会社 清掃用物品
CN101300527B (zh) * 2005-10-27 2011-11-23 亨斯迈先进材料（瑞士）有限公司 含有包括环丁二醇的聚酯和均质聚酰胺共混物的透明、多层制品的制备
KR101376401B1 (ko) * 2005-10-27 2014-03-27 3디 시스템즈 인코오퍼레이티드 무-안티몬 광경화성 수지 조성물 및 3차원 물품
WO2007102254A1 (ja) * 2006-03-09 2007-09-13 Kao Corporation 清掃用物品並びにその起毛方法及びその製造方法
EP2001656B1 (en) * 2006-04-06 2014-10-15 3D Systems Incorporated KiT FOR THE PRODUCTION OF THREE-DIMENSIONAL OBJECTS BY USE OF ELECTROMAGNETIC RADIATION
US9676899B2 (en) 2006-05-01 2017-06-13 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three dimensional imaging process using the same
WO2008073297A2 (en) * 2006-12-08 2008-06-19 Z Corporation Three dimensional printing material system and method using peroxide cure
WO2008086033A1 (en) * 2007-01-10 2008-07-17 Z Corporation Three-dimensional printing material system with improved color, article performance, and ease of use
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
EP2441761A1 (en) * 2007-03-23 2012-04-18 Daicel Chemical Industries, Ltd. Oxetane-containing vinyl ether compounds and polymerizable compositions
JP5312827B2 (ja) * 2007-03-26 2013-10-09 株式会社ダイセル 脂環エポキシ基含有ビニルエーテル化合物、及び重合性組成物
JP2008308420A (ja) * 2007-06-13 2008-12-25 Showa Denko Kk 脂環式エポキシ基とビニルエーテル基を有するカルボン酸エステル化合物及び該エステル化合物の製造方法
JP2009138116A (ja) * 2007-12-07 2009-06-25 Daicel Chem Ind Ltd カチオン重合性樹脂組成物、及びその硬化物
US8360459B2 (en) * 2008-04-11 2013-01-29 Dane Technologies, Inc. Cart transporting apparatus
WO2010043274A1 (en) * 2008-10-17 2010-04-22 Huntsman Advanced Materials (Switzerland) Gmbh Improvements for rapid prototyping apparatus
WO2010052851A1 (ja) * 2008-11-08 2010-05-14 ダイセル化学工業株式会社 体積型ホログラム記録用感光性組成物、及びその製造方法
US8501033B2 (en) 2009-03-13 2013-08-06 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three-dimensional imaging process using the same
JP5457078B2 (ja) 2009-06-05 2014-04-02 株式会社ダイセル カチオン重合性樹脂組成物、及びその硬化物
US9382352B2 (en) * 2009-11-12 2016-07-05 Ndsu Research Foundation Polymers derived from plant oil
EP2436510A1 (en) 2010-10-04 2012-04-04 3D Systems, Inc. System and resin for rapid prototyping
WO2012126695A1 (en) 2011-03-23 2012-09-27 Huntsman Advanced Materials (Switzerland) Gmbh Stable curable thiol-ene composition
JP5966310B2 (ja) * 2011-10-24 2016-08-10 住友化学株式会社 偏光板及びそれを用いた積層光学部材
US9834626B2 (en) 2013-01-15 2017-12-05 Ndsu Research Foundation Plant oil-based materials
EP3105040B1 (en) 2014-02-10 2023-10-18 Stratasys Ltd. Composition and method for additive manufacturing of an object
EP2974850A1 (de) 2014-07-17 2016-01-20 Marabu GmbH & Co. KG Verdruckbares Baumaterial für 3D-Druck
CN104311461B (zh) * 2014-09-28 2017-04-12 上海维凯光电新材料有限公司 乙氧化(2)双酚s二丙烯酸酯及其制备方法
ES2685280B2 (es) 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
KR102604506B1 (ko) * 2017-06-12 2023-11-21 오르멧 서키츠 인코퍼레이티드 양호한 사용가능 시간 및 열전도성을 갖는 금속성 접착제 조성물, 이의 제조 방법 및 이의 용도
WO2019117723A1 (en) 2017-12-15 2019-06-20 Dsm Ip Assets B.V. Compositions and methods for high-temperature jetting of viscous thermosets to create solid articles via additive fabrication

Family Cites Families (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2692256A (en) * 1951-03-09 1954-10-19 Rohm & Haas Esters of vinyloxyalkoxy compounds and unsaturated carboxylic acids and polymers thereof
DE1027401B (de) * 1956-05-02 1958-04-03 Roehm & Haas Gmbh Verfahren zum Herstellen von Polymerisaten bzw. Mischpolymerisaten
US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
JPS5343988B2 (es) * 1972-01-14 1978-11-24
JPS5140382B2 (es) 1972-05-02 1976-11-02
JPS5035529B2 (es) * 1972-09-19 1975-11-17
US4098918A (en) * 1973-02-05 1978-07-04 Ppg Industries, Inc. Method of polymerizing non-linear urethane diacrylates using radiation
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4378277A (en) * 1974-05-08 1983-03-29 Minnesota Mining & Manufacturing Company Photopolymerizable epoxy-containing compositions
SU727644A1 (ru) * 1976-05-10 1980-04-15 Иркутский институт органической химии Сибирского отделения АН СССР Способ получени эпоксивиниловых эфиров
JPS54161319A (en) * 1978-06-12 1979-12-20 Somar Mfg High energy beam setting resist material and method of using same
US4339567A (en) 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
JPS58118650A (ja) 1982-01-07 1983-07-14 Canon Inc 電子写真感光体
JPS58182639A (ja) 1982-04-20 1983-10-25 Hitachi Ltd 電子写真用感光体
DE3369398D1 (en) * 1982-05-19 1987-02-26 Ciba Geigy Ag Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use
DE3366408D1 (en) 1982-05-19 1986-10-30 Ciba Geigy Ag Photopolymerisation with organometal salts
JPS58224354A (ja) 1982-06-23 1983-12-26 Canon Inc 光導電性組成物
JPS59146063A (ja) 1983-02-09 1984-08-21 Canon Inc 有機被膜
US5073476A (en) 1983-05-18 1991-12-17 Ciba-Geigy Corporation Curable composition and the use thereof
JPS6019151A (ja) 1983-07-13 1985-01-31 Hitachi Ltd 複合型電子写真用感光体
EP0153904B1 (de) 1984-02-10 1988-09-14 Ciba-Geigy Ag Verfahren zur Herstellung einer Schutzschicht oder einer Reliefabbildung
GB8414525D0 (en) 1984-06-07 1984-07-11 Ciba Geigy Ag Sulphoxonium salts
DE3677527D1 (de) 1985-11-20 1991-03-21 Mead Corp Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien.
US4772541A (en) 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4772530A (en) 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
JPS6314153A (ja) 1986-07-04 1988-01-21 Konica Corp 正帯電用電子写真感光体
JPS63146046A (ja) 1986-07-10 1988-06-18 Konica Corp 電子写真感光体
JPH0656493B2 (ja) 1986-09-13 1994-07-27 コニカ株式会社 電子写真感光体
JPS6318355A (ja) 1986-07-10 1988-01-26 Konica Corp 電子写真感光体
JPH0644156B2 (ja) 1986-08-11 1994-06-08 コニカ株式会社 正帯電用電子写真感光体
JPS6350849A (ja) 1986-08-20 1988-03-03 Konica Corp 正帯電用電子写真感光体
JPH0625868B2 (ja) 1986-08-20 1994-04-06 コニカ株式会社 正帯電用電子写真感光体
JPS6358455A (ja) 1986-08-29 1988-03-14 Konica Corp 電子写真感光体
JPS6371855A (ja) 1986-09-13 1988-04-01 Konica Corp 感光性平版印刷版の現像方法および装置
SU1412491A1 (ru) * 1986-09-16 1992-04-23 Украинский полиграфический институт им.Ивана Федорова Фотополимеризующа с композици дл изготовлени эластичных фотополимерных печатных форм
JPS63148269A (ja) 1986-12-12 1988-06-21 Konica Corp 感光体
US4751102A (en) 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
AU2723588A (en) * 1987-10-16 1989-05-23 Gaf Corporation Divinyl epoxy ethers
WO1989008021A1 (en) * 1988-03-02 1989-09-08 Desoto, Inc. Stereolithography using composition providing reduced distortion
AU4191089A (en) * 1988-08-12 1990-03-05 Desoto Inc. Photo-curable vinyl ether compositions
WO1990003989A1 (en) * 1988-10-03 1990-04-19 Desoto, Inc. Cationically curable polyurethane compositions having vinyl ether functionality
JPH02233717A (ja) * 1989-03-08 1990-09-17 Kansai Paint Co Ltd 硬化性組成物
JPH02242820A (ja) * 1989-03-16 1990-09-27 Tosoh Corp 光学材料用樹脂組成物
JPH0337229A (ja) * 1989-07-05 1991-02-18 Kansai Paint Co Ltd ポリシロキサン系マクロモノマー、ポリシロキサン系樹脂組成物及び硬化性樹脂組成物
US4980428A (en) * 1989-10-20 1990-12-25 Gaf Chemicals Corporation Epoxy vinyl ethers and synthesis of an epoxy vinyl ether from a hydroxylated vinyl ether and a polyepoxide
EP0496828A4 (en) * 1989-10-20 1993-03-31 Isp Investments Inc. Vinyl ethers synthesized from hydroxylated vinyl ethers and polyepoxides
US4980430A (en) * 1989-10-20 1990-12-25 Gaf Chemicals Corporation Epoxy vinyl ethers and synthesis of an epoxy vinyl ether from a hydroxylated vinyl ether and a diepoxide
CA2028259A1 (en) * 1989-11-20 1991-05-21 Stefan Weigl Tacky photopolymerizable adhesive compositions
US5045572A (en) * 1990-01-26 1991-09-03 Gaf Chemicals Corporation Radiation curable cross linkable compositions containing an aliphatic polyfunctional alkenyl ether
JPH04195059A (ja) * 1990-11-28 1992-07-15 Konica Corp 感光体
US5244985A (en) * 1991-03-29 1993-09-14 New Japan Chemical Co., Ltd. Epoxidized polyesters and method of production thereof
DE4291255T1 (de) * 1991-05-01 1994-05-05 Allied Signal Inc Stereolithographie unter Verwendung von Vinylether-Epoxid-Polymeren
US5510226A (en) * 1991-05-01 1996-04-23 Alliedsignal Inc. Stereolithography using vinyl ether-epoxide polymers
JPH05310811A (ja) * 1992-05-11 1993-11-22 Nippon Kayaku Co Ltd 樹脂組成物及びその硬化物
JP3150204B2 (ja) * 1992-07-02 2001-03-26 日本化薬株式会社 樹脂組成物及びその硬化物
EP0638547B1 (de) * 1993-08-09 2000-08-16 Ciba SC Holding AG Neue urethangruppenhaltige (Meth)Acrylate
US5494618A (en) * 1994-06-27 1996-02-27 Alliedsignal Inc. Increasing the useful range of cationic photoinitiators in stereolithography

Also Published As

Publication number Publication date
DE59409385D1 (de) 2000-07-06
KR950008473A (ko) 1995-04-17
CA2132064C (en) 1999-12-28
US5705316A (en) 1998-01-06
EP0646580A2 (de) 1995-04-05
CA2132064A1 (en) 1995-03-17
ATE193532T1 (de) 2000-06-15
AU7300394A (en) 1995-03-30
AU685824B2 (en) 1998-01-29
JPH07233112A (ja) 1995-09-05
KR100355313B1 (ko) 2003-03-04
US5783712A (en) 1998-07-21
EP0646580B1 (de) 2000-05-31
US5783615A (en) 1998-07-21
US5605941A (en) 1997-02-25
EP0646580A3 (de) 1995-10-11

Similar Documents

Publication Publication Date Title
ES2147777T3 (es) Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables.
ES2097836T3 (es) Copolimeros de siloxano que tienen grupos alquenilo, su preparacion y empleo.
DK1147766T3 (da) Farmaceutiske sammensætninger
ES2074734T5 (es) Utilizacion de composiciones a base de alcoholes grasos, para la preparacion de emulsiones; procedimiento de preparacion de emulsiones y emulsiones asi obtenidas.
ATE113604T1 (de) Mometason-furoate-monohydrat, verfahren zu seiner herstellung und das enthaltende pharmazeutische zusammensetzungen.
NZ505914A (en) Three-dimensional structures and models of fc receptors and uses thereof
DE69507302D1 (de) Polyalkoxylierte terpenderivate und sie enthaltende zusammensetzungen
ATE122035T1 (de) Naphthylethylharnstoff und naphthylethylthioharnstoff verbindungen, verfahren zu ihrer herstellung und pharmazeutische zusammensetzungen, die sie enthalten.
DE69016371D1 (de) Nitrotriazalon enthaltende gaserzeugende Zusammensetzungen.
ATE174920T1 (de) Pyridothiadiazine, verfahren zu ihrer herstellung und sie enthaltende pharmazeutische zusammensetzungen
ATE156829T1 (de) Substituierte aminophosphonatderivate, verfahren zu ihrer herstellung und sie enthaltende pharmazeutische zusammensetzungen
IT1209415B (it) Composizioni di sterilizzanti di vinilalogenuri, di bassa tossicita'.
ATE164578T1 (de) Verzweigte aminothiazole-derivate, verfahren zu ihrer herstellung und pharmazeutische zusammenstellungen die sie enthalten
DE69032052D1 (de) Härtbare Gegenstände, die aus härtbaren dielektrischen Polyphenyläther-Polyepoxid-Zusammensetzungen hergestellt sind.
ATE3636T1 (de) Hepteno-nitrile, verfahren zu ihrer herstellung und sie enthaltende duftstoffzusammensetzungen.
FI954931A0 (fi) Uusia piperidinyylitioindolin johdannaisia, niiden valmistusmenetelmä, niitä sisältäviä farmaseuttisia koostumuksia, jotka ovat käyttökelpoisia erityisesti kivun lievittäjinä
ATE190498T1 (de) Stabile, pharmazeutische zusammensetzungen die hybrid alpha-interferon enthalten
DE69400752D1 (de) Zusammensetzungen die hexafluorpropan enthalten
DE69316324D1 (de) 4-Hydroxy-phenyl-beta-D-glukose-monoester, Verfahren zur ihrer Herstellung und ihre Verwendung in der Kosmetik, der Pharmazie, als Zahnpflegemitteln und Lebensmitteln
FI903701A0 (fi) Reninhaemmande amino-oligohydroxiderivat.
DE3877742D1 (de) Aufweichmittel enthaltende zusammensetzung fuer naegel.
ITTO910701A1 (it) Procedimento per la trasformazione di masse biologiche ai fini dell'utilizzo in agricoltura.
ATE10000T1 (de) Acylierte furanyl- und thienyl-acrylsaeuren, verfahren zu ihrer herstellung und pharmazeutische zubereitungen.
DE69614552D1 (de) MODIFIZIERTE ALPHA-D-GLCP-(1,2)-ALPHA-D-Glcp-(1,3)-ALPHA-D-Glcp-ANALOGE
DE69006412D1 (de) Verfahren zur reinigung von streptokinasen.

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 646580

Country of ref document: ES