CN101303536B - 曝光装置和器件加工方法 - Google Patents

曝光装置和器件加工方法 Download PDF

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Publication number
CN101303536B
CN101303536B CN2008101094373A CN200810109437A CN101303536B CN 101303536 B CN101303536 B CN 101303536B CN 2008101094373 A CN2008101094373 A CN 2008101094373A CN 200810109437 A CN200810109437 A CN 200810109437A CN 101303536 B CN101303536 B CN 101303536B
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China
Prior art keywords
liquid
substrate
exposure
platform
projection optics
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Expired - Fee Related
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CN2008101094373A
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English (en)
Chinese (zh)
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CN101303536A (zh
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原英明
高岩宏明
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Networks & Wireless Communication (AREA)
CN2008101094373A 2003-08-29 2004-08-27 曝光装置和器件加工方法 Expired - Fee Related CN101303536B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003-307025 2003-08-29
JP2003307025 2003-08-29

Related Parent Applications (1)

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CN2004800243794A Division CN100407371C (zh) 2003-08-29 2004-08-27 曝光装置和器件加工方法

Publications (2)

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CN101303536A CN101303536A (zh) 2008-11-12
CN101303536B true CN101303536B (zh) 2011-02-09

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CN2008101094373A Expired - Fee Related CN101303536B (zh) 2003-08-29 2004-08-27 曝光装置和器件加工方法
CN2004800243794A Expired - Fee Related CN100407371C (zh) 2003-08-29 2004-08-27 曝光装置和器件加工方法

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CN2004800243794A Expired - Fee Related CN100407371C (zh) 2003-08-29 2004-08-27 曝光装置和器件加工方法

Country Status (9)

Country Link
US (2) US9223224B2 (de)
EP (2) EP1670039B1 (de)
JP (3) JP4325622B2 (de)
KR (3) KR101242886B1 (de)
CN (2) CN101303536B (de)
HK (1) HK1204091A1 (de)
SG (1) SG145780A1 (de)
TW (6) TWI437619B (de)
WO (1) WO2005022616A1 (de)

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CN113844160A (zh) * 2018-10-31 2021-12-28 微技术株式会社 振动装置、振动方法、及振动撒入装置

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