CN101174669A - 磁阻效应元件的制造方法、磁头、磁记录再生装置、及磁性存储器 - Google Patents

磁阻效应元件的制造方法、磁头、磁记录再生装置、及磁性存储器 Download PDF

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Publication number
CN101174669A
CN101174669A CNA2007101474039A CN200710147403A CN101174669A CN 101174669 A CN101174669 A CN 101174669A CN A2007101474039 A CNA2007101474039 A CN A2007101474039A CN 200710147403 A CN200710147403 A CN 200710147403A CN 101174669 A CN101174669 A CN 101174669A
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CN
China
Prior art keywords
magnetic
layer
effect element
magnetoresistance effect
intermediate layer
Prior art date
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Pending
Application number
CNA2007101474039A
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English (en)
Chinese (zh)
Inventor
汤浅裕美
福泽英明
藤庆彦
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Toshiba Corp
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Toshiba Corp
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Publication of CN101174669A publication Critical patent/CN101174669A/zh
Pending legal-status Critical Current

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/093Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B2005/0002Special dispositions or recording techniques
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/11Magnetic recording head
    • Y10T428/1107Magnetoresistive

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Hall/Mr Elements (AREA)
  • Measuring Magnetic Variables (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Magnetic Heads (AREA)
CNA2007101474039A 2006-09-08 2007-09-07 磁阻效应元件的制造方法、磁头、磁记录再生装置、及磁性存储器 Pending CN101174669A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006243868A JP4764294B2 (ja) 2006-09-08 2006-09-08 磁気抵抗効果素子、及び磁気ヘッド
JP2006243868 2006-09-08

Publications (1)

Publication Number Publication Date
CN101174669A true CN101174669A (zh) 2008-05-07

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CNA2007101474039A Pending CN101174669A (zh) 2006-09-08 2007-09-07 磁阻效应元件的制造方法、磁头、磁记录再生装置、及磁性存储器

Country Status (3)

Country Link
US (1) US7948717B2 (enExample)
JP (1) JP4764294B2 (enExample)
CN (1) CN101174669A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8031444B2 (en) * 2008-10-21 2011-10-04 Tdk Corporation Magnetoresistive device of the CPP type, and magnetic disk system
JP7496089B2 (ja) * 2021-03-04 2024-06-06 株式会社東芝 磁気センサ及び検査装置

Family Cites Families (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US668709A (en) * 1900-01-29 1901-02-26 Ira P Clarke Flushing-tank.
DE2658623C2 (de) * 1976-12-23 1982-07-29 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Aufzeichnungsträger und Verfahren zu seiner Herstellung
US5390061A (en) 1990-06-08 1995-02-14 Hitachi, Ltd. Multilayer magnetoresistance effect-type magnetic head
SG46731A1 (en) * 1995-06-30 1998-02-20 Ibm Spin valve magnetoresistive sensor with antiparallel pinned layer and improved exchange bias layer and magnetic recording system using the senor
JP2000099922A (ja) * 1998-09-17 2000-04-07 Sony Corp 磁気トンネル素子及びその製造方法
JP2000196164A (ja) * 1998-12-24 2000-07-14 Victor Co Of Japan Ltd 磁気抵抗素子及び磁性メモリー及びそれらの製造方法
US6348274B1 (en) * 1998-12-28 2002-02-19 Kabushiki Kaisha Toshiba Magnetoresistive element and magnetic recording apparatus
US6181537B1 (en) * 1999-03-29 2001-01-30 International Business Machines Corporation Tunnel junction structure with junction layer embedded in amorphous ferromagnetic layers
US6667616B1 (en) * 1999-04-20 2003-12-23 Seagate Technology Llc Spin valve sensor having increased GMR ratio and decreased sensitivity to crosstalk noise
US6262869B1 (en) * 1999-08-02 2001-07-17 International Business Machines Corporation Spin valve sensor with encapsulated keeper layer and method of making
KR100373473B1 (ko) * 1999-09-24 2003-02-25 가부시끼가이샤 도시바 자기 저항 효과 소자, 자기 저항 효과 헤드, 자기 재생장치 및 자성 적층체
JP3695515B2 (ja) * 1999-09-24 2005-09-14 株式会社日立製作所 トンネル磁気抵抗効果素子、磁気ヘッド、磁気メモリ及びその製造方法
JP3756758B2 (ja) * 2000-07-11 2006-03-15 アルプス電気株式会社 交換結合膜と、この交換結合膜を用いた磁気抵抗効果素子、ならびに前記磁気抵抗効果素子を用いた薄膜磁気ヘッド
JP3971551B2 (ja) * 2000-07-19 2007-09-05 Tdk株式会社 磁気変換素子および薄膜磁気ヘッド
JP3559513B2 (ja) * 2000-09-05 2004-09-02 株式会社東芝 磁気抵抗効果素子、その製造方法及び製造装置並びに磁気再生装置
JP3618654B2 (ja) 2000-09-11 2005-02-09 株式会社東芝 磁気抵抗効果素子、磁気ヘッド及び磁気記録再生装置
US6937446B2 (en) * 2000-10-20 2005-08-30 Kabushiki Kaisha Toshiba Magnetoresistance effect element, magnetic head and magnetic recording and/or reproducing system
US6686068B2 (en) * 2001-02-21 2004-02-03 International Business Machines Corporation Heterogeneous spacers for CPP GMR stacks
US6707649B2 (en) * 2001-03-22 2004-03-16 Alps Electric Co., Ltd. Magnetic sensing element permitting decrease in effective element size while maintaining large optical element size
US6685579B2 (en) * 2001-04-10 2004-02-03 Acushnet Company Multi-layer cover polyurethane golf ball
KR100886602B1 (ko) * 2001-05-31 2009-03-05 도꾸리쯔교세이호진 상교기쥬쯔 소고겡뀨죠 터널자기저항소자
JP3563375B2 (ja) * 2001-06-19 2004-09-08 アルプス電気株式会社 磁気検出素子及び前記磁気検出素子を用いた薄膜磁気ヘッド
JP2003031870A (ja) 2001-07-19 2003-01-31 Alps Electric Co Ltd 交換結合膜及び前記交換結合膜を用いた磁気検出素子
JP3967237B2 (ja) 2001-09-19 2007-08-29 株式会社東芝 磁気抵抗効果素子及びその製造方法、磁気再生素子並びに磁気メモリ
US6937447B2 (en) * 2001-09-19 2005-08-30 Kabushiki Kaisha Toshiba Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory
JP2003110168A (ja) * 2001-10-01 2003-04-11 Alps Electric Co Ltd 磁気検出素子及びその製造方法
FR2830971B1 (fr) * 2001-10-12 2004-03-12 Commissariat Energie Atomique Dispositif magnetoresistif a vanne de spin a performances ameliorees
JP4032695B2 (ja) * 2001-10-23 2008-01-16 ソニー株式会社 磁気メモリ装置
JP3749873B2 (ja) * 2002-03-28 2006-03-01 株式会社東芝 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置
US6822838B2 (en) * 2002-04-02 2004-11-23 International Business Machines Corporation Dual magnetic tunnel junction sensor with a longitudinal bias stack
GB2413856B (en) * 2002-06-25 2006-06-21 Alps Electric Co Ltd GMR magnetic detecting element and a method of manufacturing the detecting element
JP2004095110A (ja) * 2002-09-03 2004-03-25 Hitachi Ltd 部分的な電流絞込層を備えたスピンバルブ型磁気ヘッド及びその製造方法、ならびにその電流絞込方法
US7218484B2 (en) * 2002-09-11 2007-05-15 Kabushiki Kaisha Toshiba Magnetoresistance effect element, magnetic head, and magnetic reproducing apparatus
JP4435521B2 (ja) * 2002-09-11 2010-03-17 株式会社東芝 磁気抵抗効果素子の製造方法
JP3863484B2 (ja) 2002-11-22 2006-12-27 株式会社東芝 磁気抵抗効果素子および磁気メモリ
JP2004200245A (ja) * 2002-12-16 2004-07-15 Nec Corp 磁気抵抗素子及び磁気抵抗素子の製造方法
JP3836788B2 (ja) 2002-12-26 2006-10-25 株式会社東芝 磁気抵抗効果素子、磁気抵抗効果型ヘッドおよび磁気記録再生装置
JP2004233641A (ja) 2003-01-30 2004-08-19 Nippon Kayaku Co Ltd 近赤外線吸収フィルム
JP2004257123A (ja) 2003-02-26 2004-09-16 Totaku Industries Inc 排水性舗装用排水管及び排水性舗装体
JP4316275B2 (ja) 2003-03-31 2009-08-19 大日本印刷株式会社 塗布装置
JP2004325315A (ja) 2003-04-25 2004-11-18 Seiko Epson Corp 電子時計
US7054119B2 (en) * 2003-06-18 2006-05-30 Hewlett-Packard Development Company, L.P. Coupled ferromagnetic systems having modified interfaces
JP2005075140A (ja) 2003-08-29 2005-03-24 Inoac Corp エアバッグドアにおける破断予定部およびその成形方法
US7227728B2 (en) * 2003-08-29 2007-06-05 Hitachi Global Storage Technologies Netherlands B.V. Method and apparatus for a current-perpendicular-to-plane Giant Magneto-Resistance sensor with embedded composite film
JP2005086112A (ja) * 2003-09-10 2005-03-31 Toshiba Corp 磁気抵抗効果素子、磁気ヘッド、ヘッドサスペンションアッセンブリ、および磁気再生装置
JP4244312B2 (ja) 2003-10-02 2009-03-25 株式会社東芝 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置
US20050136600A1 (en) * 2003-12-22 2005-06-23 Yiming Huai Magnetic elements with ballistic magnetoresistance utilizing spin-transfer and an MRAM device using such magnetic elements
JP4776164B2 (ja) * 2003-12-25 2011-09-21 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、磁気再生装置および磁気メモリ
JP2005259976A (ja) * 2004-03-11 2005-09-22 Toshiba Corp 磁気抵抗効果素子、磁気ヘッドおよび磁気記録再生装置
JP2005285936A (ja) * 2004-03-29 2005-10-13 Toshiba Corp 磁気抵抗効果素子、磁気再生ヘッド、および磁気再生装置
US7057921B2 (en) * 2004-05-11 2006-06-06 Grandis, Inc. Spin barrier enhanced dual magnetoresistance effect element and magnetic memory using the same
US7242556B2 (en) * 2004-06-21 2007-07-10 Hitachi Global Storage Technologies Netherlands B.V. CPP differential GMR sensor having antiparallel stabilized free layers for perpendicular recording
JP4690675B2 (ja) * 2004-07-30 2011-06-01 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、および磁気記録再生装置
JP2006049426A (ja) * 2004-08-02 2006-02-16 Toshiba Corp 磁気抵抗効果素子とその製造方法、およびそれを用いた磁気ヘッドと磁気再生装置
JP4822680B2 (ja) 2004-08-10 2011-11-24 株式会社東芝 磁気抵抗効果素子の製造方法
JP4594679B2 (ja) * 2004-09-03 2010-12-08 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、磁気記録再生装置、および磁気メモリ
JP2006114610A (ja) 2004-10-13 2006-04-27 Toshiba Corp 磁気抵抗効果素子とそれを用いた磁気ヘッドおよび磁気再生装置
JP4261454B2 (ja) * 2004-10-13 2009-04-30 株式会社東芝 磁気抵抗効果素子とそれを用いた磁気ヘッドおよび磁気再生装置
JP5095076B2 (ja) 2004-11-09 2012-12-12 株式会社東芝 磁気抵抗効果素子
JP4309363B2 (ja) 2005-03-16 2009-08-05 株式会社東芝 磁気抵抗効果素子、磁気再生ヘッド及び磁気情報再生装置
JP4521316B2 (ja) * 2005-05-26 2010-08-11 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、および磁気記録再生装置
JP2007115347A (ja) * 2005-10-20 2007-05-10 Hitachi Global Storage Technologies Netherlands Bv Gmrスクリーン層を用いたcpp−gmr磁気ヘッド
JP4886268B2 (ja) * 2005-10-28 2012-02-29 株式会社東芝 高周波発振素子、ならびにそれを用いた車載レーダー装置、車間通信装置および情報端末間通信装置

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JP2008066563A (ja) 2008-03-21
US7948717B2 (en) 2011-05-24
US20080062574A1 (en) 2008-03-13
JP4764294B2 (ja) 2011-08-31

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