CN101107909A - A kind of furrow sowing cultivation technique for crops - Google Patents

Abstract

The invention relates to a planting technique for crops, in particular to a planting technique for planting large and sparsely planted crops in a semi-arid rain-fed agricultural area with high altitude and little annual precipitation. The technology of the present invention is: ditching and building ridges in the leveled field, covering the ridges and ridge platforms with plastic film, and then planting in the ridges. Because a ridge covered by plastic film is formed on the outside of the planting ditch, it can act as a water collection surface, so that the rainwater can be fully collected and flow into the planting ditch, so that it can effectively collect rainwater and preserve moisture, which can greatly reduce soil erosion and water loss. Part of the evaporation, while making full use of limited precipitation resources,

Description

A kind of furrow sowing cultivation technique for crops

technical field

The invention relates to the planting technology of crops, especially for planting large and sparsely planted crops such as corn, potato, broad bean and oil sunflower in semi-arid rain-fed agricultural areas with high altitude and annual precipitation of 250-550mm technology.

Background technique

The semi-arid rain-fed agricultural area with an altitude of 2100-2400m and annual precipitation of 250-550mm has no available surface water and groundwater resources. The growth of crops depends entirely on natural precipitation. Drought is the main factor restricting local agricultural production. In semi-arid areas, precipitation is scarce, droughts occur frequently, and the distribution of time and space is very uneven. Most of the precipitation is concentrated in the three months from July to September, which is misaligned with the critical period of crop water demand. In semi-arid areas, due to spring drought, crops are often difficult to plant or even lost, resulting in serious losses. The basic conditions for agricultural production are weak, and grain production is low and unstable.

Since the promotion of plastic film mulching technology in the 1980s, it has been widely used in various crops for its obvious effects of increasing temperature and moisture, increasing production and increasing income. However, it is relatively slow to popularize and apply in semi-arid rainfed agricultural areas with high altitude, no irrigation conditions, and completely relying on natural precipitation. The main reasons are: the traditional mulching method of mulching film only partially covers the ground, and 1/3 to 1/2 of the ground in the field is still bare, the effect of warming is limited, and some crops are difficult to mature normally; in addition, the traditional mulching method is to Crops are planted on ridges, which can prevent long-term water accumulation in crop roots in areas with irrigation conditions and reduce the occurrence of diseases and insect pests. However, in semi-arid rain-fed agricultural areas without irrigation conditions, most of the rainwater flows along the ridges to the bare land , cannot fully enter the roots of the crops, causing local soil drought in the places where crops are planted under the ridge to become more aggravated. The utilization rate is very low, and the effect of increasing production is not obvious.

Contents of the invention

The invention provides a planting technique suitable for large and sparsely planted crops in a semi-arid rainfed agricultural area with an altitude of 2100-2400m and an annual precipitation of 250-550mm. This technique can overcome the shortcomings of the traditional plastic film covering technique and increase crop yield.

The furrow sowing cultivation technique of the present invention is to dig a ditch and build a ridge in the field that has been leveled, and then cover the ridge surface and the furrow with a plastic film. When planting crops, a seeder is used to open holes in the furrow and sow seeds.

According to relevant experiments, it is best to open ditches at minimum intervals of 70cm and 40cm in the field that has been leveled, so as to form a wide and narrow ridge surface with a ridge height greater than 5 cm, and then cover the ridge surface and furrows with plastic film, and use on-demand seeding when planting crops The device drills holes in the furrow and inserts the seeds.

The furrow sowing cultivation technique of the present invention can also be to ditch and build ridges in the already leveled field, first sow seeds in the ridges, then cover the ridges and furrows with plastic film, and leave holes in the sowing holes.

According to relevant experiments, it is best to open ditches at least 70cm and 40cm apart in the leveled field to form a wide and narrow ridge surface with a ridge height greater than 5 cm, sow seeds in the ridge, and then cover the ridge surface and the ridge with plastic film. , and leave a hole in the sowing hole.

The test shows that when the crop furrow sowing cultivation technique of the present invention is implemented, apply sufficient base fertilizer in the field while leveling the land, or cover a little donkey or horse manure around the plant when sowing or a little plant ash when sowing. .

Adopting the technology of the present invention forms a ridge platform covered by plastic film on the outside of the seeding ditch (i.e., the planting ditch), which can act as a water collection surface, so that the rainwater is fully collected and flows into the planting ditch, so that the rainwater can be effectively collected Moisture conservation can greatly reduce soil erosion and water evaporation, and at the same time make full use of limited precipitation resources, especially increase the effectiveness of ineffective precipitation less than 10mm, and fully improve water use efficiency.

Related tests also found that the adoption of the present invention can effectively increase the ground temperature at the seedling stage, promote growth and development, increase the maturity stage, expand the planting area, and greatly increase the yield per unit area. The invention can adjust the planting structure of crops, expand autumn and suppress summer, make full use of the favorable conditions of more rain in summer and autumn in the western region of my country, especially the northwest region, and achieve the purpose of increasing drought resistance.

When the present invention is adopted, the determination of the width of the ridge should consider: the conditions of the crops to be planted; the ventilation and light transmission conditions between the plants, and the convenience of personnel for field management and related operations. Just for this reason, wide and narrow furrows are adopted in the best implementation mode of the present invention. Wide furrows are convenient for personnel to carry out field management and operation, while relatively narrow furrows can properly make plants densely planted and improve land utilization rate. .

Description of drawings

Fig. 1 is a schematic diagram of furrows and ridge platforms of the present invention.

Detailed ways

In the present invention, the land is first leveled, and at the same time, enough base fertilizer is applied in the field. Get width 120cm then, ditch respectively along 40cm, 80cm place, form 40cm and 80cm two different wide and narrow ridge surfaces, its ridge height is greater than 5 centimetres. Make each ridge level off through trimming, form the situation as shown in accompanying drawing 1. Then cover the ridges and furrows with mulch. Proceed with sowing.

A specific embodiment of the present invention is: first row with a row marker with a tooth pitch of 40 cm in the small row and 80 cm in the large row, and then use a step plow to plow the small bow-shaped ridge along the small row to the middle, and the ridge height is 10 cm. ~15cm, between two small arcuate ridges is a large ridge of 80 cm, scrape the furrow formed when the ultra-small ridge is in the middle of the large ridge to form a large arcuate ridge, the height of the ridge is 5 cm, between the large and small arcuate ridges, that is, the wide and narrow ridges The middle is the seeding ditch, and then cover the ridges and furrows with plastic film. When covering the plastic film, it should be noted that it is best to set the edge of the plastic film in the middle of the wide ridge, and make the edge of another piece of plastic film overlap it, and then use soil Press and bury at the overlapping edge of two mulch films to fix the mulch film. Both sides of each sowing ditch formed in this way are two rain-collecting surfaces formed by large and small ridges. In this way, when it rains, the water on the ridges on both sides of the sowing ditch will flow in from the film through the ridge surface and the edge of the ridge, so that the plants in the sowing ditch can be fully irrigated by rainwater.

Take planting corn as an example in the test of the present invention, apply base fertilizer when leveling the land: apply 2500 to 5000 kilograms of high-quality farmyard manure per mu, 40 kilograms of ammonium bicarbonate or 15 kilograms of urea, and then cover the ridge surface and furrows with plastic film. When sowing, use 2 to 2.5 kilograms of seeds per mu, use a seeder to open holes in the furrows and sow the seeds, and at the same time cover a small amount of donkey and horse manure or plant ash around the plants, which can not only help preserve moisture, but also prevent soil compaction. When sowing, water the nest and plant in order to ensure the emergence of seedlings. During the big trumpet mouth period, 25 kg of urea was topdressed in combination with rainfall, and topdressed as appropriate for grouting. From tasseling to flowering stage, use dikill or isofenphos-methyl to control armyworm, and apply potassium dihydrogen phosphate for foliar topdressing. After being mature, the field calculation shows that the harvest of the prior art has been greatly improved. Test statistics show that after adopting the present invention, the accumulated temperature of the plow layer soil in the whole growth period is 187.2 ℃ higher than that of film mulching, and 355.2 ℃ higher than that of open field, and the growth period is 10-15 days earlier than that of film mulching, and 25-30 days earlier than open field. The average rate is 95%, which is 20 and 15 percentage points higher than that of strip film and open field respectively; the yield of corn is 4500-7500kg/hm ² , with an average of 6253.5kg/hm ² , which is 2323.5kg/hm ² higher than strip film coverage, and the yield increase rate is 59.1% %. However, corn grown in the open field cannot mature locally.

After applying the present invention to planting potatoes, the yield reaches 18750-22500kg/hm ² , with an average of 21760.5kg/hm ² , an increase of 9010.5kg/hm ² compared with film covering, with a yield increase of 70.7%, and an increase of 9760.5kg/hm ² compared with open field 81.3%. The present invention also has obvious yield-increasing effects when used for planting broad beans, oil sunflowers and other crops.

Adopt the present invention to plant corn, potato and adopt prior art to carry out the relevant parameter of planting actual measurement institute under relatively same condition see the following table:

project Double ridge full film covering furrow sowing Strip membrane (semi-membrane) coverage open field planting Moisture Soil moisture content (%) average 9.91 7.79 8.10 improve 2.12 1.81 Water use efficiency of corn (kg/m3) average 3.05 1.90 improve 1.15 Geothermal Increase in seedling stage (℃/day) 2.20 4.20 Increase in whole growth period (℃/day) 1.17 2.22 Accumulated temperature increase during the whole growth period (°C/day) 187.2 355.2 Germination rate (%) average 95 75 80 improve 20 15 Early reproductive period (days) 10-15 25-30 corn Yield (kg/mu) amplitude 300-500 200-300 Can't mature normally average 416.9 262 Increase production kg/mu 154.9 % 59.1 potato Yield per unit area (kg/mu) Amplitude 1250-1500 750-1000 750-1000 average 1450.7 850 800 increase production kg/mu 600.7 650.7 % 70.7 81.3

According to relevant experiments, when planting high stem crops such as corn, the width of the wide ridge can also be set to 70 cm, while the width of the narrow ridge can be 50 cm; if low crops such as potatoes are planted, the width of the wide ridge can also be set to 80 cm, while the narrow ridge width can be 40.

Claims (6)

1. Furrow sowing cultivation technology for crops, which is characterized by digging furrows and building ridges in the already leveled fields, and then covering the ridges and furrows with plastic film. When planting crops, use a seeder to open holes in the furrows and sow seeds. 2. The furrow sowing cultivation technique for crops according to claim 1 is characterized in that in the flattened field, furrows are opened at least at intervals of 70 cm and 40 cm to form alternate ridges with a height greater than 5 cm, and then cover the ridges with plastic film And furrows, when planting crops, use a seeder to open holes in the furrows and sow seeds. 3. Furrow sowing cultivation technology for crops, which is characterized by ditching and building ridges in the already leveled fields, then sowing seeds in the ridges, and then covering the ridges and furrows with plastic film, and leaving holes in the sowing holes. 4. according to the described crop furrow sowing cultivation technique of claim 3, it is characterized in that in the flattened field at least interval 70cm and 40cm ditches, form the ridge surface of alternate width, ridge height is greater than 5 centimetres, sow seed in furrow , and then cover the ridges and furrows with plastic film, and leave holes in the seeding holes. 5. The furrow sowing cultivation technique for any crops according to claims 1 to 4, characterized in that when the land is leveled, enough base fertilizer is applied in the field. 6. The furrow sowing cultivation technique for crops according to claim 5, characterized in that a little donkey or horse manure, or a little plant ash is covered in the sowing hole or around the plant when sowing.

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