CN107969302A - A kind of East African altiplano area corn ditch ridge cultivating method - Google Patents
A kind of East African altiplano area corn ditch ridge cultivating method Download PDFInfo
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- CN107969302A CN107969302A CN201711463845.4A CN201711463845A CN107969302A CN 107969302 A CN107969302 A CN 107969302A CN 201711463845 A CN201711463845 A CN 201711463845A CN 107969302 A CN107969302 A CN 107969302A
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01B—SOIL WORKING IN AGRICULTURE OR FORESTRY; PARTS, DETAILS, OR ACCESSORIES OF AGRICULTURAL MACHINES OR IMPLEMENTS, IN GENERAL
- A01B79/00—Methods for working soil
- A01B79/02—Methods for working soil combined with other agricultural processing, e.g. fertilising, planting
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P60/00—Technologies relating to agriculture, livestock or agroalimentary industries
- Y02P60/20—Reduction of greenhouse gas [GHG] emissions in agriculture, e.g. CO2
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Abstract
The invention discloses a kind of East African altiplano area corn ditch ridge cultivating method, this method comprises the following steps：(1) after sowing prefinishing soil, double furrows, 55~60cm of big row spacing degree, the high 3~5cm in ridge, 25~30cm of micro-ridge width, the high 5~10cm in ridge are played；(2) overlay film is carried out to the furrow on each ridge and each ridge and is managed after overlay film；(3) broadcast technology using film lateral sulcus after the completion of aluminum coated steel to be sowed corn seed, corn plants are managed away from being 60000 plants/hectare for 20~25cm, planting density after planting；(4) harvest in due course.The present invention can be good at improving local efficiency of water application, reduces moisture evaporation and soil erosion, accordingly improves the utilization rate of soil nutrient, and finally greatly improve crop yield.
Description
Technical field
The invention belongs to technical field of crop cultivation, more particularly to a kind of East African altiplano area corn ditch ridge cultivation side
Method.
Background technology
East African altiplano area, especially arid and semi-arid area, climate resources is difficult to make full use of, lacks and tackles arid and take place frequently
Farming technology and other socio-economic factors result in jointly local severe water and soil erosion, agroecological environment deteriorate so that make
Thing production level is low, and grain security is subject to great challenge.In Loess Plateau, ditch ridge film coating technique has obtained large area and has pushed away
Extensively, and to drought-hit area high crop yield and stable yields huge impetus is played, but because soil is barren, rainfall is not concentrated, and is usually existed
Ridge height and row spacing are increased during ridging, collects less rainwater to reach, while according to soil moisture and rain event, usually broadcast
Kind density is relatively low.In African semiarid zone, corn planting technology more fall behind, corn planting density it is low (2500~3000 plants/
Mu), although this area's fertile soil, African period in rainy season rainfall is concentrated, water evaporation quantity is big, moisture and nutrien utilization
Efficiency is low.
The content of the invention
It is an object of the invention to provide a kind of East African altiplano area corn ditch ridge cultivating method, it is intended to solves East African altiplano
The problem of regional maize culture yield is very low.
The present invention is achieved in that a kind of East African altiplano area corn ditch ridge cultivating method, and this method includes following step
Suddenly：
(1) after sowing prefinishing soil, double furrows, 55~60cm of big row spacing degree, the high 3~5cm in ridge, micro-ridge width 25~
30cm, the high 5~10cm in ridge；
(2) overlay film is carried out to the furrow on each ridge and each ridge and is managed after overlay film；
(3) technology broadcast using film lateral sulcus sowed corn seed after the completion of aluminum coated steel, corn plants away from for 20~
25cm, planting density are 60000 plants/hectare, are managed after planting；
(4) harvest in due course.
Preferably, in step (1), the arrangement soil is specially：Select physical features relatively flat, the soil is porous, has
The field of required thickness soil layer is cultivation object, plough horizon is turned over Cultivator after preceding stubble harvest, stubble-cleaning,
Debris in arable layer is cleared up, after it experienced initial stage in rainy season, soil is carried out to clear up again, is flattened.
Preferably, in step (1), described double furrows are specially：Ditching, ridging, every width ridge point are moved towards according to crop-planting
For big micro-ridge, paddle ditching, ridging along micro-ridge, arrange ridge Mian Shilong faces with reshaper and swell.
Preferably, in step (2), the overlay film is specially：Need to carry out overlay film immediately after the completion of ridging work, cover
Before film, first choice opens the shallow ridges of 5cm depths along sample prescription sideline, after mulch expansion, the mulch by sideline while being embedded in shallow ridges, is used in combination
Soil pressure is real, is fully deployed mulch, and mulch another side is then just placed in other ditch, and original place is put down and by ground after fetching earth under film side
Membrane pressure is fixed under soil；After having covered the first width film, by one side of the second width film, the centre in shallow ridges connects with the first width film,
Film certain width overlapping with film, and so on the complete whole sample prescription of paving；To exert oneself to stretch mulch during overlay film to pave, be taken from ridge face
After soil, mulch is flattened.
Preferably, in step (2), it is managed specially after the overlay film：Covering mulch after and mulch confirm and with
When ground is adjacent to, the water seepage hole of an a diameter of 3mm is made a call at 50cm among ditch, if arid season when is blocked up with Soil Surrounding
Firmly water seepage hole is to prevent invalid evaporation；After the overlay film of field, prevent that mulch is damaged, mulch breakage is covered tightly with fine earth in time.
Preferably, in step (3), the sowing is specially：By setting spacing in the rows or density by seed rupture of membranes bunch planting in ditch
Interior, 8~9cm of seed level, jams on planting hole immediately after program request, seed is fully combined with soil；After planting with fine sand soil, livestock circle
Excrement loose matter obturages planting hole.
Preferably, it is described to be after planting managed specially in step (3)：Seedling is put in time, is filled the gaps with seedlings and is safeguarded with field.
Preferably, in step (4), the harvest in due course is specially：When bracteal leaf of corn turns yellow, seed milk-line disappears, seed
Grain harvests when being hardened glossy.
The present invention overcomes the deficiencies of the prior art and provide a kind of East African altiplano area corn ditch ridge cultivating method.East Africa is high
The technology for the level land cultivation that original area uses, corn yield is very low, and conventional ditch ridge film-mulching technique is incorporated into East Africa
Behind highlands, corn yield is still lower than the corn yield of Loess Plateau.This is because East African altiplano area and loess
There are caused by significant difference for weather, the soil of highlands.Although East African altiplano area is also very arid, it is dropped
Rain feature is that flush period is short, concentrate and rainfall is big, and soil is fertile.The ditch ridge film-mulching technique of highlands routine is drawn
After entering, rainfall sufficiently can not be stored well, soil fertility can not also discharge.The present invention according to local climate,
Soil characteristic, on the basis of conventional ditch ridge film-mulching technique, by optimizing ditch ridge size and increasing the side of planting density
Formula, runoff and soil evaporation are reduced while evaporation, the increase rainwater-collecting of dry season soil moisture is reduced, and then are added
The soil moisture and nutrient absorbed for crop, while soil nutrient status and moisture storage are improved, greatly carry
High crop yield.
Compared with the prior art the shortcomings that and deficiency, the invention has the advantages that：The present invention can be good at carrying
High locality efficiency of water application, reduces moisture evaporation and soil erosion, accordingly improves the utilization rate of soil nutrient, and final very big
Improve crop yield.
Brief description of the drawings
Fig. 1 is the structure and size and corn of double furrows in corn ditch ridge cultivating method in East African altiplano area of the present invention
Plant schematic diagram.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to embodiments, to the present invention
It is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not used to
Limit the present invention.
Embodiment 1
1st, preceding consolidation is broadcast
Select physical features relatively flat, the soil is porous, has the field of certain depth soil thickness as basic demand.Preceding stubble
Deep about 30cm is carried out to soil after harvest with Cultivator to turn over, timely stubble-cleaning.And to preceding crop residual, stone in arable layer
The debris such as block, waddy are cleared up.After it experienced certain rainfall at initial stage in rainy season, soil progress is cleared up again in time, is whole
It is flat.
In East African altiplano, because soil is fertile, without using inorganic fertilizer, mainly using farm manure, dose is per hectare 2000
~2500 kilograms or so.
Mulch uses the polyethylene hyaline membrane and polyethylene black film produced by Lanzhou gold soil Plastics Company, thickness difference
For 0.008mm and 0.01mm, the mulch of use is special uvioresistant mulch.
2nd, ridging
As shown in Figure 1, every width ridge is divided into big micro-ridge, ditching, ridging is moved towards according to crop-planting, changes the drought of ditch ridge size
Make technology and big row spacing degree be adjusted to 55~60cm cm, the high 3~5cm in ridge, micro-ridge width is adjusted to 25~30cm, ridge to a high-profile to 5~
10cm, ridging are paddled ditching, ridging with ridger along micro-ridge, are arranged ridge face with reshaper, are swelled ridge face, be conducive to overlay film collection
Rain.
3rd, overlay film
Need to carry out overlay film immediately after the completion of ridging work, in order to avoid evaporation of soil water.It is first before corn carries out overlay film
The shallow ridges of 5cm depths is opened in choosing along sample prescription sideline, after mulch expansion, the mulch by sideline while being embedded in shallow ridges, and it is compact with soil.
Mulch is fully deployed, mulch another side is then just placed in other ditch, along mulch is every 1m or so herein, with spade under film side
Original place puts down and mulch is pressed under soil and is fixed after fetching earth.After having covered the first width film, by one side and first of the second width film
Width film in ditch among connects, film and film try one's best overlapping certain width for soil moisture conservation, and so on paving whole sample prescription entirely.Cover
To exert oneself to stretch mulch during film to pave, after fetching earth from ridge face, should flatten immediately.
4th, managed after covering
The latter week left and right of mulch is covered, when mulch is confirmed and is adjacent to ground, waddy is used at 50cm among ditch
The water seepage hole of an a diameter of 3mm is made a call to, is concentrated easy to rainfall and oozes storage under season moisture.If periphery can be used in arid season
Soil blocks water seepage hole to prevent invalid evaporation.After the overlay film of field, forbid the animals such as livestock and birds to trample on entering and cause mulch to break
Damage.It is whole to test season, it is necessary to often carefully be checked line by line along furrow, once mulch breakage is found, it is necessary to be covered tightly in time with fine earth,
Prevent strong wind from taking off film and moisture loss.
5th, sow as early as possible
, it is necessary to sow as early as possible after entirely experimental field aluminum coated steel is fully completed, to utilize moisture to greatest extent.For jade
Rice, certain spacing in the rows or density are pressed by seed rupture of membranes bunch planting in ditch using corn bunch planting apparatus, 8~9cm of seed level, after program request immediately
Planting hole is jammed on, seed is fully combined with soil.For optimization ditch ridge size, after rational close planting corn plants away from for 20~
25cm, corn seeding amount are 60000 plants/hectare.Planting hole after planting is obturaged with loose matters such as fine sand soil, livestock barnyard manures, is prevented
Planting hole dissipates moisture in the soil and meets the hardened influence emergence of rain.
6th, seedling is put in time, is filled the gaps with seedlings and is safeguarded with field
Soil is easily hardened after rainy season, rainfall, therefore, observes seedling growth in film and draws, it is necessary to break ground in due course
Seedling, preventing seedling can not be unearthed and yellow, wilting in film.To be checked at any time to field in seedling stage, discovery be short of seedling disconnected ridge will and
When transplant, after filling the gaps with seedlings at the place of being short of seedling, pour a small amount of water, then seal eyelet with thin wet soil.When seedling reaches 4~5 leaves, remove
Sick, weak, miscellaneous seedling, retains the strong sprout of growth neat and consistent.Full film corn growth is vigorous, usually produces a large amount of tillers (wooden fork), consumes
Nutrient, to during jointing after final singling, will frequently check presence and see, in time thoroughly get rid of tiller from base portion, pay attention to preventing corn top-rotten disease,
Albino Seedling and insect pest.Covering with ground sheeting can effectively suppress the growth of weeds, therefore only need to carry out chemical weed control before overlay film
, while in East African altiplano because soil fertility is fertile, be not required to carry out top dressing processing to crop in the middle and later periods.
Final-period management mainly prevents crop disease, and rust can use 12.5% standing grain fruit profit 30~35g of wettable powder per acre,
25% propiconazole emulsifiable concentrate (section's favour) 8~9g or 20% 45~60ml of triadimefon missible oil carry out spraying prevention.Powdery mildew is used per acre
15% triadimefon 8~10g of wettable powder active ingredient or 50% Piperalin colloidal suspension 100g are watered spraying.Aphid can use 50%
4000 times of liquid of Aphox wettable powder, 10% imidacloprid, 1000 times of liquid, 50% phoxim emulsifiable concentrate, 2000 times of liquid are watered spraying.
7th, harvest in due course
Harvested when bracteal leaf of corn turns yellow, seed milk-line disappears, seed is hardened glossy.Built or drying after fruit ear is received,
Preventing from drenching with rain making moist causes seed to go mouldy, after moisture is down to below 13%, threshing storage；Fruit ear receive after, stalk should and
When harvest ensiling.
Comparative example 1
The comparative example is identical with the operation of above-described embodiment 1, is in place of difference, ridging, not overlay film, do not exist directly
Planted on level land, spacing in the rows is 30~35cm during sowing, and mu application rate is 45500~52000 plants/hectare (conventional seed planting density).
Comparative example 2
The comparative example is identical with the operation of above-described embodiment 1, is in place of difference, during sowing spacing in the rows for 30~
35cm, application rate are 45500~52000 plants/hectare (conventional seed planting density).
Comparative example 3
The comparative example is identical with the operation of above-described embodiment 1, is in place of difference, and ditch ridge size is conventional during ridging
Big row spacing (70~65cm), ridge it is high (20~25cm), small row spacing (35~40cm), ridge are high (25~30cm).
Comparative example 4
The comparative example is identical with the operation of above-described embodiment 1, is in place of difference, not ridging and overlay film.
Effect example
Statistics and analysis is carried out to the result of above-described embodiment 1, comparative example 1~3, it is as a result as shown in table 1 below：
Table 1
As it can be seen from table 1
(1) embodiment 1 is compared with comparative example 1, and corn yield improves 89.27%, and ground biomass improves
40.68%, water use efficiency improves 68.01%, and organic carbon improves 1.56%, and total nitrogen improves 3.7%, and rapid available phosphorus does not have
There were significant differences.
(2) comparative example 2 is compared with comparative example 1, and output increased 14.60%, ground biomass improves
28.46%, water use efficiency improves 12.38%, and total organic carbon, total nitrogen and rapid available phosphorus and level land are without significant poor
It is different.It follows that again compared with the effect of embodiment 1, ridging, epiphragma planting type are only relied in the comparative example 2, it is every
Although index has the raising of certain amplitude compared with level land planting type, unsatisfactory, or even the ridging than Loess Plateau
The yield of epiphragma cultivation is also lower slightly.
(3) comparative example 3 is compared with comparative example 1, and output increased 16.69%, ground biomass improves
10.38%, water use efficiency improves 20.78%, and total organic carbon, total nitrogen and rapid available phosphorus and level land are without significant poor
It is different.It follows that increasing planting density again compared with the effect of embodiment 1, in the comparative example 3 but using traditional ridging
It is if size, then more larger than the cultivation technique acquired results gap after identical planting density but ridging size-modify.
(4) comparative example 4 is compared with comparative example 1, and yield reduces 3.58%, and ground biomass reduces
0.74%, water use efficiency reduces 21.25%, and total organic carbon, total nitrogen and rapid available phosphorus and level land do not differ significantly.
By the way of planting density is increased, indices are also more worse than the effect of the level land planting type in comparative example 1.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
All any modification, equivalent and improvement made within refreshing and principle etc., should all be included in the protection scope of the present invention.
Claims (8)
1. a kind of East African altiplano area corn ditch ridge cultivating method, it is characterised in that this method comprises the following steps：
(1) after sowing prefinishing soil, double furrows, 55~60cm of big row spacing degree, the high 3~5cm in ridge, micro-ridge width 25~
30cm, the high 5~10cm in ridge；
(2) overlay film is carried out to the furrow on each ridge and each ridge and is managed after overlay film；
(3) technology broadcast using film lateral sulcus sowed corn seed after the completion of aluminum coated steel, corn plants away from for 20~25cm,
Planting density is 60000 plants/hectare, is managed after planting；
(4) harvest in due course.
2. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (1), institute
Stating arrangement soil is specially：Selection physical features relatively flat, the soil is porous, the field with required thickness soil layer is to cultivate object,
Plough horizon is turned over Cultivator after preceding stubble harvest, stubble-cleaning, clears up the debris in arable layer, is passing through
After having gone through initial stage in rainy season, soil is carried out to clear up again, is flattened.
3. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (1), institute
Having stated double furrows is specially：Ditching, ridging is moved towards according to crop-planting, every width ridge is divided into big micro-ridge, paddles ditching, ridging along micro-ridge,
Ridge Mian Shilong faces are arranged with reshaper to swell.
4. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (2), institute
Stating overlay film is specially：Need to carry out overlay film immediately after the completion of ridging work, it is preferred to open 5cm depths along sample prescription sideline before overlay film
Shallow ridges, after mulch expansion, the mulch by sideline while being embedded in shallow ridges, and it is compact with soil, mulch is fully deployed, mulch is another
Side is then just placed in other ditch, and original place puts down and mulch is pressed under soil and is fixed after fetching earth under film side；Cover first
After width film, by one side of the second width film, the centre in shallow ridges connects with the first width film, film certain width overlapping with film, successively class
Nappe complete whole sample prescription；To exert oneself to stretch mulch during overlay film to pave, after fetching earth from ridge face, mulch is flattened.
5. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (2), institute
It is managed specially after stating overlay film：After covering mulch and when mulch is confirmed and is adjacent to ground, among ditch at 50cm
The water seepage hole of an a diameter of 3mm is made a call to, blocks water seepage hole with Soil Surrounding to prevent invalid evaporation during if arid season；Field overlay film
Afterwards, prevent that mulch is damaged, mulch breakage is covered tightly with fine earth in time.
6. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (3), institute
Stating sowing is specially：By spacing in the rows or density is set by seed rupture of membranes bunch planting in ditch, 8~9cm of seed level, jams on and broadcasts immediately after program request
Kind hole, makes seed fully be combined with soil；After planting planting hole is obturaged with fine sand soil, livestock barnyard manure loose matter.
7. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (3), institute
State and be after planting managed specially：Seedling is put in time, is filled the gaps with seedlings and is safeguarded with field.
8. corn ditch ridge cultivating method in East African altiplano area as claimed in claim 1, it is characterised in that in step (4), institute
Stating harvest in due course is specially：Harvested when bracteal leaf of corn turns yellow, seed milk-line disappears, seed is hardened glossy.
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| CN201711463845.4A CN107969302B (en) | 2017-12-28 | 2017-12-28 | Ditch-ridge cultivation method for corn in east Africa plateau area |
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| CN201711463845.4A CN107969302B (en) | 2017-12-28 | 2017-12-28 | Ditch-ridge cultivation method for corn in east Africa plateau area |
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| CN107969302B CN107969302B (en) | 2021-01-29 |
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| CN110214650A (en) * | 2019-07-10 | 2019-09-10 | 中国农业科学院农业环境与可持续发展研究所 | A kind of implantation methods of sustainable covering with ground sheeting spring maize |
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| CN107969302B (en) | 2021-01-29 |
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