CN107969302A - A kind of East African altiplano area corn ditch ridge cultivating method - Google Patents

Abstract

The invention discloses a method for cultivating corn furrows and ridges in the plateau region of East Africa. The method comprises the following steps: (1) After the land is sorted before sowing, double furrows are formed, the width of the large ridge is 55-60 cm, the height of the ridge is 3-5 cm, and the width of the small ridge is 55-60 cm. 25 to 30 cm, ridge height 5 to 10 cm; (2) Cover each ridge and the furrows of each ridge with film and manage after film mulching; (3) After the film mulching treatment is completed, the corn seeds are sowed with film side furrow technology. Sowing is carried out, the distance between corn plants is 20-25cm, the planting density is 60000 plants/ha, and management is carried out after sowing; (4) Harvest in good time. The invention can well improve the local water utilization rate, reduce water evaporation and soil erosion, correspondingly improve the utilization rate of soil nutrients, and finally greatly increase the crop yield.

Description

A kind of furrow and ridge cultivation method of corn in East African plateau area

technical field

The invention belongs to the technical field of crop cultivation, and in particular relates to a method for cultivating corn in furrows and ridges in the East African plateau region.

Background technique

In the plateau region of East Africa, especially the arid and semi-arid region, it is difficult to make full use of climate resources, lack of agricultural technology to deal with frequent droughts, and other socio-economic factors have jointly led to serious local soil erosion, deterioration of the agricultural ecological environment, and low levels of crop production. been greatly challenged. In the Loess Plateau area, the technology of furrow and ridge film mulching has been popularized on a large scale, and has greatly promoted the high and stable yield of crops in dry areas. Wider ridges to collect less rainwater, and usually lower seeding densities depending on soil moisture and rainfall conditions. In the semi-arid area of Africa, the corn planting technology is relatively backward, and the planting density of corn is low (2500-3000 plants/mu). Although the soil in this area is fertile, the rainfall is concentrated during the rainy season in Africa, the water evaporation is large, and the water and nutrient use efficiency is low. .

Contents of the invention

The object of the present invention is to provide a method for cultivating corn in furrows and ridges in the East African plateau area, aiming at solving the problem of very low corn cultivation yield in the East African plateau area.

The present invention is achieved in this way, a method for cultivating corn in furrows and ridges in the East African plateau region, the method comprises the following steps:

(1) After finishing the land before sowing, set up double furrows, the width of the large ridge is 55-60 cm, the height of the ridge is 3-5 cm, the width of the small ridge is 25-30 cm, and the height of the ridge is 5-10 cm;

(2) Film-cover each ridge and the furrow of each ridge and manage after film-covering;

(3) After the film covering treatment is completed, the corn seeds are sown using the film side furrow sowing technology, the corn plant spacing is 20-25cm, and the planting density is 60,000 plants/ha, and it is managed after sowing;

(4) Timely harvest.

Preferably, in step (1), the land arrangement specifically includes: selecting a relatively flat terrain, loose soil, and a field with a required thickness of the soil layer as the cultivation object, and cultivating the soil with a tiller after the previous stubble is harvested plowing and stubble removal in the plowing layer, cleaning up the sundries in the plowing layer, and cleaning and leveling the land again after the initial rainy season.

Preferably, in step (1), the double ridges and furrows specifically include: ditching and ridges according to the planting direction of the crops, each ridge is divided into large and small ridges, ditching and ridges along the small ridges, and finishing the ridges with a shaper The surface makes the ridge surface raised.

Preferably, in step (2), the film covering is specifically: film covering needs to be carried out immediately after the ridging work is completed. Before film covering, firstly open a 5cm deep shallow ditch along the sideline of the sample plot. After the film is unfolded, put One side of the plastic film near the sideline is buried in a shallow ditch, compacted with soil, and the plastic film is fully unfolded. The other side of the plastic film is just placed in another ditch, and the soil is taken from the side of the film, put down on the spot, and the plastic film is pressed under the soil to fix it. ; After covering the first film, connect one side of the second film to the first film in the middle of the shallow ditch, the film overlaps the film by a certain width, and so on to spread the entire sample square; when covering the film, use force Stretch the mulch film and level the mulch film after taking soil from the ridge surface.

Preferably, in step (2), the management after the film covering is specifically: after covering the film and when the film is firmly seated and tightly attached to the ground, a water seepage hole with a diameter of 3 mm is drilled at every 50 cm in the middle of the ditch, If it is a dry season, use the surrounding soil to block the seepage holes to prevent ineffective evaporation; after the field is covered with plastic film, prevent damage to the plastic film, and cover the damaged area with fine soil in time.

Preferably, in step (3), the sowing specifically includes: sow the seeds in the ditch according to the set spacing or density, with a depth of 8 to 9 cm, and press the sowing hole immediately after sowing, so that the seeds and the soil are fully Combine; after sowing, seal the sowing hole with fine sand and loose manure from livestock pens.

Preferably, in step (3), the management after sowing specifically includes: releasing seedlings in time, supplementing seedlings and field maintenance.

Preferably, in step (4), the timely harvesting specifically includes: harvesting when corn bracts turn yellow, grain milk lines disappear, and grains become hard and shiny.

The invention overcomes the deficiencies of the prior art and provides a method for cultivating corn in furrows and ridges in the East African plateau region. The flatland cultivation technology adopted in the East African Plateau area has very low corn yields, and after the conventional furrow and ridge plastic film mulching technology is introduced to the East African Plateau area, the corn yield is still lower than that in the Loess Plateau area. This is due to the significant differences in climate and soil between the East African Plateau and the Loess Plateau. Although the East African plateau area is also very dry, its rainfall is characterized by short, concentrated and heavy rainfall, and the land is fertile. After the introduction of the conventional furrow and ridge mulching technology in the plateau area, it cannot fully store the rainfall, and the soil fertility cannot be released. According to the local climate and soil characteristics, the present invention optimizes the size of the furrows and increases the planting density on the basis of the conventional furrow and ridge plastic film covering technology, reduces the evaporation of soil moisture in the dry season, increases the collection of rainwater, and reduces the runoff at the same time. And soil evaporation, thereby increasing the soil moisture and nutrients that can be absorbed and utilized by crops, and at the same time improving soil nutrient status and water storage status, greatly increasing crop yield.

Compared with the shortcomings and deficiencies of the prior art, the present invention has the following beneficial effects: the present invention can well improve the local water utilization rate, reduce water evaporation and soil erosion, correspondingly improve the utilization rate of soil nutrients, and ultimately greatly increased crop yields.

Description of drawings

Fig. 1 is the planting sketch map of the structure, size and the corn of the double furrow in the corn furrow and ridge cultivation method in the East African plateau region of the present invention.

Detailed ways

In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

Example 1

1. Land consolidation before sowing

Fields with relatively flat terrain, loose soil, and a certain depth of soil layer are selected as the basic requirements. After the previous stubble is harvested, use a tiller to plow the soil to a depth of about 30 cm to remove the stubble in time. And clean up the previous crop residues, stones, sticks and other sundries in the plowing layer. After a certain amount of rainfall at the beginning of the rainy season, the land should be cleared and leveled again in time.

In the East African plateau, because the land is fertile, no inorganic fertilizers are used, and farmyard manure is mainly used, and the amount of fertilizer applied is about 2000-2500 kg per hectare.

The mulching film adopts polyethylene transparent film and polyethylene black film produced by Lanzhou Golden Land Plastic Co., Ltd., with a thickness of 0.008mm and 0.01mm respectively. The mulching films used are all special anti-ultraviolet mulching films.

2. Ridging

As shown in Figure 1, each ridge is divided into large and small ridges. According to the planting direction of crops, ditches and ridges are opened, and the dry farming technology of changing the size of furrows and ridges adjusts the width of large ridges to 55-60 cm, the height of 3-5 cm, and the height of small ridges. The width is adjusted to 25-30cm, and the ridge height is adjusted to 5-10cm. Ridging machines are used to ditch and ridge along the small ridges, and the ridge surface is adjusted with a shaper to make the ridge surface bulge, which is conducive to film-covered rain collection.

3. Laminating

Mulching needs to be carried out immediately after the ridging work is completed to avoid loss of soil moisture. Before the corn is covered with film, it is preferred to open a 5cm deep shallow ditch along the side of the plot. After the plastic film is unfolded, the side of the plastic film near the side line is buried in the shallow ditch and compacted with soil. The plastic film is fully unfolded, and the other side of the plastic film is just placed in another ditch. Along the plastic film at intervals of about 1m, use a shovel to take soil from the edge of the film, put it down on the spot, and press the plastic film under the soil to fix it. After the first film is covered, one side of the second film is connected to the first film in the middle of the ditch, and the film and the film are overlapped by a certain width as far as possible to preserve moisture, and so on to spread the entire sample. When mulching, the mulch should be stretched and paved forcefully. After soil is taken from the ridge surface, it should be leveled immediately.

4. Post-launch management

About a week after covering the plastic film, when the plastic film is firmly seated and firmly attached to the ground, use a wooden stick to punch a water seepage hole with a diameter of 3 mm in the middle of the ditch every 50 cm, so as to facilitate the infiltration and storage of water in the season of concentrated rainfall. If in the dry season, the surrounding soil can be used to block the seepage hole to prevent ineffective evaporation. After the field is covered with film, it is strictly forbidden for animals such as livestock and birds to trample on the ground and cause damage to the film. Throughout the test season, it is necessary to carefully check line by line along the furrows frequently. Once the film is found to be damaged, it needs to be covered with fine soil in time to prevent the film from being removed by strong winds and water loss.

5. Sow seeds early

After the film mulching treatment of the entire test site is completed, the seeds need to be sown as soon as possible to maximize the use of water. For corn, use a corn seeder to sow the seeds in the ditch at a certain spacing or density, with a depth of 8 to 9 cm, and then step on the seeding hole after sowing to fully combine the seeds with the soil. For optimizing the size of furrows and ridges, the distance between corn plants after reasonable close planting is 20-25 cm, and the sowing rate of corn is 60,000 plants/ha. After sowing, seal the sowing hole with loose materials such as fine sand and livestock manure to prevent the seeding hole from dispersing moisture and hardening in case of rain to affect the emergence of seedlings.

6. Release seedlings, replenish seedlings and field maintenance in time

In the rainy season, the soil is easy to harden after the rainfall. Therefore, to observe the growth status of the seedlings in the film, it is necessary to break the soil and introduce the seedlings in time to prevent the seedlings from being yellowed and wilting because they cannot emerge from the soil in the film. In the seedling stage, you should go to the field to check at any time. If you find that the seedlings are missing and the ridges are broken, you should transplant them in time. When the seedlings reach 4-5 leaves, remove the diseased, weak, and miscellaneous seedlings, and keep the strong seedlings that grow neatly and uniformly. The whole-film corn grows vigorously, and often produces a large number of tillers (branches), which consume nutrients. After the seedlings are established and the jointing period, it is necessary to check and check frequently to remove the tillers from the base in time, and pay attention to preventing corn top rot, albino seedlings and pests. Film mulching can effectively inhibit the growth of weeds, so it is only necessary to carry out chemical weeding before mulching. At the same time, in the East African highlands, the soil is fertile, and there is no need to topdress crops in the middle and late stages.

Post-management is mainly to prevent and control crop diseases. Rust can be sprayed with 30-35g of 12.5% Heguoli WP, 8-9g of 25% Propiconazole EC (Kehui) or 45-60ml of 20% Fenxienin EC per mu. For powdery mildew, use 8-10 g of active ingredients of 15% Fenxie Ning wettable powder or 100 g of 50% Fenxie Ning gum suspension mixed with water to spray. Aphids can be sprayed with 50% pirimicarb WP 4000 times liquid, 10% imidacloprid 1000 times liquid, 50% phoxim EC 2000 times liquid mixed with water.

7. Timely harvest

Harvest when corn husks turn yellow, kernel milk lines disappear, and kernels become hard and shiny. After the ears are harvested, set up racks or dry them in the sun to prevent the grains from becoming mildewed due to rain and moisture. After the moisture content drops below 13%, threshing is stored; after the ears are harvested, the straw should be harvested in time for silage.

Comparative Example 1

The operation of this comparative example is the same as that of the above-mentioned Example 1, the difference is that no ridges and no film covering are required, and the plants are directly planted on the flat ground, the plant spacing is 30-35cm during sowing, and the sowing rate per mu is 45500-52000 plants/ha (regular seeding density).

Comparative Example 2

The operation of this comparative example is the same as that of the above-mentioned Example 1, except that the distance between plants during sowing is 30-35 cm, and the sowing rate is 45500-52000 plants/ha (conventional sowing density).

Comparative Example 3

The operation of this comparative example is the same as that of the above-mentioned Example 1, and the difference is that the furrow and ridge size are conventional large ridge width (70-65cm), ridge height (20-25cm), and small ridge width (35-25cm) during ridge formation. 40cm), ridge height (25-30cm).

Comparative Example 4

The operation of this comparative example is the same as that of the above-mentioned Example 1, the difference lies in that no ridges and film covering are required.

Effect example

The result of above-mentioned embodiment 1, comparative example 1～3 is carried out statistics and analysis, the result is as shown in table 1 below:

Table 1

As can be seen from Table 1,

(1) Compared with Comparative Example 1, the yield of corn in Example 1 has increased by 89.27%, the aboveground biomass has increased by 40.68%, water use efficiency has increased by 68.01%, organic carbon has increased by 1.56%, and total nitrogen has increased by 3.7%. , there was no significant difference in available phosphorus.

(2) comparative example 2 compared with comparative example 1, output has improved by 14.60%, aboveground biomass has improved by 28.46%, water use efficiency has improved by 12.38%, and total organic carbon, total nitrogen and available phosphorus have no Significant difference. It can be seen that, compared with the effect of Example 1, in this Comparative Example 2, only relying on ridges and film-covering cultivation methods, although each index has a certain degree of improvement compared with the flat cultivation method, it is not ideal, and even It is slightly lower than the yield of ridge film-covering cultivation in the Loess Plateau area.

(3) comparative example 3 compared with comparative example 1, output has improved by 16.69%, aboveground biomass has improved by 10.38%, water use efficiency has improved by 20.78%, and total organic carbon, total nitrogen and available phosphorus have no Significant difference. It can be seen that, compared with the effect of Example 1, if the planting density is increased but the size of traditional ridges is adopted in this comparative example 3, the difference in the results obtained by the cultivation technique after the same planting density but the ridge size is improved is relatively small. big.

(4) comparative example 4 is compared with comparative example 1, and output has reduced 3.58%, and aboveground biomass has reduced 0.74%, and water use efficiency has reduced 21.25%, and total organic carbon, total nitrogen and available phosphorus and flat land have no Significant difference. By adopting the method of increasing the planting density, the effect of each index is even worse than that of the flat land cultivation method in Comparative Example 1.

The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention should be included in the protection of the present invention. within range.

Claims (8)

1. a method for cultivating corn in furrows and ridges in the plateau region of East Africa, is characterized in that the method may further comprise the steps: (1) After finishing the land before sowing, set up double furrows, the width of the large ridge is 55-60 cm, the height of the ridge is 3-5 cm, the width of the small ridge is 25-30 cm, and the height of the ridge is 5-10 cm; (2) Film-cover each ridge and the furrow of each ridge and manage after film-covering; (3) After the film covering treatment is completed, the corn seeds are sown using the film side furrow sowing technology, the corn plant spacing is 20-25cm, and the planting density is 60,000 plants/ha, and it is managed after sowing; (4) Timely harvest. 2. the method for cultivating corn in furrows and ridges in the East African plateau area as claimed in claim 1, is characterized in that, in step (1), the described finishing land is specifically: select terrain relatively flat, loose soil, have required thickness soil layer The field is the object of cultivation. After the harvest of the previous stubble, the tiller is used to plow the soil cultivation layer, remove the stubble, and clean up the sundries in the cultivation layer. After the initial rainy season, the land is cleaned and consolidated again. flat. 3. The method for cultivating corn furrows and ridges in the East African plateau region as claimed in claim 1, wherein in step (1), the double furrows are specifically: according to the direction of crop planting, furrows and ridges are opened, and each ridge is divided into ridges. For large and small ridges, ditch and raise ridges along the small ridges, and use a shaper to arrange the ridge surface to make the ridge surface bulge. 4. the method for cultivating corn in furrows and ridges in the East African plateau area as claimed in claim 1, wherein in step (2), the film covering is specifically: film covering needs to be carried out immediately after the ridging work is completed, film covering First, it is preferred to open a 5cm-deep shallow ditch along the sideline of the plot. After the plastic film is unfolded, bury one side of the plastic film near the sideline in the shallow ditch and compact it with soil to fully expand the plastic film. The other side of the plastic film is just placed in another ditch. Take the soil from the edge of the film, put it down on the spot and press the film under the soil to fix it; after covering the first film, connect one side of the second film to the first film in the middle of the shallow ditch, and the film and The film is overlapped by a certain width, and so on to spread the entire sample square; when covering the film, the film should be stretched and flattened, and the film should be leveled after taking soil from the ridge surface. 5. The method for cultivating corn in furrows and ridges in the East African plateau region as claimed in claim 1, characterized in that, in step (2), the management after the mulching is specifically: after covering the mulch and the mulch is firmly seated and attached to the ground When it is tight, drill a seepage hole with a diameter of 3mm at every 50cm in the middle of the ditch. If it is a dry season, use the surrounding soil to block the seepage hole to prevent ineffective evaporation; after the field is covered with film, prevent the film from being damaged. Cover with fine soil. 6. the method for cultivating corn in furrows and ridges in the East African plateau region as claimed in claim 1, wherein, in step (3), the sowing is specifically: seed ruptured membrane hole sowing in the ditch by setting spacing or density, The sowing depth is 8-9cm, and the sowing hole is stepped on immediately after sowing on demand to fully combine the seeds with the soil; after sowing, the sowing hole is sealed with fine sand and loose manure from livestock pens. 7. The method for cultivating corn in furrows and ridges in the East African Plateau region as claimed in claim 1, wherein in step (3), the management after sowing is specifically: releasing seedlings in time, replenishing seedlings and field maintenance. 8. The method for cultivating corn in furrows and ridges in the East African plateau region as claimed in claim 1, wherein in step (4), the timely harvesting is specifically: when the corn bract leaves turn yellow, the grain milk line disappears, and the grain turns yellow. Harvested when hard and shiny.