CN107969302B - Ditch-ridge cultivation method for corn in east Africa plateau area - Google Patents
Ditch-ridge cultivation method for corn in east Africa plateau area Download PDFInfo
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01B—SOIL WORKING IN AGRICULTURE OR FORESTRY; PARTS, DETAILS, OR ACCESSORIES OF AGRICULTURAL MACHINES OR IMPLEMENTS, IN GENERAL
- A01B79/00—Methods for working soil
- A01B79/02—Methods for working soil combined with other agricultural processing, e.g. fertilising, planting
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P60/00—Technologies relating to agriculture, livestock or agroalimentary industries
- Y02P60/20—Reduction of greenhouse gas [GHG] emissions in agriculture, e.g. CO2
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Abstract
The invention discloses a ditch-ridge cultivation method for corn in east Africa plateau areas, which comprises the following steps: (1) after land is cleared up before sowing, double-furrow forming is carried out, the width of a large ridge is 55-60 cm, the height of a ridge is 3-5 cm, the width of a small ridge is 25-30 cm, and the height of the ridge is 5-10 cm; (2) performing film covering on each ridge and the furrow of each ridge and managing after film covering; (3) after the film covering treatment is finished, sowing the corn seeds by adopting a film side furrow sowing technology, wherein the corn plant spacing is 20-25 cm, the planting density is 60000 plants/hectare, and managing after sowing; (4) harvesting at proper time. The invention can well improve the local water utilization rate, reduce water evaporation and water and soil loss, correspondingly improve the utilization rate of soil nutrients and finally greatly improve the crop yield.
Description
Technical Field
The invention belongs to the technical field of crop cultivation, and particularly relates to a furrow-ridge cultivation method for corn in east Africa plateau areas.
Background
In the east non-plateau area, particularly in arid and semi-arid areas, the climate resources are difficult to fully utilize, and the local water and soil loss is serious, the agricultural ecological environment is deteriorated to cause low crop production level due to the lack of agricultural technologies for coping with the frequent drought and other social and economic factors, so that the grain safety is greatly challenged. In loess plateau areas, the furrow-ridge film covering technology is popularized in a large area, and plays a great promoting role in high yield and stable yield of crops in dry areas, but because of poor soil and unconcentrated rainfall, the ridge height and the ridge width are increased during ridging generally, so that less rainwater is collected, and the seeding density is generally lower according to soil moisture and rainfall conditions. In semiarid regions of Africa, the corn planting technology is relatively laggard, the corn planting density is low (2500-3000 plants/mu), and although the soil in the regions is fertile, the rainfall is concentrated in the rainy season of Africa, the moisture evaporation capacity is large, and the utilization efficiency of moisture and nutrients is low.
Disclosure of Invention
The invention aims to provide a furrow-ridge cultivation method for corns in east African plateau areas, and aims to solve the problem that the cultivation yield of the corns in east African plateau areas is low.
The invention is realized in such a way that a ditch-ridge cultivation method for corn in east African plateau areas comprises the following steps:
(1) after land is cleared up before sowing, double-furrow forming is carried out, the width of a large ridge is 55-60 cm, the height of a ridge is 3-5 cm, the width of a small ridge is 25-30 cm, and the height of the ridge is 5-10 cm;
(2) performing film covering on each ridge and the furrow of each ridge and managing after film covering;
(3) after the film covering treatment is finished, sowing the corn seeds by adopting a film side furrow sowing technology, wherein the corn plant spacing is 20-25 cm, the planting density is 60000 plants/hectare, and managing after sowing;
(4) harvesting at proper time.
Preferably, in step (1), the land preparation is specifically: selecting a field block with relatively flat topography, loose soil and a soil layer with required thickness as a cultivation object, ploughing a soil plough layer by using a ploughing machine after harvesting previous stubbles, cleaning sundries in the plough layer, and cleaning and leveling the soil again after the early rainy season.
Preferably, in step (1), the double-ridging trench is specifically: ditching and ridging according to the crop planting trend, dividing each ridge into large and small ridges, rowing, ditching and ridging along the small ridges, and arranging the ridge surface by using a shaper to enable the ridge surface to be raised.
Preferably, in the step (2), the coating film is specifically: the method comprises the following steps that (1) film mulching needs to be carried out immediately after ridging is finished, a shallow trench with the depth of 5cm is firstly formed along the side line of a sample before film mulching, after the mulching film is unfolded, one side of the mulching film close to the side line is buried in the shallow trench and compacted by soil, the mulching film is completely unfolded, the other side of the mulching film is just placed in the other trench, soil is taken from the side of the mulching film, then the mulching film is put down in place and is pressed under the soil for fixing; after the first film is covered, connecting one edge of the second film with the first film in the middle of the shallow trench, overlapping the films by a certain width, and spreading the whole sample by analogy in sequence; when in film covering, the mulching film needs to be stretched and spread by force, and after soil is taken from the ridge surface, the mulching film is leveled.
Preferably, in the step (2), the post-coating management is specifically: after the mulching film is covered and the mulching film is seated and tightly attached to the ground, water seepage holes with the diameter of 3mm are drilled in the middle of the ditch at intervals of 50cm, and if the ditch is dry, the water seepage holes are blocked by peripheral soil to prevent ineffective evaporation; after the mulching is carried out in the field, the mulching film is prevented from being damaged, and the damaged part of the mulching film is covered tightly with fine soil in time.
Preferably, in step (3), the seeding is specifically: the seeds are sowed in the furrows in a hole mode by breaking membranes according to the set planting distance or density, the sowing depth is 8-9 cm, and sowing holes are immediately pressed after dibbling, so that the seeds are fully combined with the soil; after sowing, the sowing holes are sealed by fine sand and loose livestock dung.
Preferably, in step (3), the post-sowing management is specifically: timely seedling releasing, seedling supplementing and field maintenance.
Preferably, in step (4), the timely harvesting is specifically: harvesting when the corn bracts turn yellow, the grain milk lines disappear, and the grains become hard and glossy.
The invention overcomes the defects of the prior art and provides a corn furrow-ridge cultivation method in east African plateau areas. The flat land cultivation technology adopted in the east non-plateau area has very low corn yield, and the corn yield is still lower than that of the loess plateau area after the conventional furrow-ridge plastic mulching technology is introduced into the east non-plateau area. This is caused by a significant difference in the climate and soil between the eastern non-plateau region and the loess plateau region. Although the eastern non-plateau area is also very arid, the rainfall is characterized by short rainfall period, concentration, large rainfall amount and fertile land. After the conventional furrow ridge plastic film mulching technology in the plateau area is introduced, the rainfall cannot be well and sufficiently stored, and the soil fertility cannot be released. According to the characteristics of local climate and soil, on the basis of the conventional furrow ridge and mulching film covering technology, by optimizing the furrow ridge size and increasing the planting density, the method reduces the evaporation of soil moisture in dry seasons, increases the collection of rainwater, reduces runoff and soil evaporation, further increases the soil moisture and nutrients which can be absorbed and utilized by crops, improves the soil nutrient condition and the moisture storage condition, and greatly improves the crop yield.
Compared with the defects and shortcomings of the prior art, the invention has the following beneficial effects: the invention can well improve the local water utilization rate, reduce water evaporation and water and soil loss, correspondingly improve the utilization rate of soil nutrients and finally greatly improve the crop yield.
Drawings
FIG. 1 is a schematic diagram of the structure and size of double furrows and the planting of corn in the furrow-ridge cultivation method for corn in east non-plateau areas.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Example 1
1. Land preparation before sowing
The field with relatively flat topography, loose soil texture and certain depth soil layer thickness is selected as the basic requirement. After the previous stubbles are harvested, the soil is ploughed by a ploughing machine with the depth of about 30cm, and the stubbles are cleaned in time. And the residues of previous crops, stones, sticks and other sundries in the plough layer are cleaned. After certain rainfall in the early stage of rainy season, the land is cleaned and leveled again in time.
In the non-plateau area, because the land is fertile, inorganic fertilizer is not used, and farmyard manure is mainly used, and the fertilizing amount is about 2000-2500 kilograms per hectare.
The mulching film adopts a polyethylene transparent film and a polyethylene black film which are produced by Lanzhou gold land plastics, the thicknesses of the polyethylene transparent film and the polyethylene black film are respectively 0.008mm and 0.01mm, and the adopted mulching films are all specially-made anti-ultraviolet mulching films.
2. Ridging
As shown in figure 1, each ridge is divided into large and small ridges, furrowing and ridging are carried out according to the crop planting direction, the width of the large ridge is adjusted to 55-60 cm by a dry farming technology for changing the size of the furrows and ridges, the height of the ridge is adjusted to 3-5 cm, the width of the small ridge is adjusted to 25-30 cm, the height of the ridge is adjusted to 5-10 cm, a ridger is used for ridging, furrowing and ridging are carried out along the small ridge, the ridge surface is arranged by a shaper, the ridge surface is enabled to be raised, and mulching film mulching and rain collection are facilitated.
3. Film coating
After ridging is finished, film mulching needs to be carried out immediately to prevent soil moisture from losing. Before corn is coated, a shallow trench with the depth of 5cm is firstly formed along the side line of the sample, after the mulching film is unfolded, one side of the mulching film close to the side line is buried in the shallow trench, and soil is used for compacting. And completely unfolding the mulching film, just placing the other side of the mulching film in the other ditch, taking soil from the edge of the mulching film along the other ditch every 1m, putting down the mulching film in place, and pressing the mulching film under the soil for fixing. After the first film is covered, one side of the second film is connected with the first film in the middle of the ditch, the films are overlapped with each other for a certain width as much as possible so as to be used for preserving soil moisture, and the whole sample is paved by analogy in sequence. When the mulching film is covered, the mulching film needs to be stretched and spread by force, and the mulching film needs to be leveled immediately after soil is taken from the ridge surface.
4. Post-mortem management
After the mulching film is covered for about one week, when the mulching film is seated and tightly attached to the ground, a water seepage hole with the diameter of 3mm is drilled in the middle of the ditch at intervals of 50cm by a wood stick, so that the water seepage storage in the rain concentration season is facilitated. If the seepage holes can be blocked by peripheral soil in the dry season to prevent ineffective evaporation. After the mulching film is covered in the field, animals such as livestock, birds and the like are strictly prohibited from trampling into the ground to cause the damage of the mulching film. In the whole test season, the furrow is required to be inspected carefully line by line, and once the damage of the mulching film is found, the mulching film needs to be covered tightly by fine soil in time to prevent the film from being uncovered by strong wind and water from losing.
5. Seeding as early as possible
After the entire test field is completely covered with film, it is necessary to sow the film as soon as possible to make the most of the water. For corn, a corn dibbler is used for dibbling seeds in furrows with a certain plant spacing or density, the sowing depth is 8-9 cm, and sowing holes are immediately stamped after dibbling so that the seeds are fully combined with soil. For optimizing the size of the furrows and ridges, the spacing between the corn plants after reasonable close planting is 20-25 cm, and the seeding rate of the corn is 60000 plants/hectare. After sowing, the sowing holes are sealed by loose objects such as fine sand soil, livestock manure and the like, and the sowing holes are prevented from diffusing soil moisture and hardening when meeting rain to influence seedling emergence.
6. Timely seedling releasing, seedling supplementing and field maintenance
In rainy season, soil is easy to harden after rainfall, so that the growth condition of seedlings in the film needs to be observed, the soil needs to be broken in due time to guide the seedlings, and the seedlings cannot emerge from the soil in the film to be yellowed and wilted. Checking in the field at any time in the seedling stage, timely transplanting when finding that the seedlings are short and the ridges are broken, watering a small amount of water after the seedlings are supplemented in the seedling-short positions, and sealing the holes with fine wet soil. When the seedlings reach 4-5 leaves, removing diseases, weak and mixed seedlings, and keeping strong seedlings with regular and consistent growth. The full-film corn grows vigorously, a large number of tillers (branches) are often generated, nutrients are consumed, the tillers are required to be broken off from the base part in time and on duty during the period from the final seedling stage to the joint stage, and the top rot, albino seedlings and insect pests of the corn are prevented. The mulching film can effectively inhibit the growth of weeds, so that chemical weeding is only needed before mulching, and meanwhile, the mulching film is fertile in the east non-high causes, and additional fertilization treatment on crops is not needed in the middle and later stages.
The later management is mainly used for preventing and treating crop diseases, 30-35 g of 12.5% procymidone wettable powder and 8-9 g of 25% propiconazole emulsifiable concentrate (Kehui) or 45-60 ml of 20% triadimefon emulsifiable concentrate can be used for preventing and treating rust diseases per mu by spraying. And spraying 8-10 g of 15% triadimefon wettable powder effective component or 100g of 50% triadimefon colloidal suspension with water per mu of powdery mildew. The aphid can be sprayed by mixing 4000 times liquid of 50% pirimicarb wettable powder, 1000 times liquid of 10% imidacloprid and 2000 times liquid of 50% phoxim missible oil with water.
7. Harvesting at the right time
Harvesting when the corn bracts turn yellow, the grain milk lines disappear, and the grains become hard and glossy. After the fruit clusters are harvested, putting up a frame or airing to prevent seeds from mildewing due to rain and moisture, and threshing and storing after the water content is reduced to below 13%; after the ears are harvested, the straws should be harvested and ensiled in time.
Comparative example 1
The comparative example is the same as the example 1, but differs in that the method is carried out without ridging and covering, the seeds are directly planted on the flat ground, the planting distance is 30-35 cm during sowing, and the mu sowing amount is 45500-52000 plants/hectare (conventional sowing density).
Comparative example 2
This comparative example was conducted in the same manner as in example 1 except that the row spacing was 30 to 35cm and the seeding rate was 45500 to 52000 plants/ha (conventional seeding density).
Comparative example 3
The comparative example is the same as the example 1, except that the sizes of the furrows and ridges during ridging are conventional large ridge width (70-65 cm), ridge height (20-25 cm), small ridge width (35-40 cm) and ridge height (25-30 cm).
Comparative example 4
This comparative example was the same as example 1 above, except that no ridging and film coating were performed.
Effects of the embodiment
The results of example 1 and comparative examples 1 to 3 were statistically analyzed, and the results are shown in table 1 below:
TABLE 1
As can be seen from table 1, it is,
(1) compared with comparative example 1, in example 1, the yield of corn is improved by 89.27%, the aboveground biomass is improved by 40.68%, the water utilization efficiency is improved by 68.01%, the organic carbon is improved by 1.56%, the total nitrogen is improved by 3.7%, and the quick-acting phosphorus has no significant difference.
(2) Compared with the comparative example 1, the yield of the comparative example 2 is improved by 14.60 percent, the aboveground biomass is improved by 28.46 percent, the water utilization efficiency is improved by 12.38 percent, and the total organic carbon, the total nitrogen and the quick-acting phosphorus have no obvious difference from the flat ground. From this, it is understood that, compared with the effect of example 1, in comparative example 2, each index is improved to some extent by the ridge-forming and film-covering cultivation method, but the yield is not ideal, and is even slightly lower than the yield of ridge-forming film-covering cultivation in loess plateau.
(3) Compared with the comparative example 1, the yield of the comparative example 3 is increased by 16.69%, the aboveground biomass is increased by 10.38%, the water utilization efficiency is increased by 20.78%, and the total organic carbon, the total nitrogen and the quick-acting phosphorus have no obvious difference from the flat ground. From this, it is understood that, compared with the effect of example 1, the difference in the results obtained by the cultivation technique of comparative example 3 in which the planting density is increased and the conventional ridge forming size is adopted is larger than that obtained by the cultivation technique of the same planting density and improved ridge forming size.
(4) Comparative example 4 compared to comparative example 1, the yield was reduced by 3.58%, aboveground biomass was reduced by 0.74%, the water use efficiency was reduced by 21.25%, and the total organic carbon, total nitrogen and fast-acting phosphorus were not significantly different from those of flat ground. The effect of each index was worse than that of the flat cultivation method in comparative example 1 by increasing the planting density.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (8)
1. A ditch-ridge cultivation method for corn in east Africa plateau is characterized by comprising the following steps:
(1) after land is cleared up before sowing, double-furrow forming is carried out, the width of a large ridge is 55-60 cm, the height of a ridge is 3-5 cm, the width of a small ridge is 25-30 cm, and the height of the ridge is 5-10 cm;
(2) performing film covering on each ridge and the furrow of each ridge and managing after film covering;
(3) after the film covering treatment is finished, sowing the corn seeds by adopting a film side furrow sowing technology, wherein the corn plant spacing is 20-25 cm, the planting density is 60000 plants/hectare, and managing after sowing;
(4) harvesting at proper time.
2. The east Africa plateau corn furrow-ridge cultivation method of claim 1, wherein in step (1), the land preparation is specifically: selecting a field block with relatively flat topography, loose soil and a soil layer with required thickness as a cultivation object, ploughing a soil plough layer by using a ploughing machine after harvesting previous stubbles, cleaning sundries in the plough layer, and cleaning and leveling the soil again after the early rainy season.
3. The corn furrow-ridge cultivation method in east Africa plateau area as claimed in claim 1, wherein in step (1), said double-ridge furrows are specifically: ditching and ridging according to the crop planting trend, dividing each ridge into large and small ridges, rowing, ditching and ridging along the small ridges, and arranging the ridge surface by using a shaper to enable the ridge surface to be raised.
4. The trench-ridge cultivation method for corn in east Africa plateau as claimed in claim 1, wherein in step (2), the mulching film is specifically: the method comprises the following steps that (1) film mulching needs to be carried out immediately after ridging is finished, a shallow trench with the depth of 5cm is firstly formed along the side line of a sample before film mulching, after the mulching film is unfolded, one side of the mulching film close to the side line is buried in the shallow trench and compacted by soil, the mulching film is completely unfolded, the other side of the mulching film is just placed in the other trench, soil is taken from the side of the mulching film, then the mulching film is put down in place and is pressed under the soil for fixing; after the first film is covered, connecting one edge of the second film with the first film in the middle of the shallow trench, overlapping the films by a certain width, and spreading the whole sample by analogy in sequence; when in film covering, the mulching film needs to be stretched and spread by force, and after soil is taken from the ridge surface, the mulching film is leveled.
5. The east Africa plateau corn furrow-ridge cultivation method of claim 1, wherein in step (2), the post-mulching management is specifically: after the mulching film is covered and the mulching film is seated and tightly attached to the ground, water seepage holes with the diameter of 3mm are drilled in the middle of the ditch at intervals of 50cm, and if the ditch is dry, the water seepage holes are blocked by peripheral soil to prevent ineffective evaporation; after the mulching is carried out in the field, the mulching film is prevented from being damaged, and the damaged part of the mulching film is covered tightly with fine soil in time.
6. The east Africa plateau corn furrow-ridge cultivation method of claim 1, wherein in step (3), the seeding is specifically: the seeds are sowed in the furrows in a hole mode by breaking membranes according to the set planting distance or density, the sowing depth is 8-9 cm, and sowing holes are immediately pressed after dibbling, so that the seeds are fully combined with the soil; after sowing, the sowing holes are sealed by fine sand and loose livestock dung.
7. The east Africa plateau corn furrow-ridge cultivation method of claim 1, wherein in step (3), the post-seeding management is specifically: timely seedling releasing, seedling supplementing and field maintenance.
8. The east Africa plateau corn furrow-ridge cultivation method of claim 1, wherein in step (4), the timely harvesting is specifically: harvesting when the corn bracts turn yellow, the grain milk lines disappear, and the grains become hard and glossy.
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| CN103493693B (en) * | 2013-10-10 | 2015-09-23 | 西北农林科技大学 | Furrow irrigates the defining method of suitable ditch, ridge ratio |
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