CN100573321C - 具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法 - Google Patents

具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法 Download PDF

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Publication number
CN100573321C
CN100573321C CNB038187469A CN03818746A CN100573321C CN 100573321 C CN100573321 C CN 100573321C CN B038187469 A CNB038187469 A CN B038187469A CN 03818746 A CN03818746 A CN 03818746A CN 100573321 C CN100573321 C CN 100573321C
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CN
China
Prior art keywords
compound
material layer
anticorrosive additive
group
additive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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CNB038187469A
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English (en)
Chinese (zh)
Other versions
CN1675588A (zh
Inventor
浦野年由
龟山泰弘
藤田理惠子
宫泽隆司
利光惠理子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichigo Morton Co ltd
Original Assignee
Mitsubishi Chemical Corp
Nippon Synthetic Chemical Industry Co Ltd
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Publication of CN1675588A publication Critical patent/CN1675588A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CNB038187469A 2002-08-07 2003-08-05 具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法 Expired - Lifetime CN100573321C (zh)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP229416/2002 2002-08-07
JP2002229416 2002-08-07
JP365470/2002 2002-12-17
JP2002365470 2002-12-17
JP2003017559 2003-01-27
JP17559/2003 2003-01-27
JP2003034161 2003-02-12
JP34161/2003 2003-02-12
JP44649/2003 2003-02-21
JP2003044649 2003-02-21

Related Child Applications (1)

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CN2007101823701A Division CN101135850B (zh) 2002-08-07 2003-08-05 具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法

Publications (2)

Publication Number Publication Date
CN1675588A CN1675588A (zh) 2005-09-28
CN100573321C true CN100573321C (zh) 2009-12-23

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Family Applications (2)

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CNB038187469A Expired - Lifetime CN100573321C (zh) 2002-08-07 2003-08-05 具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法
CN2007101823701A Expired - Lifetime CN101135850B (zh) 2002-08-07 2003-08-05 具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2007101823701A Expired - Lifetime CN101135850B (zh) 2002-08-07 2003-08-05 具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法

Country Status (5)

Country Link
KR (2) KR20050047088A (https=)
CN (2) CN100573321C (https=)
AU (1) AU2003254812A1 (https=)
TW (2) TW200416487A (https=)
WO (1) WO2004015497A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105418674A (zh) * 2015-11-10 2016-03-23 中国乐凯集团有限公司 一种高折射率树脂及其应用

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KR100970357B1 (ko) * 2003-09-25 2010-07-16 니뽄 고오세이가가꾸 고오교오 가부시끼가이샤 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법
CN1950750B (zh) * 2004-05-12 2012-10-24 旭化成电子材料株式会社 图案形成材料、图案形成设备和图案形成方法
JP2006154740A (ja) * 2004-07-14 2006-06-15 Fuji Photo Film Co Ltd 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
KR20130042049A (ko) 2004-07-14 2013-04-25 아사히 가세이 이-매터리얼즈 가부시키가이샤 감광성 조성물, 패턴형성재료, 감광성 적층체, 및 패턴형성장치 및 패턴형성방법
TW200622491A (en) * 2004-09-28 2006-07-01 Fuji Photo Film Co Ltd Pattern-forming material, pattern-forming device and pattern-forming method
TWI485064B (zh) * 2006-03-10 2015-05-21 羅門哈斯電子材料有限公司 用於光微影之組成物及製程
KR101313538B1 (ko) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물
JP4975579B2 (ja) * 2007-10-01 2012-07-11 太陽ホールディングス株式会社 組成物、ドライフィルム、硬化物及びプリント配線板
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5296828B2 (ja) * 2011-04-15 2013-09-25 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
KR102006993B1 (ko) * 2011-05-31 2019-08-02 덴카 주식회사 에너지선 경화성 수지 조성물
EP2682440A1 (en) * 2012-07-06 2014-01-08 Basf Se A chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt
CN103298265B (zh) * 2013-04-09 2016-04-06 王俊生 一种电路板外层线路成型方法
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
CN109563234B (zh) * 2016-08-08 2022-08-23 日产化学株式会社 光固化性组合物及半导体装置的制造方法
US10520813B2 (en) * 2016-12-15 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd Extreme ultraviolet photoresist with high-efficiency electron transfer
TWI816671B (zh) * 2017-04-25 2023-10-01 德商馬克專利公司 用於產生底切圖樣輪廓之負型光阻調配物以及使光阻組合物成像之方法和用於使基板上之圖樣化光阻劑金屬化之剝離方法
CN115917432A (zh) * 2020-07-01 2023-04-04 东京应化工业株式会社 感光性组合物、感光性干膜、带镀覆用铸模的基板的制造方法及镀覆造形物的制造方法
US20220067489A1 (en) 2020-08-28 2022-03-03 Illumina, Inc. Detecting and Filtering Clusters Based on Artificial Intelligence-Predicted Base Calls
AU2022248999A1 (en) 2021-03-31 2023-02-02 Illumina, Inc. Artificial intelligence-based base caller with contextual awareness
CN117631439B (zh) * 2022-08-31 2025-10-31 长春人造树脂厂股份有限公司 光阻膜及其应用

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0985683A1 (en) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
EP1148387A1 (en) * 2000-04-19 2001-10-24 Mitsubishi Chemical Corporation Photosensitive lithographic printing plate and method for making the printing plate
JP2002148801A (ja) * 2000-11-14 2002-05-22 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002169275A (ja) * 2000-12-04 2002-06-14 Mitsui Chemicals Inc 光酸発生剤及びそれを用いた可視光感光性樹脂組成物
JP2002202598A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法
JP2002244288A (ja) * 2001-02-16 2002-08-30 Mitsubishi Paper Mills Ltd 感光性組成物および感光性平版印刷版材料
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2003195526A (ja) * 2001-12-27 2003-07-09 Mitsubishi Chemicals Corp 感光性平版印刷版の刷版方法

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JPH09281698A (ja) 1996-04-11 1997-10-31 Mitsubishi Chem Corp カラーフィルター用光重合性組成物
US6335144B1 (en) 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP2002072460A (ja) * 2000-09-05 2002-03-12 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0985683A1 (en) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
EP1148387A1 (en) * 2000-04-19 2001-10-24 Mitsubishi Chemical Corporation Photosensitive lithographic printing plate and method for making the printing plate
JP2002148801A (ja) * 2000-11-14 2002-05-22 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002169275A (ja) * 2000-12-04 2002-06-14 Mitsui Chemicals Inc 光酸発生剤及びそれを用いた可視光感光性樹脂組成物
JP2002202598A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法
JP2002244288A (ja) * 2001-02-16 2002-08-30 Mitsubishi Paper Mills Ltd 感光性組成物および感光性平版印刷版材料
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2003195526A (ja) * 2001-12-27 2003-07-09 Mitsubishi Chemicals Corp 感光性平版印刷版の刷版方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105418674A (zh) * 2015-11-10 2016-03-23 中国乐凯集团有限公司 一种高折射率树脂及其应用

Also Published As

Publication number Publication date
TW200839443A (en) 2008-10-01
KR20080011351A (ko) 2008-02-01
AU2003254812A1 (en) 2004-02-25
CN101135850B (zh) 2011-02-16
TW200416487A (en) 2004-09-01
WO2004015497A1 (ja) 2004-02-19
KR20050047088A (ko) 2005-05-19
CN1675588A (zh) 2005-09-28
TWI326006B (https=) 2010-06-11
KR101003323B1 (ko) 2010-12-22
CN101135850A (zh) 2008-03-05

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