CN100457966C - 有机薄膜形成设备用加热坩埚 - Google Patents
有机薄膜形成设备用加热坩埚 Download PDFInfo
- Publication number
- CN100457966C CN100457966C CNB031255159A CN03125515A CN100457966C CN 100457966 C CN100457966 C CN 100457966C CN B031255159 A CNB031255159 A CN B031255159A CN 03125515 A CN03125515 A CN 03125515A CN 100457966 C CN100457966 C CN 100457966C
- Authority
- CN
- China
- Prior art keywords
- lid
- heating crucible
- main body
- well heater
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR52898/2002 | 2002-09-03 | ||
KR52898/02 | 2002-09-03 | ||
KR1020020052898A KR100889758B1 (ko) | 2002-09-03 | 2002-09-03 | 유기박막 형성장치의 가열용기 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1495284A CN1495284A (zh) | 2004-05-12 |
CN100457966C true CN100457966C (zh) | 2009-02-04 |
Family
ID=31973638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031255159A Expired - Fee Related CN100457966C (zh) | 2002-09-03 | 2003-09-03 | 有机薄膜形成设备用加热坩埚 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7962016B2 (zh) |
JP (1) | JP4897190B2 (zh) |
KR (1) | KR100889758B1 (zh) |
CN (1) | CN100457966C (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102732837A (zh) * | 2011-03-31 | 2012-10-17 | 株式会社日立高新技术 | 蒸镀装置 |
CN104419898A (zh) * | 2013-08-30 | 2015-03-18 | 三星显示有限公司 | 蒸镀源 |
CN105112856A (zh) * | 2015-04-30 | 2015-12-02 | 京东方科技集团股份有限公司 | 一种蒸发源、蒸镀装置、蒸镀方法 |
Families Citing this family (44)
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EP1585846B1 (en) * | 2003-01-08 | 2010-09-29 | Kennametal Sintec Keramik GmbH | Resistance-heated vaporizer boat |
US20050022743A1 (en) * | 2003-07-31 | 2005-02-03 | Semiconductor Energy Laboratory Co., Ltd. | Evaporation container and vapor deposition apparatus |
US7364772B2 (en) * | 2004-03-22 | 2008-04-29 | Eastman Kodak Company | Method for coating an organic layer onto a substrate in a vacuum chamber |
US20050229856A1 (en) * | 2004-04-20 | 2005-10-20 | Malik Roger J | Means and method for a liquid metal evaporation source with integral level sensor and external reservoir |
KR100653372B1 (ko) * | 2004-07-14 | 2006-12-04 | 엘지전자 주식회사 | 유기 전계 발광층 증착용 증착원 |
KR100592304B1 (ko) * | 2004-11-05 | 2006-06-21 | 삼성에스디아이 주식회사 | 가열 용기와 이를 구비한 증착 장치 |
DE502004004046D1 (de) * | 2004-11-20 | 2007-07-19 | Applied Materials Gmbh & Co Kg | Vorrichtung zum Verdampfen von Materialien |
KR100685431B1 (ko) * | 2004-11-26 | 2007-02-22 | 삼성에스디아이 주식회사 | 유기물 증착원 |
JP4557170B2 (ja) * | 2004-11-26 | 2010-10-06 | 三星モバイルディスプレイ株式會社 | 蒸発源 |
US7166169B2 (en) * | 2005-01-11 | 2007-01-23 | Eastman Kodak Company | Vaporization source with baffle |
JP4900241B2 (ja) | 2005-04-28 | 2012-03-21 | 東亞合成株式会社 | 活性エネルギー線硬化型接着剤組成物 |
DE102005030862B4 (de) * | 2005-07-01 | 2009-12-24 | Sintec Keramik Gmbh | Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper |
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KR100691025B1 (ko) * | 2005-12-16 | 2007-03-09 | 두산디앤디 주식회사 | 유기박막 증착용 도가니 장치 |
CN100516284C (zh) * | 2006-01-21 | 2009-07-22 | 鸿富锦精密工业(深圳)有限公司 | 蒸镀装置 |
FI121430B (fi) * | 2006-04-28 | 2010-11-15 | Beneq Oy | Kuuma lähde |
US20080050521A1 (en) * | 2006-08-24 | 2008-02-28 | Seagate Technology Llc | Apparatus & method for vapor phase lubrication of recording media with reduced lubricant consumption |
CN101140138B (zh) * | 2007-01-23 | 2012-02-29 | 北京核心动力科技有限公司 | 一种带温度传感器保护装置的坩埚 |
WO2009060739A1 (ja) * | 2007-11-05 | 2009-05-14 | Ulvac, Inc. | 蒸着源、有機el素子の製造装置 |
US20090255467A1 (en) * | 2008-04-15 | 2009-10-15 | Global Solar Energy, Inc. | Apparatus and methods for manufacturing thin-film solar cells |
JP4880647B2 (ja) * | 2008-07-01 | 2012-02-22 | 東京エレクトロン株式会社 | 有機elの成膜装置および蒸着装置 |
US20100247747A1 (en) * | 2009-03-27 | 2010-09-30 | Semiconductor Energy Laboratory Co., Ltd. | Film Deposition Apparatus, Method for Depositing Film, and Method for Manufacturing Lighting Device |
KR101153934B1 (ko) * | 2009-11-24 | 2012-06-08 | 한국과학기술연구원 | 발열부 일체형 진공 박막 증착용 분자빔 증발원, 그 제작 방법 및 증발기 |
KR101131096B1 (ko) * | 2010-02-05 | 2012-04-02 | (주)알파플러스 | 하향식 진공 증발원 장치 |
KR101128474B1 (ko) * | 2010-04-07 | 2012-03-23 | 한국과학기술연구원 | 측면 방출형 분자빔 증발원, 그 제작 방법 및 증발기 |
KR101265067B1 (ko) * | 2010-06-10 | 2013-05-16 | 한국과학기술연구원 | 측면 방출형 선형증발원, 그 제작 방법 및 선형증발기 |
US20120006809A1 (en) * | 2010-06-23 | 2012-01-12 | Colorado State University Research Foundation | Sublimation crucible with embedded heater element |
TW201204845A (en) * | 2010-07-16 | 2012-02-01 | Hon Hai Prec Ind Co Ltd | Processing apparatus for smoothing film material and evaporation deposition device with same |
JP5915026B2 (ja) * | 2011-08-26 | 2016-05-11 | 住友大阪セメント株式会社 | 温度測定用板状体及びそれを備えた温度測定装置 |
KR101810046B1 (ko) * | 2012-01-19 | 2017-12-19 | 삼성디스플레이 주식회사 | 기상 증착 장치 및 기상 증착 방법 |
KR20150004646A (ko) * | 2013-07-03 | 2015-01-13 | 삼성디스플레이 주식회사 | 증착원 |
CN103409720B (zh) * | 2013-08-23 | 2016-02-03 | 深圳市华星光电技术有限公司 | 一种镀膜机坩埚 |
CN103757590B (zh) * | 2013-12-31 | 2016-04-20 | 深圳市华星光电技术有限公司 | 一种镀膜机坩埚设备 |
CN103757591B (zh) * | 2013-12-31 | 2016-03-30 | 深圳市华星光电技术有限公司 | 一种坩埚设备及其在液晶面板生产中的应用 |
CN104078626B (zh) * | 2014-07-22 | 2016-07-06 | 深圳市华星光电技术有限公司 | 用于oled材料蒸镀的加热装置 |
CN105603365B (zh) * | 2016-01-29 | 2018-07-10 | 深圳市华星光电技术有限公司 | 真空蒸镀加热装置 |
US20190032193A1 (en) * | 2017-07-31 | 2019-01-31 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Vapor Deposition Device |
US20190048460A1 (en) * | 2017-08-14 | 2019-02-14 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Evaporation Crucible and Evaporation System |
CN111655898A (zh) * | 2018-01-23 | 2020-09-11 | 应用材料公司 | 用于蒸发源材料的蒸发器、材料沉积源、沉积装置及其方法 |
KR20200062578A (ko) | 2018-11-27 | 2020-06-04 | (주)울텍 | 진공 증착용 증발 셀 |
CN112176289A (zh) * | 2020-09-22 | 2021-01-05 | 中国建材国际工程集团有限公司 | 一种碲化镉/硫化镉/硒化镉薄膜沉积用坩埚舟及其制备方法 |
CN112609159B (zh) * | 2020-12-16 | 2023-02-14 | 尚越光电科技股份有限公司 | 一种cigs薄膜太阳能电池热电偶装配的共蒸设备 |
CN112609160B (zh) * | 2020-12-29 | 2023-06-06 | 尚越光电科技股份有限公司 | 一种cigs共蒸法的蒸发源加热结构 |
CN112680698B (zh) * | 2021-03-15 | 2021-06-29 | 苏州盟萤电子科技有限公司 | 真空蒸镀用加热坩埚及真空蒸镀装置 |
Citations (9)
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US2799764A (en) * | 1953-10-15 | 1957-07-16 | Edward F Chandler | Panel heating device |
US3842241A (en) * | 1973-02-09 | 1974-10-15 | Biozonics Corp | Electrically heated aquarium tank |
CN1057492A (zh) * | 1990-06-18 | 1992-01-01 | 三菱电机株式会社 | 薄膜形成装置 |
CN1058091A (zh) * | 1990-06-06 | 1992-01-22 | 联合碳化涂料服务技术公司 | 一氮化硼坩埚及其制造方法 |
US5157240A (en) * | 1989-09-13 | 1992-10-20 | Chow Loren A | Deposition heaters |
CN1103112A (zh) * | 1993-11-20 | 1995-05-31 | 三菱电机株式会社 | 薄膜形成装置 |
CN1104758A (zh) * | 1994-09-10 | 1995-07-05 | 冶金工业部钢铁研究总院 | 一种涂有二硼化钛涂层的坩埚及其制造方法 |
US6162300A (en) * | 1998-09-25 | 2000-12-19 | Bichrt; Craig E. | Effusion cell |
US6242719B1 (en) * | 1998-06-11 | 2001-06-05 | Shin-Etsu Handotai Co., Ltd. | Multiple-layered ceramic heater |
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-
2002
- 2002-09-03 KR KR1020020052898A patent/KR100889758B1/ko active IP Right Grant
-
2003
- 2003-09-02 US US10/652,493 patent/US7962016B2/en not_active Expired - Fee Related
- 2003-09-03 JP JP2003311324A patent/JP4897190B2/ja not_active Expired - Fee Related
- 2003-09-03 CN CNB031255159A patent/CN100457966C/zh not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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US2799764A (en) * | 1953-10-15 | 1957-07-16 | Edward F Chandler | Panel heating device |
US3842241A (en) * | 1973-02-09 | 1974-10-15 | Biozonics Corp | Electrically heated aquarium tank |
US5157240A (en) * | 1989-09-13 | 1992-10-20 | Chow Loren A | Deposition heaters |
CN1058091A (zh) * | 1990-06-06 | 1992-01-22 | 联合碳化涂料服务技术公司 | 一氮化硼坩埚及其制造方法 |
CN1057492A (zh) * | 1990-06-18 | 1992-01-01 | 三菱电机株式会社 | 薄膜形成装置 |
CN1103112A (zh) * | 1993-11-20 | 1995-05-31 | 三菱电机株式会社 | 薄膜形成装置 |
CN1104758A (zh) * | 1994-09-10 | 1995-07-05 | 冶金工业部钢铁研究总院 | 一种涂有二硼化钛涂层的坩埚及其制造方法 |
US6242719B1 (en) * | 1998-06-11 | 2001-06-05 | Shin-Etsu Handotai Co., Ltd. | Multiple-layered ceramic heater |
US6162300A (en) * | 1998-09-25 | 2000-12-19 | Bichrt; Craig E. | Effusion cell |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102732837A (zh) * | 2011-03-31 | 2012-10-17 | 株式会社日立高新技术 | 蒸镀装置 |
CN104419898A (zh) * | 2013-08-30 | 2015-03-18 | 三星显示有限公司 | 蒸镀源 |
CN105112856A (zh) * | 2015-04-30 | 2015-12-02 | 京东方科技集团股份有限公司 | 一种蒸发源、蒸镀装置、蒸镀方法 |
CN105112856B (zh) * | 2015-04-30 | 2017-11-24 | 京东方科技集团股份有限公司 | 一种蒸发源、蒸镀装置、蒸镀方法 |
Also Published As
Publication number | Publication date |
---|---|
US7962016B2 (en) | 2011-06-14 |
KR100889758B1 (ko) | 2009-03-20 |
JP2004091926A (ja) | 2004-03-25 |
JP4897190B2 (ja) | 2012-03-14 |
US20040042770A1 (en) | 2004-03-04 |
CN1495284A (zh) | 2004-05-12 |
KR20040021290A (ko) | 2004-03-10 |
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Owner name: SAMSUNG SDI CO., LTD. Free format text: FORMER OWNER: SAMSUNG OLED CO., LTD. Effective date: 20050617 |
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Effective date of registration: 20050617 Address after: Gyeonggi Do Korea Suwon Applicant after: Samsung SDI Co., Ltd. Address before: Ulsan, South Korea Applicant before: Samsung OLED Co., Ltd. |
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Effective date of registration: 20090123 Address after: Gyeonggi Do Korea Suwon Patentee after: Samsung Mobile Display Co., Ltd. Address before: Gyeonggi Do Korea Suwon Patentee before: Samsung SDI Co., Ltd. |
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Owner name: SAMSUNG MOBILE DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG SDI CO., LTD. Effective date: 20090123 |
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Owner name: SAMSUNG DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG MOBILE DISPLAY CO., LTD. Effective date: 20121122 |
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Effective date of registration: 20121122 Address after: South Korea Gyeonggi Do Yongin Patentee after: Samsung Display Co.,Ltd. Address before: Gyeonggi Do Korea Suwon Patentee before: Samsung Mobile Display Co., Ltd. |
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