JP4557170B2 - 蒸発源 - Google Patents
蒸発源 Download PDFInfo
- Publication number
- JP4557170B2 JP4557170B2 JP2005339520A JP2005339520A JP4557170B2 JP 4557170 B2 JP4557170 B2 JP 4557170B2 JP 2005339520 A JP2005339520 A JP 2005339520A JP 2005339520 A JP2005339520 A JP 2005339520A JP 4557170 B2 JP4557170 B2 JP 4557170B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- nozzle
- source according
- heat
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000008020 evaporation Effects 0.000 title claims description 175
- 238000001704 evaporation Methods 0.000 title claims description 175
- 238000010438 heat treatment Methods 0.000 claims description 113
- 238000003860 storage Methods 0.000 claims description 92
- 239000000463 material Substances 0.000 claims description 69
- 239000011368 organic material Substances 0.000 claims description 53
- 230000008021 deposition Effects 0.000 claims description 47
- 238000007740 vapor deposition Methods 0.000 claims description 42
- 239000004020 conductor Substances 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910001026 inconel Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 53
- 239000000126 substance Substances 0.000 description 46
- 238000000151 deposition Methods 0.000 description 42
- 239000005416 organic matter Substances 0.000 description 36
- 239000010408 film Substances 0.000 description 14
- 239000011146 organic particle Substances 0.000 description 13
- 239000010409 thin film Substances 0.000 description 11
- 230000002265 prevention Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 238000012546 transfer Methods 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 7
- 239000010439 graphite Substances 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000003870 refractory metal Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000005997 Calcium carbide Substances 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- CLZWAWBPWVRRGI-UHFFFAOYSA-N tert-butyl 2-[2-[2-[2-[bis[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]amino]-5-bromophenoxy]ethoxy]-4-methyl-n-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]anilino]acetate Chemical compound CC1=CC=C(N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)C(OCCOC=2C(=CC=C(Br)C=2)N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)=C1 CLZWAWBPWVRRGI-UHFFFAOYSA-N 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
前記反射板は、前記ノズル部の非開口部に位置し、前記ノズル部より突出した構造を有することができる。
20 蒸着物質貯蔵部、
30 ノズル部、
40 加熱部、
50 反射板、
60 ハウジング、
100 蒸発源、
250 マスク、
200 基板、
300 チャンバー。
Claims (21)
- 蒸着物質が位置し、一部分が開口された蒸着物質貯蔵部と、
前記蒸着物質貯蔵部の開口された部分に連結され、前記蒸着物質を噴射するための開口部を有するノズル部と、
前記ノズル部の一部の角部を取り囲み、前記ノズル部と接触せず、所定距離に離隔されている反射板と、
前記蒸着物質貯蔵部を取り囲むハウジングと、
前記ハウジングと前記蒸着物質貯蔵部との間に介在される加熱部と、を含み、
前記加熱部の熱は、伝導により前記反射板に伝達される構造を有することを特徴とする蒸発源。 - 前記ハウジングと前記加熱部との間に介在される反射板をさらに含むことを特徴とする請求項1に記載の蒸発源。
- 前記反射板は、耐熱合金よりなることを特徴とする請求項1に記載の蒸発源。
- 前記反射板は、ニッケルを主成分とする耐熱合金よりなることを特徴とする請求項3に記載の蒸発源。
- 前記反射板は、インコネル(inconel)よりなることを特徴とする請求項4に記載の蒸発源。
- 前記ノズル部は、角部より中央部が突出した構造を有することを特徴とする請求項1に記載の蒸発源。
- 前記ノズル部の角部に前記反射板が位置することを特徴とする請求項6に記載の蒸発源。
- 前記ノズル部の突出した中央部は、前記反射板の表面の高さより高いことを特徴とする請求項7に記載の蒸発源。
- 前記ノズル部の突出した中央部は、前記反射板の表面の高さより低いことを特徴とする請求項7に記載の蒸発源。
- 前記ノズル部の突出した中央部と前記反射板の表面は、1mm以下の高さ差を有することを特徴とする請求項9に記載の蒸発源。
- 前記反射板は、前記ノズル部の非開口部に位置し、前記ノズル部より突出した構造を有することを特徴とする請求項1に記載の蒸発源。
- 前記ノズル部の開口部の周辺に位置する前記反射板のエッジ部分は、テーパ角を有することを特徴とする請求項11に記載の蒸発源。
- 前記ノズル部の開口部の周辺に位置する前記反射板の表面のエッジ間隔は、前記ノズル部のノズルの幅より広いことを特徴とする請求項11に記載の蒸発源。
- 前記加熱部と前記反射板は、直接連結されることを特徴とする請求項1に記載の蒸発源。
- 前記加熱部は、熱源及び熱源支持体を含むことを特徴とする請求項1に記載の蒸発源。
- 前記蒸発源は、前記反射板上に位置し、前記反射板を覆うカバーをさらに含むことを特徴とする請求項1に記載の蒸発源。
- 前記カバーは、蒸着方向に突出した突出部を含むことを特徴とする請求項16に記載の蒸発源。
- 前記ハウジングと前記加熱部との間に介在される反射板をさらに含むことを特徴とする請求項16に記載の蒸発源。
- 前記蒸着物質は、有機物であることを特徴とする請求項1に記載の蒸発源。
- 前記蒸着物質は、導電性物質であることを特徴とする請求項1に記載の蒸発源。
- 前記加熱部は、熱源及び熱源支持体を含むことを特徴とする請求項1に記載の蒸発源。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040098270A KR100685431B1 (ko) | 2004-11-26 | 2004-11-26 | 유기물 증착원 |
KR1020050013298A KR100796589B1 (ko) | 2005-02-17 | 2005-02-17 | 증발원 및 그를 포함하는 증착장치 |
KR1020050014713A KR100712117B1 (ko) | 2005-02-22 | 2005-02-22 | 증발원 및 그를 포함하는 증착장치 |
KR1020050018833A KR100623729B1 (ko) | 2005-03-07 | 2005-03-07 | 증발원과 이를 구비한 증발원 어셈블리 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010003358A Division JP5261404B2 (ja) | 2004-11-26 | 2010-01-08 | 蒸発源及びこれを備えた蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006152440A JP2006152440A (ja) | 2006-06-15 |
JP4557170B2 true JP4557170B2 (ja) | 2010-10-06 |
Family
ID=36631068
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005339520A Active JP4557170B2 (ja) | 2004-11-26 | 2005-11-24 | 蒸発源 |
JP2010003358A Active JP5261404B2 (ja) | 2004-11-26 | 2010-01-08 | 蒸発源及びこれを備えた蒸着装置 |
JP2013041011A Active JP5809180B2 (ja) | 2004-11-26 | 2013-03-01 | 蒸発源、蒸発源アセンブリー及び蒸着装置 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010003358A Active JP5261404B2 (ja) | 2004-11-26 | 2010-01-08 | 蒸発源及びこれを備えた蒸着装置 |
JP2013041011A Active JP5809180B2 (ja) | 2004-11-26 | 2013-03-01 | 蒸発源、蒸発源アセンブリー及び蒸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (3) | JP4557170B2 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100729097B1 (ko) * | 2005-12-28 | 2007-06-14 | 삼성에스디아이 주식회사 | 증발원 및 이를 이용한 박막 증착방법 |
WO2008016247A1 (en) * | 2006-08-04 | 2008-02-07 | Soonchunhyang University Industry Academy Cooperation Foundation | Linear deposition sources for deposition processes |
EP2168644B1 (en) * | 2008-09-29 | 2014-11-05 | Applied Materials, Inc. | Evaporator for organic materials and method for evaporating organic materials |
JP5311985B2 (ja) * | 2008-11-26 | 2013-10-09 | キヤノン株式会社 | 蒸着装置および有機発光装置の製造方法 |
KR101094299B1 (ko) | 2009-12-17 | 2011-12-19 | 삼성모바일디스플레이주식회사 | 선형 증발원 및 이를 포함하는 증착 장치 |
KR101182265B1 (ko) * | 2009-12-22 | 2012-09-12 | 삼성디스플레이 주식회사 | 증발원 및 이를 포함하는 증착 장치 |
KR101671489B1 (ko) * | 2010-07-29 | 2016-11-02 | 삼성디스플레이 주식회사 | 유기물 증발원 및 그를 포함하는 증착 장치 |
DK2468917T3 (da) | 2010-12-27 | 2013-10-14 | Riber | Indsprøjtningsindretning til en vakuumfordampningskilde |
JP2012229476A (ja) * | 2011-04-27 | 2012-11-22 | Hitachi High-Technologies Corp | 蒸発源および蒸着装置 |
JP2013209696A (ja) * | 2012-03-30 | 2013-10-10 | Samsung Display Co Ltd | 真空蒸着装置およびその蒸着源 |
KR102222875B1 (ko) * | 2013-12-18 | 2021-03-04 | 주식회사 선익시스템 | 증발원 및 이를 포함하는 증착장치 |
WO2015139777A1 (en) * | 2014-03-21 | 2015-09-24 | Applied Materials, Inc. | Evaporation source for organic material |
WO2015159428A1 (ja) * | 2014-04-18 | 2015-10-22 | 長州産業株式会社 | ラインソース |
JP6291696B2 (ja) * | 2014-07-28 | 2018-03-14 | 株式会社Joled | 蒸着装置および蒸発源 |
CN107002221B (zh) * | 2014-11-07 | 2020-03-03 | 应用材料公司 | 用于真空沉积的材料沉积布置和材料分配布置 |
KR102497653B1 (ko) * | 2016-03-02 | 2023-02-08 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 발광 표시 장치의 제조 방법 |
KR101930457B1 (ko) * | 2016-12-30 | 2019-03-11 | 주식회사 에스에프에이 | 가열유닛, 이를 포함하는 증착원 및 가열유닛 조립방법 |
JP6576009B2 (ja) * | 2017-08-28 | 2019-09-18 | キヤノントッキ株式会社 | 蒸発源容器及び蒸発源装置 |
JP6543664B2 (ja) * | 2017-09-11 | 2019-07-10 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 真空堆積チャンバ |
CN107955936A (zh) * | 2017-12-28 | 2018-04-24 | 深圳市华星光电半导体显示技术有限公司 | 蒸发源和蒸镀设备 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004091926A (ja) * | 2002-09-03 | 2004-03-25 | Samsung Nec Mobile Display Co Ltd | 有機薄膜形成装置の加熱容器 |
JP2005054270A (ja) * | 2003-08-04 | 2005-03-03 | Lg Electron Inc | 有機電界発光層の蒸着源 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10335062A (ja) * | 1997-05-30 | 1998-12-18 | Tdk Corp | 有機el素子の製造装置および製造方法 |
JP3817036B2 (ja) * | 1997-07-29 | 2006-08-30 | 株式会社アルバック | 有機化合物蒸発用容器、有機蒸着源、及び真空蒸着装置 |
KR100490537B1 (ko) * | 2002-07-23 | 2005-05-17 | 삼성에스디아이 주식회사 | 가열용기와 이를 이용한 증착장치 |
JP2004149865A (ja) * | 2002-10-31 | 2004-05-27 | Nippon Seiki Co Ltd | 蒸着材料収納容器 |
JP2004158337A (ja) * | 2002-11-07 | 2004-06-03 | Sony Corp | 蒸着装置 |
JP2004238688A (ja) * | 2003-02-06 | 2004-08-26 | Sony Corp | 有機発光素子の製造装置、および表示装置の製造システム |
JP4090039B2 (ja) * | 2003-04-16 | 2008-05-28 | トッキ株式会社 | 蒸着装置における蒸発源 |
JP4439894B2 (ja) * | 2003-12-01 | 2010-03-24 | 株式会社半導体エネルギー研究所 | 蒸着用るつぼ及び蒸着装置 |
-
2005
- 2005-11-24 JP JP2005339520A patent/JP4557170B2/ja active Active
-
2010
- 2010-01-08 JP JP2010003358A patent/JP5261404B2/ja active Active
-
2013
- 2013-03-01 JP JP2013041011A patent/JP5809180B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004091926A (ja) * | 2002-09-03 | 2004-03-25 | Samsung Nec Mobile Display Co Ltd | 有機薄膜形成装置の加熱容器 |
JP2005054270A (ja) * | 2003-08-04 | 2005-03-03 | Lg Electron Inc | 有機電界発光層の蒸着源 |
Also Published As
Publication number | Publication date |
---|---|
JP2010121214A (ja) | 2010-06-03 |
JP5261404B2 (ja) | 2013-08-14 |
JP5809180B2 (ja) | 2015-11-10 |
JP2006152440A (ja) | 2006-06-15 |
JP2013144850A (ja) | 2013-07-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4557170B2 (ja) | 蒸発源 | |
JP5155941B2 (ja) | 蒸発源アセンブリ及びそれを用いた蒸着装置 | |
JP3924751B2 (ja) | 有機電界発光膜蒸着用蒸着源 | |
JP4440837B2 (ja) | 蒸発源及びこれを採用した蒸着装置 | |
CN1782120B (zh) | 蒸发源和具备蒸发源的蒸镀装置 | |
KR101450339B1 (ko) | 증발원 및 이것을 이용한 진공 증착 장치 | |
KR101015277B1 (ko) | 증발원 | |
JP2011132596A (ja) | 蒸発源及びそれを用いた蒸着装置 | |
JP2005044592A (ja) | 蒸着用マスク、この蒸着用マスクを用いた成膜方法及びこの蒸着用マスクを用いた成膜装置 | |
KR20060084042A (ko) | 증발원, 증착장치 및 이를 이용한 증착방법 | |
JP2022113863A (ja) | 蒸発源及び蒸着装置 | |
KR20060085494A (ko) | 유기물 증발장치 | |
JP2006200040A (ja) | 加熱容器支持台及びそれを備えた蒸着装置 | |
KR101104802B1 (ko) | 하향식 노즐형 진공 증발원 장치 및 이를 이용한 하향식 노즐형 진공 증착 장치 | |
JP3684343B2 (ja) | 薄膜堆積用分子線源セル | |
KR100762698B1 (ko) | 박막 증착장치 | |
KR100712117B1 (ko) | 증발원 및 그를 포함하는 증착장치 | |
KR100796589B1 (ko) | 증발원 및 그를 포함하는 증착장치 | |
KR100666570B1 (ko) | 유기물 증발원 및 유기물 증착장치 | |
KR20040008606A (ko) | 유기 전자 발광층의 증착 장치 | |
KR100623719B1 (ko) | 유기물 증착원 | |
KR100667076B1 (ko) | 유기물 증발원 및 유기물 증착장치 | |
KR102231603B1 (ko) | 박막 증착 장치 | |
CN209508394U (zh) | 蒸发源装置、成膜装置以及电子设备的制造装置 | |
KR100623729B1 (ko) | 증발원과 이를 구비한 증발원 어셈블리 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081104 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20081201 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090204 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090908 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20091208 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20091211 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100108 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100202 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100602 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20100609 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100706 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100713 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4557170 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130730 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130730 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130730 Year of fee payment: 3 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130730 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |