JP4897190B2 - 有機薄膜形成装置の加熱容器 - Google Patents
有機薄膜形成装置の加熱容器 Download PDFInfo
- Publication number
- JP4897190B2 JP4897190B2 JP2003311324A JP2003311324A JP4897190B2 JP 4897190 B2 JP4897190 B2 JP 4897190B2 JP 2003311324 A JP2003311324 A JP 2003311324A JP 2003311324 A JP2003311324 A JP 2003311324A JP 4897190 B2 JP4897190 B2 JP 4897190B2
- Authority
- JP
- Japan
- Prior art keywords
- cover
- thin film
- heater
- heating container
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
42 ノズル
43 カバーヒーター
53 本体ヒーター
45、55 熱電対
46 断熱膜
50 加熱容器
51 容器本体
52 開口部
56 断熱膜
57 有機物質
58 制御部
Claims (14)
- 内部に有機物質を収納できるように形成された本体と、
前記本体と結合されるものであって、絶縁性物質で形成され、かつ前記有機物質が吐出されるノズルを具備したカバーと、
前記カバーの上面に密着形成された薄膜のカバーヒーターと、
前記本体を取り囲むように設置される本体ヒーターと、
を含み、
前記カバーヒーターの上面には断熱膜がさらに形成され、
前記カバーヒーターと前記断熱膜との間には、カバーヒーターからの熱をカバー側に反射する反射膜がさらに形成されたことを特徴とする有機薄膜形成装置の加熱容器。 - 前記カバーヒーターは、両端に各々正極端子及び負極端子が連結された導線パターンを前記カバーの上面全体にわたって均一にパターニングして形成されていることを特徴とする請求項1に記載の有機薄膜形成装置の加熱容器。
- 前記カバーヒーターは、所定のパターンを有するように印刷された白金ヒーターであることを特徴とする請求項2に記載の有機薄膜形成装置の加熱容器。
- 前記カバーには少なくとも一つ以上の熱電対が内蔵されたことを特徴とする請求項1に記載の有機薄膜形成装置の加熱容器。
- 前記カバーを形成する絶縁性物質は、熱放射性に優れた物質であることを特徴とする請求項1に記載の有機薄膜形成装置の加熱容器。
- 前記カバーを形成する絶縁性物質は、アルミナを含むことを特徴とする請求項5に記載の有機薄膜形成装置の加熱容器。
- 前記本体は、絶縁性物質で形成され、前記本体ヒーターは前記本体の外面に密着形成されたことを特徴とする請求項1に記載の有機薄膜形成装置の加熱容器。
- 前記本体ヒーターは、両端に各々正極端子及び負極端子が連結された導線パターンを前記本体の外面全体にわたって均一にパターニングして形成されていることを特徴とする請求項7に記載の有機薄膜形成装置の加熱容器。
- 前記本体ヒーターは、所定のパターンを有するように印刷された白金ヒーターであることを特徴とする請求項8に記載の有機薄膜形成装置の加熱容器。
- 前記本体には少なくとも一つ以上の熱電対が内蔵されたことを特徴とする請求項7に記載の有機薄膜形成装置の加熱容器。
- 前記本体ヒーターの外面には断熱膜がさらに形成されたことを特徴とする請求項7に記載の有機薄膜形成装置の加熱容器。
- 前記本体ヒーターと前記断熱膜との間には反射膜がさらに形成されたことを特徴とする請求項11に記載の有機薄膜形成装置の加熱容器。
- 前記本体を形成する絶縁性物質は、熱放射性に優れた物質であることを特徴とする請求項7に記載の有機薄膜形成装置の加熱容器。
- 前記本体を形成する絶縁性物質は、アルミナを含むことを特徴とする請求項13に記載の有機薄膜形成装置の加熱容器。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020052898A KR100889758B1 (ko) | 2002-09-03 | 2002-09-03 | 유기박막 형성장치의 가열용기 |
KR2002-052898 | 2002-09-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004091926A JP2004091926A (ja) | 2004-03-25 |
JP4897190B2 true JP4897190B2 (ja) | 2012-03-14 |
Family
ID=31973638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003311324A Expired - Fee Related JP4897190B2 (ja) | 2002-09-03 | 2003-09-03 | 有機薄膜形成装置の加熱容器 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7962016B2 (ja) |
JP (1) | JP4897190B2 (ja) |
KR (1) | KR100889758B1 (ja) |
CN (1) | CN100457966C (ja) |
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-
2002
- 2002-09-03 KR KR1020020052898A patent/KR100889758B1/ko active IP Right Grant
-
2003
- 2003-09-02 US US10/652,493 patent/US7962016B2/en not_active Expired - Fee Related
- 2003-09-03 CN CNB031255159A patent/CN100457966C/zh not_active Expired - Fee Related
- 2003-09-03 JP JP2003311324A patent/JP4897190B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2004091926A (ja) | 2004-03-25 |
KR100889758B1 (ko) | 2009-03-20 |
US7962016B2 (en) | 2011-06-14 |
CN100457966C (zh) | 2009-02-04 |
CN1495284A (zh) | 2004-05-12 |
US20040042770A1 (en) | 2004-03-04 |
KR20040021290A (ko) | 2004-03-10 |
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