CN100431097C - 上部电极、等离子体处理装置和等离子体处理方法 - Google Patents
上部电极、等离子体处理装置和等离子体处理方法 Download PDFInfo
- Publication number
- CN100431097C CN100431097C CNB2006100930881A CN200610093088A CN100431097C CN 100431097 C CN100431097 C CN 100431097C CN B2006100930881 A CNB2006100930881 A CN B2006100930881A CN 200610093088 A CN200610093088 A CN 200610093088A CN 100431097 C CN100431097 C CN 100431097C
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- China
- Prior art keywords
- temperature
- heat transfer
- transfer medium
- upper electrode
- gas
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-179699 | 2005-06-20 | ||
JP2005179699A JP4593381B2 (ja) | 2005-06-20 | 2005-06-20 | 上部電極、プラズマ処理装置およびプラズマ処理方法 |
JP2005179699 | 2005-06-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1885488A CN1885488A (zh) | 2006-12-27 |
CN100431097C true CN100431097C (zh) | 2008-11-05 |
Family
ID=37583582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100930881A Active CN100431097C (zh) | 2005-06-20 | 2006-06-20 | 上部电极、等离子体处理装置和等离子体处理方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4593381B2 (ja) |
KR (1) | KR100802667B1 (ja) |
CN (1) | CN100431097C (ja) |
TW (1) | TWI433232B (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4826483B2 (ja) * | 2007-01-19 | 2011-11-30 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US8375890B2 (en) | 2007-03-19 | 2013-02-19 | Micron Technology, Inc. | Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafers |
KR100959727B1 (ko) * | 2007-11-13 | 2010-05-26 | 주식회사 동부하이텍 | 웨이퍼 냉각 장치 |
KR101381208B1 (ko) * | 2007-11-20 | 2014-04-04 | 주성엔지니어링(주) | 박막처리장치 |
KR101083590B1 (ko) * | 2008-09-11 | 2011-11-16 | 엘아이지에이디피 주식회사 | 플라즈마 처리장치 |
DE112010000818T8 (de) * | 2009-01-09 | 2012-08-09 | Ulvac, Inc. | Plasmaverarbeitungsvorrichtung |
JP5221421B2 (ja) | 2009-03-10 | 2013-06-26 | 東京エレクトロン株式会社 | シャワーヘッド及びプラズマ処理装置 |
US8591755B2 (en) | 2010-09-15 | 2013-11-26 | Lam Research Corporation | Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same |
US8791392B2 (en) * | 2010-10-22 | 2014-07-29 | Lam Research Corporation | Methods of fault detection for multiplexed heater array |
JP2013131485A (ja) * | 2011-11-22 | 2013-07-04 | Kobe Steel Ltd | プラズマ発生源の冷却機構及び冷却方法 |
TWI512306B (zh) * | 2013-04-25 | 2015-12-11 | Murata Manufacturing Co | Test equipment for electronic parts |
CN103305812A (zh) * | 2013-06-08 | 2013-09-18 | 上海和辉光电有限公司 | 一种上电极装置 |
JP6255267B2 (ja) * | 2014-02-06 | 2017-12-27 | 株式会社日立国際電気 | 基板処理装置、加熱装置、天井断熱体及び半導体装置の製造方法 |
CN105632968A (zh) * | 2014-10-30 | 2016-06-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 工艺腔室和半导体加工设备 |
JP2016174056A (ja) * | 2015-03-16 | 2016-09-29 | 株式会社東芝 | 半導体製造装置および半導体装置の製造方法 |
CN105097408B (zh) * | 2015-07-21 | 2017-09-26 | 深圳市华星光电技术有限公司 | 一种干法刻蚀机台及其使用方法 |
US10373794B2 (en) | 2015-10-29 | 2019-08-06 | Lam Research Corporation | Systems and methods for filtering radio frequencies from a signal of a thermocouple and controlling a temperature of an electrode in a plasma chamber |
JP7055061B2 (ja) * | 2018-05-01 | 2022-04-15 | 東京エレクトロン株式会社 | 温調機構及び液処理装置 |
CN109273339B (zh) * | 2018-09-18 | 2021-03-19 | 惠科股份有限公司 | 一种反应室、干法刻蚀设备及刻蚀方法 |
JP2020067212A (ja) * | 2018-10-23 | 2020-04-30 | パナソニックIpマネジメント株式会社 | 加熱装置および加熱装置を備えた冷蔵庫 |
JP7278172B2 (ja) * | 2018-10-23 | 2023-05-19 | 東京エレクトロン株式会社 | 基板処理装置 |
KR20200097021A (ko) | 2019-02-07 | 2020-08-18 | (주)포인트엔지니어링 | 온도 조절 장치 |
JP2023530706A (ja) * | 2020-06-18 | 2023-07-19 | クリック アンド ソッファ インダストリーズ、インク. | ダイアタッチシステム、フリップチップボンディングシステム、クリップアタッチシステムなどの装置のためのオーブンおよびその関連方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4534816A (en) * | 1984-06-22 | 1985-08-13 | International Business Machines Corporation | Single wafer plasma etch reactor |
JP2000306889A (ja) * | 1999-04-21 | 2000-11-02 | Hitachi Ltd | ドライエッチング装置 |
JP2001127046A (ja) * | 1999-10-29 | 2001-05-11 | Tokyo Electron Yamanashi Ltd | プラズマ処理装置 |
CN1551302A (zh) * | 2003-05-13 | 2004-12-01 | ���������ƴ���ʽ���� | 上部电极和等离子体处理装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3113796B2 (ja) * | 1995-07-10 | 2000-12-04 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP3726477B2 (ja) * | 1998-03-16 | 2005-12-14 | 株式会社日立製作所 | プラズマ処理装置及びプラズマ処理方法 |
JP2001267310A (ja) * | 2000-03-17 | 2001-09-28 | Tokyo Electron Ltd | プラズマ成膜方法及びその装置 |
JP2002129331A (ja) * | 2000-10-24 | 2002-05-09 | Sony Corp | 成膜装置および処理装置 |
-
2005
- 2005-06-20 JP JP2005179699A patent/JP4593381B2/ja not_active Expired - Fee Related
-
2006
- 2006-06-19 TW TW095121941A patent/TWI433232B/zh not_active IP Right Cessation
- 2006-06-19 KR KR1020060055096A patent/KR100802667B1/ko active IP Right Grant
- 2006-06-20 CN CNB2006100930881A patent/CN100431097C/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4534816A (en) * | 1984-06-22 | 1985-08-13 | International Business Machines Corporation | Single wafer plasma etch reactor |
JP2000306889A (ja) * | 1999-04-21 | 2000-11-02 | Hitachi Ltd | ドライエッチング装置 |
JP2001127046A (ja) * | 1999-10-29 | 2001-05-11 | Tokyo Electron Yamanashi Ltd | プラズマ処理装置 |
CN1551302A (zh) * | 2003-05-13 | 2004-12-01 | ���������ƴ���ʽ���� | 上部电极和等离子体处理装置 |
Also Published As
Publication number | Publication date |
---|---|
CN1885488A (zh) | 2006-12-27 |
KR100802667B1 (ko) | 2008-02-12 |
JP2006352040A (ja) | 2006-12-28 |
TWI433232B (zh) | 2014-04-01 |
TW200741854A (en) | 2007-11-01 |
KR20060133485A (ko) | 2006-12-26 |
JP4593381B2 (ja) | 2010-12-08 |
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