DE112010000818T8 - Plasmaverarbeitungsvorrichtung - Google Patents

Plasmaverarbeitungsvorrichtung Download PDF

Info

Publication number
DE112010000818T8
DE112010000818T8 DE112010000818T DE112010000818T DE112010000818T8 DE 112010000818 T8 DE112010000818 T8 DE 112010000818T8 DE 112010000818 T DE112010000818 T DE 112010000818T DE 112010000818 T DE112010000818 T DE 112010000818T DE 112010000818 T8 DE112010000818 T8 DE 112010000818T8
Authority
DE
Germany
Prior art keywords
processing apparatus
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE112010000818T
Other languages
English (en)
Other versions
DE112010000818T5 (de
Inventor
Sadatsugu Wakamatsu
Koji KAMESAKI
Masashi Kikuchi
Yosuke Jimbo
Kenji Eto
Shin Asari
Hiroto Uchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of DE112010000818T5 publication Critical patent/DE112010000818T5/de
Application granted granted Critical
Publication of DE112010000818T8 publication Critical patent/DE112010000818T8/de
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE112010000818T 2009-01-09 2010-01-05 Plasmaverarbeitungsvorrichtung Ceased DE112010000818T8 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-004027 2009-01-09
JP2009004027 2009-01-09
PCT/JP2010/000028 WO2010079740A1 (ja) 2009-01-09 2010-01-05 プラズマ処理装置

Publications (2)

Publication Number Publication Date
DE112010000818T5 DE112010000818T5 (de) 2012-05-31
DE112010000818T8 true DE112010000818T8 (de) 2012-08-09

Family

ID=42316506

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112010000818T Ceased DE112010000818T8 (de) 2009-01-09 2010-01-05 Plasmaverarbeitungsvorrichtung

Country Status (6)

Country Link
JP (1) JPWO2010079740A1 (de)
KR (1) KR101303968B1 (de)
CN (1) CN102272893A (de)
DE (1) DE112010000818T8 (de)
TW (1) TW201034526A (de)
WO (1) WO2010079740A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6863199B2 (ja) * 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置
WO2019142812A1 (ja) * 2018-01-19 2019-07-25 株式会社アルバック ヒータベース及び処理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1079350A (ja) * 1996-09-04 1998-03-24 Kokusai Electric Co Ltd プラズマ処理装置
JP3598717B2 (ja) * 1997-03-19 2004-12-08 株式会社日立製作所 プラズマ処理装置
JP2002270598A (ja) * 2001-03-13 2002-09-20 Tokyo Electron Ltd プラズマ処理装置
JP4593381B2 (ja) * 2005-06-20 2010-12-08 東京エレクトロン株式会社 上部電極、プラズマ処理装置およびプラズマ処理方法
JP5022077B2 (ja) 2007-03-27 2012-09-12 株式会社アルバック 成膜装置
JP4712004B2 (ja) 2007-06-21 2011-06-29 パナソニック株式会社 微小径光作製装置

Also Published As

Publication number Publication date
TW201034526A (en) 2010-09-16
KR20110089457A (ko) 2011-08-08
KR101303968B1 (ko) 2013-09-05
JPWO2010079740A1 (ja) 2012-06-21
DE112010000818T5 (de) 2012-05-31
WO2010079740A1 (ja) 2010-07-15
CN102272893A (zh) 2011-12-07

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Legal Events

Date Code Title Description
R012 Request for examination validly filed
R016 Response to examination communication
R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final