CN100363390C - 通过阴离子或者控制自由基聚合制备羟基-乙烯基-芳族聚合物或者共聚物的方法 - Google Patents

通过阴离子或者控制自由基聚合制备羟基-乙烯基-芳族聚合物或者共聚物的方法 Download PDF

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Publication number
CN100363390C
CN100363390C CNB2003801031878A CN200380103187A CN100363390C CN 100363390 C CN100363390 C CN 100363390C CN B2003801031878 A CNB2003801031878 A CN B2003801031878A CN 200380103187 A CN200380103187 A CN 200380103187A CN 100363390 C CN100363390 C CN 100363390C
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CN
China
Prior art keywords
alkyl
group
phenyl
hydrogen
general formula
Prior art date
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Expired - Fee Related
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CNB2003801031878A
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English (en)
Chinese (zh)
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CN1711290A (zh
Inventor
K·库尼莫托
P·内斯瓦巴
A·克拉默
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BASF Schweiz AG
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Ciba Spezialitaetenchemie Holding AG
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Publication date
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Publication of CN1711290A publication Critical patent/CN1711290A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/22—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Emergency Medicine (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
CNB2003801031878A 2002-11-14 2003-11-05 通过阴离子或者控制自由基聚合制备羟基-乙烯基-芳族聚合物或者共聚物的方法 Expired - Fee Related CN100363390C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405980.0 2002-11-14
EP02405980 2002-11-14

Publications (2)

Publication Number Publication Date
CN1711290A CN1711290A (zh) 2005-12-21
CN100363390C true CN100363390C (zh) 2008-01-23

Family

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Family Applications (1)

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CNB2003801031878A Expired - Fee Related CN100363390C (zh) 2002-11-14 2003-11-05 通过阴离子或者控制自由基聚合制备羟基-乙烯基-芳族聚合物或者共聚物的方法

Country Status (10)

Country Link
US (1) US7385009B2 (enExample)
EP (1) EP1572758B1 (enExample)
JP (1) JP4563814B2 (enExample)
KR (1) KR101043904B1 (enExample)
CN (1) CN100363390C (enExample)
AT (1) ATE367406T1 (enExample)
AU (1) AU2003301974A1 (enExample)
DE (1) DE60315070T2 (enExample)
TW (1) TW200415151A (enExample)
WO (1) WO2004044017A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5359752B2 (ja) * 2009-09-30 2013-12-04 日本ゼオン株式会社 重合トナーの製造方法
JP5205485B2 (ja) * 2011-02-21 2013-06-05 富士フイルム株式会社 レジスト膜、該レジスト膜を用いたレジスト塗布マスクブランクス及びレジストパターン形成方法、並びに、化学増幅型レジスト組成物
JP5453358B2 (ja) * 2011-07-26 2014-03-26 富士フイルム株式会社 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
JP5982277B2 (ja) 2012-12-21 2016-08-31 群栄化学工業株式会社 硬化性樹脂の製造方法
SG11201808773TA (en) * 2016-04-05 2018-11-29 Albemarle Corp Process and hydrocarbon soluble saline hydride catalyst for hydrogen mediated saline hydride iniated anionic chain transfer polymerization and polymer distribution compositions produced therefrom
DE102016221346A1 (de) 2016-10-28 2018-05-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung eines Polymerisates durch Nitroxyl-kontrollierte Polymerisation sowie Polymerisat
JP7334683B2 (ja) * 2019-08-02 2023-08-29 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
US20230046628A1 (en) * 2019-11-22 2023-02-16 Stichting Voor De Technische Wetenschappen Macromolecular compositions for binding small molecules

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0488748A1 (en) * 1990-11-28 1992-06-03 Shin-Etsu Chemical Co., Ltd. Resist compositions
US6107425A (en) * 1998-02-06 2000-08-22 Shipley Company, L.L.C. Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0665325A (ja) * 1992-08-19 1994-03-08 Shin Etsu Chem Co Ltd 単分散性共重合体の製造方法
JPH11255820A (ja) * 1998-03-12 1999-09-21 Mitsui Chem Inc 狭分散性のポリ（ｐ−ヒドロキシスチレン）の製造方法
JP4126760B2 (ja) * 1998-07-09 2008-07-30 住友化学株式会社 狭分散性重合体の製造方法、狭分散性重合体及びそれのレジストへの適用
JP4198351B2 (ja) * 2000-12-07 2008-12-17 信越化学工業株式会社 高分子化合物の製造方法及び該高分子化合物を用いたレジスト材料
JP2005502744A (ja) * 2001-09-10 2005-01-27 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド アニオンまたは制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマーまたはコポリマーの製造方法
US7256332B2 (en) * 2006-01-31 2007-08-14 Pioneer Hi-Bred International, Inc. Hybrid maize plant and seed 39A94

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0488748A1 (en) * 1990-11-28 1992-06-03 Shin-Etsu Chemical Co., Ltd. Resist compositions
US6107425A (en) * 1998-02-06 2000-08-22 Shipley Company, L.L.C. Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists

Also Published As

Publication number Publication date
DE60315070T2 (de) 2008-03-20
TW200415151A (en) 2004-08-16
ATE367406T1 (de) 2007-08-15
US20060041080A1 (en) 2006-02-23
CN1711290A (zh) 2005-12-21
KR101043904B1 (ko) 2011-06-29
JP2006506480A (ja) 2006-02-23
EP1572758A1 (en) 2005-09-14
EP1572758B1 (en) 2007-07-18
WO2004044017A1 (en) 2004-05-27
AU2003301974A1 (en) 2004-06-03
US7385009B2 (en) 2008-06-10
DE60315070D1 (de) 2007-08-30
JP4563814B2 (ja) 2010-10-13
KR20050086569A (ko) 2005-08-30

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