AU2003301974A1 - Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization - Google Patents
Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerizationInfo
- Publication number
- AU2003301974A1 AU2003301974A1 AU2003301974A AU2003301974A AU2003301974A1 AU 2003301974 A1 AU2003301974 A1 AU 2003301974A1 AU 2003301974 A AU2003301974 A AU 2003301974A AU 2003301974 A AU2003301974 A AU 2003301974A AU 2003301974 A1 AU2003301974 A1 AU 2003301974A1
- Authority
- AU
- Australia
- Prior art keywords
- hydroxy
- anionic
- copolymers
- vinyl
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229920001577 copolymer Polymers 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 title abstract 3
- 125000000129 anionic group Chemical group 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 238000010526 radical polymerization reaction Methods 0.000 title abstract 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 abstract 2
- 239000003153 chemical reaction reagent Substances 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 125000006239 protecting group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Emergency Medicine (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerization Catalysts (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02405980.0 | 2002-11-14 | ||
| EP02405980 | 2002-11-14 | ||
| PCT/EP2003/050793 WO2004044017A1 (en) | 2002-11-14 | 2003-11-05 | Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2003301974A1 true AU2003301974A1 (en) | 2004-06-03 |
Family
ID=32309518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2003301974A Abandoned AU2003301974A1 (en) | 2002-11-14 | 2003-11-05 | Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7385009B2 (enExample) |
| EP (1) | EP1572758B1 (enExample) |
| JP (1) | JP4563814B2 (enExample) |
| KR (1) | KR101043904B1 (enExample) |
| CN (1) | CN100363390C (enExample) |
| AT (1) | ATE367406T1 (enExample) |
| AU (1) | AU2003301974A1 (enExample) |
| DE (1) | DE60315070T2 (enExample) |
| TW (1) | TW200415151A (enExample) |
| WO (1) | WO2004044017A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5359752B2 (ja) * | 2009-09-30 | 2013-12-04 | 日本ゼオン株式会社 | 重合トナーの製造方法 |
| JP5205485B2 (ja) * | 2011-02-21 | 2013-06-05 | 富士フイルム株式会社 | レジスト膜、該レジスト膜を用いたレジスト塗布マスクブランクス及びレジストパターン形成方法、並びに、化学増幅型レジスト組成物 |
| JP5453358B2 (ja) * | 2011-07-26 | 2014-03-26 | 富士フイルム株式会社 | 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| JP5982277B2 (ja) | 2012-12-21 | 2016-08-31 | 群栄化学工業株式会社 | 硬化性樹脂の製造方法 |
| SG11201808773TA (en) * | 2016-04-05 | 2018-11-29 | Albemarle Corp | Process and hydrocarbon soluble saline hydride catalyst for hydrogen mediated saline hydride iniated anionic chain transfer polymerization and polymer distribution compositions produced therefrom |
| DE102016221346A1 (de) | 2016-10-28 | 2018-05-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines Polymerisates durch Nitroxyl-kontrollierte Polymerisation sowie Polymerisat |
| JP7334683B2 (ja) * | 2019-08-02 | 2023-08-29 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| US20230046628A1 (en) * | 2019-11-22 | 2023-02-16 | Stichting Voor De Technische Wetenschappen | Macromolecular compositions for binding small molecules |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3031421B2 (ja) * | 1990-11-28 | 2000-04-10 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材 |
| JPH0665325A (ja) * | 1992-08-19 | 1994-03-08 | Shin Etsu Chem Co Ltd | 単分散性共重合体の製造方法 |
| US6107425A (en) * | 1998-02-06 | 2000-08-22 | Shipley Company, L.L.C. | Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists |
| JPH11255820A (ja) * | 1998-03-12 | 1999-09-21 | Mitsui Chem Inc | 狭分散性のポリ（ｐ−ヒドロキシスチレン）の製造方法 |
| JP4126760B2 (ja) * | 1998-07-09 | 2008-07-30 | 住友化学株式会社 | 狭分散性重合体の製造方法、狭分散性重合体及びそれのレジストへの適用 |
| JP4198351B2 (ja) * | 2000-12-07 | 2008-12-17 | 信越化学工業株式会社 | 高分子化合物の製造方法及び該高分子化合物を用いたレジスト材料 |
| JP2005502744A (ja) * | 2001-09-10 | 2005-01-27 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | アニオンまたは制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマーまたはコポリマーの製造方法 |
| US7256332B2 (en) * | 2006-01-31 | 2007-08-14 | Pioneer Hi-Bred International, Inc. | Hybrid maize plant and seed 39A94 |
-
2003
- 2003-11-05 JP JP2004551039A patent/JP4563814B2/ja not_active Expired - Fee Related
- 2003-11-05 DE DE60315070T patent/DE60315070T2/de not_active Expired - Lifetime
- 2003-11-05 WO PCT/EP2003/050793 patent/WO2004044017A1/en not_active Ceased
- 2003-11-05 KR KR1020057008491A patent/KR101043904B1/ko not_active Expired - Fee Related
- 2003-11-05 EP EP03810997A patent/EP1572758B1/en not_active Expired - Lifetime
- 2003-11-05 CN CNB2003801031878A patent/CN100363390C/zh not_active Expired - Fee Related
- 2003-11-05 US US10/533,574 patent/US7385009B2/en not_active Expired - Fee Related
- 2003-11-05 AT AT03810997T patent/ATE367406T1/de not_active IP Right Cessation
- 2003-11-05 AU AU2003301974A patent/AU2003301974A1/en not_active Abandoned
- 2003-11-13 TW TW092131827A patent/TW200415151A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE60315070T2 (de) | 2008-03-20 |
| TW200415151A (en) | 2004-08-16 |
| ATE367406T1 (de) | 2007-08-15 |
| US20060041080A1 (en) | 2006-02-23 |
| CN1711290A (zh) | 2005-12-21 |
| KR101043904B1 (ko) | 2011-06-29 |
| JP2006506480A (ja) | 2006-02-23 |
| EP1572758A1 (en) | 2005-09-14 |
| EP1572758B1 (en) | 2007-07-18 |
| CN100363390C (zh) | 2008-01-23 |
| WO2004044017A1 (en) | 2004-05-27 |
| US7385009B2 (en) | 2008-06-10 |
| DE60315070D1 (de) | 2007-08-30 |
| JP4563814B2 (ja) | 2010-10-13 |
| KR20050086569A (ko) | 2005-08-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |