DE60315070D1 - Verfahren zur herstellung von hydroxy-vinyl aromatische polymere oder copolymere durch anionische oder kontrollierte radikal polymerisation - Google Patents

Verfahren zur herstellung von hydroxy-vinyl aromatische polymere oder copolymere durch anionische oder kontrollierte radikal polymerisation

Info

Publication number
DE60315070D1
DE60315070D1 DE60315070T DE60315070T DE60315070D1 DE 60315070 D1 DE60315070 D1 DE 60315070D1 DE 60315070 T DE60315070 T DE 60315070T DE 60315070 T DE60315070 T DE 60315070T DE 60315070 D1 DE60315070 D1 DE 60315070D1
Authority
DE
Germany
Prior art keywords
anionic
copolymers
radical polymerization
controlled radical
aromatic polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60315070T
Other languages
English (en)
Other versions
DE60315070T2 (de
Inventor
Kazuhiko Kunimoto
Peter Nesvadba
Andreas Kramer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of DE60315070D1 publication Critical patent/DE60315070D1/de
Publication of DE60315070T2 publication Critical patent/DE60315070T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/22—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Emergency Medicine (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
DE60315070T 2002-11-14 2003-11-05 Verfahren zur herstellung von hydroxy-vinyl aromatischen polymeren oder copolymeren durch anionische oder kontrollierte radikalpolymerisation Expired - Lifetime DE60315070T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP02405980 2002-11-14
EP02405980 2002-11-14
PCT/EP2003/050793 WO2004044017A1 (en) 2002-11-14 2003-11-05 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization

Publications (2)

Publication Number Publication Date
DE60315070D1 true DE60315070D1 (de) 2007-08-30
DE60315070T2 DE60315070T2 (de) 2008-03-20

Family

ID=32309518

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60315070T Expired - Lifetime DE60315070T2 (de) 2002-11-14 2003-11-05 Verfahren zur herstellung von hydroxy-vinyl aromatischen polymeren oder copolymeren durch anionische oder kontrollierte radikalpolymerisation

Country Status (10)

Country Link
US (1) US7385009B2 (de)
EP (1) EP1572758B1 (de)
JP (1) JP4563814B2 (de)
KR (1) KR101043904B1 (de)
CN (1) CN100363390C (de)
AT (1) ATE367406T1 (de)
AU (1) AU2003301974A1 (de)
DE (1) DE60315070T2 (de)
TW (1) TW200415151A (de)
WO (1) WO2004044017A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5359752B2 (ja) * 2009-09-30 2013-12-04 日本ゼオン株式会社 重合トナーの製造方法
JP5205485B2 (ja) 2011-02-21 2013-06-05 富士フイルム株式会社 レジスト膜、該レジスト膜を用いたレジスト塗布マスクブランクス及びレジストパターン形成方法、並びに、化学増幅型レジスト組成物
JP5453358B2 (ja) * 2011-07-26 2014-03-26 富士フイルム株式会社 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
JP5982277B2 (ja) 2012-12-21 2016-08-31 群栄化学工業株式会社 硬化性樹脂の製造方法
CA3020160A1 (en) * 2016-04-05 2017-10-12 Albemarle Corporation Hydrogen mediated, saline hydride initiated, anionic chain transfer polymerization catalysts, processes, and polymers produced therefrom
DE102016221346A1 (de) 2016-10-28 2018-05-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung eines Polymerisates durch Nitroxyl-kontrollierte Polymerisation sowie Polymerisat
JP7334683B2 (ja) * 2019-08-02 2023-08-29 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
CA3158277A1 (en) * 2019-11-22 2021-05-27 Robert Smakman Macromolecular compositions for binding small molecules

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3031421B2 (ja) * 1990-11-28 2000-04-10 信越化学工業株式会社 化学増幅ポジ型レジスト材
JPH0665325A (ja) * 1992-08-19 1994-03-08 Shin Etsu Chem Co Ltd 単分散性共重合体の製造方法
US6107425A (en) * 1998-02-06 2000-08-22 Shipley Company, L.L.C. Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists
JPH11255820A (ja) * 1998-03-12 1999-09-21 Mitsui Chem Inc 狭分散性のポリ（ｐ−ヒドロキシスチレン）の製造方法
JP4126760B2 (ja) * 1998-07-09 2008-07-30 住友化学株式会社 狭分散性重合体の製造方法、狭分散性重合体及びそれのレジストへの適用
JP4198351B2 (ja) * 2000-12-07 2008-12-17 信越化学工業株式会社 高分子化合物の製造方法及び該高分子化合物を用いたレジスト材料
JP2005502744A (ja) * 2001-09-10 2005-01-27 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド アニオンまたは制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマーまたはコポリマーの製造方法
US7256332B2 (en) * 2006-01-31 2007-08-14 Pioneer Hi-Bred International, Inc. Hybrid maize plant and seed 39A94

Also Published As

Publication number Publication date
US7385009B2 (en) 2008-06-10
TW200415151A (en) 2004-08-16
CN1711290A (zh) 2005-12-21
WO2004044017A1 (en) 2004-05-27
EP1572758A1 (de) 2005-09-14
KR101043904B1 (ko) 2011-06-29
ATE367406T1 (de) 2007-08-15
JP2006506480A (ja) 2006-02-23
AU2003301974A1 (en) 2004-06-03
CN100363390C (zh) 2008-01-23
JP4563814B2 (ja) 2010-10-13
EP1572758B1 (de) 2007-07-18
DE60315070T2 (de) 2008-03-20
US20060041080A1 (en) 2006-02-23
KR20050086569A (ko) 2005-08-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC