CN100360575C - 光敏树脂组合物和形成水凝胶的方法 - Google Patents

光敏树脂组合物和形成水凝胶的方法 Download PDF

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Publication number
CN100360575C
CN100360575C CNB2003801032758A CN200380103275A CN100360575C CN 100360575 C CN100360575 C CN 100360575C CN B2003801032758 A CNB2003801032758 A CN B2003801032758A CN 200380103275 A CN200380103275 A CN 200380103275A CN 100360575 C CN100360575 C CN 100360575C
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CN
China
Prior art keywords
photosensitive resin
resin composition
water
meth
acrylic acid
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Expired - Fee Related
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CNB2003801032758A
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English (en)
Chinese (zh)
Other versions
CN1711295A (zh
Inventor
宇都宫伸
山田圣悟
高野和浩
宫崎光晴
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Toyo Gosei Co Ltd
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Toyo Gosei Co Ltd
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Publication of CN1711295A publication Critical patent/CN1711295A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/02—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of acids, salts or anhydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Medicinal Preparation (AREA)
CNB2003801032758A 2002-11-14 2003-11-13 光敏树脂组合物和形成水凝胶的方法 Expired - Fee Related CN100360575C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP331269/2002 2002-11-14
JP2002331269A JP4093557B2 (ja) 2002-11-14 2002-11-14 感光性樹脂組成物および含水ゲルの形成方法並びに含水ゲル

Publications (2)

Publication Number Publication Date
CN1711295A CN1711295A (zh) 2005-12-21
CN100360575C true CN100360575C (zh) 2008-01-09

Family

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Family Applications (1)

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CNB2003801032758A Expired - Fee Related CN100360575C (zh) 2002-11-14 2003-11-13 光敏树脂组合物和形成水凝胶的方法

Country Status (7)

Country Link
US (1) US7408002B2 (enExample)
EP (1) EP1564232B1 (enExample)
JP (1) JP4093557B2 (enExample)
KR (1) KR100787989B1 (enExample)
CN (1) CN100360575C (enExample)
DE (1) DE60323121D1 (enExample)
WO (1) WO2004044024A1 (enExample)

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JP4278083B2 (ja) * 2002-12-10 2009-06-10 東洋合成工業株式会社 新規なポリ酢酸ビニル鹸化物系感光性樹脂、感光性樹脂組成物及びそれを用いた含水ゲルの形成方法並びに化合物
EP1852476B1 (en) * 2005-01-27 2012-08-15 Konica Minolta Holdings, Inc. Inkjet ink, inkjet ink set and method of inkjet recording
DE602006003453D1 (de) * 2005-03-14 2008-12-18 Konica Minolta Holdings Inc Tinte, Tintensatz und Aufnahmemethode für den Tintenstrahldruck
US20070064050A1 (en) * 2005-09-21 2007-03-22 Konica Minolta Holdings, Inc. Ink-jet ink, ink-jet ink set and ink-jet recording method
US20070109375A1 (en) * 2005-11-16 2007-05-17 Konica Minolta Holdings, Inc. Ink-jet ink, ink-jet ink set and ink-jet recording method
US20070115325A1 (en) * 2005-11-21 2007-05-24 Konica Minolta Holdings, Inc. Ink-jet ink and ink-jet recording method
EP2042304B1 (en) 2006-07-14 2013-01-02 Konica Minolta Holdings, Inc. Plate making method and planographic printing plate
JP2008221468A (ja) 2007-03-08 2008-09-25 Konica Minolta Holdings Inc インクジェット記録方法
JP5098397B2 (ja) 2007-03-29 2012-12-12 コニカミノルタホールディングス株式会社 インクジェットインク、及びインクジェット記録方法
JP5014873B2 (ja) * 2007-05-11 2012-08-29 群栄化学工業株式会社 高分子樹脂、及びそれを用いた感放射線性樹脂組成物
JP5181576B2 (ja) * 2007-08-17 2013-04-10 ソニー株式会社 燃料電池の製造方法、燃料電池および電子機器
EP2075293B1 (en) 2007-12-28 2014-03-12 Konica Minolta Holdings, Inc. Ink-jet ink and ink-jet recording method
WO2009119622A1 (ja) * 2008-03-25 2009-10-01 綜研化学株式会社 感光性樹脂およびこれを利用した感光性樹脂組成物
ES2335958B2 (es) * 2008-08-06 2010-11-02 Universidad De Santiago De Compostela Hidrogeles acrilicos con ciclodextrinas colgantes, su preparacion y su aplicacion como sistemas de liberacion y componentes de lentes de contacto.
JP5561986B2 (ja) * 2009-09-30 2014-07-30 積水化成品工業株式会社 光硬化性樹脂組成物及び粘着性高分子ゲル
EP3275919B1 (en) * 2015-03-24 2022-07-20 FUJIFILM Corporation Water dispersion of gel particles, producing method thereof, and image forming method
EP3130453A1 (en) * 2015-08-13 2017-02-15 Sika Technology AG Tire filling based on acrylic hydrogels

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CN1107278A (zh) * 1993-06-18 1995-08-23 旭化成工业株式会社 用于波纹板印版的光敏树脂组合物
JPH11327139A (ja) * 1998-05-18 1999-11-26 Nippon Kayaku Co Ltd 樹脂組成物及びその硬化物
JP2001058972A (ja) * 1999-08-19 2001-03-06 Nippon Kasei Chem Co Ltd （メタ）アクリレート誘導体およびその製造方法
CN1308094A (zh) * 2000-01-17 2001-08-15 东洋合成工业株式会社 聚合物配混料及其制备方法,光敏组合物及制备图案的方法

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US3872047A (en) 1972-12-04 1975-03-18 Hana Jandourek Composition and method for improving adherence of polymeric materials to substrates
JPS5879006A (ja) 1981-11-05 1983-05-12 Toagosei Chem Ind Co Ltd 含水ゲルの製造法
JPH0823545B2 (ja) 1986-09-18 1996-03-06 株式会社エー・アンド・デイ 簡易酵素電極
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JP2748516B2 (ja) 1989-03-14 1998-05-06 エヌオーケー株式会社 グルコースセンサ
JP2538056B2 (ja) 1989-05-23 1996-09-25 信越化学工業株式会社 アクリル系樹脂組成物
US5723261A (en) 1989-11-30 1998-03-03 Tamura Kaken Co., Ltd. Photopolymerizable composition
JPH04337087A (ja) 1991-05-14 1992-11-25 Toagosei Chem Ind Co Ltd 微細有孔板の製造方法
JPH05320612A (ja) 1992-05-22 1993-12-03 Hisamitsu Pharmaceut Co Inc 粘着組成物
US5399604A (en) * 1992-07-24 1995-03-21 Japan Synthetic Rubber Co., Ltd. Epoxy group-containing resin compositions
JP2718007B2 (ja) * 1995-06-06 1998-02-25 太陽インキ製造株式会社 アルカリ現像可能な一液型フォトソルダーレジスト組成物及びそれを用いたプリント配線板の製造方法
JP3620155B2 (ja) 1996-06-14 2005-02-16 上野化学工業株式会社 水溶性感光性組成物
JP3254572B2 (ja) 1996-06-28 2002-02-12 バンティコ株式会社 光重合性熱硬化性樹脂組成物
GB2366538B (en) * 2000-09-09 2002-10-30 Alan Roger Harper Production of composite mouldings
JP4536914B2 (ja) 2000-12-19 2010-09-01 コダック株式会社 光重合性組成物及び光重合性平版印刷版
JP2002214354A (ja) * 2001-01-23 2002-07-31 Nippon Kayaku Co Ltd 放射線線量計用樹脂組成物及びその硬化物

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CN1107278A (zh) * 1993-06-18 1995-08-23 旭化成工业株式会社 用于波纹板印版的光敏树脂组合物
JPH11327139A (ja) * 1998-05-18 1999-11-26 Nippon Kayaku Co Ltd 樹脂組成物及びその硬化物
JP2001058972A (ja) * 1999-08-19 2001-03-06 Nippon Kasei Chem Co Ltd （メタ）アクリレート誘導体およびその製造方法
CN1308094A (zh) * 2000-01-17 2001-08-15 东洋合成工业株式会社 聚合物配混料及其制备方法,光敏组合物及制备图案的方法

Also Published As

Publication number Publication date
US20060041052A1 (en) 2006-02-23
EP1564232B1 (en) 2008-08-20
US7408002B2 (en) 2008-08-05
CN1711295A (zh) 2005-12-21
EP1564232A4 (en) 2007-03-14
EP1564232A1 (en) 2005-08-17
JP4093557B2 (ja) 2008-06-04
WO2004044024A1 (ja) 2004-05-27
DE60323121D1 (de) 2008-10-02
KR20050074599A (ko) 2005-07-18
KR100787989B1 (ko) 2007-12-24
JP2004161942A (ja) 2004-06-10

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Granted publication date: 20080109

Termination date: 20101113