DE60323121D1 - Lichtempfindliche harzzusammensetzung und verfahren zur bildung von hydrogel - Google Patents

Lichtempfindliche harzzusammensetzung und verfahren zur bildung von hydrogel

Info

Publication number
DE60323121D1
DE60323121D1 DE60323121T DE60323121T DE60323121D1 DE 60323121 D1 DE60323121 D1 DE 60323121D1 DE 60323121 T DE60323121 T DE 60323121T DE 60323121 T DE60323121 T DE 60323121T DE 60323121 D1 DE60323121 D1 DE 60323121D1
Authority
DE
Germany
Prior art keywords
light
resin composition
sensitive resin
forming hydrogel
hydrogel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60323121T
Other languages
English (en)
Inventor
Shin Utsunomiya
Seigo Yamada
Masahiro Takano
Mitsuharu Miyazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Gosei Co Ltd
Original Assignee
Toyo Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Gosei Co Ltd filed Critical Toyo Gosei Co Ltd
Application granted granted Critical
Publication of DE60323121D1 publication Critical patent/DE60323121D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/02—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of acids, salts or anhydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Medicinal Preparation (AREA)
DE60323121T 2002-11-14 2003-11-13 Lichtempfindliche harzzusammensetzung und verfahren zur bildung von hydrogel Expired - Lifetime DE60323121D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002331269A JP4093557B2 (ja) 2002-11-14 2002-11-14 感光性樹脂組成物および含水ゲルの形成方法並びに含水ゲル
PCT/JP2003/014466 WO2004044024A1 (ja) 2002-11-14 2003-11-13 感光性樹脂組成物および含水ゲルの形成方法

Publications (1)

Publication Number Publication Date
DE60323121D1 true DE60323121D1 (de) 2008-10-02

Family

ID=32310620

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60323121T Expired - Lifetime DE60323121D1 (de) 2002-11-14 2003-11-13 Lichtempfindliche harzzusammensetzung und verfahren zur bildung von hydrogel

Country Status (7)

Country Link
US (1) US7408002B2 (de)
EP (1) EP1564232B1 (de)
JP (1) JP4093557B2 (de)
KR (1) KR100787989B1 (de)
CN (1) CN100360575C (de)
DE (1) DE60323121D1 (de)
WO (1) WO2004044024A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4278083B2 (ja) * 2002-12-10 2009-06-10 東洋合成工業株式会社 新規なポリ酢酸ビニル鹸化物系感光性樹脂、感光性樹脂組成物及びそれを用いた含水ゲルの形成方法並びに化合物
CN101107333B (zh) * 2005-01-27 2010-07-07 柯尼卡美能达控股株式会社 喷墨用油墨、喷墨用油墨组和喷墨记录方法
EP1702961B1 (de) * 2005-03-14 2008-11-05 Konica Minolta Holdings, Inc. Tinte, Tintensatz und Aufnahmemethode für den Tintenstrahldruck
US20070064050A1 (en) * 2005-09-21 2007-03-22 Konica Minolta Holdings, Inc. Ink-jet ink, ink-jet ink set and ink-jet recording method
US20070109375A1 (en) * 2005-11-16 2007-05-17 Konica Minolta Holdings, Inc. Ink-jet ink, ink-jet ink set and ink-jet recording method
US20070115325A1 (en) * 2005-11-21 2007-05-24 Konica Minolta Holdings, Inc. Ink-jet ink and ink-jet recording method
WO2008007550A1 (fr) 2006-07-14 2008-01-17 Konica Minolta Holdings, Inc. Procédé de fabrication de plaque d'impression lithographique
JP2008221468A (ja) 2007-03-08 2008-09-25 Konica Minolta Holdings Inc インクジェット記録方法
JP5098397B2 (ja) 2007-03-29 2012-12-12 コニカミノルタホールディングス株式会社 インクジェットインク、及びインクジェット記録方法
JP5014873B2 (ja) * 2007-05-11 2012-08-29 群栄化学工業株式会社 高分子樹脂、及びそれを用いた感放射線性樹脂組成物
JP5181576B2 (ja) * 2007-08-17 2013-04-10 ソニー株式会社 燃料電池の製造方法、燃料電池および電子機器
EP2075293B1 (de) 2007-12-28 2014-03-12 Konica Minolta Holdings, Inc. Tintenstrahltinte und Tintenstrahlaufzeichnungsverfahren
CN101965375B (zh) * 2008-03-25 2014-05-28 综研化学株式会社 感光性树脂以及利用其的感光性树脂组合物
ES2335958B2 (es) 2008-08-06 2010-11-02 Universidad De Santiago De Compostela Hidrogeles acrilicos con ciclodextrinas colgantes, su preparacion y su aplicacion como sistemas de liberacion y componentes de lentes de contacto.
JP5561986B2 (ja) * 2009-09-30 2014-07-30 積水化成品工業株式会社 光硬化性樹脂組成物及び粘着性高分子ゲル
WO2016151904A1 (ja) * 2015-03-24 2016-09-29 富士フイルム株式会社 ゲル粒子の水分散物及びその製造方法、並びに画像形成方法
EP3130453A1 (de) * 2015-08-13 2017-02-15 Sika Technology AG Reifenfüllen auf basis von acrylhydrogelen

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3872047A (en) 1972-12-04 1975-03-18 Hana Jandourek Composition and method for improving adherence of polymeric materials to substrates
JPS5879006A (ja) 1981-11-05 1983-05-12 Toagosei Chem Ind Co Ltd 含水ゲルの製造法
JPH0823545B2 (ja) 1986-09-18 1996-03-06 株式会社エー・アンド・デイ 簡易酵素電極
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JP2748516B2 (ja) 1989-03-14 1998-05-06 エヌオーケー株式会社 グルコースセンサ
JP2538056B2 (ja) 1989-05-23 1996-09-25 信越化学工業株式会社 アクリル系樹脂組成物
US5723261A (en) 1989-11-30 1998-03-03 Tamura Kaken Co., Ltd. Photopolymerizable composition
JPH04337087A (ja) 1991-05-14 1992-11-25 Toagosei Chem Ind Co Ltd 微細有孔板の製造方法
JPH05320612A (ja) 1992-05-22 1993-12-03 Hisamitsu Pharmaceut Co Inc 粘着組成物
US5399604A (en) * 1992-07-24 1995-03-21 Japan Synthetic Rubber Co., Ltd. Epoxy group-containing resin compositions
US5716757A (en) * 1993-06-18 1998-02-10 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition used for a corrugated board printing plate
JP2718007B2 (ja) * 1995-06-06 1998-02-25 太陽インキ製造株式会社 アルカリ現像可能な一液型フォトソルダーレジスト組成物及びそれを用いたプリント配線板の製造方法
JP3620155B2 (ja) * 1996-06-14 2005-02-16 上野化学工業株式会社 水溶性感光性組成物
JP3254572B2 (ja) * 1996-06-28 2002-02-12 バンティコ株式会社 光重合性熱硬化性樹脂組成物
JPH11327139A (ja) * 1998-05-18 1999-11-26 Nippon Kayaku Co Ltd 樹脂組成物及びその硬化物
JP4572431B2 (ja) 1999-08-19 2010-11-04 日本化成株式会社 （メタ）アクリレート誘導体およびその製造方法
JP2001270919A (ja) * 2000-01-17 2001-10-02 Toyo Gosei Kogyo Kk 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法
GB2366538B (en) * 2000-09-09 2002-10-30 Alan Roger Harper Production of composite mouldings
JP4536914B2 (ja) 2000-12-19 2010-09-01 コダック株式会社 光重合性組成物及び光重合性平版印刷版
JP2002214354A (ja) * 2001-01-23 2002-07-31 Nippon Kayaku Co Ltd 放射線線量計用樹脂組成物及びその硬化物

Also Published As

Publication number Publication date
JP4093557B2 (ja) 2008-06-04
EP1564232A1 (de) 2005-08-17
JP2004161942A (ja) 2004-06-10
KR20050074599A (ko) 2005-07-18
CN100360575C (zh) 2008-01-09
EP1564232A4 (de) 2007-03-14
US20060041052A1 (en) 2006-02-23
US7408002B2 (en) 2008-08-05
EP1564232B1 (de) 2008-08-20
WO2004044024A1 (ja) 2004-05-27
KR100787989B1 (ko) 2007-12-24
CN1711295A (zh) 2005-12-21

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