CH627790A5 - Electron beam evaporator and container for holding evaporable material - Google Patents
Electron beam evaporator and container for holding evaporable material Download PDFInfo
- Publication number
- CH627790A5 CH627790A5 CH743777A CH743777A CH627790A5 CH 627790 A5 CH627790 A5 CH 627790A5 CH 743777 A CH743777 A CH 743777A CH 743777 A CH743777 A CH 743777A CH 627790 A5 CH627790 A5 CH 627790A5
- Authority
- CH
- Switzerland
- Prior art keywords
- electron beam
- container
- impact plate
- impact
- evaporation
- Prior art date
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 48
- 239000000463 material Substances 0.000 title claims description 30
- 238000001704 evaporation Methods 0.000 claims description 30
- 230000008020 evaporation Effects 0.000 claims description 30
- 239000000126 substance Substances 0.000 claims description 13
- 230000001133 acceleration Effects 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 239000011819 refractory material Substances 0.000 claims 1
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000010410 dusting Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 210000001364 upper extremity Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762628765 DE2628765C3 (de) | 1976-06-26 | 1976-06-26 | Vorrichtung zum Aufdampfen insbesondere sublimierbarer Stoffe im Vakuum mittels einer Elektronenstrahlquelle |
Publications (1)
Publication Number | Publication Date |
---|---|
CH627790A5 true CH627790A5 (en) | 1982-01-29 |
Family
ID=5981519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH743777A CH627790A5 (en) | 1976-06-26 | 1977-06-17 | Electron beam evaporator and container for holding evaporable material |
Country Status (6)
Country | Link |
---|---|
CH (1) | CH627790A5 (fr) |
DE (1) | DE2628765C3 (fr) |
FR (1) | FR2356268A1 (fr) |
GB (1) | GB1540944A (fr) |
IT (1) | IT1079238B (fr) |
SE (1) | SE434651B (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0111611B1 (fr) | 1982-10-28 | 1987-05-13 | International Business Machines Corporation | Perfectionnements aux procédés et équipements de dépôt par évaporation sous vide mettant en oeuvre un canon à électrons |
US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
DE19539986A1 (de) * | 1995-10-27 | 1997-04-30 | Leybold Ag | Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material |
CN116004994A (zh) * | 2022-12-26 | 2023-04-25 | 核工业理化工程研究院 | 用于电子束蒸发熔炼的蒸发器装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2745773A (en) * | 1953-03-25 | 1956-05-15 | Rca Corp | Apparatus and method for forming juxtaposed as well as superimposed coatings |
CH452313A (de) * | 1965-12-18 | 1968-05-31 | Balzers Patent Beteilig Ag | Vorrichtung zur Verdampfung von Stoffen im Vakuum |
GB1111955A (en) * | 1966-05-10 | 1968-05-01 | Mullard Ltd | Improvements in or relating to devices for evaporating powdered material |
-
1976
- 1976-06-26 DE DE19762628765 patent/DE2628765C3/de not_active Expired
-
1977
- 1977-05-31 IT IT2421177A patent/IT1079238B/it active
- 1977-06-17 CH CH743777A patent/CH627790A5/de not_active IP Right Cessation
- 1977-06-22 SE SE7707216A patent/SE434651B/xx not_active IP Right Cessation
- 1977-06-23 FR FR7719313A patent/FR2356268A1/fr active Granted
- 1977-06-23 GB GB2639277A patent/GB1540944A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2628765C3 (de) | 1979-01-11 |
GB1540944A (en) | 1979-02-21 |
FR2356268A1 (fr) | 1978-01-20 |
DE2628765A1 (de) | 1977-12-29 |
DE2628765B2 (de) | 1978-04-20 |
FR2356268B1 (fr) | 1982-04-16 |
SE434651B (sv) | 1984-08-06 |
IT1079238B (it) | 1985-05-08 |
SE7707216L (sv) | 1977-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PFA | Name/firm changed |
Owner name: LEYBOLD AKTIENGESELLSCHAFT |
|
PL | Patent ceased | ||
PL | Patent ceased |