CA2461338C - Low viscosity precursor compositions and methods for the deposition of conductive electronic features - Google Patents

Low viscosity precursor compositions and methods for the deposition of conductive electronic features Download PDF

Info

Publication number
CA2461338C
CA2461338C CA2461338A CA2461338A CA2461338C CA 2461338 C CA2461338 C CA 2461338C CA 2461338 A CA2461338 A CA 2461338A CA 2461338 A CA2461338 A CA 2461338A CA 2461338 C CA2461338 C CA 2461338C
Authority
CA
Canada
Prior art keywords
recited
precursor composition
metal
substrate
resistivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA2461338A
Other languages
English (en)
French (fr)
Other versions
CA2461338A1 (en
Inventor
Toivo T. Kodas
Mark J. Hampden-Smith
Paolina Atanassova
Klaus Kunze
Karel Vanheusden
Hugh Denham
Aaron Stump
Allen Schult
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of CA2461338A1 publication Critical patent/CA2461338A1/en
Application granted granted Critical
Publication of CA2461338C publication Critical patent/CA2461338C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/30Making metallic powder or suspensions thereof using chemical processes with decomposition of metal compounds, e.g. by pyrolysis
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/06Coating on selected surface areas, e.g. using masks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/097Inks comprising nanoparticles and specially adapted for being sintered at low temperature
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09009Substrate related
    • H05K2201/09036Recesses or grooves in insulating substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0104Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013Inkjet printing, e.g. for printing insulating material or resist
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1142Conversion of conductive material into insulating material or into dissolvable compound
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/121Metallo-organic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/107Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1258Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by using a substrate provided with a shape pattern, e.g. grooves, banks, resist pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • H05K3/4061Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in inorganic insulating substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • H05K3/4069Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Conductive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Chemically Coating (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CA2461338A 2001-10-05 2002-10-04 Low viscosity precursor compositions and methods for the deposition of conductive electronic features Expired - Fee Related CA2461338C (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US32762101P 2001-10-05 2001-10-05
US32762001P 2001-10-05 2001-10-05
US60/327,621 2001-10-05
US60/327,620 2001-10-05
PCT/US2002/031884 WO2003032084A2 (en) 2001-10-05 2002-10-04 Low viscosity precursor compositions and methods for the deposition of conductive electronic features

Publications (2)

Publication Number Publication Date
CA2461338A1 CA2461338A1 (en) 2003-04-17
CA2461338C true CA2461338C (en) 2011-12-20

Family

ID=26985968

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2461338A Expired - Fee Related CA2461338C (en) 2001-10-05 2002-10-04 Low viscosity precursor compositions and methods for the deposition of conductive electronic features

Country Status (6)

Country Link
EP (1) EP1448725A4 (ja)
JP (1) JP2005537386A (ja)
KR (1) KR100893564B1 (ja)
AU (1) AU2002337822A1 (ja)
CA (1) CA2461338C (ja)
WO (1) WO2003032084A2 (ja)

Families Citing this family (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL161622A0 (en) * 2001-11-01 2004-09-27 Yissum Res Dev Co Ink jet inks containing metal nanoparticles
US7005378B2 (en) * 2002-08-26 2006-02-28 Nanoink, Inc. Processes for fabricating conductive patterns using nanolithography as a patterning tool
KR100545288B1 (ko) * 2003-03-28 2006-01-25 주식회사 잉크테크 유기은 조성물 및 그 제조방법, 그로부터 제조되는 잉크및 그 잉크를 이용한 도전배선 형성 방법
DE10326547A1 (de) * 2003-06-12 2005-01-05 Siemens Ag Tandemsolarzelle mit einer gemeinsamen organischen Elektrode
JP2005097345A (ja) * 2003-09-22 2005-04-14 Konica Minolta Medical & Graphic Inc インクジェットインクおよびこれを用い作製した非接触通信機能を有するic基体
US7618704B2 (en) 2003-09-29 2009-11-17 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
KR100568419B1 (ko) * 2003-12-15 2006-04-05 매그나칩 반도체 유한회사 반도체 소자의 인덕터 제조 방법
JP4711415B2 (ja) * 2004-01-29 2011-06-29 Jx日鉱日石金属株式会社 無電解めっき前処理剤、それを用いる無電解めっき方法、及び無電解めっき物
JP4848617B2 (ja) * 2004-02-02 2011-12-28 セイコーエプソン株式会社 回路基板の製造方法、回路基板、薄膜トランジスタ、電気光学装置、電子機器
US20070289479A1 (en) * 2004-05-28 2007-12-20 Sakata Inx Corp. Nickel Compound-Containing Solution, Method of Producing the Same, and Method of Forming Nickel Metal Thin Film Using the Same
US20060024447A1 (en) * 2004-08-02 2006-02-02 Mccomas Edward Electroless plating with nanometer particles
WO2006083326A2 (en) 2004-08-07 2006-08-10 Cabot Corporation Gas dispersion manufacture of nanoparticulates and nanoparticulate-containing products and processing thereof
US20060083694A1 (en) 2004-08-07 2006-04-20 Cabot Corporation Multi-component particles comprising inorganic nanoparticles distributed in an organic matrix and processes for making and using same
US8143326B2 (en) 2004-09-28 2012-03-27 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
CA2588343C (en) * 2004-11-24 2011-11-08 Nanotechnologies, Inc. Electrical, plating and catalytic uses of metal nanomaterial compositions
US20060130700A1 (en) * 2004-12-16 2006-06-22 Reinartz Nicole M Silver-containing inkjet ink
US8167393B2 (en) 2005-01-14 2012-05-01 Cabot Corporation Printable electronic features on non-uniform substrate and processes for making same
US8334464B2 (en) 2005-01-14 2012-12-18 Cabot Corporation Optimized multi-layer printing of electronics and displays
TW200642785A (en) 2005-01-14 2006-12-16 Cabot Corp Metal nanoparticle compositions
US7824466B2 (en) 2005-01-14 2010-11-02 Cabot Corporation Production of metal nanoparticles
TWI285568B (en) * 2005-02-02 2007-08-21 Dowa Mining Co Powder of silver particles and process
JP4284283B2 (ja) * 2005-02-02 2009-06-24 Dowaエレクトロニクス株式会社 銀の粒子粉末の製造法
JP4710342B2 (ja) * 2005-02-08 2011-06-29 東洋インキScホールディングス株式会社 フレキソ印刷用活性エネルギー線硬化型導電性インキおよびそれを用いた印刷物、非接触型メディア
US7704483B2 (en) 2005-04-29 2010-04-27 Cabot Corporation High surface area tetragonal zirconia and processes for synthesizing same
CN101194041B (zh) 2005-06-17 2010-12-15 住友金属矿山株式会社 镍膜形成用涂布液与镍膜及其制造方法
EP1899993B1 (en) * 2005-06-27 2012-06-27 E.I. Du Pont De Nemours And Company Electrically conductive polymer compositions
US7732330B2 (en) 2005-06-30 2010-06-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method using an ink-jet method of the same
JP2007043113A (ja) * 2005-06-30 2007-02-15 Semiconductor Energy Lab Co Ltd 半導体装置、半導体装置の作製方法
EP1905756B1 (en) * 2005-07-04 2013-02-27 Osaka University Silver beta-ketocarboxylate derivatives for forming silver metal
KR100729719B1 (ko) 2005-09-02 2007-06-18 연세대학교 산학협력단 잉크젯 프린팅용 전도성 잉크 조성물 및 이를 이용한 금속패턴 형성방법
WO2007076424A1 (en) * 2005-12-27 2007-07-05 Bp Corporation North America Inc. Process for forming electrical contacts on a semiconductor wafer using a phase changing ink
JP4899504B2 (ja) * 2006-02-02 2012-03-21 株式会社日立製作所 有機薄膜トランジスタの製造方法および製造装置
EP2591912A1 (en) * 2006-02-20 2013-05-15 Daicel Chemical Industries, Ltd. Multilayer assembly and composite material comprising same
JP4811066B2 (ja) * 2006-03-17 2011-11-09 株式会社村田製作所 回路形成用荷電性粉末およびその製造方法ならびに回路パターンを有するガラス基板の製造方法
AT9473U1 (de) * 2006-05-04 2007-10-15 Austria Tech & System Tech Verfahren zur herstellung wenigstens eines leitfähigen elements einer leiterplatte sowie leiterplatte und verwendung eines derartigen verfahrens
JP5127155B2 (ja) 2006-05-12 2013-01-23 株式会社日立製作所 配線および有機トランジスタとその製法
DE102006028536A1 (de) 2006-06-21 2007-12-27 Axel Ahnert Verfahren zur Herstellung eines Schaltungsteils auf einem Substrat
JP4235921B2 (ja) * 2006-09-21 2009-03-11 株式会社フューチャービジョン 液晶表示パネルの製造方法および液晶表示パネル
JP5219296B2 (ja) * 2006-09-22 2013-06-26 フライズ・メタルズ・インコーポレイテッド 金属およびインクのための溶剤系
JP5179092B2 (ja) * 2006-10-03 2013-04-10 新光電気工業株式会社 銅膜の形成方法
DE102007037079A1 (de) * 2006-10-25 2008-04-30 Bayer Materialscience Ag Silberhaltige wässrige Formulierung und ihre Verwendung zur Herstellung von elektrisch leitenden oder spiegelnden Beschichtungen
WO2008111484A1 (ja) 2007-03-15 2008-09-18 Dic Corporation 凸版反転印刷用導電性インキ
US8125067B2 (en) 2007-03-20 2012-02-28 Kabushiki Kaisha Nihon Micronics Method for forming terminal of stacked package element and method for forming stacked package
US7936058B2 (en) * 2007-05-14 2011-05-03 Kabushiki Kaisha Nihon Micronics Stacked package and method for forming stacked package
EP2156715B1 (en) 2007-06-01 2012-05-02 BAE Systems PLC Direct write and additive manufacturing proces and apparatus
US8143431B2 (en) 2007-06-05 2012-03-27 Air Products And Chemicals, Inc. Low temperature thermal conductive inks
US20090023235A1 (en) * 2007-07-19 2009-01-22 Mackenzie John D Method and Apparatus for Improved Printed Cathodes for Light-Emitting Devices
JP2009167522A (ja) * 2007-12-21 2009-07-30 Shinko Electric Ind Co Ltd 銅膜の形成方法
US8048488B2 (en) * 2008-01-14 2011-11-01 Xerox Corporation Methods for removing a stabilizer from a metal nanoparticle using a destabilizer
JP5108628B2 (ja) * 2008-05-23 2012-12-26 克廣 前川 高密着性金属ナノ粒子焼結体膜の形成方法
KR100978671B1 (ko) * 2008-08-05 2010-08-30 삼성전기주식회사 금속입자 분산액
EP2159270A1 (de) * 2008-08-28 2010-03-03 Bayer MaterialScience AG Verfahren zur Herstellung von elektrisch leitfähigen Strukturen
KR101096031B1 (ko) 2009-03-31 2011-12-19 한양대학교 산학협력단 자기조립단분자막 형성방법과 이를 이용한 반도체 소자의 구리배선 및 그의 형성방법
DE102009053943A1 (de) * 2009-11-19 2011-05-26 Evonik Degussa Gmbh Verfahren zur Erzeugung silberhaltiger Strukturen, die silberhaltigen Strukturen aufweisende Erzeugnisse und ihre Verwendung
JP5468885B2 (ja) * 2009-12-01 2014-04-09 ハリマ化成株式会社 導電性アルミニウムペースト
KR20110064153A (ko) 2009-12-07 2011-06-15 삼성전자주식회사 금속 유기 전구체, 이의 제조방법, 및 이를 이용한 전도성 금속막 또는 패턴 형성방법
JP2011122177A (ja) * 2009-12-08 2011-06-23 Tosoh Corp 複合体微粒子、その製造方法、並びにそれを用いた導電膜形成用組成物、及び導電膜の形成方法
US9080067B2 (en) * 2010-03-01 2015-07-14 Sun Chemical Corporation Surface tension of inks for high speeding printing
US8697770B2 (en) 2010-04-13 2014-04-15 Johnson & Johnson Vision Care, Inc. Pupil-only photochromic contact lenses displaying desirable optics and comfort
US8877103B2 (en) 2010-04-13 2014-11-04 Johnson & Johnson Vision Care, Inc. Process for manufacture of a thermochromic contact lens material
JP5866749B2 (ja) * 2010-05-19 2016-02-17 東ソー株式会社 導電性インク組成物、電気的導通部位の製造方法、及びその用途
WO2012010893A1 (en) * 2010-07-21 2012-01-26 Bae Systems Plc Forming direct write functional or structural elements on a surface
EP2410077A1 (en) * 2010-07-21 2012-01-25 BAE Systems PLC Forming direct write functional or structural elements on a surface
JP2012126814A (ja) * 2010-12-15 2012-07-05 Tosoh Corp 導電性インク組成物、及び電気的導通部位の製造方法
JP2012126815A (ja) * 2010-12-15 2012-07-05 Tosoh Corp 導電性インク組成物及びその製造方法
JP2012131894A (ja) * 2010-12-21 2012-07-12 Tosoh Corp 導電性インク組成物、及びそれを用いて製造された電気的導通部位
DE102011000562A1 (de) * 2011-02-08 2012-08-09 Solarworld Innovations Gmbh Verfahren zur Erzeugung von lötbaren Kontaktstrukturen auf einer Substratoberfläche
TWI567205B (zh) * 2011-05-04 2017-01-21 黎可德X印製金屬公司 自分子油墨形成金屬合金之方法及組合物
JP5876996B2 (ja) * 2011-06-24 2016-03-02 ハリマ化成株式会社 傾斜構造の形成方法及び分散液
FR2977178B1 (fr) * 2011-06-30 2014-05-16 Thales Sa Procede de fabrication d'un dispositif comprenant des brasures realisees a partir d'oxalate metallique
KR102020914B1 (ko) * 2011-09-06 2019-09-11 헨켈 아이피 앤드 홀딩 게엠베하 전도성 물질 및 방법
DE102012206587A1 (de) * 2012-04-20 2013-11-07 Technische Universität Berlin Lotmaterial, Verfahren zu dessen Herstellung und seine Verwendung zum drucklosen Fügen metallischer Substrate
US9034075B2 (en) 2012-04-30 2015-05-19 Dow Global Technologies Llc Methods of manufacturing high aspect ratio silver nanowires
WO2014046306A1 (ja) 2012-09-21 2014-03-27 住友化学株式会社 導電性膜形成用の組成物
EP2733759A1 (en) * 2012-11-15 2014-05-21 Heraeus Precious Metals GmbH & Co. KG Multi-layer composite with metal-organic layer
US8828503B1 (en) * 2013-02-28 2014-09-09 Eastman Kodak Company Making multi-layer micro-wire structure
CN106574135B (zh) 2014-06-19 2021-04-06 加拿大国家研究委员会 分子油墨
JP6920631B2 (ja) * 2014-08-29 2021-08-18 株式会社Flosfia 金属膜形成方法
JP6945120B2 (ja) * 2014-08-29 2021-10-06 株式会社Flosfia 金属膜形成方法
DE102015013220A1 (de) 2014-10-28 2016-04-28 Dow Global Technologies Llc Verfahren zur Herstellung von Silber-Nanodrähten
DE102015013239A1 (de) 2014-10-28 2016-04-28 Dow Global Technologies Llc Hydrothermalverfahren zur Herstellung von Silber-Nanodrähten
DE102015013219A1 (de) 2014-10-28 2016-04-28 Dow Global Technologies Llc Verfahren zur Herstellung von Silber-Nanodrähten
DE102015013238A1 (de) 2014-10-28 2016-04-28 Dow Global Technologies Llc Verfahren mit niedriger Sauerstoffkonzentration zur Herstellung von Silber-Nanodrähten
JP6483462B2 (ja) * 2015-02-13 2019-03-13 株式会社ミマキエンジニアリング 印刷方法及び印刷装置
JP5983805B2 (ja) * 2015-03-06 2016-09-06 東ソー株式会社 導電性インク組成物、電気的導通部位の製造方法、及びその用途
EP3085811A1 (en) * 2015-04-20 2016-10-26 Heraeus Deutschland GmbH & Co. KG Low temperature ag-compositions
US10376898B2 (en) 2015-06-12 2019-08-13 Dow Global Technologies Llc Method for manufacturing high aspect ratio silver nanowires
US10081020B2 (en) 2015-06-12 2018-09-25 Dow Global Technologies Llc Hydrothermal method for manufacturing filtered silver nanowires
WO2017065395A1 (ko) * 2015-10-13 2017-04-20 (주)썬텍엔지니어링 실시간 다항목 중금속 분석 장치, 실시간 다항목 중금속 분석 방법 및 상기 중금속 분석 장치의 센서 제조방법
FR3045675A1 (fr) * 2015-12-17 2017-06-23 Univ Toulouse Iii - Paul Sabatier Procede de fabrication d'une piece ou d'une microstructure supportee par insolation laser a partir d'un oxalate de metal
JP7242557B2 (ja) * 2017-02-08 2023-03-20 ナショナル リサーチ カウンシル オブ カナダ 低粘度及び低処理温度を有する銀分子インク
TW201842087A (zh) 2017-02-08 2018-12-01 加拿大國家研究委員會 具改良之熱穩定性的分子油墨
TW201842088A (zh) * 2017-02-08 2018-12-01 加拿大國家研究委員會 可印刷分子油墨
CN110832040A (zh) 2017-05-15 2020-02-21 巴斯夫欧洲公司 制备金属纳米颗粒层的方法及其在装饰或安全元件中的用途
US11643561B2 (en) 2017-07-28 2023-05-09 Basf Se Process for the preparation of metallic nano-particle layers and their use for decorative or security elements
EP3749124A4 (en) * 2018-02-13 2021-04-28 Liquid X Printed Metals, Inc. ELECTRONIC TEXTILES MANUFACTURED USING CONDUCTIVE PARTICLE-FREE INKS
US11284510B2 (en) * 2018-04-17 2022-03-22 Board Of Trustees Of Michigan State University Controlled wetting and spreading of metals on substrates using porous interlayers and related articles
US11724471B2 (en) 2019-03-28 2023-08-15 Johnson & Johnson Vision Care, Inc. Methods for the manufacture of photoabsorbing contact lenses and photoabsorbing contact lenses produced thereby
KR102129886B1 (ko) * 2019-03-29 2020-08-05 주식회사 픽스앤맥스 목재 pcb 기판 제작 방법 및 이를 이용하여 제작된 목재 pcb 기판
WO2020236934A1 (en) * 2019-05-20 2020-11-26 Liquid X Printed Metals, Inc. Particle-free adhesive gold inks
IT201900022953A1 (it) * 2019-12-04 2021-06-04 Cleanby S R L “uso di una miscela pulente per la detersione di ugelli di stampanti digitali ceramiche”
US20220143699A1 (en) * 2020-11-09 2022-05-12 General Electric Company Dip-coat binder solutions comprising a dip-coat metallic precursor for use in additive manufacturing
US20220145102A1 (en) * 2020-11-09 2022-05-12 General Electric Company Dip-coat binder solutions comprising metal dip-coat powder for use in additive manufacturing
WO2022119584A1 (en) * 2020-12-01 2022-06-09 Hewlett-Packard Development Company, L.P. Conductive traces
WO2022130892A1 (ja) * 2020-12-15 2022-06-23 国立研究開発法人物質・材料研究機構 銅ニッケル合金電極用導電性インク、銅ニッケル合金電極付基板、および、それらの製造方法
CN114975378B (zh) * 2022-04-29 2024-02-06 西安电子科技大学 基于3d打印的柔性射频封装模块及制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB566718A (en) * 1943-09-07 1945-01-10 Johnson Matthey Co Ltd Improvements in or relating to the silvering of non-metallic surfaces
JPS5332015A (en) * 1976-09-07 1978-03-25 Fuji Photo Film Co Ltd Thermodevelopable photosensitive material
JPS60195077A (ja) * 1984-03-16 1985-10-03 奥野製薬工業株式会社 セラミツクスの無電解めつき用触媒組成物
JPS63278983A (ja) * 1987-05-09 1988-11-16 Toyota Autom Loom Works Ltd 金属有機物インク
EP0322764B1 (en) * 1987-12-24 1993-03-17 Mitsubishi Gas Chemical Company, Inc. Method for producing copper film-formed articles
EP0508399A2 (en) * 1991-04-08 1992-10-14 Mitsubishi Gas Chemical Company, Inc. Method of producing thin film-deposited substrate
DE69506333T2 (de) * 1994-07-11 1999-07-15 Agfa Gevaert Nv Tintenstrahldruckverfahren
US6197366B1 (en) * 1997-05-06 2001-03-06 Takamatsu Research Laboratory Metal paste and production process of metal film
US5980998A (en) * 1997-09-16 1999-11-09 Sri International Deposition of substances on a surface
US6753108B1 (en) * 1998-02-24 2004-06-22 Superior Micropowders, Llc Energy devices and methods for the fabrication of energy devices
JP2000011875A (ja) * 1998-06-19 2000-01-14 Dainippon Toryo Co Ltd プラズマディスプレイの製造方法
US6143356A (en) * 1999-08-06 2000-11-07 Parelec, Inc. Diffusion barrier and adhesive for PARMOD™ application to rigid printed wiring boards
EP1441864B1 (en) * 2000-01-21 2009-11-18 Midwest Research Institute Method for forming thin-film conductors through the decomposition of metal-chelates in association with metal particles

Also Published As

Publication number Publication date
EP1448725A2 (en) 2004-08-25
WO2003032084A2 (en) 2003-04-17
JP2005537386A (ja) 2005-12-08
KR20050033513A (ko) 2005-04-12
CA2461338A1 (en) 2003-04-17
WO2003032084A3 (en) 2003-08-21
EP1448725A4 (en) 2008-07-23
AU2002337822A1 (en) 2003-04-22
KR100893564B1 (ko) 2009-04-17

Similar Documents

Publication Publication Date Title
CA2461338C (en) Low viscosity precursor compositions and methods for the deposition of conductive electronic features
US7691664B2 (en) Low viscosity precursor compositions and methods for the deposition of conductive electronic features
US7629017B2 (en) Methods for the deposition of conductive electronic features
US6951666B2 (en) Precursor compositions for the deposition of electrically conductive features
US7524528B2 (en) Precursor compositions and methods for the deposition of passive electrical components on a substrate

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed

Effective date: 20161004