CA2396018A1 - Discharge vessel with excimer fill, and associated discharge lamp - Google Patents
Discharge vessel with excimer fill, and associated discharge lamp Download PDFInfo
- Publication number
- CA2396018A1 CA2396018A1 CA002396018A CA2396018A CA2396018A1 CA 2396018 A1 CA2396018 A1 CA 2396018A1 CA 002396018 A CA002396018 A CA 002396018A CA 2396018 A CA2396018 A CA 2396018A CA 2396018 A1 CA2396018 A1 CA 2396018A1
- Authority
- CA
- Canada
- Prior art keywords
- discharge vessel
- layer
- discharge
- excimer
- fill
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000002161 passivation Methods 0.000 claims abstract description 15
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 8
- 150000002367 halogens Chemical class 0.000 claims abstract description 8
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 5
- 229910052756 noble gas Inorganic materials 0.000 claims abstract description 5
- 229910052706 scandium Inorganic materials 0.000 claims abstract description 5
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 5
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 3
- 150000002739 metals Chemical class 0.000 claims abstract description 3
- 238000000576 coating method Methods 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 13
- 239000011737 fluorine Substances 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 8
- 238000005253 cladding Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000003980 solgel method Methods 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 108010025899 gelatin film Proteins 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000002243 precursor Substances 0.000 claims description 3
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 61
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 12
- 230000005855 radiation Effects 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- -1 aluminum alkoxide Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- RPSSQXXJRBEGEE-UHFFFAOYSA-N xenon tetrafluoride Chemical compound F[Xe](F)(F)F RPSSQXXJRBEGEE-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/82—Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
- H01J61/827—Metal halide arc lamps
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
- H01J61/125—Selection of substances for gas fillings; Specified operating pressure or temperature having an halogenide as principal component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10137015A DE10137015A1 (de) | 2001-07-30 | 2001-07-30 | Entladungsgefäß mit Excimerfüllung und zugehörige Entladungslampe |
| DE10137015.6 | 2001-07-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2396018A1 true CA2396018A1 (en) | 2003-01-30 |
Family
ID=7693545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002396018A Abandoned CA2396018A1 (en) | 2001-07-30 | 2002-07-29 | Discharge vessel with excimer fill, and associated discharge lamp |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6734629B2 (enExample) |
| EP (1) | EP1282153A3 (enExample) |
| JP (1) | JP4340047B2 (enExample) |
| KR (1) | KR100942846B1 (enExample) |
| CA (1) | CA2396018A1 (enExample) |
| DE (1) | DE10137015A1 (enExample) |
| TW (1) | TWI275120B (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7268355B2 (en) | 2002-12-27 | 2007-09-11 | Franek Olstowski | Excimer UV fluorescence detection |
| DE10350114B4 (de) * | 2003-10-28 | 2006-01-12 | Tuilaser Ag | Optisches Element sowie Excimerlaser mit optischem Element |
| WO2006017644A2 (en) * | 2004-08-03 | 2006-02-16 | Franek Olstowski | Improved closed-loop light intensity control and related fluorescence application method |
| KR100706184B1 (ko) * | 2005-12-26 | 2007-04-12 | 주식회사 디엠에스 | 형광램프 및 이의 제조방법 |
| DE102006028749A1 (de) * | 2006-06-20 | 2007-12-27 | Universität Bielefeld | Verfahren zur Herstellung einer transparenten Aluminiumoxid-Schutzschicht auf einem Glassubstrat |
| JP2008146906A (ja) * | 2006-12-07 | 2008-06-26 | Toshiba Corp | 紫外線発生装置 |
| JP4424394B2 (ja) * | 2007-08-31 | 2010-03-03 | ウシオ電機株式会社 | エキシマランプ |
| DE102007046343A1 (de) | 2007-09-27 | 2009-04-02 | Osram Gesellschaft mit beschränkter Haftung | Verfahren zum Verbinden eines Entladungsgefäßes einer Entladungslampe mit einem Rohrstück, insbesondere einem Pumprohr |
| JP4462448B2 (ja) | 2007-12-29 | 2010-05-12 | ウシオ電機株式会社 | エキシマランプ |
| DE102008009029A1 (de) * | 2008-02-14 | 2009-08-20 | Osram Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines Entladungsgefäßes für eine Entladungslampe |
| JP5223443B2 (ja) * | 2008-04-28 | 2013-06-26 | ウシオ電機株式会社 | ＡｒＦエキシマランプ |
| JP2010198977A (ja) * | 2009-02-26 | 2010-09-09 | Seiko Epson Corp | 放電ランプ及びその製造方法、光源装置、プロジェクタ |
| DE102009014425B4 (de) * | 2009-03-26 | 2011-02-03 | Heraeus Noblelight Gmbh | Deuteriumlampe |
| JP5741603B2 (ja) * | 2013-01-30 | 2015-07-01 | ウシオ電機株式会社 | エキシマランプ |
| CA2944903A1 (en) | 2014-04-24 | 2015-10-29 | Dana-Farber Cancer Institute, Inc. | Tumor suppressor and oncogene biomarkers predictive of anti-immune checkpoint inhibitor response |
| CA3067260A1 (en) * | 2017-06-20 | 2018-12-27 | General Fusion Inc. | Vacuum compatible electrical insulator |
| RU208591U1 (ru) * | 2020-12-02 | 2021-12-24 | Игорь Георгиевич Рудой | Газоразрядная лампа ультрафиолетового диапазона спектра |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3821585A (en) * | 1973-04-30 | 1974-06-28 | Westinghouse Electric Corp | Tungsten halogen incandescent lamp with group iva metal getter and method of manufacture |
| US4256988A (en) * | 1977-01-17 | 1981-03-17 | Thorn Lighting Limited | Incandescent halogen lamp with protective envelope coating |
| US4363998A (en) * | 1981-05-19 | 1982-12-14 | Westinghouse Electric Corp. | Fluorescent lamp processing which improves performance of zinc silicate phosphor used therein |
| NL8202778A (nl) * | 1982-07-09 | 1984-02-01 | Philips Nv | Lagedrukkwikdampontladingslamp. |
| CH672380A5 (en) | 1987-01-27 | 1989-11-15 | Bbc Brown Boveri & Cie | Reduce darkening of mercury vapour UV tube - using hafnium, lanthanum, thorium or aluminium oxide coating |
| JPH01211854A (ja) * | 1988-02-19 | 1989-08-25 | Mitsubishi Electric Corp | ラピッドスタート型蛍光ランプ |
| US5270615A (en) | 1991-11-22 | 1993-12-14 | General Electric Company | Multi-layer oxide coating for high intensity metal halide discharge lamps |
| US5218269A (en) * | 1991-11-29 | 1993-06-08 | Gte Products Corporation | Negative glow discharge lamp having wire anode |
| US5258689A (en) * | 1991-12-11 | 1993-11-02 | General Electric Company | Fluorescent lamps having reduced interference colors |
| JP3189481B2 (ja) * | 1993-03-19 | 2001-07-16 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| BE1007440A3 (nl) | 1993-08-20 | 1995-06-13 | Philips Electronics Nv | Lagedrukkwikdampontladingslamp. |
| US5473226A (en) * | 1993-11-16 | 1995-12-05 | Osram Sylvania Inc. | Incandescent lamp having hardglass envelope with internal barrier layer |
| JP3087565B2 (ja) * | 1994-03-30 | 2000-09-11 | ウシオ電機株式会社 | 誘電体バリア放電ランプ |
| WO2004076711A1 (ja) * | 1995-10-03 | 2004-09-10 | Seigo Yamamoto | 耐ハロゲン系ガス腐食性及び耐ハロゲン系プラズマ腐食性に優れたコーティング膜、該コーティング膜を施した積層構造体並びにそれらの製造方法 |
| US5898265A (en) | 1996-05-31 | 1999-04-27 | Philips Electronics North America Corporation | TCLP compliant fluorescent lamp |
| JPH10139480A (ja) * | 1996-10-31 | 1998-05-26 | Toshiba Ceramics Co Ltd | アルミナ被覆石英ガラス及びその製造方法並びに半導体製造装置用部品 |
| ATE261188T1 (de) * | 1997-03-21 | 2004-03-15 | Vollkommer Frank Dr | Flachleuchtstofflampe für die hintergrundbeleuchtung und flüssigkristallanzeige-vorrichtung mit dieser flachleuchtstofflampe |
| IT1306214B1 (it) | 1998-09-09 | 2001-05-30 | Gel Design And Engineering Srl | Processo per la preparazione di film vetrosi spessi di ossido disilicio secondo la tecnica sol-gel e film spessi cosi' ottenuti. |
| US6130512A (en) * | 1999-08-25 | 2000-10-10 | College Of William & Mary | Rf capacitively-coupled electrodeless light source |
| DE19953533A1 (de) | 1999-11-05 | 2001-05-10 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Elektrodenhalterung |
| DE60017232T2 (de) * | 1999-11-10 | 2005-12-08 | Denglas Technologies, Llc | Schichten auf Basis von Nioboxid für optische Dünnfilmbeschichtungen und Verfahren zu deren Herstellung |
-
2001
- 2001-07-30 DE DE10137015A patent/DE10137015A1/de not_active Ceased
-
2002
- 2002-07-10 EP EP02015380A patent/EP1282153A3/de not_active Ceased
- 2002-07-16 TW TW091115822A patent/TWI275120B/zh not_active IP Right Cessation
- 2002-07-29 KR KR1020020044615A patent/KR100942846B1/ko not_active Expired - Fee Related
- 2002-07-29 CA CA002396018A patent/CA2396018A1/en not_active Abandoned
- 2002-07-30 US US10/207,129 patent/US6734629B2/en not_active Expired - Lifetime
- 2002-07-30 JP JP2002221343A patent/JP4340047B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1282153A2 (de) | 2003-02-05 |
| KR20030011659A (ko) | 2003-02-11 |
| DE10137015A1 (de) | 2003-02-20 |
| TWI275120B (en) | 2007-03-01 |
| US6734629B2 (en) | 2004-05-11 |
| EP1282153A3 (de) | 2006-04-19 |
| JP4340047B2 (ja) | 2009-10-07 |
| KR100942846B1 (ko) | 2010-02-17 |
| US20030020407A1 (en) | 2003-01-30 |
| JP2003059457A (ja) | 2003-02-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |