CA2336918C - Improved method for forming conductive traces and printed circuits made thereby - Google Patents
Improved method for forming conductive traces and printed circuits made thereby Download PDFInfo
- Publication number
- CA2336918C CA2336918C CA002336918A CA2336918A CA2336918C CA 2336918 C CA2336918 C CA 2336918C CA 002336918 A CA002336918 A CA 002336918A CA 2336918 A CA2336918 A CA 2336918A CA 2336918 C CA2336918 C CA 2336918C
- Authority
- CA
- Canada
- Prior art keywords
- conductive metal
- copper
- layer
- copper foil
- metal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 86
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 137
- 229910052751 metal Inorganic materials 0.000 claims abstract description 94
- 239000002184 metal Substances 0.000 claims abstract description 94
- 239000011889 copper foil Substances 0.000 claims abstract description 73
- 229910052802 copper Inorganic materials 0.000 claims abstract description 64
- 239000010949 copper Substances 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 57
- 239000011888 foil Substances 0.000 claims description 54
- 229910052759 nickel Inorganic materials 0.000 claims description 28
- 238000005530 etching Methods 0.000 claims description 20
- 238000011282 treatment Methods 0.000 claims description 17
- 230000003750 conditioning effect Effects 0.000 claims description 15
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 238000003384 imaging method Methods 0.000 claims description 5
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 2
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 claims description 2
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims description 2
- 238000007788 roughening Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 description 17
- 239000011651 chromium Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 229910052804 chromium Inorganic materials 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 238000004070 electrodeposition Methods 0.000 description 6
- 238000011536 re-plating Methods 0.000 description 6
- 239000002131 composite material Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000001143 conditioned effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- -1 gold Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
- H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0302—Properties and characteristics in general
- H05K2201/0317—Thin film conductor layer; Thin film passive component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0344—Electroless sublayer, e.g. Ni, Co, Cd or Ag; Transferred electroless sublayer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10431—Details of mounted components
- H05K2201/10439—Position of a single component
- H05K2201/10477—Inverted
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0147—Carriers and holders
- H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0726—Electroforming, i.e. electroplating on a metallic carrier thereby forming a self-supporting structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Laminated Bodies (AREA)
- Credit Cards Or The Like (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/113,043 US6117300A (en) | 1996-05-01 | 1998-07-09 | Method for forming conductive traces and printed circuits made thereby |
| US09/113,043 | 1998-07-09 | ||
| PCT/US1999/015546 WO2000003568A1 (en) | 1998-07-09 | 1999-07-09 | Improved method for forming conductive traces and printed circuits made thereby |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2336918A1 CA2336918A1 (en) | 2000-01-20 |
| CA2336918C true CA2336918C (en) | 2008-02-26 |
Family
ID=22347304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002336918A Expired - Fee Related CA2336918C (en) | 1998-07-09 | 1999-07-09 | Improved method for forming conductive traces and printed circuits made thereby |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6117300A (enExample) |
| EP (1) | EP1099361B1 (enExample) |
| JP (1) | JP4959052B2 (enExample) |
| KR (1) | KR100599139B1 (enExample) |
| CN (1) | CN100344212C (enExample) |
| AT (1) | ATE355726T1 (enExample) |
| CA (1) | CA2336918C (enExample) |
| DE (1) | DE69935333T2 (enExample) |
| TW (1) | TW480902B (enExample) |
| WO (1) | WO2000003568A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6884944B1 (en) | 1998-01-14 | 2005-04-26 | Mitsui Mining & Smelting Co., Ltd. | Multi-layer printed wiring boards having blind vias |
| WO2000007197A2 (en) * | 1998-07-31 | 2000-02-10 | Oak-Mitsui Inc. | Composition and method for manufacturing integral resistors in printed circuit boards |
| JP3690962B2 (ja) * | 2000-04-26 | 2005-08-31 | 三井金属鉱業株式会社 | キャリア箔付電解銅箔及びそのキャリア箔付電解銅箔の製造方法並びに銅張積層板 |
| US6426290B1 (en) * | 2000-08-18 | 2002-07-30 | Advanced Micro Devices, Inc. | Electroplating both sides of a workpiece |
| US6447929B1 (en) * | 2000-08-29 | 2002-09-10 | Gould Electronics Inc. | Thin copper on usable carrier and method of forming same |
| KR100899588B1 (ko) * | 2000-10-26 | 2009-05-27 | 오우크-미츠이, 인크 . | 인쇄 회로 기판 제조에서 옥사이드 공정을 대체하고 미세라인을 제조하기 위해 구리 포일을 금속 처리하는 인쇄회로 기판 제조 방법 |
| US6763575B2 (en) * | 2001-06-11 | 2004-07-20 | Oak-Mitsui Inc. | Printed circuit boards having integrated inductor cores |
| JP2003051673A (ja) * | 2001-08-06 | 2003-02-21 | Mitsui Mining & Smelting Co Ltd | プリント配線板用銅箔及びそのプリント配線板用銅箔を用いた銅張積層板 |
| US6610417B2 (en) | 2001-10-04 | 2003-08-26 | Oak-Mitsui, Inc. | Nickel coated copper as electrodes for embedded passive devices |
| US6770976B2 (en) | 2002-02-13 | 2004-08-03 | Nikko Materials Usa, Inc. | Process for manufacturing copper foil on a metal carrier substrate |
| US7261920B2 (en) * | 2002-04-24 | 2007-08-28 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure on a substrate |
| US7972472B2 (en) * | 2002-04-24 | 2011-07-05 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure for in-mold decoration |
| TWI268813B (en) * | 2002-04-24 | 2006-12-21 | Sipix Imaging Inc | Process for forming a patterned thin film conductive structure on a substrate |
| US7156945B2 (en) * | 2002-04-24 | 2007-01-02 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure for in-mold decoration |
| US8002948B2 (en) * | 2002-04-24 | 2011-08-23 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure on a substrate |
| US7767126B2 (en) * | 2005-08-22 | 2010-08-03 | Sipix Imaging, Inc. | Embossing assembly and methods of preparation |
| KR101232137B1 (ko) | 2005-11-21 | 2013-02-12 | 엘지디스플레이 주식회사 | 인쇄판, 인쇄판의 제조방법 및 그를 이용한 액정표시소자제조방법 |
| EP2312022A4 (en) * | 2008-07-22 | 2012-11-14 | Furukawa Electric Co Ltd | SURFACE-TREATED COPPER AND COPPER-COATED LAMINATE |
| WO2011159929A1 (en) * | 2010-06-17 | 2011-12-22 | Ddi Global Corp. | Systems and methods for reducing overhang on electroplated surfaces of printed circuit boards |
| KR102038137B1 (ko) * | 2012-12-21 | 2019-10-30 | 주식회사 넥스플렉스 | 다층 연성금속박 적층체 및 이의 제조방법 |
| US9707738B1 (en) | 2016-01-14 | 2017-07-18 | Chang Chun Petrochemical Co., Ltd. | Copper foil and methods of use |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE503299A (enExample) * | 1949-10-29 | |||
| US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
| US3857681A (en) * | 1971-08-03 | 1974-12-31 | Yates Industries | Copper foil treatment and products produced therefrom |
| US3998601A (en) * | 1973-12-03 | 1976-12-21 | Yates Industries, Inc. | Thin foil |
| US3984598A (en) * | 1974-02-08 | 1976-10-05 | Universal Oil Products Company | Metal-clad laminates |
| US3981691A (en) * | 1974-07-01 | 1976-09-21 | Minnesota Mining And Manufacturing Company | Metal-clad dielectric sheeting having an improved bond between the metal and dielectric layers |
| JPS5856758B2 (ja) * | 1975-12-17 | 1983-12-16 | ミツイアナコンダドウハク カブシキガイシヤ | ドウハクヒヨウメンシヨリホウホウ |
| US4088544A (en) * | 1976-04-19 | 1978-05-09 | Hutkin Irving J | Composite and method for making thin copper foil |
| US4049431A (en) * | 1976-09-30 | 1977-09-20 | The United States Of America As Represented By The United States Energy Research And Development Administration | High strength ferritic alloy |
| US4082620A (en) * | 1977-04-29 | 1978-04-04 | Bell Telephone Laboratories, Incorporated | Process for chromating metallic surfaces |
| US4357395A (en) * | 1980-08-22 | 1982-11-02 | General Electric Company | Transfer lamination of vapor deposited foils, method and product |
| US4808967A (en) * | 1985-05-29 | 1989-02-28 | Ohmega Electronics | Circuit board material |
| US4863808A (en) * | 1985-09-13 | 1989-09-05 | Gould Inc. | Copper-chromium-polyimide composite |
| DE3576900D1 (de) * | 1985-12-30 | 1990-05-03 | Ibm Deutschland | Verfahren zum herstellen von gedruckten schaltungen. |
| JPS62173748A (ja) * | 1986-01-27 | 1987-07-30 | Hitachi Cable Ltd | 半導体用リ−ドフレ−ムの製造方法 |
| JPS648694A (en) * | 1987-06-30 | 1989-01-12 | Hitachi Chemical Co Ltd | Manufacture of insulating substrate with thin nickel layer |
| JP2550081B2 (ja) * | 1987-07-08 | 1996-10-30 | 株式会社日立製作所 | 回路形成法 |
| JPH01124286A (ja) * | 1987-11-09 | 1989-05-17 | Hitachi Chem Co Ltd | プリント配線板の製造法 |
| US5243320A (en) * | 1988-02-26 | 1993-09-07 | Gould Inc. | Resistive metal layers and method for making same |
| JPH0818401B2 (ja) * | 1989-05-17 | 1996-02-28 | 福田金属箔粉工業株式会社 | 複合箔とその製法 |
| US5017271A (en) * | 1990-08-24 | 1991-05-21 | Gould Inc. | Method for printed circuit board pattern making using selectively etchable metal layers |
| TW230290B (enExample) * | 1991-11-15 | 1994-09-11 | Nikko Guruder Foreer Kk | |
| JPH0787270B2 (ja) * | 1992-02-19 | 1995-09-20 | 日鉱グールド・フォイル株式会社 | 印刷回路用銅箔及びその製造方法 |
| US5242562A (en) * | 1992-05-27 | 1993-09-07 | Gould Inc. | Method and apparatus for forming printed circuits |
| US5685970A (en) * | 1992-07-01 | 1997-11-11 | Gould Electronics Inc. | Method and apparatus for sequentially metalized polymeric films and products made thereby |
| US5403672A (en) * | 1992-08-17 | 1995-04-04 | Hitachi Chemical Co., Ltd. | Metal foil for printed wiring board and production thereof |
| JP2717911B2 (ja) * | 1992-11-19 | 1998-02-25 | 日鉱グールド・フォイル株式会社 | 印刷回路用銅箔及びその製造方法 |
| JP2762386B2 (ja) * | 1993-03-19 | 1998-06-04 | 三井金属鉱業株式会社 | 銅張り積層板およびプリント配線板 |
| US5482784A (en) * | 1993-12-24 | 1996-01-09 | Mitsui Mining And Smelting Co., Ltd. | Printed circuit inner-layer copper foil and process for producing the same |
| JP3476264B2 (ja) * | 1993-12-24 | 2003-12-10 | 三井金属鉱業株式会社 | プリント回路内層用銅箔およびその製造方法 |
| JP3276765B2 (ja) * | 1994-02-16 | 2002-04-22 | 清川メッキ工業株式会社 | チップ固定抵抗器の電極端子形成方法 |
| AU2993997A (en) * | 1996-05-01 | 1997-11-19 | Allied-Signal Inc. | New method of forming fine circuit lines |
-
1998
- 1998-07-09 US US09/113,043 patent/US6117300A/en not_active Expired - Lifetime
-
1999
- 1999-07-09 DE DE69935333T patent/DE69935333T2/de not_active Expired - Lifetime
- 1999-07-09 KR KR1020017000254A patent/KR100599139B1/ko not_active Expired - Fee Related
- 1999-07-09 CN CNB998083623A patent/CN100344212C/zh not_active Expired - Lifetime
- 1999-07-09 WO PCT/US1999/015546 patent/WO2000003568A1/en not_active Ceased
- 1999-07-09 JP JP2000559716A patent/JP4959052B2/ja not_active Expired - Fee Related
- 1999-07-09 AT AT99930884T patent/ATE355726T1/de active
- 1999-07-09 TW TW088111684A patent/TW480902B/zh not_active IP Right Cessation
- 1999-07-09 EP EP99930884A patent/EP1099361B1/en not_active Expired - Lifetime
- 1999-07-09 CA CA002336918A patent/CA2336918C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR100599139B1 (ko) | 2006-07-12 |
| CN1308836A (zh) | 2001-08-15 |
| ATE355726T1 (de) | 2006-03-15 |
| KR20010079509A (ko) | 2001-08-22 |
| CA2336918A1 (en) | 2000-01-20 |
| WO2000003568A1 (en) | 2000-01-20 |
| DE69935333T2 (de) | 2007-10-11 |
| JP4959052B2 (ja) | 2012-06-20 |
| EP1099361B1 (en) | 2007-02-28 |
| WO2000003568A9 (en) | 2000-06-08 |
| DE69935333D1 (de) | 2007-04-12 |
| US6117300A (en) | 2000-09-12 |
| EP1099361A1 (en) | 2001-05-16 |
| CN100344212C (zh) | 2007-10-17 |
| JP2002520195A (ja) | 2002-07-09 |
| TW480902B (en) | 2002-03-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2336918C (en) | Improved method for forming conductive traces and printed circuits made thereby | |
| US4889584A (en) | Method of producing conductor circuit boards | |
| US5679230A (en) | Copper foil for printed circuit boards | |
| EP0177686A2 (en) | Process for bonding metals to electrophoretically deposited coatings, and printed circuit with plated through holes produced thereby | |
| EP0996319B1 (en) | Composite material used in making printed wiring boards | |
| JP2006022406A (ja) | キャリア付き極薄銅箔 | |
| WO2003022569A1 (en) | Copper foil with low profile bond enhancement | |
| EP0557073A1 (en) | Copper foil for printed circuits and process for producing the same | |
| TWI500824B (zh) | An electronic circuit and a method for forming the same, and a copper-clad laminate for forming an electronic circuit | |
| US5447619A (en) | Copper foil for the manufacture of printed circuit boards and method of producing the same | |
| JPH06318783A (ja) | 多層回路基板の製造方法 | |
| US20040075528A1 (en) | Printed circuit heaters with ultrathin low resistivity materials | |
| TWI853007B (zh) | 印刷配線板用金屬箔、附載體金屬箔及覆金屬層積板、以及使用其等的印刷配線板的製造方法 | |
| EP0868837A1 (en) | New method of forming fine circuit lines | |
| GB2080630A (en) | Printed circuit panels | |
| EP0996318B1 (en) | Novel composite foil, process for producing the same and copper-clad laminate | |
| JP7017369B2 (ja) | 表面処理銅箔、銅張積層板及びプリント配線板 | |
| JP3615973B2 (ja) | 新規な複合箔およびその製造方法、銅張り積層板 | |
| CA2227179A1 (en) | Copper foil for the manufacture of printed circuits and method of producing same | |
| JPH0194695A (ja) | 導体回路板の製造方法 | |
| JP2004006611A (ja) | プリント配線板の製造方法 | |
| JPH02113589A (ja) | 印刷配線板の製造方法 | |
| JPH02113590A (ja) | 印刷配線板の製造方法 | |
| KR19990029060A (ko) | 인쇄 회로 제조용 동박 및 그의 제조 방법 | |
| JPH1140924A (ja) | 微細な回路線の新規な形成法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |
Effective date: 20170710 |