AU551827B2 - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
AU551827B2
AU551827B2 AU18536/83A AU1853683A AU551827B2 AU 551827 B2 AU551827 B2 AU 551827B2 AU 18536/83 A AU18536/83 A AU 18536/83A AU 1853683 A AU1853683 A AU 1853683A AU 551827 B2 AU551827 B2 AU 551827B2
Authority
AU
Australia
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU18536/83A
Other languages
English (en)
Other versions
AU1853683A (en
Inventor
Hideki Nagasaka
Noriaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Publication of AU1853683A publication Critical patent/AU1853683A/en
Application granted granted Critical
Publication of AU551827B2 publication Critical patent/AU551827B2/en
Assigned to MITSUBISHI CHEMICAL CORPORATION reassignment MITSUBISHI CHEMICAL CORPORATION Request to Amend Deed and Register Assignors: MITSUBISHI KASEI CORPORATION
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
AU18536/83A 1982-09-27 1983-08-30 Photopolymerisable compositions Ceased AU551827B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57168088A JPS5956403A (ja) 1982-09-27 1982-09-27 光重合性組成物
JP57-168088 1982-09-27

Publications (2)

Publication Number Publication Date
AU1853683A AU1853683A (en) 1984-04-05
AU551827B2 true AU551827B2 (en) 1986-05-15

Family

ID=15861616

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18536/83A Ceased AU551827B2 (en) 1982-09-27 1983-08-30 Photopolymerisable compositions

Country Status (6)

Country Link
US (1) US4985470A (enExample)
EP (1) EP0107792B1 (enExample)
JP (1) JPS5956403A (enExample)
AU (1) AU551827B2 (enExample)
CA (1) CA1222091A (enExample)
DE (1) DE3361644D1 (enExample)

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JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
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JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
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JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JP3070184B2 (ja) * 1991-10-18 2000-07-24 三菱化学株式会社 光重合性組成物及び感光材料
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JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
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JPH09218514A (ja) * 1996-02-09 1997-08-19 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
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JPH11184084A (ja) 1997-12-22 1999-07-09 Brother Ind Ltd 速硬化性感光性組成物及び記録用シート
US6573380B2 (en) 1999-03-09 2003-06-03 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo 4-cyanocoumarin derivatives and uses thereof
KR101079607B1 (ko) 2001-12-13 2011-11-03 (주)하야시바라 생물화학연구소 쿠마린 화합물
KR20060041223A (ko) 2003-07-11 2006-05-11 가부시끼가이샤 하야시바라 세이부쓰 가가꾸 겐꾸조 아민화합물과 그 용도
CN1882879B (zh) * 2003-09-22 2010-08-11 爱克发印艺公司 可光聚合的组合物
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US7749683B2 (en) * 2004-11-05 2010-07-06 Agfa Graphics Nv Photopolymerizable composition
JP4315892B2 (ja) 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
ES2479066T3 (es) 2005-11-18 2014-07-23 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
EP1788430B1 (en) 2005-11-18 2009-03-18 Agfa Graphics N.V. Method of making a lithographic printing plate
DE602005026136D1 (de) 2005-11-18 2011-03-10 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
DE602005013398D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788431B1 (en) 2005-11-18 2009-01-28 Agfa Graphics N.V. Method of making a lithographic printing plate
PL1788450T3 (pl) 2005-11-18 2009-07-31 Agfa Nv Sposób wytwarzania kliszy do druku litograficznego
EP1788434B2 (en) 2005-11-18 2019-01-02 Agfa Nv Method of making a lithographic printing plate
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ES2324542T3 (es) 2005-11-21 2009-08-10 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
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JP2007171407A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版原版及びその製版方法
US8451401B2 (en) 2006-04-19 2013-05-28 Mitsubishi Chemical Corporation Color image display device
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
BRPI0811197B1 (pt) 2007-05-25 2019-04-02 Agfa Nv Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão
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US3652275A (en) * 1970-07-09 1972-03-28 Du Pont HEXAARYLBIIMIDAZOLE BIS (p-DIALKYL-AMINOPHENYL-{60 ,{62 -UNSATURATED) KETONE COMPOSITIONS
ZA757987B (en) * 1975-12-23 1976-12-29 Dynachem Corp Adhesion promoters for polymerizable films
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
DE3023247C2 (de) * 1980-06-21 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
JPS5721401A (en) * 1980-07-14 1982-02-04 Mitsubishi Chem Ind Ltd Photopolymerizable composition
DE3048490C2 (de) * 1980-12-22 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
US4459349A (en) * 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan

Also Published As

Publication number Publication date
DE3361644D1 (en) 1986-02-06
JPS5956403A (ja) 1984-03-31
EP0107792A1 (en) 1984-05-09
US4985470A (en) 1991-01-15
AU1853683A (en) 1984-04-05
JPH0363562B2 (enExample) 1991-10-01
EP0107792B1 (en) 1985-12-27
CA1222091A (en) 1987-05-19

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