DE3361644D1 - Photopolymerizable compositions - Google Patents

Photopolymerizable compositions

Info

Publication number
DE3361644D1
DE3361644D1 DE8383109584T DE3361644T DE3361644D1 DE 3361644 D1 DE3361644 D1 DE 3361644D1 DE 8383109584 T DE8383109584 T DE 8383109584T DE 3361644 T DE3361644 T DE 3361644T DE 3361644 D1 DE3361644 D1 DE 3361644D1
Authority
DE
Germany
Prior art keywords
photopolymerizable compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383109584T
Other languages
German (de)
English (en)
Inventor
Hideki Nagasaka
Noriaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lastra SpA
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Application granted granted Critical
Publication of DE3361644D1 publication Critical patent/DE3361644D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
DE8383109584T 1982-09-27 1983-09-26 Photopolymerizable compositions Expired DE3361644D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168088A JPS5956403A (ja) 1982-09-27 1982-09-27 光重合性組成物

Publications (1)

Publication Number Publication Date
DE3361644D1 true DE3361644D1 (en) 1986-02-06

Family

ID=15861616

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383109584T Expired DE3361644D1 (en) 1982-09-27 1983-09-26 Photopolymerizable compositions

Country Status (6)

Country Link
US (1) US4985470A (enExample)
EP (1) EP0107792B1 (enExample)
JP (1) JPS5956403A (enExample)
AU (1) AU551827B2 (enExample)
CA (1) CA1222091A (enExample)
DE (1) DE3361644D1 (enExample)

Families Citing this family (115)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
SE458860B (sv) * 1986-02-06 1989-05-16 Itronic Process Ab Anordning vid en foer vaermebehandling av banformiga alster anordnad behandlingsanlaeggning
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
ATE89086T1 (de) * 1988-01-15 1993-05-15 Du Pont Lagerstabile photopolymerisierbare zusammensetzung fuer die aufzeichnung von beugungsbildern.
US5514521A (en) * 1990-08-22 1996-05-07 Brother Kogyo Kabushiki Kaisha Photocurable composition
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JP3070184B2 (ja) * 1991-10-18 2000-07-24 三菱化学株式会社 光重合性組成物及び感光材料
JP2693670B2 (ja) * 1991-11-06 1997-12-24 住友ベークライト株式会社 感光性樹脂組成物
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
CA2169091C (en) * 1993-08-23 2000-06-20 Peter Marte Torgerson Silicone grafted thermoplastic elastomeric copolymers and hair and skin care compositions containing the same
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
EP0780731B1 (en) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid crystal display device
JPH09218514A (ja) * 1996-02-09 1997-08-19 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JPH11184084A (ja) 1997-12-22 1999-07-09 Brother Ind Ltd 速硬化性感光性組成物及び記録用シート
US6573380B2 (en) 1999-03-09 2003-06-03 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo 4-cyanocoumarin derivatives and uses thereof
KR101079607B1 (ko) 2001-12-13 2011-11-03 (주)하야시바라 생물화학연구소 쿠마린 화합물
KR20060041223A (ko) 2003-07-11 2006-05-11 가부시끼가이샤 하야시바라 세이부쓰 가가꾸 겐꾸조 아민화합물과 그 용도
CN1882879B (zh) * 2003-09-22 2010-08-11 爱克发印艺公司 可光聚合的组合物
EP1742096A4 (en) 2004-04-26 2008-10-01 Mitsubishi Chem Corp BLUE COLOR COMPOSITION FOR COLOR FILTER, COLOR FILTER, AND COLOR IMAGE DISPLAY DEVICE
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US7749683B2 (en) * 2004-11-05 2010-07-06 Agfa Graphics Nv Photopolymerizable composition
JP4315892B2 (ja) 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
ES2479066T3 (es) 2005-11-18 2014-07-23 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
EP1788430B1 (en) 2005-11-18 2009-03-18 Agfa Graphics N.V. Method of making a lithographic printing plate
DE602005026136D1 (de) 2005-11-18 2011-03-10 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
DE602005013398D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788431B1 (en) 2005-11-18 2009-01-28 Agfa Graphics N.V. Method of making a lithographic printing plate
PL1788450T3 (pl) 2005-11-18 2009-07-31 Agfa Nv Sposób wytwarzania kliszy do druku litograficznego
EP1788434B2 (en) 2005-11-18 2019-01-02 Agfa Nv Method of making a lithographic printing plate
ES2347442T3 (es) 2005-11-18 2010-10-29 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
JP4816239B2 (ja) * 2005-11-21 2011-11-16 日立化成工業株式会社 永久レジスト用感光性エレメント、レジストパターンの形成方法、プリント配線板及び半導体素子
PL1788435T3 (pl) 2005-11-21 2013-09-30 Agfa Nv Sposób wytwarzania litograficznej płyty drukowej
ES2324542T3 (es) 2005-11-21 2009-08-10 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
EP1788449A1 (en) 2005-11-21 2007-05-23 Agfa Graphics N.V. Method for making a lithographic printing plate
JP2007171407A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版原版及びその製版方法
US8451401B2 (en) 2006-04-19 2013-05-28 Mitsubishi Chemical Corporation Color image display device
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
BRPI0811197B1 (pt) 2007-05-25 2019-04-02 Agfa Nv Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão
ES2344668T3 (es) 2007-11-30 2010-09-02 Agfa Graphics N.V. Metodo para tratar una plancha de impresion litografica.
WO2009086492A1 (en) * 2007-12-28 2009-07-09 E. I. Du Pont De Nemours And Company Thermally and actinically curable adhesive composition
EP2242119A4 (en) 2008-02-07 2012-03-07 Mitsubishi Chem Corp SEMICONDUCTOR LIGHT ARRANGEMENT, BACKLIGHT ARRANGEMENT, PAINT DISPLAY ARRANGEMENT, AND FLUORATE USED FOR THESE ARRANGEMENTS
EP2098376B1 (en) 2008-03-04 2013-09-18 Agfa Graphics N.V. A method for making a lithographic printing plate support
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
EP2106924B1 (en) 2008-03-31 2011-06-29 Agfa Graphics N.V. A method for treating a lithographic printing plate
JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
JP2010156945A (ja) 2008-08-22 2010-07-15 Fujifilm Corp 平版印刷版の作製方法
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
JP2011090294A (ja) 2009-09-24 2011-05-06 Fujifilm Corp 平版印刷版の作製方法
JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
EP2339402A1 (en) 2009-12-28 2011-06-29 Fujifilm Corporation Lithographic printing plate precursor and method of preparing lithographic printing plate
JP5322963B2 (ja) 2010-01-29 2013-10-23 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5346845B2 (ja) 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
JP2011221522A (ja) 2010-03-26 2011-11-04 Fujifilm Corp 平版印刷版の作製方法
AU2011236976B2 (en) 2010-03-31 2014-08-14 Fujifilm Corporation Developer for processing planographic printing plate precursor, method for preparing planographic printing plate using the developer, and method for printing
JP2012073594A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP2012073595A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP5205483B2 (ja) 2011-02-04 2013-06-05 富士フイルム株式会社 平版印刷版原版及び製版方法
JP5211187B2 (ja) 2011-02-28 2013-06-12 富士フイルム株式会社 平版印刷版原版及び製版方法
JP5186574B2 (ja) 2011-02-28 2013-04-17 富士フイルム株式会社 平版印刷版原版及びその製版方法
WO2012117882A1 (ja) 2011-02-28 2012-09-07 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
CN103562794B (zh) 2011-03-28 2016-07-13 富士胶片株式会社 平版印刷版的制版方法
JP5301015B2 (ja) 2011-07-25 2013-09-25 富士フイルム株式会社 感光性平版印刷版原版及び平版印刷版の作製方法
JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
WO2013027590A1 (ja) 2011-08-22 2013-02-28 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5432960B2 (ja) 2011-08-24 2014-03-05 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5401522B2 (ja) 2011-09-15 2014-01-29 富士フイルム株式会社 コーティング組成物、ならびに該組成物を用いた、画像形成材料、平版印刷版原版及び酸素遮断性フィルム
EP2762974B1 (en) 2011-09-26 2017-07-26 Fujifilm Corporation Method for producing lithographic printing plate
BR112014007143A2 (pt) 2011-09-26 2017-06-13 Fujifilm Corp processo para fabricar chapa de impressão litográfica
JP5602195B2 (ja) 2011-09-27 2014-10-08 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
WO2013125315A1 (ja) 2012-02-20 2013-08-29 富士フイルム株式会社 製版処理廃液の濃縮方法およびリサイクル方法
JP5711168B2 (ja) 2012-02-27 2015-04-30 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
JP5715975B2 (ja) 2012-02-29 2015-05-13 富士フイルム株式会社 平版印刷版原版および平版印刷版の製造方法
US9329479B2 (en) 2012-06-05 2016-05-03 Agfa Graphics Nv Lithographic printing plate precusor
CN105308504B (zh) 2013-06-14 2019-12-03 爱克发有限公司 平版印刷版前体
EP2883699B1 (en) 2013-12-11 2017-05-03 Agfa Graphics Nv A lithographic printing plate precursor and monomer
EP2916171B1 (en) 2014-03-03 2017-05-31 Agfa Graphics Nv A method for making a lithographic printing plate precursor
ES2655798T3 (es) 2014-12-08 2018-02-21 Agfa Nv Sistema para reducir los residuos de ablación
EP3147335A1 (en) 2015-09-23 2017-03-29 BYK-Chemie GmbH Colorant compositions containing wettting and/or dispersing agents with low amine number
BR112018068694A2 (pt) 2016-03-16 2019-01-15 Agfa Nv método para processar uma chapa de impressão litográfica
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
EP3431290B1 (en) 2017-07-20 2021-09-08 Agfa Nv A lithographic printing plate precursor
EP3474073B1 (en) 2017-10-17 2022-12-07 Agfa Offset Bv A method for making a printing plate
US20210179764A1 (en) 2017-11-15 2021-06-17 Byk-Chemie Gmbh Block co-polymer
US20200347171A1 (en) 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer
EP3495891B1 (en) 2017-12-08 2021-06-16 Agfa Nv A method for making a lithographic printing plate
EP3768514A1 (en) 2018-03-22 2021-01-27 Agfa Nv A lithographic printing plate precursor
ES2951652T3 (es) 2018-05-14 2023-10-24 Agfa Offset Bv Precursor de plancha de impresión litográfica
EP3587113B1 (en) 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
EP3587112B1 (en) 2018-06-21 2024-04-03 Eco3 Bv A lithographic printing plate precursor
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3650938A1 (en) 2018-11-09 2020-05-13 Agfa Nv A lithographic printing plate precursor
EP3894957A1 (en) 2018-12-10 2021-10-20 Agfa Nv On-press processing of a uv or violet-sensitized lithographic printing plate
EP3686011A1 (en) 2019-01-23 2020-07-29 Agfa Nv A lithographic printing plate precursor
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
EP3875271B1 (en) 2020-03-04 2025-10-15 Eco3 Bv A lithographic printing plate precursor
EP3892469B1 (en) 2020-04-10 2023-11-08 Eco3 Bv Lithographic printing plate precursor
EP3922462B1 (en) 2020-06-08 2023-03-01 Agfa Offset Bv Lithographic photopolymer printing plate precursor with improved daylight stability
EP4171957B1 (en) 2020-06-24 2025-02-12 Eco3 Bv A lithographic printing plate precursor
EP4171958B1 (en) 2020-06-24 2025-08-13 Eco3 Bv Lithographic printing plate precursor, method for making a printing plate precursor and method for making a printing plate
EP3928983B1 (en) 2020-06-24 2023-09-27 Eco3 Bv A lithographic printing plate precursor
EP3960455B1 (en) 2020-08-31 2025-08-06 Eco3 Bv A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate
EP4225582B1 (en) 2020-10-09 2024-08-28 Eco3 Bv A lithographic printing plate precursor
US20240100820A1 (en) 2020-12-16 2024-03-28 Agfa Offset Bv Lithographic Printing Press Make-Ready Method
EP4035897A1 (en) 2021-01-28 2022-08-03 Agfa Offset Bv A lithographic printing plate precursor
EP4223534A1 (en) 2022-02-07 2023-08-09 Agfa Offset Bv A lithographic printing plate precursor
EP4239411A1 (en) 2022-03-04 2023-09-06 Eco3 Bv Method and apparatus for processing a lithographic printing plate precursor
EP4382306A1 (en) 2022-12-08 2024-06-12 Eco3 Bv Lithographic printing press make-ready method
EP4461539A1 (en) 2023-05-10 2024-11-13 Eco3 Bv A negative-working lithographic printing plate precursor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3652275A (en) * 1970-07-09 1972-03-28 Du Pont HEXAARYLBIIMIDAZOLE BIS (p-DIALKYL-AMINOPHENYL-{60 ,{62 -UNSATURATED) KETONE COMPOSITIONS
ZA757987B (en) * 1975-12-23 1976-12-29 Dynachem Corp Adhesion promoters for polymerizable films
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
DE3023247C2 (de) * 1980-06-21 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
JPS5721401A (en) * 1980-07-14 1982-02-04 Mitsubishi Chem Ind Ltd Photopolymerizable composition
DE3048490C2 (de) * 1980-12-22 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
US4459349A (en) * 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan

Also Published As

Publication number Publication date
JPS5956403A (ja) 1984-03-31
EP0107792A1 (en) 1984-05-09
AU551827B2 (en) 1986-05-15
US4985470A (en) 1991-01-15
AU1853683A (en) 1984-04-05
JPH0363562B2 (enExample) 1991-10-01
EP0107792B1 (en) 1985-12-27
CA1222091A (en) 1987-05-19

Similar Documents

Publication Publication Date Title
DE3361644D1 (en) Photopolymerizable compositions
DE3369999D1 (en) Photopolymerizable composition
GB8407501D0 (en) Photopolymerizable compositions
DE3373221D1 (en) Photopolymerizable photosensitive composition
DE3476068D1 (en) Photopolymerizable composition
EP0102450A3 (en) Resist compositions
AU569145B2 (en) Photopolymerizable fluoroacrylate compositions
DE3367235D1 (en) Photopolymerizable compositions containing diaryliodosyl salts
EP0109073A3 (en) Polymerizable compositions
DE3370700D1 (en) Photosensitive composition
GB2169090B (en) Photobleachable compositions
DE3378734D1 (en) Light-sensitive composition
GB2131692B (en) Compositions for local corticotherapy
GB8310276D0 (en) Ester-heterocycle compositions
GB8314459D0 (en) Photoresist compositions
GB2125815B (en) Stripping compositions
DE3372291D1 (en) Compositions
GB2132212B (en) Photopolymerizable composition
ZA834494B (en) Cementiferous compositions
EP0131824A3 (en) Photopolymerizable composition
DE3474452D1 (en) Photopolymerizable composition
GB8333745D0 (en) Photopolymerizable composition
GB8329395D0 (en) Photopolymerisable compositions
DE3467821D1 (en) Photopolymerizable compositions
EP0095629A3 (en) Vulcanisable compositions

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUBISHI KASEI CORP., TOKIO/TOKYO, JP

8327 Change in the person/name/address of the patent owner

Owner name: LASTRA S.P.A., MANERBIO, IT