ATE556098T1 - Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur - Google Patents
Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstrukturInfo
- Publication number
- ATE556098T1 ATE556098T1 AT08711219T AT08711219T ATE556098T1 AT E556098 T1 ATE556098 T1 AT E556098T1 AT 08711219 T AT08711219 T AT 08711219T AT 08711219 T AT08711219 T AT 08711219T AT E556098 T1 ATE556098 T1 AT E556098T1
- Authority
- AT
- Austria
- Prior art keywords
- compound
- mass
- producing
- light
- surface structure
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
- C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007162466 | 2007-06-20 | ||
PCT/JP2008/052373 WO2008155928A1 (ja) | 2007-06-20 | 2008-02-13 | 光硬化性組成物および表面に微細パターンを有する成形体の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE556098T1 true ATE556098T1 (de) | 2012-05-15 |
Family
ID=40156091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08711219T ATE556098T1 (de) | 2007-06-20 | 2008-02-13 | Lichthärtbare zusammensetzung und verfahren zur herstellung eines formobjekts mit feiner oberflächenstruktur |
Country Status (8)
Country | Link |
---|---|
US (2) | US8163813B2 (de) |
EP (1) | EP2159236B1 (de) |
JP (1) | JP5387406B2 (de) |
KR (1) | KR101431861B1 (de) |
CN (1) | CN101679568B (de) |
AT (1) | ATE556098T1 (de) |
TW (1) | TWI455951B (de) |
WO (1) | WO2008155928A1 (de) |
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CN101416083A (zh) * | 2006-04-07 | 2009-04-22 | 旭硝子株式会社 | 线栅型偏振器及其制造方法 |
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JP2009215179A (ja) * | 2008-03-07 | 2009-09-24 | Fujifilm Corp | (メタ)アクリレート化合物、これを用いた硬化性組成物、光ナノインプリント用組成物、並びにこれらの硬化性組成物の硬化物およびその製造方法 |
CN101981479A (zh) * | 2008-04-03 | 2011-02-23 | 旭硝子株式会社 | 线栅型偏振器及其制造方法 |
EP2264492B1 (de) * | 2008-04-08 | 2014-07-02 | Asahi Glass Company, Limited | Verfahren zur herstellung eines drahtgitterpolarisierers |
KR101702278B1 (ko) * | 2008-05-29 | 2017-02-03 | 아사히 가라스 가부시키가이샤 | 광경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법 |
JP5459210B2 (ja) * | 2008-07-10 | 2014-04-02 | 旭硝子株式会社 | ワイヤグリッド型偏光子およびその製造方法 |
JP5594147B2 (ja) * | 2008-12-05 | 2014-09-24 | 旭硝子株式会社 | 光硬化性組成物および表面に微細パターンを有する成形体の製造方法 |
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JP5245164B2 (ja) * | 2009-05-14 | 2013-07-24 | 公立大学法人首都大学東京 | マイクロリアクターおよびマイクロリアクターの製造方法 |
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JP5671302B2 (ja) * | 2009-11-10 | 2015-02-18 | 富士フイルム株式会社 | インプリント用硬化性組成物、パターン形成方法およびパターン |
JP5693925B2 (ja) * | 2010-02-04 | 2015-04-01 | 丸善石油化学株式会社 | 樹脂型、成形体、及び成形体の製造方法 |
JP5681980B2 (ja) * | 2010-03-01 | 2015-03-11 | 公立大学法人大阪府立大学 | 溶剤溶解型光硬化性組成物を用いた微細構造体の製造方法 |
WO2011125800A1 (ja) * | 2010-03-31 | 2011-10-13 | Jsr株式会社 | ナノインプリント用硬化性組成物、半導体素子及びナノインプリント方法 |
TWI480324B (zh) * | 2010-08-04 | 2015-04-11 | Asahi Glass Co Ltd | A photohardenable composition, and a molded article having a fine pattern on its surface |
KR101692101B1 (ko) * | 2010-08-04 | 2017-01-02 | 아사히 가라스 가부시키가이샤 | 광 경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법 |
JP5905207B2 (ja) | 2011-04-21 | 2016-04-20 | 丸善石油化学株式会社 | 金属不純物量の少ない半導体リソグラフィー用共重合体の製造方法及び該共重合体を製造するための重合開始剤の精製方法 |
US9504987B2 (en) * | 2011-07-18 | 2016-11-29 | New Jersey Institute Of Technology | System and method for superabsorbent material |
JP5696017B2 (ja) * | 2011-09-27 | 2015-04-08 | 富士フイルム株式会社 | インプリント用硬化性組成物、パターン形成方法およびパターン |
JP5959865B2 (ja) | 2012-02-09 | 2016-08-02 | キヤノン株式会社 | 光硬化物及びその製造方法 |
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JP4770354B2 (ja) * | 2005-09-20 | 2011-09-14 | 日立化成工業株式会社 | 光硬化性樹脂組成物及びこれを用いたパターン形成方法 |
JP2007137998A (ja) * | 2005-11-17 | 2007-06-07 | Daikin Ind Ltd | 硬化性組成物およびそれを硬化してなる光学材料 |
JP2007162466A (ja) | 2005-12-09 | 2007-06-28 | Denso Corp | ソレノイド制御装置 |
JP2007178724A (ja) * | 2005-12-28 | 2007-07-12 | Mitsubishi Rayon Co Ltd | 表面に微細凹凸構造を有する成形体の製造方法および反射防止物品 |
CN101495443A (zh) * | 2006-08-04 | 2009-07-29 | 出光兴产株式会社 | 含金刚烷结构的聚合性化合物、其制备方法和树脂组合物 |
-
2008
- 2008-02-13 CN CN2008800208873A patent/CN101679568B/zh active Active
- 2008-02-13 KR KR1020097021536A patent/KR101431861B1/ko active IP Right Grant
- 2008-02-13 AT AT08711219T patent/ATE556098T1/de active
- 2008-02-13 WO PCT/JP2008/052373 patent/WO2008155928A1/ja active Application Filing
- 2008-02-13 EP EP08711219A patent/EP2159236B1/de not_active Not-in-force
- 2008-02-13 JP JP2009520366A patent/JP5387406B2/ja active Active
- 2008-03-28 TW TW097111181A patent/TWI455951B/zh not_active IP Right Cessation
-
2009
- 2009-08-17 US US12/542,086 patent/US8163813B2/en active Active
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2012
- 2012-03-20 US US13/425,098 patent/US20120175821A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN101679568A (zh) | 2010-03-24 |
JP5387406B2 (ja) | 2014-01-15 |
EP2159236A1 (de) | 2010-03-03 |
EP2159236B1 (de) | 2012-05-02 |
WO2008155928A1 (ja) | 2008-12-24 |
EP2159236A4 (de) | 2010-12-22 |
US20100038831A1 (en) | 2010-02-18 |
KR20100032358A (ko) | 2010-03-25 |
KR101431861B1 (ko) | 2014-08-25 |
CN101679568B (zh) | 2012-07-04 |
JPWO2008155928A1 (ja) | 2010-08-26 |
TW200916488A (en) | 2009-04-16 |
US8163813B2 (en) | 2012-04-24 |
US20120175821A1 (en) | 2012-07-12 |
TWI455951B (zh) | 2014-10-11 |
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