ATE445229T1 - Flüssigkeitsverarbeitungsvorrichtung - Google Patents

Flüssigkeitsverarbeitungsvorrichtung

Info

Publication number
ATE445229T1
ATE445229T1 AT07007785T AT07007785T ATE445229T1 AT E445229 T1 ATE445229 T1 AT E445229T1 AT 07007785 T AT07007785 T AT 07007785T AT 07007785 T AT07007785 T AT 07007785T AT E445229 T1 ATE445229 T1 AT E445229T1
Authority
AT
Austria
Prior art keywords
cup
substrate
liquid
exhaust
drain
Prior art date
Application number
AT07007785T
Other languages
English (en)
Inventor
Masami Akimoto
Takayuki Toshima
Satoshi Kaneko
Kazuhisa Matsumoto
Norihiro Ito
Hiromitsu Nanba
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of ATE445229T1 publication Critical patent/ATE445229T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
AT07007785T 2006-04-18 2007-04-17 Flüssigkeitsverarbeitungsvorrichtung ATE445229T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006114959 2006-04-18

Publications (1)

Publication Number Publication Date
ATE445229T1 true ATE445229T1 (de) 2009-10-15

Family

ID=38121611

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07007785T ATE445229T1 (de) 2006-04-18 2007-04-17 Flüssigkeitsverarbeitungsvorrichtung

Country Status (8)

Country Link
US (1) US7793610B2 (de)
EP (1) EP1848024B1 (de)
JP (1) JP5156114B2 (de)
KR (1) KR101019444B1 (de)
CN (1) CN101060069B (de)
AT (1) ATE445229T1 (de)
DE (1) DE602007002660D1 (de)
TW (1) TW200802563A (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5312856B2 (ja) * 2008-06-27 2013-10-09 大日本スクリーン製造株式会社 基板処理装置
CN101992165B (zh) * 2009-08-27 2012-10-24 沈阳芯源微电子设备有限公司 一种用于圆形薄片状物体进行化学液喷洒处理的装置
US8541309B2 (en) 2010-12-03 2013-09-24 Applied Materials, Inc. Processing assembly for semiconductor workpiece and methods of processing same
US9799537B2 (en) * 2010-12-03 2017-10-24 Applied Materials, Inc. Processing assembly for semiconductor workpiece and methods of processing same
JP5472169B2 (ja) * 2011-03-16 2014-04-16 東京エレクトロン株式会社 液処理装置、液処理方法および記憶媒体
JP5387636B2 (ja) * 2011-08-31 2014-01-15 東京エレクトロン株式会社 液処理装置
JP5596071B2 (ja) * 2012-03-09 2014-09-24 東京エレクトロン株式会社 液処理装置
JP6057624B2 (ja) 2012-09-03 2017-01-11 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ カップおよび基板処理装置
JP6281161B2 (ja) * 2013-09-27 2018-02-21 東京エレクトロン株式会社 液処理装置
TWI569349B (zh) * 2013-09-27 2017-02-01 斯克林集團公司 基板處理裝置及基板處理方法
JP6090113B2 (ja) * 2013-10-30 2017-03-08 東京エレクトロン株式会社 液処理装置
CN103567175A (zh) * 2013-10-30 2014-02-12 广西钦州天山微电子有限公司 铬板清洗机
CN103639089A (zh) * 2013-11-14 2014-03-19 上海和辉光电有限公司 显影剂喷涂装置及方法
CN103691631B (zh) * 2013-12-16 2016-01-27 南通大学 带保护结构的匀胶机托盘
JP6287750B2 (ja) * 2013-12-27 2018-03-07 東京エレクトロン株式会社 基板液処理装置
TWI661502B (zh) 2014-02-27 2019-06-01 日商斯克林集團公司 基板處理裝置
KR102277539B1 (ko) * 2014-09-17 2021-07-15 세메스 주식회사 기판 처리 장치 및 컵 유닛
JP6797526B2 (ja) * 2014-11-11 2020-12-09 株式会社荏原製作所 基板洗浄装置
CN105161442B (zh) * 2015-07-21 2018-02-23 北京七星华创电子股份有限公司 一种清洗液体收集装置
CN111069219B (zh) * 2019-12-27 2022-06-07 上海至纯洁净系统科技股份有限公司 一种排液罩以及半导体清洗设备
TWI800064B (zh) * 2021-10-29 2023-04-21 弘塑科技股份有限公司 單晶圓濕處理設備
CN117153740B (zh) * 2023-10-31 2024-02-09 宁波润华全芯微电子设备有限公司 一种晶圆加工装置

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
JPH0537469Y2 (de) * 1990-10-08 1993-09-22
JPH04174848A (ja) * 1990-11-08 1992-06-23 Fujitsu Ltd レジスト塗布装置
JPH05146736A (ja) * 1991-11-27 1993-06-15 Sharp Corp スピン式コーテイング装置
JP3138897B2 (ja) 1993-10-07 2001-02-26 大日本スクリーン製造株式会社 回転式基板処理装置
US5626675A (en) * 1993-11-18 1997-05-06 Tokyo Electron Limited Resist processing apparatus, substrate processing apparatus and method of transferring a processed article
JP3102831B2 (ja) 1994-06-20 2000-10-23 大日本スクリーン製造株式会社 回転処理装置
JPH0878368A (ja) 1994-09-07 1996-03-22 Hitachi Ltd ワークの処理方法および装置
TW406216B (en) 1995-05-24 2000-09-21 Tokyo Electron Ltd Apparatus for coating resist on substrate
JPH0945750A (ja) * 1995-07-26 1997-02-14 Hitachi Ltd 板状物保持部材およびそれを用いた回転処理装置
JPH09122558A (ja) * 1995-11-06 1997-05-13 Dainippon Screen Mfg Co Ltd 回転式塗布装置
US5997653A (en) 1996-10-07 1999-12-07 Tokyo Electron Limited Method for washing and drying substrates
JP3276601B2 (ja) * 1997-01-22 2002-04-22 東京エレクトロン株式会社 洗浄処理方法及び洗浄処理装置
JP2000084503A (ja) * 1998-07-13 2000-03-28 Kokusai Electric Co Ltd 被処理物の流体処理方法及びその装置
JP2000138163A (ja) * 1998-10-30 2000-05-16 Tokyo Electron Ltd 液処理装置
US6558478B1 (en) * 1999-10-06 2003-05-06 Ebara Corporation Method of and apparatus for cleaning substrate
JP3837017B2 (ja) 2000-12-04 2006-10-25 大日本スクリーン製造株式会社 基板処理装置及び基板処理方法ならびに基板処理装置の洗浄方法
JP4074814B2 (ja) 2002-01-30 2008-04-16 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP3890025B2 (ja) * 2003-03-10 2007-03-07 東京エレクトロン株式会社 塗布処理装置及び塗布処理方法
JP4029066B2 (ja) 2003-08-28 2008-01-09 東京エレクトロン株式会社 基板処理装置
JP4446875B2 (ja) 2004-06-14 2010-04-07 大日本スクリーン製造株式会社 基板処理装置

Also Published As

Publication number Publication date
CN101060069A (zh) 2007-10-24
DE602007002660D1 (de) 2009-11-19
US20070240638A1 (en) 2007-10-18
CN101060069B (zh) 2010-11-03
KR101019444B1 (ko) 2011-03-07
EP1848024B1 (de) 2009-10-07
TWI353632B (de) 2011-12-01
JP2011238967A (ja) 2011-11-24
JP5156114B2 (ja) 2013-03-06
KR20070103310A (ko) 2007-10-23
US7793610B2 (en) 2010-09-14
TW200802563A (en) 2008-01-01
EP1848024A1 (de) 2007-10-24

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