ATE445152T1 - Systeme zur inspektion strukturierter oder unstrukturierter wafer und anderer proben - Google Patents

Systeme zur inspektion strukturierter oder unstrukturierter wafer und anderer proben

Info

Publication number
ATE445152T1
ATE445152T1 AT04754334T AT04754334T ATE445152T1 AT E445152 T1 ATE445152 T1 AT E445152T1 AT 04754334 T AT04754334 T AT 04754334T AT 04754334 T AT04754334 T AT 04754334T AT E445152 T1 ATE445152 T1 AT E445152T1
Authority
AT
Austria
Prior art keywords
specimen
light
different portions
systems
samples
Prior art date
Application number
AT04754334T
Other languages
English (en)
Inventor
Christopher Bevis
Mike Kirk
Mehdi Vaez-Iravani
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Application granted granted Critical
Publication of ATE445152T1 publication Critical patent/ATE445152T1/de

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4738Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G01N21/474Details of optical heads therefor, e.g. using optical fibres
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AT04754334T 2003-06-06 2004-06-04 Systeme zur inspektion strukturierter oder unstrukturierter wafer und anderer proben ATE445152T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/456,203 US7068363B2 (en) 2003-06-06 2003-06-06 Systems for inspection of patterned or unpatterned wafers and other specimen
PCT/US2004/017707 WO2004111623A1 (en) 2003-06-06 2004-06-04 Systems for inspection of patterned or unpatterned wafers and other specimen

Publications (1)

Publication Number Publication Date
ATE445152T1 true ATE445152T1 (de) 2009-10-15

Family

ID=33490112

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04754334T ATE445152T1 (de) 2003-06-06 2004-06-04 Systeme zur inspektion strukturierter oder unstrukturierter wafer und anderer proben

Country Status (6)

Country Link
US (1) US7068363B2 (de)
EP (1) EP1636572B1 (de)
JP (1) JP5032114B2 (de)
AT (1) ATE445152T1 (de)
DE (1) DE602004023505D1 (de)
WO (1) WO2004111623A1 (de)

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* Cited by examiner, † Cited by third party
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WO2004111623B1 (en) 2005-03-17
US20040246476A1 (en) 2004-12-09
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JP5032114B2 (ja) 2012-09-26
US7068363B2 (en) 2006-06-27

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