ATE463736T1 - Optisches system zur detektion von anomalien und/oder charakteristika von oberflächen - Google Patents
Optisches system zur detektion von anomalien und/oder charakteristika von oberflächenInfo
- Publication number
- ATE463736T1 ATE463736T1 AT04756129T AT04756129T ATE463736T1 AT E463736 T1 ATE463736 T1 AT E463736T1 AT 04756129 T AT04756129 T AT 04756129T AT 04756129 T AT04756129 T AT 04756129T AT E463736 T1 ATE463736 T1 AT E463736T1
- Authority
- AT
- Austria
- Prior art keywords
- channels
- detector arrays
- employed
- inspected
- lines
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
- G01N21/474—Details of optical heads therefor, e.g. using optical fibres
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48253903P | 2003-06-24 | 2003-06-24 | |
US10/874,861 US7365834B2 (en) | 2003-06-24 | 2004-06-22 | Optical system for detecting anomalies and/or features of surfaces |
PCT/US2004/020483 WO2005003746A1 (en) | 2003-06-24 | 2004-06-24 | Optical system for detecting anomalies and/or features of surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE463736T1 true ATE463736T1 (de) | 2010-04-15 |
Family
ID=33567651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04756129T ATE463736T1 (de) | 2003-06-24 | 2004-06-24 | Optisches system zur detektion von anomalien und/oder charakteristika von oberflächen |
Country Status (7)
Country | Link |
---|---|
US (2) | US7365834B2 (de) |
EP (1) | EP1636573B1 (de) |
JP (2) | JP4838122B2 (de) |
KR (1) | KR101128717B1 (de) |
AT (1) | ATE463736T1 (de) |
DE (1) | DE602004026442D1 (de) |
WO (1) | WO2005003746A1 (de) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6411377B1 (en) * | 1991-04-02 | 2002-06-25 | Hitachi, Ltd. | Optical apparatus for defect and particle size inspection |
US7365834B2 (en) | 2003-06-24 | 2008-04-29 | Kla-Tencor Technologies Corporation | Optical system for detecting anomalies and/or features of surfaces |
JP2005283190A (ja) * | 2004-03-29 | 2005-10-13 | Hitachi High-Technologies Corp | 異物検査方法及びその装置 |
US20060012778A1 (en) * | 2004-07-12 | 2006-01-19 | August Technology Corp. | Illuminator for dark field inspection |
US7684032B1 (en) * | 2005-01-06 | 2010-03-23 | Kla-Tencor Corporation | Multi-wavelength system and method for detecting epitaxial layer defects |
JP4988223B2 (ja) * | 2005-06-22 | 2012-08-01 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびその方法 |
JP4564910B2 (ja) | 2005-09-26 | 2010-10-20 | 株式会社日立ハイテクノロジーズ | ウェハ欠陥検査方法および装置 |
US20070119836A1 (en) * | 2005-11-29 | 2007-05-31 | Thomas Schroeder | Method and apparatus for focusing a beam from an excimer laser to form a line of light on a substrate |
US7433033B2 (en) * | 2006-05-05 | 2008-10-07 | Asml Netherlands B.V. | Inspection method and apparatus using same |
EP1975603A1 (de) * | 2007-03-27 | 2008-10-01 | Visys NV | Verfahren und System zur Verwendung bei der Prüfung und/oder Entfernung ungeeigneter Objekte aus einem Strom von Produkten und Sortiervorrichtung zu dessen Implementierung |
US8174690B2 (en) * | 2007-05-11 | 2012-05-08 | Argos Solutions As | Apparatus for characterizing a surface structure |
US7782452B2 (en) * | 2007-08-31 | 2010-08-24 | Kla-Tencor Technologies Corp. | Systems and method for simultaneously inspecting a specimen with two distinct channels |
JP2009074802A (ja) * | 2007-09-18 | 2009-04-09 | Lasertec Corp | 検査装置、検査方法及びパターン基板の製造方法 |
JP5308212B2 (ja) * | 2009-03-31 | 2013-10-09 | 株式会社日立ハイテクノロジーズ | ディスク表面欠陥検査方法及び装置 |
WO2011011291A1 (en) * | 2009-07-22 | 2011-01-27 | Kla-Tencor Corporation | Dark field inspection system with ring illumination |
WO2011136963A1 (en) | 2010-04-30 | 2011-11-03 | Boston Scientific Scimed, Inc. | Duodenal metabolic stent |
KR101517097B1 (ko) * | 2010-06-04 | 2015-05-07 | 이제선 | 평판패널 검사장치 |
DE102011014796A1 (de) | 2011-03-15 | 2012-09-20 | Carl Zeiss Laser Optics Gmbh | Optische Vorrichtung zum Umformen eines Lichtstrahls zu einem Linienfokus |
DE102011102588A1 (de) | 2011-05-25 | 2012-11-29 | Carl Zeiss Laser Optics Gmbh | Optische Anordnung zum Umformen eines einfallenden Lichtstrahlbündels, Verfahren zum Umformen eines Lichtstrahlbündels zu einem Linienfokus sowie optische Vorrichtung dafür |
US9279774B2 (en) * | 2011-07-12 | 2016-03-08 | Kla-Tencor Corp. | Wafer inspection |
JP5869817B2 (ja) | 2011-09-28 | 2016-02-24 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法および欠陥検査装置 |
JP5993691B2 (ja) | 2012-09-28 | 2016-09-14 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
US8929406B2 (en) * | 2013-01-24 | 2015-01-06 | Kla-Tencor Corporation | 193NM laser and inspection system |
JP5944850B2 (ja) | 2013-03-11 | 2016-07-05 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びこれを用いた装置 |
US9182358B2 (en) * | 2013-03-15 | 2015-11-10 | Kla-Tencor Corporation | Multi-spot defect inspection system |
JP2016038302A (ja) | 2014-08-08 | 2016-03-22 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
KR102316146B1 (ko) * | 2014-08-13 | 2021-10-22 | 삼성전자주식회사 | 표면 검사용 광학 모듈 및 이를 포함하는 표면 검사 장치 |
CN115060650A (zh) * | 2015-05-20 | 2022-09-16 | 科磊股份有限公司 | 用于以由空间选择性波长滤波器所修改的照明源将样本成像的系统及方法 |
US10616987B2 (en) | 2015-08-28 | 2020-04-07 | Kla-Tencor Corporation | System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter |
KR101884781B1 (ko) * | 2015-12-02 | 2018-08-03 | 한국생산기술연구원 | 3차원 스캐닝 시스템 |
WO2017108410A1 (en) * | 2015-12-23 | 2017-06-29 | Asml Netherlands B.V. | Lithographic apparatus and method for performing a measurement |
US10648924B2 (en) * | 2016-01-04 | 2020-05-12 | Kla-Tencor Corp. | Generating high resolution images from low resolution images for semiconductor applications |
WO2017157645A1 (en) | 2016-03-15 | 2017-09-21 | Stichting Vu | Inspection method, inspection apparatus and illumination method and apparatus |
US10120214B2 (en) | 2016-06-24 | 2018-11-06 | Qualcomm Incorporated | Systems and methods for light beam position detection |
KR20180028787A (ko) * | 2016-09-09 | 2018-03-19 | 삼성전자주식회사 | 디펙 검사 시스템과 방법, 및 그 검사 방법을 이용한 반도체 소자 제조방법 |
WO2019016856A1 (ja) | 2017-07-18 | 2019-01-24 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびパターンチップ |
US10386233B2 (en) * | 2018-01-06 | 2019-08-20 | Kla-Tencor Corporation | Variable resolution spectrometer |
NL2020623B1 (en) * | 2018-01-24 | 2019-07-30 | Illumina Inc | Structured illumination microscopy with line scanning |
KR102241104B1 (ko) * | 2019-05-21 | 2021-04-16 | 우순 테크놀로지 컴퍼니, 리미티드 | 편광 정렬 검사 장치 및 그 검사 방법 |
WO2021024319A1 (ja) * | 2019-08-02 | 2021-02-11 | 株式会社日立ハイテク | 欠陥検査装置および欠陥検査方法 |
KR20220088571A (ko) * | 2020-12-18 | 2022-06-28 | 삼성디스플레이 주식회사 | 다결정 실리콘층의 제조 방법, 표시 장치 및 표시 장치의 제조 방법 |
WO2023152848A1 (ja) * | 2022-02-09 | 2023-08-17 | 株式会社日立ハイテク | 欠陥検査装置及び欠陥検査方法 |
CN114705133B (zh) * | 2022-04-15 | 2023-05-26 | 电子科技大学 | 一种高度不连续镜面三维面形检测系统及方法 |
CN115791807B (zh) * | 2023-01-09 | 2023-05-30 | 苏州高视半导体技术有限公司 | 用于检测晶圆缺陷的装置 |
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JPS57132044A (en) | 1981-02-10 | 1982-08-16 | Hitachi Metals Ltd | Discriminating method of surface defect |
US4579455A (en) | 1983-05-09 | 1986-04-01 | Kla Instruments Corporation | Photomask inspection apparatus and method with improved defect detection |
JPH0610656B2 (ja) * | 1986-02-27 | 1994-02-09 | 株式会社神戸製鋼所 | 表面欠陥検出装置 |
DE3637477A1 (de) | 1986-11-04 | 1988-05-11 | Wacker Chemitronic | Verfahren und vorrichtung zur ermittlung der qualitaet von oberflaechen, insbesondere von halbleiterscheiben |
US4898471A (en) | 1987-06-18 | 1990-02-06 | Tencor Instruments | Particle detection on patterned wafers and the like |
JPS63314963A (ja) | 1987-06-18 | 1988-12-22 | Fuji Photo Film Co Ltd | 原稿照明装置 |
US5206699A (en) * | 1988-05-06 | 1993-04-27 | Gersan Establishment | Sensing a narrow frequency band of radiation and gemstones |
JPH03102249A (ja) * | 1989-09-18 | 1991-04-26 | Hitachi Ltd | 異物検出方法およびその装置 |
JPH0434347A (ja) * | 1990-05-31 | 1992-02-05 | Asahi Glass Co Ltd | 表面検査方法 |
US5192856A (en) | 1990-11-19 | 1993-03-09 | An Con Genetics, Inc. | Auto focusing bar code reader |
US5463459A (en) | 1991-04-02 | 1995-10-31 | Hitachi, Ltd. | Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process |
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US5479259A (en) | 1991-05-20 | 1995-12-26 | Hitachi, Ltd. | Method and apparatus for detecting photoacoustic signal |
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JPH06109647A (ja) * | 1992-09-24 | 1994-04-22 | Nikon Corp | 欠陥検査装置 |
JPH06281587A (ja) * | 1993-03-26 | 1994-10-07 | Asahi Glass Co Ltd | 透明板状体の欠点検出方法 |
JP3253177B2 (ja) | 1993-06-15 | 2002-02-04 | キヤノン株式会社 | 表面状態検査装置 |
JPH0792236A (ja) * | 1993-08-06 | 1995-04-07 | Nikon Corp | 基板表面の電圧分布の検査装置 |
US5576831A (en) | 1994-06-20 | 1996-11-19 | Tencor Instruments | Wafer alignment sensor |
US5864394A (en) | 1994-06-20 | 1999-01-26 | Kla-Tencor Corporation | Surface inspection system |
US5530550A (en) | 1994-12-21 | 1996-06-25 | Tencor Instruments | Optical wafer positioning system |
US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
JP3140664B2 (ja) | 1995-06-30 | 2001-03-05 | 松下電器産業株式会社 | 異物検査方法及び装置 |
US5644393A (en) | 1995-10-19 | 1997-07-01 | Hitachi Electronics Engineering Co., Ltd. | Extraneous substance inspection method and apparatus |
US5737074A (en) | 1995-12-05 | 1998-04-07 | New Creation Co., Ltd. | Surface inspection method and apparatus |
EP0979398B1 (de) * | 1996-06-04 | 2012-01-04 | KLA-Tencor Corporation | Optische rastervorrichtung fur oberflaechenpruefung |
US5917588A (en) | 1996-11-04 | 1999-06-29 | Kla-Tencor Corporation | Automated specimen inspection system for and method of distinguishing features or anomalies under either bright field or dark field illumination |
US5719840A (en) | 1996-12-30 | 1998-02-17 | Phase Metrics | Optical sensor with an elliptical illumination spot |
US6608676B1 (en) | 1997-08-01 | 2003-08-19 | Kla-Tencor Corporation | System for detecting anomalies and/or features of a surface |
US20040057045A1 (en) * | 2000-12-21 | 2004-03-25 | Mehdi Vaez-Iravani | Sample inspection system |
US6956644B2 (en) * | 1997-09-19 | 2005-10-18 | Kla-Tencor Technologies Corporation | Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination |
US6201601B1 (en) * | 1997-09-19 | 2001-03-13 | Kla-Tencor Corporation | Sample inspection system |
JP3566589B2 (ja) * | 1998-07-28 | 2004-09-15 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
JP2000162141A (ja) * | 1998-11-27 | 2000-06-16 | Hitachi Ltd | 欠陥検査装置および方法 |
US6587193B1 (en) | 1999-05-11 | 2003-07-01 | Applied Materials, Inc. | Inspection systems performing two-dimensional imaging with line light spot |
US6369888B1 (en) * | 1999-11-17 | 2002-04-09 | Applied Materials, Inc. | Method and apparatus for article inspection including speckle reduction |
JP3996728B2 (ja) * | 2000-03-08 | 2007-10-24 | 株式会社日立製作所 | 表面検査装置およびその方法 |
US6950196B2 (en) * | 2000-09-20 | 2005-09-27 | Kla-Tencor Technologies Corp. | Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
US6731384B2 (en) | 2000-10-10 | 2004-05-04 | Hitachi, Ltd. | Apparatus for detecting foreign particle and defect and the same method |
US6538730B2 (en) | 2001-04-06 | 2003-03-25 | Kla-Tencor Technologies Corporation | Defect detection system |
US7088443B2 (en) * | 2002-02-11 | 2006-08-08 | Kla-Tencor Technologies Corporation | System for detecting anomalies and/or features of a surface |
EP1546693A1 (de) * | 2002-09-30 | 2005-06-29 | Applied Materials Israel, Ltd. | Dunkelfeld-inspektionssystem |
US7365834B2 (en) | 2003-06-24 | 2008-04-29 | Kla-Tencor Technologies Corporation | Optical system for detecting anomalies and/or features of surfaces |
US7037734B2 (en) * | 2004-06-23 | 2006-05-02 | Solid State Measurements, Inc. | Method and apparatus for determining generation lifetime of product semiconductor wafers |
US7397552B2 (en) * | 2004-09-27 | 2008-07-08 | Applied Materials, Israel, Ltd. | Optical inspection with alternating configurations |
-
2004
- 2004-06-22 US US10/874,861 patent/US7365834B2/en active Active
- 2004-06-24 KR KR1020057024877A patent/KR101128717B1/ko active IP Right Grant
- 2004-06-24 WO PCT/US2004/020483 patent/WO2005003746A1/en active Application Filing
- 2004-06-24 AT AT04756129T patent/ATE463736T1/de not_active IP Right Cessation
- 2004-06-24 EP EP04756129A patent/EP1636573B1/de not_active Expired - Lifetime
- 2004-06-24 DE DE602004026442T patent/DE602004026442D1/de not_active Expired - Lifetime
- 2004-06-24 JP JP2006517681A patent/JP4838122B2/ja not_active Expired - Lifetime
-
2008
- 2008-03-20 US US12/052,546 patent/US7679735B2/en not_active Expired - Lifetime
-
2011
- 2011-07-29 JP JP2011166568A patent/JP2012021994A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2005003746A1 (en) | 2005-01-13 |
EP1636573B1 (de) | 2010-04-07 |
KR20060052712A (ko) | 2006-05-19 |
US20050052644A1 (en) | 2005-03-10 |
DE602004026442D1 (de) | 2010-05-20 |
JP4838122B2 (ja) | 2011-12-14 |
EP1636573A1 (de) | 2006-03-22 |
US7679735B2 (en) | 2010-03-16 |
KR101128717B1 (ko) | 2012-03-23 |
JP2007524832A (ja) | 2007-08-30 |
US20080165343A1 (en) | 2008-07-10 |
US7365834B2 (en) | 2008-04-29 |
JP2012021994A (ja) | 2012-02-02 |
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Legal Events
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