ATE359132T1 - Exzentrisch rotierendes bearbeitungsgerät für flache medien - Google Patents

Exzentrisch rotierendes bearbeitungsgerät für flache medien

Info

Publication number
ATE359132T1
ATE359132T1 AT99930500T AT99930500T ATE359132T1 AT E359132 T1 ATE359132 T1 AT E359132T1 AT 99930500 T AT99930500 T AT 99930500T AT 99930500 T AT99930500 T AT 99930500T AT E359132 T1 ATE359132 T1 AT E359132T1
Authority
AT
Austria
Prior art keywords
bowl
rotor
processing device
flat media
eccentric rotating
Prior art date
Application number
AT99930500T
Other languages
German (de)
English (en)
Inventor
Daniel P Bexten
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semitool Inc filed Critical Semitool Inc
Application granted granted Critical
Publication of ATE359132T1 publication Critical patent/ATE359132T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
  • Centrifugal Separators (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Hydraulic Motors (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Rotary Pumps (AREA)
  • Separation Of Solids By Using Liquids Or Pneumatic Power (AREA)
  • Holding Or Fastening Of Disk On Rotational Shaft (AREA)
AT99930500T 1998-06-30 1999-06-21 Exzentrisch rotierendes bearbeitungsgerät für flache medien ATE359132T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/107,878 US6125863A (en) 1998-06-30 1998-06-30 Offset rotor flat media processor

Publications (1)

Publication Number Publication Date
ATE359132T1 true ATE359132T1 (de) 2007-05-15

Family

ID=22318945

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99930500T ATE359132T1 (de) 1998-06-30 1999-06-21 Exzentrisch rotierendes bearbeitungsgerät für flache medien

Country Status (6)

Country Link
US (1) US6125863A (enExample)
EP (1) EP1115511B1 (enExample)
JP (1) JP2002519856A (enExample)
AT (1) ATE359132T1 (enExample)
DE (1) DE69935795T2 (enExample)
WO (1) WO2000000301A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6350322B1 (en) 1997-03-21 2002-02-26 Micron Technology, Inc. Method of reducing water spotting and oxide growth on a semiconductor structure
US6516816B1 (en) * 1999-04-08 2003-02-11 Applied Materials, Inc. Spin-rinse-dryer
US20040025901A1 (en) * 2001-07-16 2004-02-12 Semitool, Inc. Stationary wafer spin/spray processor
US6691720B2 (en) * 2001-07-16 2004-02-17 Semitool, Inc. Multi-process system with pivoting process chamber
US6895981B2 (en) * 2002-07-19 2005-05-24 Semitool, Inc. Cross flow processor
TW200415674A (en) * 2002-07-26 2004-08-16 Applied Materials Inc Hydrophilic components for a spin-rinse-dryer
US7289734B2 (en) * 2002-12-24 2007-10-30 Tropic Networks Inc. Method and system for multi-level power management in an optical network
US20060201541A1 (en) * 2005-03-11 2006-09-14 Semiconductor Energy Laboratory Co., Ltd. Cleaning-drying apparatus and cleaning-drying method
KR100829923B1 (ko) * 2006-08-30 2008-05-16 세메스 주식회사 스핀헤드 및 이를 이용하는 기판처리방법
WO2009114043A1 (en) * 2008-03-07 2009-09-17 Automation Technology, Inc. Solar wafer cleaning systems, apparatus and methods
US9421617B2 (en) 2011-06-22 2016-08-23 Tel Nexx, Inc. Substrate holder
US8967935B2 (en) 2011-07-06 2015-03-03 Tel Nexx, Inc. Substrate loader and unloader
AT515531B1 (de) * 2014-09-19 2015-10-15 Siconnex Customized Solutions Gmbh Halterungssystem und Beschickungsverfahren für scheibenförmige Objekte
EP3817870B1 (en) * 2018-07-06 2024-04-17 Shellback Semiconductor Technology, LLC Systems and methods for a spray measurement apparatus
CN115228828B (zh) * 2022-09-20 2023-01-24 山东鲁西药业有限公司 一种药品原料清洗装置

Family Cites Families (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US28135A (en) * 1860-05-01 Aaron williamson
US193222A (en) * 1877-07-17 Improvement in steam dish-cleaners
US1035480A (en) * 1907-10-09 1912-08-13 Milton Schnaier Area-drain.
US910882A (en) * 1908-10-15 1909-01-26 George Truesdell Bottle-washing apparatus.
US1405243A (en) * 1920-11-16 1922-01-31 Claude E Wing Dishwashing machine
US1793798A (en) * 1928-07-05 1931-02-24 Sarah B Harker Dishwashing machine
US2225501A (en) * 1938-06-04 1940-12-17 James R Lapham Machine for washing cream separator disks
US2699660A (en) * 1946-05-23 1955-01-18 Apex Electrical Mfg Co Washing and extracting machine
US2573128A (en) * 1947-04-05 1951-10-30 Cavicchioli Mario Device in dishwashing machine for recovering silverware and the like
US2677381A (en) * 1950-05-25 1954-05-04 Spray Blast Corp Spray blast cleaning cabinet
US2684585A (en) * 1951-08-01 1954-07-27 Carl D Smith Washing machine
US2669660A (en) * 1951-10-27 1954-02-16 Western Electric Co Leak detecting apparatus
US2721566A (en) * 1952-05-08 1955-10-25 William E Brucker Parts washer
US2675012A (en) * 1952-10-18 1954-04-13 Frank J Scales Washing apparatus for automotive and machine parts and assmeblies
US3214026A (en) * 1961-10-03 1965-10-26 Borg Warner Solvent recovery device
US3079286A (en) * 1962-03-02 1963-02-26 Detrex Chem Ind Enclosed cold solvent spray cleaner
US3116744A (en) * 1962-10-26 1964-01-07 Earl E Hager Washing machine for small articles
US3203434A (en) * 1963-12-06 1965-08-31 Western Electric Co Chemical polishing machine
US3242934A (en) * 1964-07-22 1966-03-29 Heinricke Instr Co Combination washer and drier
US3383255A (en) * 1964-11-05 1968-05-14 North American Rockwell Planar etching of fused silica
US3341016A (en) * 1965-08-23 1967-09-12 Jens A Paasche Spray booth
DE1477965A1 (de) * 1965-10-08 1969-06-04 Badische Maschinenfabrik Ag Se Schleuderstrahlmaschine
US3489608A (en) * 1965-10-26 1970-01-13 Kulicke & Soffa Ind Inc Method and apparatus for treating semiconductor wafers
US3443567A (en) * 1967-11-01 1969-05-13 Howard L Moore Automatic egg flat washer
US3464429A (en) * 1967-12-14 1969-09-02 Henry B Ehrhardt Automatic washer for small machine parts
US3607478A (en) * 1967-12-14 1971-09-21 Bosch Gmbh Robert Method of treating semiconductor elements of circular outline
US3514329A (en) 1968-03-27 1970-05-26 Charles Amory Hull Solid smooth-surface article washing device
US3526237A (en) * 1968-05-08 1970-09-01 Scott E Neill Jr Filter cleaner
US3585668A (en) * 1969-06-02 1971-06-22 Bell Telephone Labor Inc Brush cleaning apparatus for semiconductor slices
US3585128A (en) * 1969-07-28 1971-06-15 Gen Electric Pre-wash scrap basket for dishwasher
US3727620A (en) * 1970-03-18 1973-04-17 Fluoroware Of California Inc Rinsing and drying device
US3608567A (en) * 1970-06-26 1971-09-28 Scott E Neill Jr Filter cleaning process and apparatuses
US3748677A (en) * 1970-09-18 1973-07-31 Western Electric Co Methods and apparatus for scrubbing thin, fragile slices of material
US3664872A (en) * 1970-09-18 1972-05-23 Western Electric Co Method for scrubbing thin, fragile slices of material
DE2125102A1 (de) * 1971-05-19 1972-11-30 Anton Huber Gmbh & Co Kg, 8050 Freising Verfahren und Einrichtung zum Reinigen einer Anzahl kleiner Gegenstände
US3756410A (en) * 1971-11-08 1973-09-04 Moody Aquamatic System Inc Sewage disposal effluent purifier
US3769992A (en) * 1971-12-06 1973-11-06 Fluoroware Inc Spray processing machine
US3808065A (en) * 1972-02-28 1974-04-30 Rca Corp Method of polishing sapphire and spinel
US3760822A (en) * 1972-03-22 1973-09-25 A Evans Machine for cleaning semiconductive wafers
US3804758A (en) * 1972-03-29 1974-04-16 Cosham Eng Design Ltd Screen changer
US4027686A (en) * 1973-01-02 1977-06-07 Texas Instruments Incorporated Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water
US3964957A (en) * 1973-12-19 1976-06-22 Monsanto Company Apparatus for processing semiconductor wafers
US3939514A (en) * 1974-11-11 1976-02-24 Kayex Corporation Apparatus for cleaning thin, fragile wafers of a material
US3977926A (en) * 1974-12-20 1976-08-31 Western Electric Company, Inc. Methods for treating articles
US3970471A (en) * 1975-04-23 1976-07-20 Western Electric Co., Inc. Methods and apparatus for treating wafer-like articles
US3990462A (en) * 1975-05-19 1976-11-09 Fluoroware Systems Corporation Substrate stripping and cleaning apparatus
JPS5271871A (en) * 1975-12-11 1977-06-15 Nec Corp Washing apparatus
DE2710586C2 (de) * 1977-03-11 1981-12-24 Krauss-Maffei AG, 8000 München Taumelzentrifuge
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
US4208760A (en) * 1977-12-19 1980-06-24 Huestis Machine Corp. Apparatus and method for cleaning wafers
DE2901643A1 (de) * 1979-01-17 1980-07-31 Krauss Maffei Ag Zentrifugen-produktbeschleuniger
US4226642A (en) * 1979-02-06 1980-10-07 American Sterilizer Company System providing for decontamination washing and/or biocidal treatment
US4286541A (en) * 1979-07-26 1981-09-01 Fsi Corporation Applying photoresist onto silicon wafers
US4300581A (en) * 1980-03-06 1981-11-17 Thompson Raymon F Centrifugal wafer processor
JPS587830A (ja) * 1981-07-08 1983-01-17 Hitachi Ltd 薄片状物品の洗浄方法及び装置
US4370992A (en) * 1981-09-21 1983-02-01 Abbott Laboratories Washing apparatus for small parts
US4456022A (en) * 1981-10-16 1984-06-26 Roberts Donald E Flatware washing machine
DE3223703C2 (de) * 1982-06-25 1984-05-30 M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 4200 Oberhausen Gasgesperrte Wellendichtung mit radialem Dichtspalt
US4440185A (en) * 1982-08-18 1984-04-03 Wiltse Dean P Support stand for a food slicer
JPS6014244A (ja) * 1983-07-06 1985-01-24 Fujitsu Ltd マスク洗浄装置
US4982753A (en) * 1983-07-26 1991-01-08 National Semiconductor Corporation Wafer etching, cleaning and stripping apparatus
US4536845A (en) * 1983-08-31 1985-08-20 Culligan International Company Self-programmable controller for water conditioner recharging
US4571850A (en) * 1984-05-17 1986-02-25 The Fluorocarbon Company Centrifugal wafer processor
DE8430403U1 (de) * 1984-10-16 1985-04-25 Gebr. Steimel, 5202 Hennef Zentrifugiervorrichtung
JPS61164226A (ja) * 1985-01-17 1986-07-24 Toshiba Ceramics Co Ltd 半導体ウエ−ハ洗浄装置
JPS61178187U (enExample) * 1985-04-26 1986-11-06
US4682614A (en) * 1985-07-26 1987-07-28 Fsi Corporation Wafer processing machine
US4753258A (en) * 1985-08-06 1988-06-28 Aigo Seiichiro Treatment basin for semiconductor material
US4745422A (en) * 1985-11-18 1988-05-17 Kabushiki Kaisha Toshiba Automatic developing apparatus
US4731154A (en) * 1986-06-23 1988-03-15 The Dow Chemical Company Method and apparatus for quantitative measurement of organic contaminants remaining on cleaned surfaces
JPS6314434A (ja) * 1986-07-04 1988-01-21 Dainippon Screen Mfg Co Ltd 基板表面処理方法および装置
US4788994A (en) * 1986-08-13 1988-12-06 Dainippon Screen Mfg. Co. Wafer holding mechanism
US4828660A (en) * 1986-10-06 1989-05-09 Athens Corporation Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids
US5022419A (en) * 1987-04-27 1991-06-11 Semitool, Inc. Rinser dryer system
US5095927A (en) * 1987-04-27 1992-03-17 Semitool, Inc. Semiconductor processor gas-liquid separation
DE3815018A1 (de) * 1987-05-06 1988-12-01 Dan Science Co Traegerreinigungs- und -trocknungsvorrichtung
JPH069499Y2 (ja) * 1987-06-23 1994-03-09 黒谷 信子 半導体材料の水切乾燥装置
JPH01111338A (ja) * 1987-10-24 1989-04-28 Sony Corp 洗浄方法及び洗浄装置
AT389959B (de) * 1987-11-09 1990-02-26 Sez Semiconduct Equip Zubehoer Vorrichtung zum aetzen von scheibenfoermigen gegenstaenden, insbesondere von siliziumscheiben
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置
US5069236A (en) * 1990-03-07 1991-12-03 Pathway Systems, Inc. Method and apparatus for cleaning disks
US5027841A (en) * 1990-04-24 1991-07-02 Electronic Controls Design, Inc. Apparatus to clean printed circuit boards
US5000208A (en) * 1990-06-21 1991-03-19 Micron Technology, Inc. Wafer rinser/dryer
US5232328A (en) * 1991-03-05 1993-08-03 Semitool, Inc. Robot loadable centrifugal semiconductor processor with extendible rotor
US5174045A (en) * 1991-05-17 1992-12-29 Semitool, Inc. Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers
JP2877216B2 (ja) * 1992-10-02 1999-03-31 東京エレクトロン株式会社 洗浄装置
US5784797A (en) * 1994-04-28 1998-07-28 Semitool, Inc. Carrierless centrifugal semiconductor processing system
US5664337A (en) * 1996-03-26 1997-09-09 Semitool, Inc. Automated semiconductor processing systems

Also Published As

Publication number Publication date
EP1115511A4 (en) 2005-04-20
JP2002519856A (ja) 2002-07-02
DE69935795D1 (de) 2007-05-24
DE69935795T2 (de) 2007-12-27
US6125863A (en) 2000-10-03
EP1115511A1 (en) 2001-07-18
EP1115511B1 (en) 2007-04-11
WO2000000301A1 (en) 2000-01-06

Similar Documents

Publication Publication Date Title
ATE359132T1 (de) Exzentrisch rotierendes bearbeitungsgerät für flache medien
KR880004554A (ko) 기판의 회전식 표면처리장치
KR920701573A (ko) 진공배수장치
DE50210134D1 (de) Selbstansaugende hybridpumpe
KR950031250A (ko) 회전식 약액 처리장치
CN102817853B (zh) 真空腔自吸泵
EP0474476A3 (en) Rotary pump
FR2917592B1 (fr) Receveur extra-plat a poser avec evacuation integree
JP2002519856A5 (enExample)
SE0004406L (sv) Inkapsling för fluidsmorda roterande element
ES2044651T3 (es) Maquina de secar por conveccion y/o fijar.
BR9707307A (pt) Dispositivo difusor e condutor
KR970020214A (ko) 회전컵식 액체공급장치
KR100355017B1 (ko) 자흡식 이중 임펠라형 수중폭기장치
KR870011662A (ko) 기판의 회전 건조 장치
DE19882900T1 (de) Schraubenrotor-Nassvakuumpumpe
SE9900257L (sv) Utlopp vid centrifugalseparator med reaktionsdriven rotor
JP2000005972A (ja) 油切り手段付きスパイラルチップコンベアー
JPH075275Y2 (ja) 排水ポンプ
JP2855313B2 (ja) 水中ポンプ
SU1323758A1 (ru) Всасывающа труба насоса
ATE347929T1 (de) Dispergiervorrichtung
RU2038331C1 (ru) Кавитационный аэратор роторного типа шеремета п.з.
JP3864271B2 (ja) ドレン排水ポンプ
ES2174762A1 (es) Maquina para la limpieza de visceras de animales.

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification

Ref document number: 1115511

Country of ref document: EP