ATE356431T1 - Hochtemperatur elektrostatischer halter - Google Patents

Hochtemperatur elektrostatischer halter

Info

Publication number
ATE356431T1
ATE356431T1 AT02732033T AT02732033T ATE356431T1 AT E356431 T1 ATE356431 T1 AT E356431T1 AT 02732033 T AT02732033 T AT 02732033T AT 02732033 T AT02732033 T AT 02732033T AT E356431 T1 ATE356431 T1 AT E356431T1
Authority
AT
Austria
Prior art keywords
chuck
heat transfer
expansion assembly
transfer body
plasma etching
Prior art date
Application number
AT02732033T
Other languages
English (en)
Inventor
Greg Sexton
Alan Schoepp
Mark Allen Kennard
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE356431T1 publication Critical patent/ATE356431T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Physical Vapour Deposition (AREA)
AT02732033T 2001-06-28 2002-06-05 Hochtemperatur elektrostatischer halter ATE356431T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/892,458 US6669783B2 (en) 2001-06-28 2001-06-28 High temperature electrostatic chuck

Publications (1)

Publication Number Publication Date
ATE356431T1 true ATE356431T1 (de) 2007-03-15

Family

ID=25399981

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02732033T ATE356431T1 (de) 2001-06-28 2002-06-05 Hochtemperatur elektrostatischer halter

Country Status (12)

Country Link
US (1) US6669783B2 (de)
EP (1) EP1399963B1 (de)
JP (1) JP4256257B2 (de)
KR (1) KR100907848B1 (de)
CN (2) CN100437968C (de)
AT (1) ATE356431T1 (de)
AU (1) AU2002303965A1 (de)
DE (1) DE60218669D1 (de)
IL (2) IL159497A0 (de)
RU (1) RU2295799C2 (de)
TW (1) TW550643B (de)
WO (1) WO2003003448A2 (de)

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Also Published As

Publication number Publication date
IL159497A (en) 2008-03-20
RU2004102206A (ru) 2005-02-27
DE60218669D1 (de) 2007-04-19
CN1537328A (zh) 2004-10-13
WO2003003448A2 (en) 2003-01-09
RU2295799C2 (ru) 2007-03-20
WO2003003448A3 (en) 2003-05-08
KR20040015763A (ko) 2004-02-19
TW550643B (en) 2003-09-01
JP2005516379A (ja) 2005-06-02
AU2002303965A1 (en) 2003-03-03
JP4256257B2 (ja) 2009-04-22
US20030003749A1 (en) 2003-01-02
CN1941317A (zh) 2007-04-04
US6669783B2 (en) 2003-12-30
EP1399963B1 (de) 2007-03-07
CN100437968C (zh) 2008-11-26
CN1293620C (zh) 2007-01-03
KR100907848B1 (ko) 2009-07-14
IL159497A0 (en) 2004-06-01
EP1399963A2 (de) 2004-03-24

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