ATE244777T1 - Rechteckige vakuumlichtbogenplasmaquelle - Google Patents
Rechteckige vakuumlichtbogenplasmaquelleInfo
- Publication number
- ATE244777T1 ATE244777T1 AT95917050T AT95917050T ATE244777T1 AT E244777 T1 ATE244777 T1 AT E244777T1 AT 95917050 T AT95917050 T AT 95917050T AT 95917050 T AT95917050 T AT 95917050T AT E244777 T1 ATE244777 T1 AT E244777T1
- Authority
- AT
- Austria
- Prior art keywords
- rectangular
- plasma
- arc
- source
- cathode
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 4
- 239000010406 cathode material Substances 0.000 abstract 2
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Arc Welding In General (AREA)
- Discharge Heating (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/233,006 US5480527A (en) | 1994-04-25 | 1994-04-25 | Rectangular vacuum-arc plasma source |
PCT/US1995/004786 WO1995029272A1 (en) | 1994-04-25 | 1995-04-25 | Rectangular vacuum-arc plasma source |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE244777T1 true ATE244777T1 (de) | 2003-07-15 |
Family
ID=22875490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT95917050T ATE244777T1 (de) | 1994-04-25 | 1995-04-25 | Rechteckige vakuumlichtbogenplasmaquelle |
Country Status (9)
Country | Link |
---|---|
US (2) | US5480527A (de) |
EP (1) | EP0758408B1 (de) |
JP (1) | JP3868483B2 (de) |
KR (1) | KR100361620B1 (de) |
AT (1) | ATE244777T1 (de) |
AU (1) | AU695441B2 (de) |
CA (1) | CA2188799A1 (de) |
DE (1) | DE69531240D1 (de) |
WO (1) | WO1995029272A1 (de) |
Families Citing this family (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9503304D0 (en) * | 1995-02-20 | 1995-04-12 | Univ Nanyang | Deposition apparatus |
GB9503305D0 (en) * | 1995-02-20 | 1995-04-12 | Univ Nanyang | Filtered cathodic arc source |
JP2904263B2 (ja) * | 1995-12-04 | 1999-06-14 | 日本電気株式会社 | スパッタ装置 |
WO1997038149A1 (en) * | 1996-04-08 | 1997-10-16 | Ronald Christy | Cathodic arc cathode |
DE19621855C2 (de) * | 1996-05-31 | 2003-03-27 | Univ Dresden Tech | Verfahren zur Herstellung von Metallisierungen auf Halbleiterkörpern unter Verwendung eines gepulsten Vakuumbogenverdampfers |
US6209481B1 (en) * | 1996-08-30 | 2001-04-03 | University Of Maryland Baltimore County | Sequential ion implantation and deposition (SIID) system |
JPH10168565A (ja) * | 1996-12-13 | 1998-06-23 | Mitsubishi Electric Corp | イオン化pvd装置および半導体装置の製造方法 |
US6027619A (en) * | 1996-12-19 | 2000-02-22 | Micron Technology, Inc. | Fabrication of field emission array with filtered vacuum cathodic arc deposition |
US5902462A (en) * | 1997-03-27 | 1999-05-11 | Krauss; Alan R. | Filtered cathodic arc deposition apparatus and method |
KR100230279B1 (ko) * | 1997-03-31 | 1999-11-15 | 윤종용 | 음극 아크 방전을 이용한 박막 증착장치 |
US6036828A (en) * | 1997-08-30 | 2000-03-14 | United Technologies Corporation | Apparatus for steering the arc in a cathodic arc coater |
US6009829A (en) * | 1997-08-30 | 2000-01-04 | United Technologies Corporation | Apparatus for driving the arc in a cathodic arc coater |
US5932078A (en) * | 1997-08-30 | 1999-08-03 | United Technologies Corporation | Cathodic arc vapor deposition apparatus |
US5972185A (en) * | 1997-08-30 | 1999-10-26 | United Technologies Corporation | Cathodic arc vapor deposition apparatus (annular cathode) |
DE19739527C2 (de) * | 1997-09-09 | 2003-10-16 | Rossendorf Forschzent | Vakuumbogen-Plasmaquelle mit Magnet-Partikelfilter |
US7014738B2 (en) | 1997-10-24 | 2006-03-21 | Filplas Vacuum Technology Pte Ltd. | Enhanced macroparticle filter and cathode arc source |
GB9722645D0 (en) | 1997-10-24 | 1997-12-24 | Univ Nanyang | Enhanced macroparticle filter and cathode arc source |
AU9410498A (en) | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
US6103074A (en) * | 1998-02-14 | 2000-08-15 | Phygen, Inc. | Cathode arc vapor deposition method and apparatus |
US6426125B1 (en) * | 1999-03-17 | 2002-07-30 | General Electric Company | Multilayer article and method of making by ARC plasma deposition |
US6365016B1 (en) * | 1999-03-17 | 2002-04-02 | General Electric Company | Method and apparatus for arc plasma deposition with evaporation of reagents |
US6465780B1 (en) * | 1999-03-31 | 2002-10-15 | The Regents Of The University Of California | Filters for cathodic arc plasmas |
US6929727B2 (en) * | 1999-04-12 | 2005-08-16 | G & H Technologies, Llc | Rectangular cathodic arc source and method of steering an arc spot |
US6645354B1 (en) | 2000-04-07 | 2003-11-11 | Vladimir I. Gorokhovsky | Rectangular cathodic arc source and method of steering an arc spot |
CA2268659C (en) * | 1999-04-12 | 2008-12-30 | Vladimir I. Gorokhovsky | Rectangular cathodic arc source and method of steering an arc spot |
US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
JP2001059165A (ja) * | 1999-08-18 | 2001-03-06 | Nissin Electric Co Ltd | アーク式イオンプレーティング装置 |
US6684513B1 (en) * | 2000-02-29 | 2004-02-03 | The Gillette Company | Razor blade technology |
CA2305938C (en) | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
US7300559B2 (en) * | 2000-04-10 | 2007-11-27 | G & H Technologies Llc | Filtered cathodic arc deposition method and apparatus |
JP3860954B2 (ja) * | 2000-07-07 | 2006-12-20 | 株式会社日立グローバルストレージテクノロジーズ | リアルタイムパーティクルフィルタを具備したプラズマ処理装置 |
JP4000764B2 (ja) * | 2000-09-18 | 2007-10-31 | 日新電機株式会社 | 真空アーク蒸発装置 |
JP2002105628A (ja) | 2000-10-03 | 2002-04-10 | Nissin Electric Co Ltd | 真空アーク蒸着装置 |
JP4085593B2 (ja) * | 2001-03-29 | 2008-05-14 | 日新電機株式会社 | 真空アーク蒸着装置 |
US20030101999A1 (en) * | 2001-04-06 | 2003-06-05 | Kittelsen Jon D. | Composite mouthguard with nonsoftening framework |
US6706157B2 (en) * | 2001-09-12 | 2004-03-16 | Transarc Ltd. | Vacuum arc plasma gun deposition system |
US7033462B2 (en) * | 2001-11-30 | 2006-04-25 | Nissin Electric Co., Ltd. | Vacuum arc vapor deposition process and apparatus |
DE10159907B4 (de) * | 2001-12-06 | 2008-04-24 | Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co. | Beschichtungsverfahren |
US6756596B2 (en) * | 2002-04-10 | 2004-06-29 | Paul E. Sathrum | Filtered ion source |
US7179335B2 (en) * | 2002-10-28 | 2007-02-20 | Finisar Corporation | In situ adaptive masks |
US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
US6904935B2 (en) | 2002-12-18 | 2005-06-14 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
US7866342B2 (en) * | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
US8555921B2 (en) * | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
JP4045953B2 (ja) * | 2002-12-27 | 2008-02-13 | 日新電機株式会社 | 真空アーク蒸着装置 |
US20040172832A1 (en) * | 2003-03-04 | 2004-09-09 | Colin Clipstone | Razor blade |
JP4438326B2 (ja) * | 2003-06-13 | 2010-03-24 | 日新電機株式会社 | 偏向磁場型真空アーク蒸着装置 |
JP2005029855A (ja) * | 2003-07-08 | 2005-02-03 | Fuji Electric Device Technology Co Ltd | 真空アーク蒸着装置、真空アーク蒸着法、および磁気記録媒体 |
US7381311B2 (en) * | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
JP4319556B2 (ja) * | 2004-01-28 | 2009-08-26 | 浩史 滝川 | プラズマ生成装置 |
US20050176251A1 (en) * | 2004-02-05 | 2005-08-11 | Duong Chau H. | Polishing pad with releasable slick particles |
DE102006009160B4 (de) * | 2006-02-22 | 2010-01-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Anordnung für die Separation von Partikeln aus einem Plasma |
US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
US20080003377A1 (en) * | 2006-06-30 | 2008-01-03 | The Board Of Regents Of The Nevada System Of Higher Ed. On Behalf Of The Unlv | Transparent vacuum system |
JP4660452B2 (ja) * | 2006-09-30 | 2011-03-30 | 株式会社フェローテック | 拡径管型プラズマ生成装置 |
US7914603B2 (en) * | 2008-06-26 | 2011-03-29 | Mks Instruments, Inc. | Particle trap for a plasma source |
WO2010064715A1 (en) * | 2008-12-04 | 2010-06-10 | Canon Kabushiki Kaisha | Mesoporous silica film and process for production thereof |
JP5424744B2 (ja) * | 2009-07-01 | 2014-02-26 | 株式会社フェローテック | 分割環状リブ型プラズマ処理装置 |
CN101792895B (zh) * | 2010-03-25 | 2012-07-25 | 中国科学院宁波材料技术与工程研究所 | 阴极真空电弧源薄膜沉积装置及沉积薄膜的方法 |
JP5606777B2 (ja) * | 2010-04-22 | 2014-10-15 | 株式会社フェローテック | プラズマ流生成方法、プラズマ処理方法、プラズマ発生装置及びプラズマ処理装置 |
WO2011156876A1 (en) | 2010-06-18 | 2011-12-22 | Mahle Metal Leve S/A | Plasma processing device |
JP2012067352A (ja) * | 2010-09-22 | 2012-04-05 | Ferrotec Corp | 終端反射壁フィルタを有するプラズマ生成装置及びプラズマ加工装置 |
UA97584C2 (ru) * | 2010-11-08 | 2012-02-27 | Национальный Научный Центр "Харьковский Физико-Технический Институт" | СПОСОБ ТРАНСПОРТИРОВКИ Вакуумно-дуговой Катодной ПЛАЗМЫ С фильтрованием От макрочастиц И УСТРОЙСТВО ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ |
US10304665B2 (en) | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
US9761424B1 (en) | 2011-09-07 | 2017-09-12 | Nano-Product Engineering, LLC | Filtered cathodic arc method, apparatus and applications thereof |
WO2013120097A1 (en) | 2012-02-09 | 2013-08-15 | Fluxion Inc. | Compact, filtered ion source |
US9683285B2 (en) | 2013-03-25 | 2017-06-20 | The Regents Of The University Of California | Filters for blocking macroparticles in plasma deposition apparatus |
JP6403269B2 (ja) * | 2014-07-30 | 2018-10-10 | 株式会社神戸製鋼所 | アーク蒸発源 |
JP6347414B2 (ja) * | 2014-11-04 | 2018-06-27 | 日新イオン機器株式会社 | 質量分析電磁石 |
JP7082789B2 (ja) * | 2017-12-26 | 2022-06-09 | 株式会社オンワード技研 | 真空アークプラズマ蒸着装置の先端防汚型着火装置 |
US11834204B1 (en) | 2018-04-05 | 2023-12-05 | Nano-Product Engineering, LLC | Sources for plasma assisted electric propulsion |
KR101962904B1 (ko) | 2018-07-11 | 2019-03-27 | 썬더에코 주식회사 | 상용화가 가능한 플라즈마 상태의 고농도 산화질소를 갖는 다량의 플라즈마가 생성되는 썬더볼트 방전장치 |
CA3114863C (en) * | 2018-11-19 | 2023-06-27 | Kvarc Services Inc | Coating apparatus and method for use thereof |
CN110747437A (zh) * | 2019-12-06 | 2020-02-04 | 北京师范大学 | 一种磁过滤管道 |
DE102020215892A1 (de) | 2020-12-15 | 2022-06-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung zur Ausbildung von amorphen Kohlenstoffschichten auf Bauteiloberflächen mit reduzierter Oberflächenrauheit |
KR102406350B1 (ko) | 2022-03-31 | 2022-06-08 | 주식회사 조양 | 플라즈마 생성용 가스 도관 제조방법 및 이에 따라 제조된 가스 도관 |
KR20230149066A (ko) | 2022-04-19 | 2023-10-26 | 주식회사 코리아모빌리티 | 전압 및 주파수 가변 플라즈마 고전압 발생기가 구비된 공기청정기 |
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US484582A (en) * | 1892-10-18 | Process of duplicating phonograms | ||
US2972695A (en) * | 1957-05-24 | 1961-02-21 | Vickers Electrical Co Ltd | Stabilisation of low pressure d.c. arc discharges |
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FR2349391A2 (fr) * | 1976-04-28 | 1977-11-25 | Commissariat Energie Atomique | Procede et dispositif de soudage de pieces massives par bombardement electronique |
FR2349771A1 (fr) * | 1976-04-28 | 1977-11-25 | Commissariat Energie Atomique | Dispositif d'etancheite pour enceinte a vide |
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US4452686A (en) * | 1982-03-22 | 1984-06-05 | Axenov Ivan I | Arc plasma generator and a plasma arc apparatus for treating the surfaces of work-pieces, incorporating the same arc plasma generator |
AT376460B (de) * | 1982-09-17 | 1984-11-26 | Kljuchko Gennady V | Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen |
US4673477A (en) * | 1984-03-02 | 1987-06-16 | Regents Of The University Of Minnesota | Controlled vacuum arc material deposition, method and apparatus |
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US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
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US5037522B1 (en) * | 1990-07-24 | 1996-07-02 | Vergason Technology Inc | Electric arc vapor deposition device |
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EP0577667B1 (de) * | 1991-03-25 | 1998-07-22 | Commonwealth Scientific And Industrial Research Organisation | Makroteilchenfilter in lichtbogenquelle |
US5282944A (en) * | 1992-07-30 | 1994-02-01 | The United States Of America As Represented By The United States Department Of Energy | Ion source based on the cathodic arc |
US5279723A (en) * | 1992-07-30 | 1994-01-18 | As Represented By The United States Department Of Energy | Filtered cathodic arc source |
US5435900A (en) * | 1992-11-04 | 1995-07-25 | Gorokhovsky; Vladimir I. | Apparatus for application of coatings in vacuum |
US5468363A (en) * | 1994-04-25 | 1995-11-21 | Regents Of The University Of California | Magnetic-cusp, cathodic-arc source |
-
1994
- 1994-04-25 US US08/233,006 patent/US5480527A/en not_active Expired - Lifetime
-
1995
- 1995-04-25 AT AT95917050T patent/ATE244777T1/de not_active IP Right Cessation
- 1995-04-25 AU AU23887/95A patent/AU695441B2/en not_active Ceased
- 1995-04-25 WO PCT/US1995/004786 patent/WO1995029272A1/en active IP Right Grant
- 1995-04-25 CA CA002188799A patent/CA2188799A1/en not_active Abandoned
- 1995-04-25 DE DE69531240T patent/DE69531240D1/de not_active Expired - Lifetime
- 1995-04-25 JP JP52772895A patent/JP3868483B2/ja not_active Expired - Fee Related
- 1995-04-25 KR KR1019960706023A patent/KR100361620B1/ko not_active IP Right Cessation
- 1995-04-25 EP EP95917050A patent/EP0758408B1/de not_active Expired - Lifetime
- 1995-12-22 US US08/577,810 patent/US5840163A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3868483B2 (ja) | 2007-01-17 |
JPH10505633A (ja) | 1998-06-02 |
AU2388795A (en) | 1995-11-16 |
EP0758408A1 (de) | 1997-02-19 |
EP0758408A4 (de) | 2000-01-26 |
CA2188799A1 (en) | 1995-11-02 |
US5480527A (en) | 1996-01-02 |
AU695441B2 (en) | 1998-08-13 |
DE69531240D1 (de) | 2003-08-14 |
WO1995029272A1 (en) | 1995-11-02 |
KR100361620B1 (ko) | 2003-02-17 |
US5840163A (en) | 1998-11-24 |
EP0758408B1 (de) | 2003-07-09 |
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