CN110747437A - 一种磁过滤管道 - Google Patents
一种磁过滤管道 Download PDFInfo
- Publication number
- CN110747437A CN110747437A CN201911239897.2A CN201911239897A CN110747437A CN 110747437 A CN110747437 A CN 110747437A CN 201911239897 A CN201911239897 A CN 201911239897A CN 110747437 A CN110747437 A CN 110747437A
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- Prior art keywords
- rectangular pipe
- magnetic
- coil
- inlet
- conduit according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000001914 filtration Methods 0.000 title claims abstract description 55
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000004804 winding Methods 0.000 claims description 31
- 230000007704 transition Effects 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000009286 beneficial effect Effects 0.000 abstract description 5
- 239000013077 target material Substances 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 14
- 238000000151 deposition Methods 0.000 description 11
- 239000002245 particle Substances 0.000 description 7
- 238000005452 bending Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Filtering Materials (AREA)
Abstract
Description
Claims (10)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911239897.2A CN110747437A (zh) | 2019-12-06 | 2019-12-06 | 一种磁过滤管道 |
US16/883,326 US11189468B2 (en) | 2019-12-06 | 2020-05-26 | Magnetic filter tube |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911239897.2A CN110747437A (zh) | 2019-12-06 | 2019-12-06 | 一种磁过滤管道 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110747437A true CN110747437A (zh) | 2020-02-04 |
Family
ID=69285690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201911239897.2A Pending CN110747437A (zh) | 2019-12-06 | 2019-12-06 | 一种磁过滤管道 |
Country Status (2)
Country | Link |
---|---|
US (1) | US11189468B2 (zh) |
CN (1) | CN110747437A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022001342A1 (zh) * | 2020-07-02 | 2022-01-06 | 安徽纯源镀膜科技有限公司 | 用于等离子体传送的传输通道装置及镀膜设备 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1081247A2 (en) * | 1999-08-18 | 2001-03-07 | Nissin Electric Co., Ltd. | Arc type ion plating apparatus |
EP1316986A1 (en) * | 2001-11-30 | 2003-06-04 | Nissin Electric Co., Ltd. | Vacuum arc vapor deposition process and apparatus |
CN1460638A (zh) * | 2003-06-11 | 2003-12-10 | 中国科学院上海微系统与信息技术研究所 | 鳞状碳纳米管、制备方法和专用装置 |
CN2594277Y (zh) * | 2003-01-15 | 2003-12-24 | 北京师范大学 | 视线外磁过滤金属蒸气真空弧等离子体沉积源 |
CN2683626Y (zh) * | 2004-02-20 | 2005-03-09 | 云南省分析测试研究所 | 磁控电弧法制备纳米结构材料的装置 |
US20070034509A1 (en) * | 2005-08-12 | 2007-02-15 | Ching-Ching Chen | Magnetic filter for physical vapor deposition equipment |
CN101321427A (zh) * | 2008-07-22 | 2008-12-10 | 核工业西南物理研究院 | 直流磁过滤阴极真空弧等离子体源 |
CN101792895A (zh) * | 2010-03-25 | 2010-08-04 | 中国科学院宁波材料技术与工程研究所 | 阴极真空电弧源薄膜沉积装置及沉积薄膜的方法 |
CN108842133A (zh) * | 2018-05-31 | 2018-11-20 | 北京师范大学 | 一种图形化静电卡盘的制备方法和设备 |
CN211665167U (zh) * | 2019-12-06 | 2020-10-13 | 北京师范大学 | 一种磁过滤管道 |
CN112176292A (zh) * | 2020-09-18 | 2021-01-05 | 广东汇成真空科技股份有限公司 | 一种磁过滤弧镀膜装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5480527A (en) * | 1994-04-25 | 1996-01-02 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
GB9503304D0 (en) * | 1995-02-20 | 1995-04-12 | Univ Nanyang | Deposition apparatus |
US5985115A (en) * | 1997-04-11 | 1999-11-16 | Novellus Systems, Inc. | Internally cooled target assembly for magnetron sputtering |
US6465793B1 (en) * | 1999-03-31 | 2002-10-15 | The Regents Of The University Of California | Arc initiation in cathodic arc plasma sources |
-
2019
- 2019-12-06 CN CN201911239897.2A patent/CN110747437A/zh active Pending
-
2020
- 2020-05-26 US US16/883,326 patent/US11189468B2/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1081247A2 (en) * | 1999-08-18 | 2001-03-07 | Nissin Electric Co., Ltd. | Arc type ion plating apparatus |
EP1316986A1 (en) * | 2001-11-30 | 2003-06-04 | Nissin Electric Co., Ltd. | Vacuum arc vapor deposition process and apparatus |
CN2594277Y (zh) * | 2003-01-15 | 2003-12-24 | 北京师范大学 | 视线外磁过滤金属蒸气真空弧等离子体沉积源 |
CN1460638A (zh) * | 2003-06-11 | 2003-12-10 | 中国科学院上海微系统与信息技术研究所 | 鳞状碳纳米管、制备方法和专用装置 |
CN2683626Y (zh) * | 2004-02-20 | 2005-03-09 | 云南省分析测试研究所 | 磁控电弧法制备纳米结构材料的装置 |
US20070034509A1 (en) * | 2005-08-12 | 2007-02-15 | Ching-Ching Chen | Magnetic filter for physical vapor deposition equipment |
CN101321427A (zh) * | 2008-07-22 | 2008-12-10 | 核工业西南物理研究院 | 直流磁过滤阴极真空弧等离子体源 |
CN101792895A (zh) * | 2010-03-25 | 2010-08-04 | 中国科学院宁波材料技术与工程研究所 | 阴极真空电弧源薄膜沉积装置及沉积薄膜的方法 |
CN108842133A (zh) * | 2018-05-31 | 2018-11-20 | 北京师范大学 | 一种图形化静电卡盘的制备方法和设备 |
CN211665167U (zh) * | 2019-12-06 | 2020-10-13 | 北京师范大学 | 一种磁过滤管道 |
CN112176292A (zh) * | 2020-09-18 | 2021-01-05 | 广东汇成真空科技股份有限公司 | 一种磁过滤弧镀膜装置 |
Non-Patent Citations (1)
Title |
---|
丁剑飞;吴先映;李强;周奎;王桂岳;冷崇燕;: "磁过滤阴极真空弧沉积法制备TiAlN薄膜的研究", 真空, no. 04, pages 24 - 28 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022001342A1 (zh) * | 2020-07-02 | 2022-01-06 | 安徽纯源镀膜科技有限公司 | 用于等离子体传送的传输通道装置及镀膜设备 |
Also Published As
Publication number | Publication date |
---|---|
US11189468B2 (en) | 2021-11-30 |
US20210175053A1 (en) | 2021-06-10 |
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Inventor after: Liao Bin Inventor after: Yingminju Inventor after: OuYang Xiaoping Inventor after: Hua Qingsong Inventor after: Luo Jun Inventor after: Chen Lin Inventor after: Zhang Xu Inventor after: Wu Xianying Inventor after: Pang Pan Inventor after: Han Ran Inventor before: Liao Bin Inventor before: Pang Pan Inventor before: Han Ran Inventor before: Yingminju Inventor before: OuYang Xiaoping Inventor before: Hua Qingsong Inventor before: He Weifeng Inventor before: He Guangyu Inventor before: Luo Jun Inventor before: Chen Lin Inventor before: Zhang Xu Inventor before: Wu Xianying |