AT376460B - Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen - Google Patents

Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen

Info

Publication number
AT376460B
AT376460B AT0330782A AT330782A AT376460B AT 376460 B AT376460 B AT 376460B AT 0330782 A AT0330782 A AT 0330782A AT 330782 A AT330782 A AT 330782A AT 376460 B AT376460 B AT 376460B
Authority
AT
Austria
Prior art keywords
plasma arc
arc device
applying covers
covers
applying
Prior art date
Application number
AT0330782A
Other languages
English (en)
Other versions
ATA330782A (de
Inventor
Gennady Vasilievich Kljuchko
Valentin Glebovich Padalka
Leonid Pavlovich Sablev
Rimma Ivanovna Stupak
Original Assignee
Kljuchko Gennady V
Padalka Valentin G
Sablev Leonid P
Rimma Ivanovna Stupak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kljuchko Gennady V, Padalka Valentin G, Sablev Leonid P, Rimma Ivanovna Stupak filed Critical Kljuchko Gennady V
Publication of ATA330782A publication Critical patent/ATA330782A/de
Application granted granted Critical
Publication of AT376460B publication Critical patent/AT376460B/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
AT0330782A 1982-09-17 1982-09-03 Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen AT376460B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08226496A GB2127043B (en) 1982-09-17 1982-09-17 Plasma arc apparatus for applying coatings

Publications (2)

Publication Number Publication Date
ATA330782A ATA330782A (de) 1984-04-15
AT376460B true AT376460B (de) 1984-11-26

Family

ID=10532967

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0330782A AT376460B (de) 1982-09-17 1982-09-03 Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen

Country Status (7)

Country Link
US (1) US4492845A (de)
AT (1) AT376460B (de)
CH (1) CH656400A5 (de)
DE (1) DE3234100C2 (de)
FR (1) FR2533398A1 (de)
GB (1) GB2127043B (de)
SE (1) SE450539B (de)

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Citations (4)

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GB1258301A (de) * 1968-03-15 1971-12-30
US4090941A (en) * 1977-03-18 1978-05-23 United Technologies Corporation Cathode sputtering apparatus
US4219397A (en) * 1978-11-24 1980-08-26 Clarke Peter J Magnetron sputter apparatus
US4243505A (en) * 1979-06-18 1981-01-06 Telic Corporation Magnetic field generator for use in sputtering apparatus

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Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
GB1258301A (de) * 1968-03-15 1971-12-30
US4090941A (en) * 1977-03-18 1978-05-23 United Technologies Corporation Cathode sputtering apparatus
US4219397A (en) * 1978-11-24 1980-08-26 Clarke Peter J Magnetron sputter apparatus
US4243505A (en) * 1979-06-18 1981-01-06 Telic Corporation Magnetic field generator for use in sputtering apparatus

Also Published As

Publication number Publication date
DE3234100A1 (de) 1984-03-15
FR2533398B1 (de) 1985-02-08
GB2127043B (en) 1985-10-23
SE450539B (sv) 1987-06-29
FR2533398A1 (fr) 1984-03-23
SE8205250D0 (sv) 1982-09-14
DE3234100C2 (de) 1985-04-11
US4492845A (en) 1985-01-08
CH656400A5 (de) 1986-06-30
GB2127043A (en) 1984-04-04
SE8205250L (sv) 1984-03-15
ATA330782A (de) 1984-04-15

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Legal Events

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ELJ Ceased due to non-payment of the annual fee
ELJ Ceased due to non-payment of the annual fee