GB1258301A - - Google Patents

Info

Publication number
GB1258301A
GB1258301A GB1258301DA GB1258301A GB 1258301 A GB1258301 A GB 1258301A GB 1258301D A GB1258301D A GB 1258301DA GB 1258301 A GB1258301 A GB 1258301A
Authority
GB
United Kingdom
Prior art keywords
electrode
substrate
march
sputtering apparatus
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1258301A publication Critical patent/GB1258301A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB1258301D 1968-03-15 1969-03-13 Expired GB1258301A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990468 1968-03-15

Publications (1)

Publication Number Publication Date
GB1258301A true GB1258301A (de) 1971-12-30

Family

ID=12012180

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1258301D Expired GB1258301A (de) 1968-03-15 1969-03-13

Country Status (2)

Country Link
US (1) US3644191A (de)
GB (1) GB1258301A (de)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
GB2153975A (en) * 1984-02-03 1985-08-29 Petroles Cie Francaise Control valve
GB2191787A (en) * 1986-06-23 1987-12-23 Balzers Hochvakuum Process and arrangement for sputtering a material by means of high frequency
DE4022708A1 (de) * 1990-07-17 1992-04-02 Balzers Hochvakuum Aetz- oder beschichtungsanlagen
DE4042417A1 (de) * 1990-07-17 1992-05-14 Balzers Hochvakuum Aetz- oder beschichtungsanlagen
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4041353A (en) * 1971-09-07 1977-08-09 Telic Corporation Glow discharge method and apparatus
GB1485266A (en) * 1973-11-20 1977-09-08 Atomic Energy Authority Uk Storage of material
GB1500701A (en) * 1974-01-24 1978-02-08 Atomic Energy Authority Uk Vapour deposition apparatus
US4268374A (en) * 1979-08-09 1981-05-19 Bell Telephone Laboratories, Incorporated High capacity sputter-etching apparatus
US4990876A (en) * 1989-09-15 1991-02-05 Eastman Kodak Company Magnetic brush, inner core therefor, and method for making such core
US20060124588A1 (en) * 1999-01-05 2006-06-15 Berg & Berg Enterprises, Llc System and method for reducing metal oxides with hydrogen radicals
US6193853B1 (en) 1999-02-25 2001-02-27 Cametoid Limited Magnetron sputtering method and apparatus
KR100829327B1 (ko) * 2002-04-05 2008-05-13 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치 및 반응 용기
WO2006093136A1 (ja) * 2005-03-01 2006-09-08 Hitachi Kokusai Electric Inc. 基板処理装置および半導体デバイスの製造方法
US8176871B2 (en) * 2006-03-28 2012-05-15 Hitachi Kokusai Electric Inc. Substrate processing apparatus
JP5568212B2 (ja) * 2007-09-19 2014-08-06 株式会社日立国際電気 基板処理装置、そのコーティング方法、基板処理方法及び半導体デバイスの製造方法
KR100995700B1 (ko) * 2008-07-14 2010-11-22 한국전기연구원 3차원 표면형상을 갖는 원통형 가공물을 위한 유도 결합형플라즈마 공정 챔버 및 방법

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US4492845A (en) * 1982-09-17 1985-01-08 Kljuchko Gennady V Plasma arc apparatus for applying coatings by means of a consumable cathode
GB2153975A (en) * 1984-02-03 1985-08-29 Petroles Cie Francaise Control valve
GB2191787A (en) * 1986-06-23 1987-12-23 Balzers Hochvakuum Process and arrangement for sputtering a material by means of high frequency
GB2191787B (en) * 1986-06-23 1991-03-13 Balzers Hochvakuum Process and arrangement for sputtering a material by means of high frequency
DE4022708A1 (de) * 1990-07-17 1992-04-02 Balzers Hochvakuum Aetz- oder beschichtungsanlagen
DE4042417A1 (de) * 1990-07-17 1992-05-14 Balzers Hochvakuum Aetz- oder beschichtungsanlagen
US5460707A (en) * 1990-07-17 1995-10-24 Balzers Aktiengesellschaft Etching or coating method and a plant therefor
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method

Also Published As

Publication number Publication date
US3644191A (en) 1972-02-22

Similar Documents

Publication Publication Date Title
GB1258301A (de)
GB834655A (en) Improvements in ionic vacuum pumps
GB1294025A (en) Rf sputtering
US5074984A (en) Method for coating polymethylmethacrylate substrate with aluminum
GB830391A (en) Improvements in or relating to cathodic sputtering of metal and dielectric films
GB1008363A (en) Improvements in or relating to electric discharge apparatus
GB1114644A (en) Sputtering apparatus
GB1391842A (en) Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel
GB1333617A (en) Cathode sputtering apparatus
GB1119277A (en) Improvements in or relating to sputtering apparatus
GB468825A (en) Improvements in or relating to split-anode magnetrons
GB1232125A (de)
GB1295465A (de)
GB1049124A (en) Ion pump
GB1241213A (en) Sequential sputtering apparatus
GB1008362A (en) Improvements in or relating to low pressure mercury vapour discharge tubes
GB931384A (en) Cold cathode electron discharge device
GB956970A (en) Glow discharge device
GB1447754A (en) Apparatus for and process of metal coating
FR2194105A1 (en) Plasma generator for thin film deposition - in which anode and cathode bodies are fixed rigidly together and magnet is fixed to anode
GB1354566A (en) Electrostatic lens arrangements
GB1486171A (en) Plasma gun for ionmilling machine
SU571102A1 (ru) Способ нанесения покрытий
GB943022A (en) Improvements in and relating to x-ray tube construction
JPS5799744A (en) Apparatus and method of plasma etching

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
746 Register noted 'licences of right' (sect. 46/1977)